{"id":"https://openalex.org/W2035959001","doi":"https://doi.org/10.1109/nems.2012.6196839","title":"Surface analysis and process optimization of black silicon","display_name":"Surface analysis and process optimization of black silicon","publication_year":2012,"publication_date":"2012-03-01","ids":{"openalex":"https://openalex.org/W2035959001","doi":"https://doi.org/10.1109/nems.2012.6196839","mag":"2035959001"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2012.6196839","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2012.6196839","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5025734504","display_name":"Fu-Yun Zhu","orcid":null},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Fu-Yun Zhu","raw_affiliation_strings":["Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China"],"affiliations":[{"raw_affiliation_string":"Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007178584","display_name":"Qianli Di","orcid":null},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Qian-Li Di","raw_affiliation_strings":["Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China"],"affiliations":[{"raw_affiliation_string":"Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019457232","display_name":"Xing-Juan Zeng","orcid":null},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xing-Juan Zeng","raw_affiliation_strings":["Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China"],"affiliations":[{"raw_affiliation_string":"Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001048120","display_name":"Xiaosheng Zhang","orcid":"https://orcid.org/0000-0001-9719-0573"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xiao-Sheng Zhang","raw_affiliation_strings":["Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China"],"affiliations":[{"raw_affiliation_string":"Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019676309","display_name":"Xin Zhao","orcid":"https://orcid.org/0000-0001-6310-2715"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xin Zhao","raw_affiliation_strings":["Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China"],"affiliations":[{"raw_affiliation_string":"Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China","institution_ids":["https://openalex.org/I20231570"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100375644","display_name":"Haixia Zhang","orcid":"https://orcid.org/0000-0003-4565-4123"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Hai-Xia Zhang","raw_affiliation_strings":["Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China"],"affiliations":[{"raw_affiliation_string":"Science and Technology on MicroiNano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Science and Technology on Micro/Nano Fabrication Lab, Institute of Microelectronics, Peking University, Beijing, 100871, China","institution_ids":["https://openalex.org/I20231570"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5025734504"],"corresponding_institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.10332331,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"567","last_page":"570"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9986000061035156,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/black-silicon","display_name":"Black silicon","score":0.7292531728744507},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.6875646114349365},{"id":"https://openalex.org/keywords/passivation","display_name":"Passivation","score":0.5556942224502563},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.5054490566253662},{"id":"https://openalex.org/keywords/surface","display_name":"Surface (topology)","score":0.5035008788108826},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.44114747643470764},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4197908043861389},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.30495357513427734},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.22836482524871826},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.220293790102005},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.20437458157539368},{"id":"https://openalex.org/keywords/geometry","display_name":"Geometry","score":0.13435211777687073}],"concepts":[{"id":"https://openalex.org/C2778166601","wikidata":"https://www.wikidata.org/wiki/Q2254210","display_name":"Black silicon","level":3,"score":0.7292531728744507},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6875646114349365},{"id":"https://openalex.org/C33574316","wikidata":"https://www.wikidata.org/wiki/Q917260","display_name":"Passivation","level":3,"score":0.5556942224502563},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.5054490566253662},{"id":"https://openalex.org/C2776799497","wikidata":"https://www.wikidata.org/wiki/Q484298","display_name":"Surface (topology)","level":2,"score":0.5035008788108826},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.44114747643470764},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4197908043861389},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.30495357513427734},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.22836482524871826},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.220293790102005},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.20437458157539368},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.13435211777687073},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2012.6196839","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2012.6196839","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.47999998927116394,"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1511495870","https://openalex.org/W1982221527","https://openalex.org/W2046489548","https://openalex.org/W2080960744","https://openalex.org/W2084821417","https://openalex.org/W2162263939","https://openalex.org/W2168756522"],"related_works":["https://openalex.org/W2033635242","https://openalex.org/W1974693958","https://openalex.org/W2756992022","https://openalex.org/W2160714641","https://openalex.org/W2902719342","https://openalex.org/W3000023775","https://openalex.org/W2728717397","https://openalex.org/W2046305916","https://openalex.org/W3209632655","https://openalex.org/W1773788769"],"abstract_inverted_index":{"This":[0],"paper":[1],"puts":[2],"forward":[3],"a":[4,27,74,89,115],"description":[5],"method":[6],"for":[7,83,143],"surface":[8,110,141],"topography":[9,111],"of":[10,67,86,105,117,134,146],"black":[11,46,122,135,147],"silicon":[12,47,136],"using":[13],"SF":[14],"<sub":[15,19,23],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[16,20,24],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">6</sub>":[17],"/C":[18],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">4</sub>":[21],"F":[22],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">8</sub>":[25],"in":[26],"cyclic":[28],"etching-passivation":[29],"DRIE":[30],"process.":[31],"Three":[32],"main":[33],"parameters,":[34,55],"i.e.":[35],"density,":[36],"height":[37],"and":[38,42,48,62,98,112,137],"width,":[39],"are":[40,128],"defined":[41],"used":[43],"to":[44,52,77,93,109,120,130],"describe":[45],"can":[49,71],"be":[50],"extended":[51],"several":[53],"other":[54,84],"such":[56],"as":[57],"aspect":[58],"ratio,":[59],"duty":[60],"ratio":[61],"so":[63],"on.":[64],"By":[65],"means":[66],"these":[68,95,125],"parameters":[69,96,108,119],"we":[70,101,127],"also":[72],"establish":[73],"standard":[75],"modal":[76],"provide":[78],"the":[79,103,106],"very":[80],"basic":[81],"data":[82],"kind":[85],"research.":[87],"So":[88],"program":[90],"is":[91],"developed":[92],"achieve":[94],"expediently":[97],"accurately.":[99],"Then":[100],"discuss":[102],"influence":[104],"process":[107],"finally":[113],"obtain":[114],"group":[116],"optimum":[118],"fabricate":[121],"silicon.":[123,148],"Through":[124],"results":[126],"expecting":[129],"get":[131],"better":[132],"cognition":[133],"form":[138],"more":[139],"controllable":[140],"structures":[142],"mass":[144],"production":[145]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}