{"id":"https://openalex.org/W2903576356","doi":"https://doi.org/10.1109/nems.2018.8557011","title":"Modeling and Fabrication of Timed-Development-and-Thermal-Reflow (TDTR) Process for Microlens","display_name":"Modeling and Fabrication of Timed-Development-and-Thermal-Reflow (TDTR) Process for Microlens","publication_year":2018,"publication_date":"2018-04-01","ids":{"openalex":"https://openalex.org/W2903576356","doi":"https://doi.org/10.1109/nems.2018.8557011","mag":"2903576356"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2018.8557011","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2018.8557011","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2018 IEEE 13th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5042776767","display_name":"Gyuhyeong Goh","orcid":"https://orcid.org/0000-0002-1685-3927"},"institutions":[{"id":"https://openalex.org/I189590672","display_name":"Kansas State University","ror":"https://ror.org/05p1j8758","country_code":"US","type":"education","lineage":["https://openalex.org/I189590672"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Gyuhyeong Goh","raw_affiliation_strings":["Department of Statistics, Kansas State University, Manhattan, KS, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Statistics, Kansas State University, Manhattan, KS, USA","institution_ids":["https://openalex.org/I189590672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085619140","display_name":"Jun Ying Tan","orcid":"https://orcid.org/0000-0001-9052-5705"},"institutions":[{"id":"https://openalex.org/I189590672","display_name":"Kansas State University","ror":"https://ror.org/05p1j8758","country_code":"US","type":"education","lineage":["https://openalex.org/I189590672"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jun Ying Tan","raw_affiliation_strings":["Department of Electrical and Computer Engineering, Kansas State University, Manhattan, KS, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, Kansas State University, Manhattan, KS, USA","institution_ids":["https://openalex.org/I189590672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086915520","display_name":"Kyuseok Lee","orcid":null},"institutions":[{"id":"https://openalex.org/I189590672","display_name":"Kansas State University","ror":"https://ror.org/05p1j8758","country_code":"US","type":"education","lineage":["https://openalex.org/I189590672"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Kyuseok Lee","raw_affiliation_strings":["Department of Electrical and Computer Engineering, Kansas State University, Manhattan, KS, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, Kansas State University, Manhattan, KS, USA","institution_ids":["https://openalex.org/I189590672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030520472","display_name":"Y. Kim","orcid":"https://orcid.org/0000-0001-8341-2868"},"institutions":[{"id":"https://openalex.org/I72816309","display_name":"Drexel University","ror":"https://ror.org/04bdffz58","country_code":"US","type":"education","lineage":["https://openalex.org/I72816309"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yoontae Kim","raw_affiliation_strings":["Department of Mechanical Engineering, Drexel University, Philadelphia, PA, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Mechanical Engineering, Drexel University, Philadelphia, PA, USA","institution_ids":["https://openalex.org/I72816309"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5074821186","display_name":"Jungkwun Kim","orcid":"https://orcid.org/0000-0001-7428-4315"},"institutions":[{"id":"https://openalex.org/I189590672","display_name":"Kansas State University","ror":"https://ror.org/05p1j8758","country_code":"US","type":"education","lineage":["https://openalex.org/I189590672"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jungkwun Kim","raw_affiliation_strings":["Department of Electrical and Computer Engineering, Kansas State University, Manhattan, KS, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, Kansas State University, Manhattan, KS, USA","institution_ids":["https://openalex.org/I189590672"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.1309,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.51309626,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"578","last_page":"581"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photoresist","display_name":"Photoresist","score":0.9084932804107666},{"id":"https://openalex.org/keywords/microlens","display_name":"Microlens","score":0.7504011392593384},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.7190772294998169},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6428157687187195},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5767601132392883},{"id":"https://openalex.org/keywords/substrate","display_name":"Substrate (aquarium)","score":0.5091802477836609},{"id":"https://openalex.org/keywords/thermal","display_name":"Thermal","score":0.449354887008667},{"id":"https://openalex.org/keywords/development","display_name":"Development (topology)","score":0.4303463101387024},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.3804185688495636},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.3688836097717285},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.3257199227809906},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.26726940274238586},{"id":"https://openalex.org/keywords/lens","display_name":"Lens (geology)","score":0.25769850611686707},{"id":"https://openalex.org/keywords/geology","display_name":"Geology","score":0.1091005802154541},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.10100013017654419},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.08028489351272583}],"concepts":[{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.9084932804107666},{"id":"https://openalex.org/C192560794","wikidata":"https://www.wikidata.org/wiki/Q500199","display_name":"Microlens","level":3,"score":0.7504011392593384},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.7190772294998169},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6428157687187195},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5767601132392883},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5091802477836609},{"id":"https://openalex.org/C204530211","wikidata":"https://www.wikidata.org/wiki/Q752823","display_name":"Thermal","level":2,"score":0.449354887008667},{"id":"https://openalex.org/C2776542497","wikidata":"https://www.wikidata.org/wiki/Q5266672","display_name":"Development (topology)","level":2,"score":0.4303463101387024},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3804185688495636},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3688836097717285},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3257199227809906},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.26726940274238586},{"id":"https://openalex.org/C15336307","wikidata":"https://www.wikidata.org/wiki/Q1766051","display_name":"Lens (geology)","level":2,"score":0.25769850611686707},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.1091005802154541},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.10100013017654419},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.08028489351272583},{"id":"https://openalex.org/C134306372","wikidata":"https://www.wikidata.org/wiki/Q7754","display_name":"Mathematical analysis","level":1,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C153294291","wikidata":"https://www.wikidata.org/wiki/Q25261","display_name":"Meteorology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2018.8557011","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2018.8557011","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2018 IEEE 13th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","score":0.41999998688697815,"id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1968505967","https://openalex.org/W1972374408","https://openalex.org/W2188990103","https://openalex.org/W2489605225","https://openalex.org/W2528926171","https://openalex.org/W2564934057","https://openalex.org/W2626684082"],"related_works":["https://openalex.org/W2038165602","https://openalex.org/W2070549153","https://openalex.org/W2381921710","https://openalex.org/W1565400633","https://openalex.org/W2088295097","https://openalex.org/W2325870752","https://openalex.org/W2099590874","https://openalex.org/W2373705384","https://openalex.org/W2005267439","https://openalex.org/W1982670279"],"abstract_inverted_index":{"This":[0,120],"paper":[1],"presents":[2],"modeling":[3],"and":[4,60,90,127,135,146,156],"fabrication":[5,161],"of":[6,32,87,94,131,158],"timed-development-and-thermal-reflow":[7],"(TDTR)":[8],"process":[9,42,74],"for":[10],"various":[11,163],"plano-convex/concave":[12],"type":[13],"microlenses":[14,165],"on":[15,35,77,169],"a":[16,23,29,56,62,81,85,91,170],"single":[17,171],"substrate.":[18],"A":[19],"partial":[20],"development":[21,25,88,110],"called":[22,54],"timed":[24],"in":[26],"microlithography":[27],"determines":[28],"remaining":[30],"amount":[31],"uncrosslinked":[33,46],"photoresist":[34,38,47],"the":[36,44,49,66,78,95,103,108,125,128,132,136,142,149,154,159],"non-UV-exposed":[37],"area.":[39,98],"The":[40,71,99],"baking":[41],"turns":[43],"solid":[45],"into":[48],"liquid":[50],"state,":[51],"to":[52,65],"be":[53],"as":[55,84,124],"thermal":[57],"reflow":[58],"process,":[59,162],"creates":[61],"smooth":[63],"meniscus":[64],"UV-exposed":[67],"crosslinked":[68],"side":[69],"wall.":[70],"proposed":[72,160],"TDTR":[73],"was":[75,122],"modeled":[76,140],"relationship":[79,121],"between":[80],"polymer-dissolving":[82],"rate":[83],"function":[86],"time":[89,134],"lateral":[92,115,137],"dimension":[93,138],"chemical":[96],"contact":[97],"longer":[100],"it":[101],"develops,":[102],"deeper":[104,118],"trench":[105],"forms.":[106],"Given":[107],"same":[109],"time,":[111],"trenches":[112],"with":[113,166],"wider":[114],"dimensions":[116],"show":[117],"patterns.":[119],"expressed":[123],"depth":[126],"surface":[129],"profile":[130],"developing":[133],"were":[139,173],"by":[141,148],"nonlinear":[143],"regression":[144],"analysis":[145],"verified":[147],"experimental":[150],"data.":[151],"To":[152],"demonstrate":[153],"feasibility":[155],"usefulness":[157],"plano-convex":[164],"different":[167],"heights":[168],"substrate":[172],"successfully":[174],"fabricated.":[175]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2020,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}