{"id":"https://openalex.org/W4384499491","doi":"https://doi.org/10.1109/mocast57943.2023.10176854","title":"Modelling and Verification of MOS Transistors at Cryogenic Temperature","display_name":"Modelling and Verification of MOS Transistors at Cryogenic Temperature","publication_year":2023,"publication_date":"2023-06-28","ids":{"openalex":"https://openalex.org/W4384499491","doi":"https://doi.org/10.1109/mocast57943.2023.10176854"},"language":"en","primary_location":{"id":"doi:10.1109/mocast57943.2023.10176854","is_oa":false,"landing_page_url":"http://dx.doi.org/10.1109/mocast57943.2023.10176854","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 12th International Conference on Modern Circuits and Systems Technologies (MOCAST)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5067973857","display_name":"Alessandro Andreani","orcid":"https://orcid.org/0000-0002-2389-0099"},"institutions":[{"id":"https://openalex.org/I4210136779","display_name":"Istituto Nazionale di Fisica Nucleare, Sezione di Milano","ror":"https://ror.org/04w4m6z96","country_code":"IT","type":"facility","lineage":["https://openalex.org/I160013858","https://openalex.org/I4210136779"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Alessandro Andreani","raw_affiliation_strings":["Universit&#x00E0; Degli Studi di Milano and INFN &#x2013; Sezione di Milano,Department of Physics,Milan,Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universit&#x00E0; Degli Studi di Milano and INFN &#x2013; Sezione di Milano,Department of Physics,Milan,Italy","institution_ids":["https://openalex.org/I4210136779"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033404614","display_name":"L. Frontini","orcid":"https://orcid.org/0000-0002-1137-8629"},"institutions":[{"id":"https://openalex.org/I4210136779","display_name":"Istituto Nazionale di Fisica Nucleare, Sezione di Milano","ror":"https://ror.org/04w4m6z96","country_code":"IT","type":"facility","lineage":["https://openalex.org/I160013858","https://openalex.org/I4210136779"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Luca Frontini","raw_affiliation_strings":["Universit&#x00E0; Degli Studi di Milano and INFN &#x2013; Sezione di Milano,Department of Physics,Milan,Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universit&#x00E0; Degli Studi di Milano and INFN &#x2013; Sezione di Milano,Department of Physics,Milan,Italy","institution_ids":["https://openalex.org/I4210136779"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5104437581","display_name":"Valentino Liberali","orcid":"https://orcid.org/0000-0003-1333-6876"},"institutions":[{"id":"https://openalex.org/I4210136779","display_name":"Istituto Nazionale di Fisica Nucleare, Sezione di Milano","ror":"https://ror.org/04w4m6z96","country_code":"IT","type":"facility","lineage":["https://openalex.org/I160013858","https://openalex.org/I4210136779"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Valentino Liberali","raw_affiliation_strings":["Universit&#x00E0; Degli Studi di Milano and INFN &#x2013; Sezione di Milano,Department of Physics,Milan,Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universit&#x00E0; Degli Studi di Milano and INFN &#x2013; Sezione di Milano,Department of Physics,Milan,Italy","institution_ids":["https://openalex.org/I4210136779"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041389564","display_name":"A. Stabile","orcid":"https://orcid.org/0000-0002-6868-8329"},"institutions":[{"id":"https://openalex.org/I4210136779","display_name":"Istituto Nazionale di Fisica Nucleare, Sezione di Milano","ror":"https://ror.org/04w4m6z96","country_code":"IT","type":"facility","lineage":["https://openalex.org/I160013858","https://openalex.org/I4210136779"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Alberto Stabile","raw_affiliation_strings":["Universit&#x00E0; Degli Studi di Milano and INFN &#x2013; Sezione di Milano,Department of Physics,Milan,Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universit&#x00E0; Degli Studi di Milano and INFN &#x2013; Sezione di Milano,Department of Physics,Milan,Italy","institution_ids":["https://openalex.org/I4210136779"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5092482279","display_name":"Valeria Trabattoni","orcid":"https://orcid.org/0009-0006-5046-5967"},"institutions":[{"id":"https://openalex.org/I189158943","display_name":"University of Milan","ror":"https://ror.org/00wjc7c48","country_code":"IT","type":"education","lineage":["https://openalex.org/I189158943"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Valeria Trabattoni","raw_affiliation_strings":["Universit&#x00E0; Degli Studi di Milano,Department of Physics,Milan,Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universit&#x00E0; Degli Studi di Milano,Department of Physics,Milan,Italy","institution_ids":["https://openalex.org/I189158943"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.09182352,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.7514100670814514},{"id":"https://openalex.org/keywords/liquid-nitrogen","display_name":"Liquid nitrogen","score":0.689984917640686},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.6497112512588501},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.636144757270813},{"id":"https://openalex.org/keywords/threshold-voltage","display_name":"Threshold voltage","score":0.6176766157150269},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5262571573257446},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.5139674544334412},{"id":"https://openalex.org/keywords/chip","display_name":"Chip","score":0.5059625506401062},{"id":"https://openalex.org/keywords/temperature-measurement","display_name":"Temperature measurement","score":0.5033025145530701},{"id":"https://openalex.org/keywords/cryogenics","display_name":"Cryogenics","score":0.4769641160964966},{"id":"https://openalex.org/keywords/semiconductor-device-modeling","display_name":"Semiconductor device modeling","score":0.4496845602989197},{"id":"https://openalex.org/keywords/cryogenic-temperature","display_name":"Cryogenic temperature","score":0.4321432113647461},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.427776962518692},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3211597204208374},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1971929669380188},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.13618409633636475},{"id":"https://openalex.org/keywords/thermodynamics","display_name":"Thermodynamics","score":0.08490827679634094}],"concepts":[{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.7514100670814514},{"id":"https://openalex.org/C108939769","wikidata":"https://www.wikidata.org/wiki/Q1139370","display_name":"Liquid nitrogen","level":2,"score":0.689984917640686},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.6497112512588501},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.636144757270813},{"id":"https://openalex.org/C195370968","wikidata":"https://www.wikidata.org/wiki/Q1754002","display_name":"Threshold voltage","level":4,"score":0.6176766157150269},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5262571573257446},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.5139674544334412},{"id":"https://openalex.org/C165005293","wikidata":"https://www.wikidata.org/wiki/Q1074500","display_name":"Chip","level":2,"score":0.5059625506401062},{"id":"https://openalex.org/C72293138","wikidata":"https://www.wikidata.org/wiki/Q909741","display_name":"Temperature measurement","level":2,"score":0.5033025145530701},{"id":"https://openalex.org/C179725390","wikidata":"https://www.wikidata.org/wiki/Q192116","display_name":"Cryogenics","level":2,"score":0.4769641160964966},{"id":"https://openalex.org/C4775677","wikidata":"https://www.wikidata.org/wiki/Q7449393","display_name":"Semiconductor device modeling","level":3,"score":0.4496845602989197},{"id":"https://openalex.org/C2985130431","wikidata":"https://www.wikidata.org/wiki/Q192116","display_name":"Cryogenic temperature","level":2,"score":0.4321432113647461},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.427776962518692},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3211597204208374},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1971929669380188},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.13618409633636475},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.08490827679634094},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/mocast57943.2023.10176854","is_oa":false,"landing_page_url":"http://dx.doi.org/10.1109/mocast57943.2023.10176854","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 12th International Conference on Modern Circuits and Systems Technologies (MOCAST)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","score":0.6499999761581421,"display_name":"Affordable and clean energy"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1644292857","https://openalex.org/W2144016451","https://openalex.org/W2163938496","https://openalex.org/W2794745494","https://openalex.org/W4238664186"],"related_works":["https://openalex.org/W2184188413","https://openalex.org/W2605037363","https://openalex.org/W2046499634","https://openalex.org/W3043938047","https://openalex.org/W2001120051","https://openalex.org/W3113168399","https://openalex.org/W3010716238","https://openalex.org/W2059894852","https://openalex.org/W1547199682","https://openalex.org/W2076380812"],"abstract_inverted_index":{"This":[0],"paper":[1],"presents":[2],"a":[3,36],"simple":[4],"model":[5,18,54],"to":[6],"simulate":[7],"MOS":[8],"transistors":[9],"at":[10],"liquid":[11,47],"nitrogen":[12,48],"temperature":[13],"(77":[14],"K).":[15],"The":[16],"proposed":[17],"accounts":[19],"for":[20,58],"the":[21,24,29,50,53],"variations":[22],"of":[23,28,52],"threshold":[25],"voltage":[26],"and":[27,44,55],"carrier":[30],"mobility.":[31],"Transistor":[32],"characteristics":[33],"obtained":[34],"from":[35],"test":[37],"chip":[38],"fabricated":[39],"in":[40,46],"110":[41],"nm":[42],"CMOS":[43],"submerged":[45],"confirm":[49],"validity":[51],"provide":[56],"information":[57],"parameter":[59],"tuning.":[60]},"counts_by_year":[],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}
