{"id":"https://openalex.org/W2333204489","doi":"https://doi.org/10.1109/mwscas.2014.6908466","title":"Efficient and accurate RIE modeling methodology for BEOL 2.5D parasitic extraction","display_name":"Efficient and accurate RIE modeling methodology for BEOL 2.5D parasitic extraction","publication_year":2014,"publication_date":"2014-08-01","ids":{"openalex":"https://openalex.org/W2333204489","doi":"https://doi.org/10.1109/mwscas.2014.6908466","mag":"2333204489"},"language":"en","primary_location":{"id":"doi:10.1109/mwscas.2014.6908466","is_oa":false,"landing_page_url":"https://doi.org/10.1109/mwscas.2014.6908466","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2014 IEEE 57th International Midwest Symposium on Circuits and Systems (MWSCAS)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5031084546","display_name":"Nur Kurt Karsilayan","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Nur Kurt Karsilayan","raw_affiliation_strings":["Mentor Graphics Corporation, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110353134","display_name":"Jim Falbo","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jim Falbo","raw_affiliation_strings":["Mentor Graphics Corporation, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, USA","institution_ids":["https://openalex.org/I4210156212"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5052446669","display_name":"Dusan Petranovic","orcid":null},"institutions":[{"id":"https://openalex.org/I4210156212","display_name":"Mentor Technologies","ror":"https://ror.org/05vewsj04","country_code":"US","type":"other","lineage":["https://openalex.org/I4210156212"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Dusan Petranovic","raw_affiliation_strings":["Mentor Graphics Corporation, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Mentor Graphics Corporation, USA","institution_ids":["https://openalex.org/I4210156212"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210156212"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.28031362,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":null,"issue":null,"first_page":"519","last_page":"522"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9954000115394592,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sensitivity","display_name":"Sensitivity (control systems)","score":0.7174105644226074},{"id":"https://openalex.org/keywords/solver","display_name":"Solver","score":0.5911003351211548},{"id":"https://openalex.org/keywords/calibration","display_name":"Calibration","score":0.5787102580070496},{"id":"https://openalex.org/keywords/parasitic-capacitance","display_name":"Parasitic capacitance","score":0.5699138641357422},{"id":"https://openalex.org/keywords/capacitance","display_name":"Capacitance","score":0.5358579754829407},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5323111414909363},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.46176284551620483},{"id":"https://openalex.org/keywords/parasitic-extraction","display_name":"Parasitic extraction","score":0.42546209692955017},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.14225760102272034},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.12394621968269348}],"concepts":[{"id":"https://openalex.org/C21200559","wikidata":"https://www.wikidata.org/wiki/Q7451068","display_name":"Sensitivity (control systems)","level":2,"score":0.7174105644226074},{"id":"https://openalex.org/C2778770139","wikidata":"https://www.wikidata.org/wiki/Q1966904","display_name":"Solver","level":2,"score":0.5911003351211548},{"id":"https://openalex.org/C165838908","wikidata":"https://www.wikidata.org/wiki/Q736777","display_name":"Calibration","level":2,"score":0.5787102580070496},{"id":"https://openalex.org/C154318817","wikidata":"https://www.wikidata.org/wiki/Q2157249","display_name":"Parasitic capacitance","level":4,"score":0.5699138641357422},{"id":"https://openalex.org/C30066665","wikidata":"https://www.wikidata.org/wiki/Q164399","display_name":"Capacitance","level":3,"score":0.5358579754829407},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5323111414909363},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.46176284551620483},{"id":"https://openalex.org/C159818811","wikidata":"https://www.wikidata.org/wiki/Q7135947","display_name":"Parasitic extraction","level":2,"score":0.42546209692955017},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.14225760102272034},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.12394621968269348},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/mwscas.2014.6908466","is_oa":false,"landing_page_url":"https://doi.org/10.1109/mwscas.2014.6908466","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2014 IEEE 57th International Midwest Symposium on Circuits and Systems (MWSCAS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Zero hunger","id":"https://metadata.un.org/sdg/2","score":0.5600000023841858}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1540975571","https://openalex.org/W2126924619","https://openalex.org/W2146029486","https://openalex.org/W2149102666","https://openalex.org/W2171815793","https://openalex.org/W6681894058"],"related_works":["https://openalex.org/W2058545256","https://openalex.org/W2394034449","https://openalex.org/W2904654231","https://openalex.org/W2999380399","https://openalex.org/W4210807885","https://openalex.org/W2248915580","https://openalex.org/W2059163921","https://openalex.org/W2051045034","https://openalex.org/W63447294","https://openalex.org/W4304890870"],"abstract_inverted_index":{"An":[0],"efficient":[1],"and":[2,36,50],"accurate":[3],"sensitivity":[4,37,51,65],"based":[5,27],"methodology":[6,21],"is":[7,61,72],"introduced":[8],"for":[9],"modeling":[10,66],"reactive":[11],"ion":[12],"etch":[13],"(RIE)":[14],"in":[15,53],"BEOL":[16,70],"2.5D":[17,55],"parasitic":[18,56],"extraction.":[19],"Proposed":[20,81],"involves":[22],"calibration":[23],"of":[24,90],"analytical":[25],"equations":[26,52],"on":[28],"layout":[29],"parameters":[30],"that":[31],"are":[32,44],"fitted":[33],"to":[34,64,74,94],"capacitance":[35,49],"data":[38],"from":[39,92],"2D":[40],"field":[41],"solver.":[42],"Formulas":[43],"derived":[45],"along":[46],"with":[47,77],"new":[48],"a":[54,87],"extraction":[57],"framework.":[58],"Calibration":[59],"runtime":[60],"reduced":[62],"due":[63],"while":[67],"the":[68,75],"overall":[69],"accuracy":[71],"comparable":[73],"case":[76],"no":[78],"RIE":[79],"effect.":[80],"method":[82],"has":[83],"been":[84],"validated":[85],"over":[86],"wide":[88],"range":[89],"technologies":[91],"65nm":[93],"20nm.":[95]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1}],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}