{"id":"https://openalex.org/W2037430995","doi":"https://doi.org/10.1109/nems.2012.6196717","title":"Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate","display_name":"Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate","publication_year":2012,"publication_date":"2012-03-01","ids":{"openalex":"https://openalex.org/W2037430995","doi":"https://doi.org/10.1109/nems.2012.6196717","mag":"2037430995"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2012.6196717","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2012.6196717","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Jhih-Nan Yan","orcid":null},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Jhih-Nan Yan","raw_affiliation_strings":["Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan","National Cheng\u2013Kung University, Taiwan"],"affiliations":[{"raw_affiliation_string":"Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan","institution_ids":["https://openalex.org/I91807558"]},{"raw_affiliation_string":"National Cheng\u2013Kung University, Taiwan","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5068385728","display_name":"Yung-Chun Lee","orcid":"https://orcid.org/0000-0001-8990-6615"},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yung-Chun Lee","raw_affiliation_strings":["Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan"],"affiliations":[{"raw_affiliation_string":"Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan","institution_ids":["https://openalex.org/I91807558"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I91807558"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.08089202,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"18","issue":null,"first_page":"36","last_page":"39"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10313","display_name":"Surface Modification and Superhydrophobicity","score":0.9954000115394592,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9950000047683716,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.9502139091491699},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.8016754388809204},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.791771411895752},{"id":"https://openalex.org/keywords/sapphire","display_name":"Sapphire","score":0.7666845321655273},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.7469074130058289},{"id":"https://openalex.org/keywords/contact-print","display_name":"Contact print","score":0.7238107919692993},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.7056419849395752},{"id":"https://openalex.org/keywords/photoresist","display_name":"Photoresist","score":0.6400951147079468},{"id":"https://openalex.org/keywords/computational-lithography","display_name":"Computational lithography","score":0.5960598587989807},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5700024962425232},{"id":"https://openalex.org/keywords/substrate","display_name":"Substrate (aquarium)","score":0.49172452092170715},{"id":"https://openalex.org/keywords/photomask","display_name":"Photomask","score":0.43164360523223877},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.4174043536186218},{"id":"https://openalex.org/keywords/x-ray-lithography","display_name":"X-ray lithography","score":0.34151601791381836},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.2912546396255493},{"id":"https://openalex.org/keywords/laser","display_name":"Laser","score":0.2577008605003357},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.05545118451118469}],"concepts":[{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.9502139091491699},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8016754388809204},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.791771411895752},{"id":"https://openalex.org/C2780064504","wikidata":"https://www.wikidata.org/wiki/Q127583","display_name":"Sapphire","level":3,"score":0.7666845321655273},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7469074130058289},{"id":"https://openalex.org/C188079319","wikidata":"https://www.wikidata.org/wiki/Q372487","display_name":"Contact print","level":2,"score":0.7238107919692993},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.7056419849395752},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.6400951147079468},{"id":"https://openalex.org/C182873914","wikidata":"https://www.wikidata.org/wiki/Q5157329","display_name":"Computational lithography","level":5,"score":0.5960598587989807},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5700024962425232},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.49172452092170715},{"id":"https://openalex.org/C14737013","wikidata":"https://www.wikidata.org/wiki/Q1319657","display_name":"Photomask","level":4,"score":0.43164360523223877},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4174043536186218},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.34151601791381836},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.2912546396255493},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.2577008605003357},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.05545118451118469},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2012.6196717","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2012.6196717","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.44999998807907104,"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1967764736","https://openalex.org/W1971142476","https://openalex.org/W1973381121","https://openalex.org/W1979848328","https://openalex.org/W1981098055","https://openalex.org/W1982255647","https://openalex.org/W2008974200","https://openalex.org/W2025283447","https://openalex.org/W2076865010","https://openalex.org/W2078371875","https://openalex.org/W2136109756","https://openalex.org/W2147570569"],"related_works":["https://openalex.org/W2331780832","https://openalex.org/W2014089292","https://openalex.org/W2354791188","https://openalex.org/W2115322984","https://openalex.org/W2083608678","https://openalex.org/W2026384529","https://openalex.org/W2389678594","https://openalex.org/W2080608046","https://openalex.org/W2129122970","https://openalex.org/W2183602760"],"abstract_inverted_index":{"This":[0,26,87],"paper":[1],"describes":[2],"the":[3,71,92],"fabrication":[4],"processes":[5],"of":[6,10,116],"a":[7,65],"new":[8,27,60],"type":[9],"metal-embedded":[11,28,61,106],"photo-mask,":[12],"which":[13,122],"will":[14],"be":[15],"used":[16],"in":[17,53,69,80,96,125],"standard":[18],"photolithography":[19],"and":[20,37,55,76,98,111],"for":[21],"fabricating":[22,54],"patterned":[23],"sapphire":[24,120],"substrates.":[25],"photo-mask":[29,62,68,95,107],"is":[30,108],"prepared":[31,110],"by":[32],"metal":[33],"contact":[34,81],"printing":[35],"lithography":[36],"therefore":[38,77],"can":[39,90],"easily":[40],"achieve":[41],"smaller":[42,57],"feature":[43,89],"size":[44],"around":[45],"or":[46],"below":[47],"1":[48],"\u03bcm.":[49],"Besides":[50],"its":[51,100],"easiness":[52],"obtaining":[56],"line-width,":[58],"this":[59,103,105],"differs":[63],"from":[64],"conventional":[66],"Cr/glass":[67],"that":[70],"metallic":[72],"patterns":[73],"are":[74,78,123],"embedded":[75],"not":[79],"with":[82],"photo-resist":[83],"during":[84],"UV":[85],"exposure.":[86],"unique":[88],"minimize":[91],"damage":[93],"to":[94,113],"use":[97],"prolong":[99],"lifetime.":[101],"In":[102],"work,":[104],"experimentally":[109],"applied":[112],"photolithographic":[114],"patterning":[115],"PR":[117],"microstructures":[118],"on":[119],"substrates,":[121],"important":[124],"LED":[126],"industries.":[127]},"counts_by_year":[],"updated_date":"2026-04-21T08:09:41.155169","created_date":"2025-10-10T00:00:00"}