{"id":"https://openalex.org/W2118520226","doi":"https://doi.org/10.1109/nems.2009.5068582","title":"Characterization of line edge roughness and line width roughness of nano-scale typical structures","display_name":"Characterization of line edge roughness and line width roughness of nano-scale typical structures","publication_year":2009,"publication_date":"2009-01-01","ids":{"openalex":"https://openalex.org/W2118520226","doi":"https://doi.org/10.1109/nems.2009.5068582","mag":"2118520226"},"language":"en","primary_location":{"id":"doi:10.1109/nems.2009.5068582","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2009.5068582","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5062577404","display_name":"Zhuangde Jiang","orcid":"https://orcid.org/0000-0002-8452-6768"},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Zhuangde Jiang","raw_affiliation_strings":["School of Mechanical Engineering, University of Binningham, Birmingham, UK","State Key Laboratory of Manufacturing Systems Engineering, Xi''an Jiaotong University, Xi'an, Shanxi, China"],"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, University of Binningham, Birmingham, UK","institution_ids":[]},{"raw_affiliation_string":"State Key Laboratory of Manufacturing Systems Engineering, Xi''an Jiaotong University, Xi'an, Shanxi, China","institution_ids":["https://openalex.org/I87445476"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102148777","display_name":"Fengxia Zhao","orcid":null},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Fengxia Zhao","raw_affiliation_strings":["State Key Laboratory of Manufacturing Systems Engineering, Xi''an Jiaotong University, Xi'an, Shanxi, China"],"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Manufacturing Systems Engineering, Xi''an Jiaotong University, Xi'an, Shanxi, China","institution_ids":["https://openalex.org/I87445476"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5009153977","display_name":"Weixuan Jing","orcid":"https://orcid.org/0000-0002-9320-930X"},"institutions":[{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]},{"id":"https://openalex.org/I162868743","display_name":"Tianjin University","ror":"https://ror.org/012tb2g32","country_code":"CN","type":"education","lineage":["https://openalex.org/I162868743"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Weixuan Jing","raw_affiliation_strings":["State Key Laboratory of Manufacturing Systems Engineering, Xi''an Jiaotong University, Xi'an, Shanxi, China","State Key Laboratory of Precision Measuring Technology and Instruments, Tianjin University, TJU, Tianjin, China"],"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Manufacturing Systems Engineering, Xi''an Jiaotong University, Xi'an, Shanxi, China","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"State Key Laboratory of Precision Measuring Technology and Instruments, Tianjin University, TJU, Tianjin, China","institution_ids":["https://openalex.org/I162868743"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071608785","display_name":"Philip D. Prewett","orcid":"https://orcid.org/0000-0003-2313-0943"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Philip D. Prewett","raw_affiliation_strings":["School of Mechanical Engineering, University of Binningham, Birmingham, UK"],"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, University of Binningham, Birmingham, UK","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5102807983","display_name":"Kyle Jiang","orcid":"https://orcid.org/0000-0001-9591-534X"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Kyle Jiang","raw_affiliation_strings":["School of Mechanical Engineering, University of Binningham, Birmingham, UK"],"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, University of Binningham, Birmingham, UK","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":["https://openalex.org/A5062577404"],"corresponding_institution_ids":["https://openalex.org/I87445476"],"apc_list":null,"apc_paid":null,"fwci":0.8972,"has_fulltext":false,"cited_by_count":9,"citation_normalized_percentile":{"value":0.77351697,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"18","issue":null,"first_page":"299","last_page":"303"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/grating","display_name":"Grating","score":0.6015396118164062},{"id":"https://openalex.org/keywords/laser-linewidth","display_name":"Laser linewidth","score":0.5151461362838745},{"id":"https://openalex.org/keywords/surface-finish","display_name":"Surface finish","score":0.47501835227012634},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.46000343561172485},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.38940390944480896},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.3199956715106964},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.2517693340778351},{"id":"https://openalex.org/keywords/laser","display_name":"Laser","score":0.07971084117889404}],"concepts":[{"id":"https://openalex.org/C2777813233","wikidata":"https://www.wikidata.org/wiki/Q1527816","display_name":"Grating","level":2,"score":0.6015396118164062},{"id":"https://openalex.org/C142181693","wikidata":"https://www.wikidata.org/wiki/Q6493080","display_name":"Laser linewidth","level":3,"score":0.5151461362838745},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.47501835227012634},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.46000343561172485},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.38940390944480896},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3199956715106964},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2517693340778351},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.07971084117889404},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/nems.2009.5068582","is_oa":false,"landing_page_url":"https://doi.org/10.1109/nems.2009.5068582","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320322701","display_name":"Tianjin University","ror":"https://ror.org/012tb2g32"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1965618765","https://openalex.org/W1995198835","https://openalex.org/W2009308054","https://openalex.org/W2033908822","https://openalex.org/W2034663597","https://openalex.org/W2042233497"],"related_works":["https://openalex.org/W4391375266","https://openalex.org/W2935759653","https://openalex.org/W3105167352","https://openalex.org/W54078636","https://openalex.org/W2954470139","https://openalex.org/W1501425562","https://openalex.org/W2155174779","https://openalex.org/W2133239258","https://openalex.org/W1965007223","https://openalex.org/W2029028893"],"abstract_inverted_index":{"Two":[0],"kinds":[1],"of":[2,75,135,162],"nano-scale":[3,50,56,66,114,137,164],"typical":[4],"structures":[5],"were":[6,59,87,140],"fabricated":[7],"for":[8],"characterizing":[9],"line":[10,15],"edge":[11],"roughness":[12,17],"(LER)":[13],"and":[14,21,38,54,81,93,103,118],"width":[16],"(LWR).":[18],"With":[19,110],"Cr":[20],"Si":[22],"<sub":[23,27,100,106],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[24,28,101,107],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">3</sub>":[25],"N":[26],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">4</sub>":[29],"thin":[30],"films":[31],"alternately":[32],"deposited":[33],"on":[34,43,143],"a":[35,44,49,55,82],"silicon":[36],"substrate":[37],"electronic":[39],"beam":[40],"lithography":[41],"employed":[42,88],"positive":[45],"resist":[46],"ZEP520":[47],"layer,":[48],"multiple":[51,67],"linewidth":[52,68],"standard":[53,96,122],"grating":[57,115,138,165],"structure":[58,139],"processed":[60],"respectively.":[61],"In":[62],"regard":[63],"to":[64,89,112,147,158],"the":[65,113,136,163],"standards,":[69],"an":[70],"offline":[71],"image":[72,80],"analysis":[73,85,146,154],"algorithm":[74],"scanning":[76],"electron":[77],"microscopy":[78],"(SEM)":[79],"random":[83],"error":[84],"method":[86],"characterize":[90],"its":[91],"LER":[92,149,160],"LWR,":[94],"including":[95],"deviations":[97],"3":[98,104],"sigma":[99,105],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">LER</sub>":[102],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">LWR</sub>":[108],".":[109],"respect":[111],"structure,":[116],"sampling":[117],"evaluation":[119],"length,":[120],"amplitude":[121],"deviation,":[123],"skewness,":[124],"kurtosis,":[125],"auto-correlation":[126],"function":[127,134],"as":[128,130],"well":[129],"power":[131],"spectral":[132],"density":[133],"analyzed":[141],"based":[142],"stochastic":[144],"process":[145],"show":[148],"characteristics.":[150],"Similarly":[151],"Motif":[152],"parameters-based":[153],"also":[155],"was":[156],"introduced":[157],"get":[159],"characteristics":[161],"structure.":[166]},"counts_by_year":[{"year":2020,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}