{"id":"https://openalex.org/W1983675879","doi":"https://doi.org/10.1109/nems.2013.6559744","title":"In-situ measurement of ion angular distribution in bulk titanium DRIE for modeling the etch profile","display_name":"In-situ measurement of ion angular distribution in bulk titanium DRIE for modeling the etch profile","publication_year":2013,"publication_date":"2013-04-01","ids":{"openalex":"https://openalex.org/W1983675879","doi":"https://doi.org/10.1109/nems.2013.6559744","mag":"1983675879"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2013.6559744","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2013.6559744","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5103325537","display_name":"Jia Hu","orcid":"https://orcid.org/0000-0003-2618-2079"},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jia Hu","raw_affiliation_strings":["MEMS Research Center, Institute of Microelectronics, Peking University, China","Inst. of Microelectron. Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MEMS Research Center, Institute of Microelectronics, Peking University, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Inst. of Microelectron. Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102098349","display_name":"Shuwei He","orcid":null},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Shuwei He","raw_affiliation_strings":["MEMS Research Center, Institute of Microelectronics, Peking University, China","Inst. of Microelectron. Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MEMS Research Center, Institute of Microelectronics, Peking University, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Inst. of Microelectron. Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100395355","display_name":"Yiming Zhang","orcid":"https://orcid.org/0000-0001-9603-2362"},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yiming Zhang","raw_affiliation_strings":["MEMS Research Center, Institute of Microelectronics, Peking University, China","Inst. of Microelectron. Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MEMS Research Center, Institute of Microelectronics, Peking University, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Inst. of Microelectron. Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100659051","display_name":"Jing Chen","orcid":"https://orcid.org/0000-0002-0353-7650"},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jing Chen","raw_affiliation_strings":["MEMS Research Center, Institute of Microelectronics, Peking University, China","Inst. of Microelectron. Peking Univ., Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MEMS Research Center, Institute of Microelectronics, Peking University, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Inst. of Microelectron. Peking Univ., Beijing, China","institution_ids":["https://openalex.org/I20231570"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.4053,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.48784488,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"332","last_page":"335"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.9983999729156494,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/deep-reactive-ion-etching","display_name":"Deep reactive-ion etching","score":0.9765328168869019},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.7187742590904236},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7058770656585693},{"id":"https://openalex.org/keywords/titanium","display_name":"Titanium","score":0.703827440738678},{"id":"https://openalex.org/keywords/ion","display_name":"Ion","score":0.5169524550437927},{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"Reactive-ion etching","score":0.4922980070114136},{"id":"https://openalex.org/keywords/in-situ","display_name":"In situ","score":0.4885319471359253},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4166167676448822},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.30336588621139526},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.16924023628234863},{"id":"https://openalex.org/keywords/metallurgy","display_name":"Metallurgy","score":0.13721579313278198}],"concepts":[{"id":"https://openalex.org/C124634506","wikidata":"https://www.wikidata.org/wiki/Q486936","display_name":"Deep reactive-ion etching","level":5,"score":0.9765328168869019},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7187742590904236},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7058770656585693},{"id":"https://openalex.org/C506065880","wikidata":"https://www.wikidata.org/wiki/Q716","display_name":"Titanium","level":2,"score":0.703827440738678},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.5169524550437927},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.4922980070114136},{"id":"https://openalex.org/C2777822432","wikidata":"https://www.wikidata.org/wiki/Q216681","display_name":"In situ","level":2,"score":0.4885319471359253},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4166167676448822},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.30336588621139526},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.16924023628234863},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.13721579313278198},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2013.6559744","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2013.6559744","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320322701","display_name":"Tianjin University","ror":"https://ror.org/012tb2g32"},{"id":"https://openalex.org/F4320324787","display_name":"Peking University","ror":"https://ror.org/02v51f717"},{"id":"https://openalex.org/F4320335624","display_name":"Institute of Microelectronics of the Chinese Academy of Sciences","ror":"https://ror.org/02s6gs133"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W1976854299","https://openalex.org/W1984186692","https://openalex.org/W1988715457","https://openalex.org/W2000595920","https://openalex.org/W2068031735","https://openalex.org/W2084581619","https://openalex.org/W2133802631","https://openalex.org/W2162790602"],"related_works":["https://openalex.org/W2507729704","https://openalex.org/W2070736010","https://openalex.org/W2359313340","https://openalex.org/W4388376001","https://openalex.org/W2360464821","https://openalex.org/W3001471993","https://openalex.org/W1912896571","https://openalex.org/W2389091192","https://openalex.org/W2009420109","https://openalex.org/W2292233544"],"abstract_inverted_index":{"The":[0],"bulk":[1],"titanium":[2,82],"deep":[3],"reactive":[4],"ion":[5,41],"etching":[6,25,68],"(DRIE)":[7],"enabled":[8],"high":[9],"aspect":[10],"ratio":[11],"structures":[12],"and":[13,19],"devices":[14],"are":[15],"promising":[16],"for":[17,29],"harsh":[18],"in":[20,37,45],"vivo":[21],"environments":[22],"applications.":[23],"An":[24],"model":[26,76],"is":[27,48,57,77],"necessary":[28],"better":[30],"profile":[31,74],"control":[32],"to":[33,59,79],"acquire":[34],"needed":[35],"performance,":[36],"which":[38],"a":[39,73],"correct":[40],"angular":[42],"distribution":[43],"(IAD)":[44],"chlorine":[46],"plasma":[47],"crucial.":[49],"In":[50],"this":[51],"paper,":[52],"an":[53],"overhang":[54],"SU-8":[55],"structure":[56],"proposed":[58],"experimentally":[60],"in-situ":[61],"measure":[62],"the":[63,67,81],"IAD":[64],"by":[65],"analyzing":[66],"profiles.":[69],"With":[70],"these":[71],"data,":[72],"evolution":[75],"developed":[78],"predict":[80],"DRIE":[83],"process.":[84]},"counts_by_year":[{"year":2022,"cited_by_count":2},{"year":2016,"cited_by_count":1}],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}