{"id":"https://openalex.org/W2563121643","doi":"https://doi.org/10.1109/nems.2016.7758269","title":"Research of periodic amorphous carbon composite films for MEMS IR source fabricated by magnetron sputtering","display_name":"Research of periodic amorphous carbon composite films for MEMS IR source fabricated by magnetron sputtering","publication_year":2016,"publication_date":"2016-04-01","ids":{"openalex":"https://openalex.org/W2563121643","doi":"https://doi.org/10.1109/nems.2016.7758269","mag":"2563121643"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2016.7758269","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2016.7758269","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5020362768","display_name":"Anjie Ming","orcid":"https://orcid.org/0000-0001-8061-1570"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Anjie Ming","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017178573","display_name":"Weibing Liu","orcid":"https://orcid.org/0000-0003-4885-1675"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I135714990","display_name":"North University of China","ror":"https://ror.org/047bp1713","country_code":"CN","type":"education","lineage":["https://openalex.org/I135714990"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Weibing Liu","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China","National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]},{"raw_affiliation_string":"National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan, People's Republic of China","institution_ids":["https://openalex.org/I135714990"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100408422","display_name":"Lingling Li","orcid":"https://orcid.org/0000-0001-5193-1081"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Lingling Li","raw_affiliation_strings":["ZhongAo Huicheng Technology Co. Ltd, Beijing, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"ZhongAo Huicheng Technology Co. Ltd, Beijing, People's Republic of China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109171564","display_name":"Xilong Sun","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Xilong Sun","raw_affiliation_strings":["Smart Sensor Engineering Center, Jiangsu R&D Center for Internet of Things, Wuxi, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"Smart Sensor Engineering Center, Jiangsu R&D Center for Internet of Things, Wuxi, People's Republic of China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108953497","display_name":"Xuan Zheng","orcid":"https://orcid.org/0000-0001-5800-3026"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xuan Zheng","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China","Smart Sensor Engineering Center, Jiangsu R&D Center for Internet of Things, Wuxi, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]},{"raw_affiliation_string":"Smart Sensor Engineering Center, Jiangsu R&D Center for Internet of Things, Wuxi, People's Republic of China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112462500","display_name":"Weibing Wang","orcid":null},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Weibing Wang","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002509281","display_name":"Qiulin Tan","orcid":"https://orcid.org/0000-0001-7877-9278"},"institutions":[{"id":"https://openalex.org/I135714990","display_name":"North University of China","ror":"https://ror.org/047bp1713","country_code":"CN","type":"education","lineage":["https://openalex.org/I135714990"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Qiulin Tan","raw_affiliation_strings":["National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan, People's Republic of China","institution_ids":["https://openalex.org/I135714990"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054341902","display_name":"Jijun Xiong","orcid":"https://orcid.org/0000-0003-1560-9858"},"institutions":[{"id":"https://openalex.org/I135714990","display_name":"North University of China","ror":"https://ror.org/047bp1713","country_code":"CN","type":"education","lineage":["https://openalex.org/I135714990"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jijun Xiong","raw_affiliation_strings":["National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan, People's Republic of China","institution_ids":["https://openalex.org/I135714990"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100723405","display_name":"Dapeng Chen","orcid":"https://orcid.org/0000-0002-0494-2391"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Dapeng Chen","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China"],"affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Microelectronics, Beijing, People's Republic of China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":9,"corresponding_author_ids":["https://openalex.org/A5020362768"],"corresponding_institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210119392"],"apc_list":null,"apc_paid":null,"fwci":0.1838,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.60235784,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":"34","issue":null,"first_page":"366","last_page":"369"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10461","display_name":"Gas Sensing Nanomaterials and Sensors","score":0.9907000064849854,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10461","display_name":"Gas Sensing Nanomaterials and Sensors","score":0.9907000064849854,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.961899995803833,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.947700023651123,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.838308572769165},{"id":"https://openalex.org/keywords/sputter-deposition","display_name":"Sputter deposition","score":0.8090023398399353},{"id":"https://openalex.org/keywords/microelectromechanical-systems","display_name":"Microelectromechanical systems","score":0.7352456450462341},{"id":"https://openalex.org/keywords/amorphous-solid","display_name":"Amorphous solid","score":0.6632671356201172},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6441046595573425},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.6117437481880188},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.6069622039794922},{"id":"https://openalex.org/keywords/substrate","display_name":"Substrate (aquarium)","score":0.5941815376281738},{"id":"https://openalex.org/keywords/sputtering","display_name":"Sputtering","score":0.5941206216812134},{"id":"https://openalex.org/keywords/titanium","display_name":"Titanium","score":0.5184532999992371},{"id":"https://openalex.org/keywords/infrared","display_name":"Infrared","score":0.517510175704956},{"id":"https://openalex.org/keywords/amorphous-silicon","display_name":"Amorphous silicon","score":0.49742963910102844},{"id":"https://openalex.org/keywords/composite-number","display_name":"Composite number","score":0.47805455327033997},{"id":"https://openalex.org/keywords/amorphous-carbon","display_name":"Amorphous carbon","score":0.4544118642807007},{"id":"https://openalex.org/keywords/carbon-fibers","display_name":"Carbon fibers","score":0.42497169971466064},{"id":"https://openalex.org/keywords/cavity-magnetron","display_name":"Cavity magnetron","score":0.4128761887550354},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.3388426601886749},{"id":"https://openalex.org/keywords/thin-film","display_name":"Thin film","score":0.2393069863319397},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.2305964231491089},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.227285236120224},{"id":"https://openalex.org/keywords/crystalline-silicon","display_name":"Crystalline silicon","score":0.21686145663261414},{"id":"https://openalex.org/keywords/metallurgy","display_name":"Metallurgy","score":0.17303192615509033},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.051074713468551636}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.838308572769165},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.8090023398399353},{"id":"https://openalex.org/C37977207","wikidata":"https://www.wikidata.org/wiki/Q175561","display_name":"Microelectromechanical systems","level":2,"score":0.7352456450462341},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.6632671356201172},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6441046595573425},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6117437481880188},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6069622039794922},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5941815376281738},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5941206216812134},{"id":"https://openalex.org/C506065880","wikidata":"https://www.wikidata.org/wiki/Q716","display_name":"Titanium","level":2,"score":0.5184532999992371},{"id":"https://openalex.org/C158355884","wikidata":"https://www.wikidata.org/wiki/Q11388","display_name":"Infrared","level":2,"score":0.517510175704956},{"id":"https://openalex.org/C2776390347","wikidata":"https://www.wikidata.org/wiki/Q474163","display_name":"Amorphous silicon","level":4,"score":0.49742963910102844},{"id":"https://openalex.org/C104779481","wikidata":"https://www.wikidata.org/wiki/Q50707","display_name":"Composite number","level":2,"score":0.47805455327033997},{"id":"https://openalex.org/C201931942","wikidata":"https://www.wikidata.org/wiki/Q798012","display_name":"Amorphous carbon","level":3,"score":0.4544118642807007},{"id":"https://openalex.org/C140205800","wikidata":"https://www.wikidata.org/wiki/Q5860","display_name":"Carbon fibers","level":3,"score":0.42497169971466064},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.4128761887550354},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3388426601886749},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.2393069863319397},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2305964231491089},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.227285236120224},{"id":"https://openalex.org/C2779667780","wikidata":"https://www.wikidata.org/wiki/Q18206302","display_name":"Crystalline silicon","level":3,"score":0.21686145663261414},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.17303192615509033},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.051074713468551636},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2016.7758269","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2016.7758269","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W1489905572","https://openalex.org/W1967645337","https://openalex.org/W2024376710","https://openalex.org/W2101043804","https://openalex.org/W2101877361","https://openalex.org/W2133031219","https://openalex.org/W2135363291","https://openalex.org/W2160023822","https://openalex.org/W2160677031"],"related_works":["https://openalex.org/W2092364266","https://openalex.org/W3139358434","https://openalex.org/W2088091229","https://openalex.org/W2029460333","https://openalex.org/W2009023799","https://openalex.org/W4254148944","https://openalex.org/W3193980021","https://openalex.org/W3116458923","https://openalex.org/W2944705329","https://openalex.org/W1969786090"],"abstract_inverted_index":{"In":[0],"this":[1],"work,":[2],"we":[3],"present":[4],"a":[5],"newly":[6],"titanium-contained":[7],"periodic":[8],"amorphous":[9],"carbon(a-C)":[10],"composite":[11],"films":[12],"by":[13],"magnetron":[14],"sputtering":[15],"process":[16],"on":[17],"silicon":[18],"(100)":[19],"substrate":[20],"which":[21],"has":[22],"lower":[23],"intrinsic":[24],"compressive":[25],"stress":[26],"that":[27],"can":[28],"be":[29],"used":[30],"in":[31],"electrical":[32],"modulation":[33],"pulsed":[34],"MEMS":[35],"infrared(IR)":[36],"source":[37],"for":[38],"NDIR":[39],"gas":[40],"sensors.":[41],"The":[42],"fabrication":[43],"process,":[44],"results,":[45],"performance":[46],"and":[47],"results":[48],"analysis":[49],"are":[50],"then":[51],"carried":[52],"out.":[53]},"counts_by_year":[{"year":2016,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}