{"id":"https://openalex.org/W1970075513","doi":"https://doi.org/10.1109/newcas.2012.6329027","title":"Premature edge breakdown prevention techniques in CMOS APD fabrication","display_name":"Premature edge breakdown prevention techniques in CMOS APD fabrication","publication_year":2012,"publication_date":"2012-06-01","ids":{"openalex":"https://openalex.org/W1970075513","doi":"https://doi.org/10.1109/newcas.2012.6329027","mag":"1970075513"},"language":"en","primary_location":{"id":"doi:10.1109/newcas.2012.6329027","is_oa":false,"landing_page_url":"https://doi.org/10.1109/newcas.2012.6329027","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"10th IEEE International NEWCAS Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5079553023","display_name":"Ehsan Kamrani","orcid":"https://orcid.org/0000-0002-0919-1179"},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":true,"raw_author_name":"Ehsan Kamrani","raw_affiliation_strings":["Electrical Engineering Department, Ecole Polytechnique, Montreal, QUE, Canada","[Electrical Engineering Department, \u00c9cole Polytechnique Montr\u00e9al, Qu\u00e9bec, Canada]"],"affiliations":[{"raw_affiliation_string":"Electrical Engineering Department, Ecole Polytechnique, Montreal, QUE, Canada","institution_ids":["https://openalex.org/I45683168"]},{"raw_affiliation_string":"[Electrical Engineering Department, \u00c9cole Polytechnique Montr\u00e9al, Qu\u00e9bec, Canada]","institution_ids":["https://openalex.org/I45683168"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075040052","display_name":"Fr\u00e9d\u00e9ric Lesage","orcid":"https://orcid.org/0000-0003-3699-1283"},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Frederic Lesage","raw_affiliation_strings":["Electrical Engineering Department, Ecole Polytechnique, Montreal, QUE, Canada","[Electrical Engineering Department, \u00c9cole Polytechnique Montr\u00e9al, Qu\u00e9bec, Canada]"],"affiliations":[{"raw_affiliation_string":"Electrical Engineering Department, Ecole Polytechnique, Montreal, QUE, Canada","institution_ids":["https://openalex.org/I45683168"]},{"raw_affiliation_string":"[Electrical Engineering Department, \u00c9cole Polytechnique Montr\u00e9al, Qu\u00e9bec, Canada]","institution_ids":["https://openalex.org/I45683168"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5082509767","display_name":"Mohamad Sawan","orcid":null},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Mohamad Sawan","raw_affiliation_strings":["Electrical Engineering Department, Ecole Polytechnique, Montreal, QUE, Canada","[Electrical Engineering Department, \u00c9cole Polytechnique Montr\u00e9al, Qu\u00e9bec, Canada]"],"affiliations":[{"raw_affiliation_string":"Electrical Engineering Department, Ecole Polytechnique, Montreal, QUE, Canada","institution_ids":["https://openalex.org/I45683168"]},{"raw_affiliation_string":"[Electrical Engineering Department, \u00c9cole Polytechnique Montr\u00e9al, Qu\u00e9bec, Canada]","institution_ids":["https://openalex.org/I45683168"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5079553023"],"corresponding_institution_ids":["https://openalex.org/I45683168"],"apc_list":null,"apc_paid":null,"fwci":6.7529,"has_fulltext":false,"cited_by_count":14,"citation_normalized_percentile":{"value":0.96268233,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":null,"issue":null,"first_page":"345","last_page":"348"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12153","display_name":"Advanced Optical Sensing Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12153","display_name":"Advanced Optical Sensing Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/avalanche-photodiode","display_name":"Avalanche photodiode","score":0.781552791595459},{"id":"https://openalex.org/keywords/miniaturization","display_name":"Miniaturization","score":0.689063549041748},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.5939561128616333},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.5915255546569824},{"id":"https://openalex.org/keywords/guard","display_name":"Guard (computer science)","score":0.5654810667037964},{"id":"https://openalex.org/keywords/enhanced-data-rates-for-gsm-evolution","display_name":"Enhanced Data Rates for GSM Evolution","score":0.459267258644104},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4476012885570526},{"id":"https://openalex.org/keywords/detector","display_name":"Detector","score":0.42965394258499146},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.38300466537475586},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.344340980052948},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.3435477614402771},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3236117959022522},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2954895496368408},{"id":"https://openalex.org/keywords/telecommunications","display_name":"Telecommunications","score":0.1154043972492218}],"concepts":[{"id":"https://openalex.org/C109679912","wikidata":"https://www.wikidata.org/wiki/Q175932","display_name":"Avalanche photodiode","level":3,"score":0.781552791595459},{"id":"https://openalex.org/C57528182","wikidata":"https://www.wikidata.org/wiki/Q1271842","display_name":"Miniaturization","level":2,"score":0.689063549041748},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.5939561128616333},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.5915255546569824},{"id":"https://openalex.org/C141141315","wikidata":"https://www.wikidata.org/wiki/Q2379942","display_name":"Guard (computer science)","level":2,"score":0.5654810667037964},{"id":"https://openalex.org/C162307627","wikidata":"https://www.wikidata.org/wiki/Q204833","display_name":"Enhanced Data Rates for GSM Evolution","level":2,"score":0.459267258644104},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4476012885570526},{"id":"https://openalex.org/C94915269","wikidata":"https://www.wikidata.org/wiki/Q1834857","display_name":"Detector","level":2,"score":0.42965394258499146},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.38300466537475586},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.344340980052948},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3435477614402771},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3236117959022522},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2954895496368408},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.1154043972492218},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/newcas.2012.6329027","is_oa":false,"landing_page_url":"https://doi.org/10.1109/newcas.2012.6329027","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"10th IEEE International NEWCAS Conference","raw_type":"proceedings-article"},{"id":"pmh:oai:publications.polymtl.ca:15202","is_oa":false,"landing_page_url":"https://publications.polymtl.ca/15202/","pdf_url":null,"source":{"id":"https://openalex.org/S4306401013","display_name":"PolyPublie (\u00c9cole Polytechnique de Montr\u00e9al)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I45683168","host_organization_name":"Polytechnique Montr\u00e9al","host_organization_lineage":["https://openalex.org/I45683168"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Communication de conf\u00e9rence"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320994","display_name":"Canada Research Chairs","ror":"https://ror.org/0517h6h17"},{"id":"https://openalex.org/F4320334392","display_name":"Health Canada","ror":"https://ror.org/05p8nb362"},{"id":"https://openalex.org/F4320334506","display_name":"Canadian Institutes of Health Research","ror":"https://ror.org/01gavpb45"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1964568578","https://openalex.org/W2012924090","https://openalex.org/W2026096371","https://openalex.org/W2074640843","https://openalex.org/W2090345877","https://openalex.org/W2102204611","https://openalex.org/W2103394958","https://openalex.org/W2103885486","https://openalex.org/W2104698724","https://openalex.org/W2136103934","https://openalex.org/W2151016044","https://openalex.org/W2155697465","https://openalex.org/W2495080454"],"related_works":["https://openalex.org/W2167717389","https://openalex.org/W2122883036","https://openalex.org/W2540126364","https://openalex.org/W2030831940","https://openalex.org/W2367110087","https://openalex.org/W2538219064","https://openalex.org/W2121868920","https://openalex.org/W2058172954","https://openalex.org/W2038631214","https://openalex.org/W2536686777","https://openalex.org/W2139746732","https://openalex.org/W2565826091","https://openalex.org/W2080637318","https://openalex.org/W2077551696","https://openalex.org/W2160841000","https://openalex.org/W3111399584","https://openalex.org/W2117911862","https://openalex.org/W1568573568","https://openalex.org/W2545806777","https://openalex.org/W2163442929"],"abstract_inverted_index":{"In":[0],"this":[1],"paper":[2],"we":[3],"have":[4],"introduced":[5,97],"the":[6,51,72,77,82,104],"most":[7],"popular":[8],"applied":[9],"premature":[10],"edge":[11],"breakdown":[12,136],"prevention":[13],"(PEBP)":[14],"techniques":[15,60],"and":[16,21,41,87,98,134],"proposed":[17,58],"a":[18,28,64,85,90,109,123],"new":[19,91],"practical":[20],"efficient":[22],"design":[23,27],"procedure":[24],"technique":[25,95],"to":[26,49],"functional":[29],"avalanche":[30],"photodiode":[31],"using":[32,103],"standard":[33],"CMOS":[34],"process":[35],"based":[36],"on":[37,76],"our":[38],"design,":[39],"simulation":[40],"fabrication":[42,83],"experiences.":[43],"The":[44],"device":[45,105],"simulations":[46],"are":[47,61],"used":[48],"find":[50],"best":[52],"dimensional":[53],"values":[54],"minimizing":[55],"PEB.":[56],"Three":[57],"PEBP":[59,94],"emerged":[62],"from":[63,81],"systematic":[65],"study":[66],"aimed":[67],"at":[68,120,130],"miniaturization,":[69],"while":[70],"optimizing":[71],"overall":[73],"performance.":[74],"Based":[75],"experimental":[78],"results":[79],"gained":[80],"of":[84,113,128],"p-well":[86],"p-sub":[88],"guard-rings":[89],"n-well":[92],"guard-ring":[93],"is":[96,101],"its":[99],"performance":[100],"evaluated":[102],"simulation.":[106],"It":[107],"exhibits":[108],"dark":[110],"count":[111],"rate":[112],"1":[114],"kHz":[115],"(with":[116],"0.5V":[117],"excess":[118,132],"bias":[119,133],"room":[121],"temperature),":[122],"maximum":[124,131],"photon":[125],"detection":[126],"probability":[127],"70%":[129],"9V":[135],"voltage.":[137]},"counts_by_year":[{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2015,"cited_by_count":3},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":2}],"updated_date":"2026-03-20T23:20:44.827607","created_date":"2025-10-10T00:00:00"}