{"id":"https://openalex.org/W3189944800","doi":"https://doi.org/10.1109/nems51815.2021.9451358","title":"Mass fabrication of 4H-SiC high temperature pressure sensors by femtosecond laser etching","display_name":"Mass fabrication of 4H-SiC high temperature pressure sensors by femtosecond laser etching","publication_year":2021,"publication_date":"2021-04-25","ids":{"openalex":"https://openalex.org/W3189944800","doi":"https://doi.org/10.1109/nems51815.2021.9451358","mag":"3189944800"},"language":"en","primary_location":{"id":"doi:10.1109/nems51815.2021.9451358","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems51815.2021.9451358","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2021 IEEE 16th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5003404584","display_name":"Lukang Wang","orcid":"https://orcid.org/0000-0002-5363-0140"},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Lukang Wang","raw_affiliation_strings":["The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","an Jiaotong University, Xi&#x0027","an, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","institution_ids":[]},{"raw_affiliation_string":"an Jiaotong University, Xi&#x0027","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"an, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083126155","display_name":"You Zhao","orcid":"https://orcid.org/0000-0002-8305-5984"},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"You Zhao","raw_affiliation_strings":["The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","an Jiaotong University, Xi&#x0027","an, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","institution_ids":[]},{"raw_affiliation_string":"an Jiaotong University, Xi&#x0027","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"an, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056618863","display_name":"Yulong Zhao","orcid":"https://orcid.org/0000-0001-9186-3204"},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yulong Zhao","raw_affiliation_strings":["The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","an Jiaotong University, Xi&#x0027","an, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","institution_ids":[]},{"raw_affiliation_string":"an Jiaotong University, Xi&#x0027","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"an, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5114500390","display_name":"Yu Yang","orcid":"https://orcid.org/0000-0001-5365-4890"},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yu Yang","raw_affiliation_strings":["The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","an Jiaotong University, Xi&#x0027","an, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","institution_ids":[]},{"raw_affiliation_string":"an Jiaotong University, Xi&#x0027","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"an, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055273736","display_name":"Bo Li","orcid":"https://orcid.org/0000-0002-7513-0657"},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Bo Li","raw_affiliation_strings":["The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","an Jiaotong University, Xi&#x0027","an, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","institution_ids":[]},{"raw_affiliation_string":"an Jiaotong University, Xi&#x0027","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"an, China","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103947984","display_name":"Taobo Gong","orcid":null},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Taobo Gong","raw_affiliation_strings":["The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","an Jiaotong University, Xi&#x0027","an, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi'an Jiaotong University, Xi'an, China","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"The State Key Laboratory for Mechanical Manufacturing Systems, Xi&#x0027","institution_ids":[]},{"raw_affiliation_string":"an Jiaotong University, Xi&#x0027","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"an, China","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I87445476"],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1478","last_page":"1481"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9991999864578247,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/femtosecond","display_name":"Femtosecond","score":0.8586384057998657},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.8466508388519287},{"id":"https://openalex.org/keywords/silicon-carbide","display_name":"Silicon carbide","score":0.7968167066574097},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.7568548917770386},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.6263366937637329},{"id":"https://openalex.org/keywords/laser","display_name":"Laser","score":0.6173851490020752},{"id":"https://openalex.org/keywords/deep-reactive-ion-etching","display_name":"Deep reactive-ion etching","score":0.5604208707809448},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5177665948867798},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.5146423578262329},{"id":"https://openalex.org/keywords/dry-etching","display_name":"Dry etching","score":0.5074195265769958},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"Surface roughness","score":0.45799949765205383},{"id":"https://openalex.org/keywords/surface-finish","display_name":"Surface finish","score":0.44011181592941284},{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"Reactive-ion etching","score":0.4020380973815918},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.3853301703929901},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.21910390257835388},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.1929159164428711}],"concepts":[{"id":"https://openalex.org/C167735695","wikidata":"https://www.wikidata.org/wiki/Q1777507","display_name":"Femtosecond","level":3,"score":0.8586384057998657},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8466508388519287},{"id":"https://openalex.org/C2780722187","wikidata":"https://www.wikidata.org/wiki/Q412356","display_name":"Silicon carbide","level":2,"score":0.7968167066574097},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7568548917770386},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6263366937637329},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.6173851490020752},{"id":"https://openalex.org/C124634506","wikidata":"https://www.wikidata.org/wiki/Q486936","display_name":"Deep reactive-ion etching","level":5,"score":0.5604208707809448},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5177665948867798},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5146423578262329},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.5074195265769958},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.45799949765205383},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.44011181592941284},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.4020380973815918},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3853301703929901},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.21910390257835388},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.1929159164428711},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems51815.2021.9451358","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems51815.2021.9451358","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2021 IEEE 16th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.8999999761581421,"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy"}],"awards":[{"id":"https://openalex.org/G2764252283","display_name":null,"funder_award_id":"2020ZDLGY14-10","funder_id":"https://openalex.org/F4320336350","funder_display_name":"Key Research and Development Projects of Shaanxi Province"},{"id":"https://openalex.org/G3637805126","display_name":null,"funder_award_id":"51705408","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G4292360069","display_name":null,"funder_award_id":"2017YFB1102900","funder_id":"https://openalex.org/F4320335777","funder_display_name":"National Key Research and Development Program of China"}],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"},{"id":"https://openalex.org/F4320335777","display_name":"National Key Research and Development Program of China","ror":null},{"id":"https://openalex.org/F4320336350","display_name":"Key Research and Development Projects of Shaanxi Province","ror":null}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":10,"referenced_works":["https://openalex.org/W651784078","https://openalex.org/W1996702057","https://openalex.org/W2053397650","https://openalex.org/W2141664132","https://openalex.org/W2178269323","https://openalex.org/W2592188400","https://openalex.org/W2883229649","https://openalex.org/W3024359547","https://openalex.org/W3096546718","https://openalex.org/W3120700804"],"related_works":["https://openalex.org/W2507729704","https://openalex.org/W2045553774","https://openalex.org/W3163667899","https://openalex.org/W2360464821","https://openalex.org/W1504164758","https://openalex.org/W2011001474","https://openalex.org/W2014359839","https://openalex.org/W2093631838","https://openalex.org/W2027983671","https://openalex.org/W2512909473"],"abstract_inverted_index":{"4H":[0],"Silicon":[1],"carbide":[2],"(4H-SiC)":[3],"is":[4],"one":[5],"of":[6,26,32,53,78],"the":[7,19,50,76,80],"most":[8],"promising":[9],"materials":[10],"for":[11,91],"pressure":[12,34,92],"sensing":[13],"in":[14,68],"harsh":[15],"environments.":[16],"Due":[17],"to":[18,48,85],"low":[20,65],"efficiency":[21],"and":[22,64],"high":[23],"energy":[24],"consumption":[25],"dry":[27],"etching":[28,70],"process,":[29],"mass":[30],"manufacturing":[31],"SiC":[33,88],"sensors":[35],"has":[36],"always":[37],"been":[38],"a":[39],"challenging":[40],"problem.":[41],"A":[42],"Yb:KGW":[43],"femtosecond":[44,81],"laser":[45,82],"was":[46],"used":[47],"perform":[49],"circular":[51],"diaphragms":[52],"bulk":[54,87],"4H-SiC":[55],"by":[56],"parallel":[57],"straight":[58],"line":[59],"scanning.":[60],"Small":[61],"dimension":[62],"errors":[63],"surface":[66],"roughness":[67],"rapid":[69],"process":[71],"were":[72],"measured.":[73],"This":[74],"indicates":[75],"potential":[77],"utilising":[79],"scanning":[83],"approach":[84],"mass-fabricate":[86],"sensor":[89],"chips":[90],"sensing.":[93]},"counts_by_year":[{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":3}],"updated_date":"2026-07-28T07:46:37.118299","created_date":"2025-10-10T00:00:00"}