{"id":"https://openalex.org/W2048772139","doi":"https://doi.org/10.1109/nems.2010.5592606","title":"Fabrication of Sub-100-nm silicon nanowire devices on SOI wafer by CMOS compatible fabrication process","display_name":"Fabrication of Sub-100-nm silicon nanowire devices on SOI wafer by CMOS compatible fabrication process","publication_year":2010,"publication_date":"2010-01-01","ids":{"openalex":"https://openalex.org/W2048772139","doi":"https://doi.org/10.1109/nems.2010.5592606","mag":"2048772139"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2010.5592606","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2010.5592606","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109161007","display_name":"Liangliang Sun","orcid":null},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"L N Sun","raw_affiliation_strings":["National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, China"],"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090098615","display_name":"T M H Lee","orcid":null},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I14243506","display_name":"Hong Kong Polytechnic University","ror":"https://ror.org/0030zas98","country_code":"HK","type":"education","lineage":["https://openalex.org/I14243506"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN","HK"],"is_corresponding":false,"raw_author_name":"T M H Lee","raw_affiliation_strings":["Department of Health Technology and Informatics, The Hong Kong Polytechnic University, Hong Kong, China","National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, China"],"affiliations":[{"raw_affiliation_string":"Department of Health Technology and Informatics, The Hong Kong Polytechnic University, Hong Kong, China","institution_ids":["https://openalex.org/I14243506"]},{"raw_affiliation_string":"National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101579502","display_name":"Zhenchuan Yang","orcid":"https://orcid.org/0000-0002-8926-2319"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Z C Yang","raw_affiliation_strings":["National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, China"],"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5070820811","display_name":"G.Z. Yan","orcid":"https://orcid.org/0000-0003-2765-682X"},"institutions":[{"id":"https://openalex.org/I20231570","display_name":"Peking University","ror":"https://ror.org/02v51f717","country_code":"CN","type":"education","lineage":["https://openalex.org/I20231570"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"G Z Yan","raw_affiliation_strings":["National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, China"],"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, China","institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5109161007"],"corresponding_institution_ids":["https://openalex.org/I20231570","https://openalex.org/I4210119392"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.1260627,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":95},"biblio":{"volume":"23","issue":null,"first_page":"971","last_page":"974"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.8919820189476013},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"Silicon on insulator","score":0.8159366250038147},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.8107061386108398},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7290102243423462},{"id":"https://openalex.org/keywords/nanowire","display_name":"Nanowire","score":0.6267361044883728},{"id":"https://openalex.org/keywords/silicon-nanowires","display_name":"Silicon nanowires","score":0.5723598599433899},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5609270930290222},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.5304763913154602},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.5188461542129517},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.4179225564002991},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.39126214385032654},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.12604910135269165}],"concepts":[{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.8919820189476013},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.8159366250038147},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.8107061386108398},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7290102243423462},{"id":"https://openalex.org/C74214498","wikidata":"https://www.wikidata.org/wiki/Q631739","display_name":"Nanowire","level":2,"score":0.6267361044883728},{"id":"https://openalex.org/C2986665194","wikidata":"https://www.wikidata.org/wiki/Q28324872","display_name":"Silicon nanowires","level":3,"score":0.5723598599433899},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5609270930290222},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5304763913154602},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.5188461542129517},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4179225564002991},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.39126214385032654},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.12604910135269165},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2010.5592606","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2010.5592606","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.46000000834465027,"id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[{"id":"https://openalex.org/F4320327019","display_name":"National Key Laboratory of Science and Technology on Micro/Nano Fabrication","ror":null}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2015248366","https://openalex.org/W2130686586","https://openalex.org/W4252314738"],"related_works":["https://openalex.org/W3143516596","https://openalex.org/W2089372549","https://openalex.org/W4300780679","https://openalex.org/W2104300577","https://openalex.org/W2001476809","https://openalex.org/W2095990703","https://openalex.org/W1921407827","https://openalex.org/W2146341803","https://openalex.org/W2014118584","https://openalex.org/W2089236473"],"abstract_inverted_index":{"A":[0],"technique":[1],"for":[2,33,80],"the":[3,38,74,89,96],"fabrication":[4,115],"of":[5,60,78,98],"planar":[6],"silicon":[7,67],"nanowires":[8,94],"(SiNWs)":[9],"on":[10,16,46,58],"SIMOX-SOI":[11,79],"(Separation":[12],"by":[13,111],"Implanted":[14],"Oxygen-Silicon":[15],"Insulator)":[17],"wafers":[18],"using":[19],"sidewall":[20,52],"transfer":[21],"lithography":[22],"is":[23,44,53,85],"presented,":[24],"which":[25,84],"can":[26],"be":[27],"used":[28],"as":[29,71],"field":[30],"effect":[31],"devices":[32],"biomolecular":[34],"detections.":[35],"Different":[36],"from":[37],"existing":[39],"synthesis":[40],"process,":[41],"this":[42,56,112],"method":[43],"based":[45],"standard":[47],"\u201ctop-down\u201d":[48],"semiconductor":[49],"process.":[50,116],"Aluminum":[51],"applied":[54],"in":[55],"work":[57],"account":[59],"its":[61],"high":[62],"etching":[63],"selectivity":[64],"over":[65],"both":[66],"and":[68],"oxide,":[69],"so":[70],"to":[72,88],"preserve":[73],"thin":[75],"oxide":[76],"layer":[77],"reliable":[81],"electrical":[82],"isolation":[83],"considered":[86],"crucial":[87],"weak":[90],"signal":[91],"detection.":[92],"Silicon":[93],"with":[95],"dimensions":[97],"50":[99],"nm":[100,103],"\u00d7":[101,104],"90":[102],"5":[105],"\u03bcm":[106],"have":[107],"been":[108],"successfully":[109],"demonstrated":[110],"CMOS":[113],"compatible":[114]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2023,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}