{"id":"https://openalex.org/W2077205725","doi":"https://doi.org/10.1109/nems.2013.6559808","title":"Research on the structure of ultrathin Si PIN detector","display_name":"Research on the structure of ultrathin Si PIN detector","publication_year":2013,"publication_date":"2013-04-01","ids":{"openalex":"https://openalex.org/W2077205725","doi":"https://doi.org/10.1109/nems.2013.6559808","mag":"2077205725"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2013.6559808","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2013.6559808","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5010273030","display_name":"Peiquan Wang","orcid":null},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Peiquan Wang","raw_affiliation_strings":["National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100550853","display_name":"Dayu Tian","orcid":null},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Dayu Tian","raw_affiliation_strings":["National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008120917","display_name":"Shaonan Wang","orcid":null},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Shaonan Wang","raw_affiliation_strings":["National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101860335","display_name":"Min Yu","orcid":"https://orcid.org/0000-0002-5620-469X"},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Min Yu","raw_affiliation_strings":["National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112009202","display_name":"Yufeng Jin","orcid":"https://orcid.org/0000-0002-4218-8297"},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yufeng Jin","raw_affiliation_strings":["National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano, Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Nat. Key Lab. of Nano/Micro Fabrication Technol., Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"629","last_page":"632"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11044","display_name":"Particle Detector Development and Performance","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/3106","display_name":"Nuclear and High Energy Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11044","display_name":"Particle Detector Development and Performance","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/3106","display_name":"Nuclear and High Energy Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11216","display_name":"Radiation Detection and Scintillator Technologies","score":0.9958000183105469,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","score":0.9896000027656555,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/detector","display_name":"Detector","score":0.8342580795288086},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6392353773117065},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5987510085105896},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.5613340735435486},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.48727428913116455},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.24365878105163574},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.24198690056800842},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.18985515832901},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.12714704871177673}],"concepts":[{"id":"https://openalex.org/C94915269","wikidata":"https://www.wikidata.org/wiki/Q1834857","display_name":"Detector","level":2,"score":0.8342580795288086},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6392353773117065},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5987510085105896},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5613340735435486},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.48727428913116455},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.24365878105163574},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.24198690056800842},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.18985515832901},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.12714704871177673}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2013.6559808","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2013.6559808","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4246450666","https://openalex.org/W4388998267","https://openalex.org/W2898370298","https://openalex.org/W2137437058","https://openalex.org/W4390401159","https://openalex.org/W2744391499","https://openalex.org/W2800070131","https://openalex.org/W4230250635","https://openalex.org/W3041790586","https://openalex.org/W2018879842"],"abstract_inverted_index":{"Ultrathin":[0],"PIN":[1,27,47],"Detectors":[2],"have":[3],"been":[4],"applied":[5],"in":[6],"radiation":[7],"detection":[8],"for":[9],"particle":[10],"identification":[11],"and":[12,41,51,58],"etc.":[13],"In":[14],"this":[15],"paper,":[16],"we":[17],"present":[18],"simulation":[19],"research":[20],"on":[21,30],"the":[22,68,72,78,89,100],"structure":[23,40,43,74],"of":[24,44,56,71,102],"ultrathin":[25,45],"Si":[26,46],"detector":[28,48,57],"based":[29],"bonding":[31],"technology":[32],"by":[33,87,98],"using":[34],"Sentaurus":[35],"TCAD":[36],"tool.":[37],"The":[38,53],"normal":[39],"reverse":[42,54,69,73],"are":[49,62],"simulated":[50],"compared.":[52],"current":[55,70],"electrical":[59],"field":[60],"distribution":[61],"analyzed.":[63],"It":[64,84],"is":[65,85],"found":[66],"that":[67],"increases":[75],"fast":[76],"when":[77],"voltage":[79],"exceeds":[80],"a":[81],"threshold":[82],"value.":[83],"explained":[86],"considering":[88],"parasitic":[90],"MOS":[91],"structure.":[92],"This":[93],"effect":[94],"can":[95],"be":[96],"reduced":[97],"increasing":[99],"thickness":[101],"buried":[103],"SiO":[104],"<inf":[105],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[106],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">2</inf>":[107],".":[108]},"counts_by_year":[{"year":2022,"cited_by_count":1}],"updated_date":"2026-07-14T23:27:15.235271","created_date":"2025-10-10T00:00:00"}