{"id":"https://openalex.org/W2032684497","doi":"https://doi.org/10.1109/nems.2010.5592424","title":"Hybrid etching process and its application in thermopile infrared sensor","display_name":"Hybrid etching process and its application in thermopile infrared sensor","publication_year":2010,"publication_date":"2010-01-01","ids":{"openalex":"https://openalex.org/W2032684497","doi":"https://doi.org/10.1109/nems.2010.5592424","mag":"2032684497"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2010.5592424","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2010.5592424","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5068161146","display_name":"Dehui Xu","orcid":"https://orcid.org/0000-0002-7181-0137"},"institutions":[{"id":"https://openalex.org/I4210107198","display_name":"State Key Laboratory of Transducer Technology","ror":"https://ror.org/01qg56n75","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366","https://openalex.org/I19820366","https://openalex.org/I4210107198","https://openalex.org/I4210110458","https://openalex.org/I4210147322"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Dehui Xu","raw_affiliation_strings":["Graduate School of Chinese Academy of Sciences, Beijing, China","State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy and Sciences, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"Graduate School of Chinese Academy of Sciences, Beijing, China","institution_ids":["https://openalex.org/I19820366"]},{"raw_affiliation_string":"State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy and Sciences, Shanghai, China","institution_ids":["https://openalex.org/I4210107198","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101889406","display_name":"Bin Xiong","orcid":"https://orcid.org/0000-0001-8728-2191"},"institutions":[{"id":"https://openalex.org/I4210107198","display_name":"State Key Laboratory of Transducer Technology","ror":"https://ror.org/01qg56n75","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366","https://openalex.org/I19820366","https://openalex.org/I4210107198","https://openalex.org/I4210110458","https://openalex.org/I4210147322"]},{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Bin Xiong","raw_affiliation_strings":["State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy and Sciences, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy and Sciences, Shanghai, China","institution_ids":["https://openalex.org/I4210107198","https://openalex.org/I4210147322"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072148963","display_name":"Yuelin Wang","orcid":"https://orcid.org/0009-0008-4393-4109"},"institutions":[{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]},{"id":"https://openalex.org/I4210107198","display_name":"State Key Laboratory of Transducer Technology","ror":"https://ror.org/01qg56n75","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366","https://openalex.org/I19820366","https://openalex.org/I4210107198","https://openalex.org/I4210110458","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yuelin Wang","raw_affiliation_strings":["State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy and Sciences, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy and Sciences, Shanghai, China","institution_ids":["https://openalex.org/I4210107198","https://openalex.org/I4210147322"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101153481","display_name":"Yinglei Ma","orcid":null},"institutions":[{"id":"https://openalex.org/I4210147322","display_name":"Shanghai Institute of Microsystem and Information Technology","ror":"https://ror.org/04nytyj38","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210147322"]},{"id":"https://openalex.org/I4210107198","display_name":"State Key Laboratory of Transducer Technology","ror":"https://ror.org/01qg56n75","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366","https://openalex.org/I19820366","https://openalex.org/I4210107198","https://openalex.org/I4210110458","https://openalex.org/I4210147322"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yinglei Ma","raw_affiliation_strings":["State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy and Sciences, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy and Sciences, Shanghai, China","institution_ids":["https://openalex.org/I4210107198","https://openalex.org/I4210147322"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5068161146"],"corresponding_institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210107198","https://openalex.org/I4210147322"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.10203362,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"425","last_page":"428"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.9991999864578247,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/thermopile","display_name":"Thermopile","score":0.8334757089614868},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.7691899538040161},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.6784661412239075},{"id":"https://openalex.org/keywords/dry-etching","display_name":"Dry etching","score":0.6238529682159424},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6142204403877258},{"id":"https://openalex.org/keywords/isotropic-etching","display_name":"Isotropic etching","score":0.5701488256454468},{"id":"https://openalex.org/keywords/surface-micromachining","display_name":"Surface micromachining","score":0.4818181097507477},{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"Reactive-ion etching","score":0.4744376242160797},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4370945692062378},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.33888110518455505},{"id":"https://openalex.org/keywords/infrared","display_name":"Infrared","score":0.3128030300140381},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.15485239028930664},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.14123278856277466},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.08512407541275024},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.05120819807052612}],"concepts":[{"id":"https://openalex.org/C47279676","wikidata":"https://www.wikidata.org/wiki/Q915693","display_name":"Thermopile","level":3,"score":0.8334757089614868},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7691899538040161},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6784661412239075},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.6238529682159424},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6142204403877258},{"id":"https://openalex.org/C33220542","wikidata":"https://www.wikidata.org/wiki/Q6086567","display_name":"Isotropic etching","level":4,"score":0.5701488256454468},{"id":"https://openalex.org/C145667562","wikidata":"https://www.wikidata.org/wiki/Q7646003","display_name":"Surface micromachining","level":4,"score":0.4818181097507477},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.4744376242160797},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4370945692062378},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.33888110518455505},{"id":"https://openalex.org/C158355884","wikidata":"https://www.wikidata.org/wiki/Q11388","display_name":"Infrared","level":2,"score":0.3128030300140381},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.15485239028930664},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.14123278856277466},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.08512407541275024},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.05120819807052612},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2010.5592424","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2010.5592424","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W1975337849","https://openalex.org/W1979079174","https://openalex.org/W2011651788","https://openalex.org/W2051010767","https://openalex.org/W2056030209","https://openalex.org/W2077837734","https://openalex.org/W2100694491","https://openalex.org/W2153974036","https://openalex.org/W6675161306"],"related_works":["https://openalex.org/W2744329487","https://openalex.org/W2045553774","https://openalex.org/W2011001474","https://openalex.org/W2093631838","https://openalex.org/W4387743859","https://openalex.org/W2542354647","https://openalex.org/W4388394548","https://openalex.org/W2196738352","https://openalex.org/W1991288435","https://openalex.org/W2065825709"],"abstract_inverted_index":{"This":[0],"paper":[1],"presents":[2],"a":[3,23,29,89],"hybrid":[4,79,130],"silicon":[5,14,43,100,111],"etching":[6,80,131],"processing":[7],"technique":[8],"for":[9],"removing":[10],"the":[11,49,52,56,64,69,83,94,97,104,109,115,128],"entire":[12],"bulk":[13,99,110],"to":[15,93,108],"release":[16,70],"microstructure.":[17],"The":[18],"proposed":[19,53,129],"method":[20,54],"that":[21,96],"combines":[22],"back-side":[24],"wet":[25],"anisotropic":[26,46],"pre-etching":[27,47],"and":[28,67,77,103],"front-side":[30],"XeF":[31,57],"<sub":[32,58],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[33,59],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">2</sub>":[34,60],"dry":[35,61],"isotropic":[36],"post-etching":[37,62],"differs":[38],"from":[39],"previous":[40],"works":[41],"in":[42,88],"micromachining.":[44],"Wet":[45],"enhances":[48],"low-cost":[50,76],"of":[51],"while":[55],"avoids":[63],"stiction":[65],"problem":[66],"makes":[68],"process":[71,81,132],"easier.":[72],"By":[73],"using":[74,127],"this":[75],"high-yield":[78],"technique,":[82],"micro-structure":[84],"can":[85,112,118],"be":[86,113,120],"released":[87],"short":[90],"time.":[91],"Due":[92],"fact":[95],"whole":[98],"is":[101,133],"removed":[102],"loss":[105],"mechanism":[106],"due":[107],"eliminated,":[114],"device's":[116],"performance":[117],"also":[119,134],"significantly":[121],"enhanced.":[122],"A":[123],"thermopile":[124],"infrared":[125],"sensor":[126],"demonstrated.":[135]},"counts_by_year":[{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}