{"id":"https://openalex.org/W4221024106","doi":"https://doi.org/10.1109/isscc42614.2022.9731554","title":"A 1.2W 51%-Peak-Efficiency Isolated DC-DC Converter with a Cross-Coupled Shoot-Through-Free Class-D Oscillator Meeting the CISPR-32 Class-B EMI Standard","display_name":"A 1.2W 51%-Peak-Efficiency Isolated DC-DC Converter with a Cross-Coupled Shoot-Through-Free Class-D Oscillator Meeting the CISPR-32 Class-B EMI Standard","publication_year":2022,"publication_date":"2022-02-20","ids":{"openalex":"https://openalex.org/W4221024106","doi":"https://doi.org/10.1109/isscc42614.2022.9731554"},"language":"en","primary_location":{"id":"doi:10.1109/isscc42614.2022.9731554","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isscc42614.2022.9731554","pdf_url":null,"source":{"id":"https://openalex.org/S4363607897","display_name":"2022 IEEE International Solid- State Circuits Conference (ISSCC)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2022 IEEE International Solid- State Circuits Conference (ISSCC)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5073798183","display_name":"Dongfang Pan","orcid":"https://orcid.org/0000-0001-9704-586X"},"institutions":[{"id":"https://openalex.org/I126520041","display_name":"University of Science and Technology of China","ror":"https://ror.org/04c4dkn09","country_code":"CN","type":"education","lineage":["https://openalex.org/I126520041","https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Dongfang Pan","raw_affiliation_strings":["University of Science and Technology of China,Hefei,China","University of Science and Technology of China, Hefei, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Science and Technology of China,Hefei,China","institution_ids":["https://openalex.org/I126520041"]},{"raw_affiliation_string":"University of Science and Technology of China, Hefei, China","institution_ids":["https://openalex.org/I126520041"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084607178","display_name":"Guolong Li","orcid":"https://orcid.org/0000-0001-9402-5054"},"institutions":[{"id":"https://openalex.org/I126520041","display_name":"University of Science and Technology of China","ror":"https://ror.org/04c4dkn09","country_code":"CN","type":"education","lineage":["https://openalex.org/I126520041","https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Guolong Li","raw_affiliation_strings":["University of Science and Technology of China,Hefei,China","University of Science and Technology of China, Hefei, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Science and Technology of China,Hefei,China","institution_ids":["https://openalex.org/I126520041"]},{"raw_affiliation_string":"University of Science and Technology of China, Hefei, China","institution_ids":["https://openalex.org/I126520041"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072013028","display_name":"Fangting Miao","orcid":null},"institutions":[{"id":"https://openalex.org/I126520041","display_name":"University of Science and Technology of China","ror":"https://ror.org/04c4dkn09","country_code":"CN","type":"education","lineage":["https://openalex.org/I126520041","https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Fangting Miao","raw_affiliation_strings":["University of Science and Technology of China,Hefei,China","University of Science and Technology of China, Hefei, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Science and Technology of China,Hefei,China","institution_ids":["https://openalex.org/I126520041"]},{"raw_affiliation_string":"University of Science and Technology of China, Hefei, China","institution_ids":["https://openalex.org/I126520041"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090814614","display_name":"Wei Sun","orcid":"https://orcid.org/0000-0002-3475-9870"},"institutions":[{"id":"https://openalex.org/I126520041","display_name":"University of Science and Technology of China","ror":"https://ror.org/04c4dkn09","country_code":"CN","type":"education","lineage":["https://openalex.org/I126520041","https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Wei Sun","raw_affiliation_strings":["University of Science and Technology of China,Hefei,China","University of Science and Technology of China, Hefei, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Science and Technology of China,Hefei,China","institution_ids":["https://openalex.org/I126520041"]},{"raw_affiliation_string":"University of Science and Technology of China, Hefei, China","institution_ids":["https://openalex.org/I126520041"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101153091","display_name":"Xiaohan Gong","orcid":null},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xiaohan Gong","raw_affiliation_strings":["Suzhou Novosense Microelectronics,Suzhou,China","Suzhou Novosense Microelectronics, Suzhou, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Suzhou Novosense Microelectronics,Suzhou,China","institution_ids":["https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Suzhou Novosense Microelectronics, Suzhou, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100682930","display_name":"Lele Zhang","orcid":"https://orcid.org/0000-0002-1417-2802"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Lele Zhang","raw_affiliation_strings":["Suzhou Novosense Microelectronics,Suzhou,China","Suzhou Novosense Microelectronics, Suzhou, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Suzhou Novosense Microelectronics,Suzhou,China","institution_ids":["https://openalex.org/I4210119392"]},{"raw_affiliation_string":"Suzhou Novosense Microelectronics, Suzhou, China","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5075157873","display_name":"Lin Cheng","orcid":"https://orcid.org/0000-0002-3285-0187"},"institutions":[{"id":"https://openalex.org/I126520041","display_name":"University of Science and Technology of China","ror":"https://ror.org/04c4dkn09","country_code":"CN","type":"education","lineage":["https://openalex.org/I126520041","https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Lin Cheng","raw_affiliation_strings":["University of Science and Technology of China,Hefei,China","University of Science and Technology of China, Hefei, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Science and Technology of China,Hefei,China","institution_ids":["https://openalex.org/I126520041"]},{"raw_affiliation_string":"University of Science and Technology of China, Hefei, China","institution_ids":["https://openalex.org/I126520041"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":7,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":7.6548,"has_fulltext":false,"cited_by_count":26,"citation_normalized_percentile":{"value":0.98700748,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":94,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"240","last_page":"242"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11444","display_name":"Electromagnetic Compatibility and Noise Suppression","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11444","display_name":"Electromagnetic Compatibility and Noise Suppression","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10187","display_name":"Radio Frequency Integrated Circuit Design","score":0.9969000220298767,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/emi","display_name":"EMI","score":0.6256464719772339},{"id":"https://openalex.org/keywords/electromagnetic-interference","display_name":"Electromagnetic interference","score":0.5536068677902222},{"id":"https://openalex.org/keywords/capacitor","display_name":"Capacitor","score":0.47749799489974976},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.46221229434013367},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.4009873569011688},{"id":"https://openalex.org/keywords/topology","display_name":"Topology (electrical circuits)","score":0.3722754120826721},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.33988261222839355},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.18262800574302673},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1637941300868988}],"concepts":[{"id":"https://openalex.org/C43461449","wikidata":"https://www.wikidata.org/wiki/Q2495531","display_name":"EMI","level":3,"score":0.6256464719772339},{"id":"https://openalex.org/C184892835","wikidata":"https://www.wikidata.org/wiki/Q1474513","display_name":"Electromagnetic interference","level":2,"score":0.5536068677902222},{"id":"https://openalex.org/C52192207","wikidata":"https://www.wikidata.org/wiki/Q5322","display_name":"Capacitor","level":3,"score":0.47749799489974976},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.46221229434013367},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.4009873569011688},{"id":"https://openalex.org/C184720557","wikidata":"https://www.wikidata.org/wiki/Q7825049","display_name":"Topology (electrical circuits)","level":2,"score":0.3722754120826721},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.33988261222839355},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.18262800574302673},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1637941300868988}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/isscc42614.2022.9731554","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isscc42614.2022.9731554","pdf_url":null,"source":{"id":"https://openalex.org/S4363607897","display_name":"2022 IEEE International Solid- State Circuits Conference (ISSCC)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2022 IEEE International Solid- State Circuits Conference (ISSCC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","score":0.4300000071525574,"id":"https://metadata.un.org/sdg/9"}],"awards":[{"id":"https://openalex.org/G4027129818","display_name":null,"funder_award_id":"2019YFB2204800","funder_id":"https://openalex.org/F4320335777","funder_display_name":"National Key Research and Development Program of China"},{"id":"https://openalex.org/G8909982725","display_name":null,"funder_award_id":"62104220","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"}],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"},{"id":"https://openalex.org/F4320335777","display_name":"National Key Research and Development Program of China","ror":null}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":4,"referenced_works":["https://openalex.org/W2921401512","https://openalex.org/W2921644351","https://openalex.org/W3015933661","https://openalex.org/W3134360909"],"related_works":["https://openalex.org/W76001227","https://openalex.org/W2349537384","https://openalex.org/W2041511579","https://openalex.org/W1986241886","https://openalex.org/W3120066331","https://openalex.org/W2549052135","https://openalex.org/W2018141764","https://openalex.org/W4385545073","https://openalex.org/W2005020230","https://openalex.org/W4391237117"],"abstract_inverted_index":{"Low":[0],"electromagnetic":[1],"interference":[2],"(EMI)":[3],"is":[4,38,100,268],"essential":[5],"for":[6],"isolated":[7],"DC-DC":[8],"converters":[9],"that":[10,60],"are":[11,67,190,293],"used":[12],"in":[13,72,161,206,217],"the":[14,20,35,45,48,51,65,80,89,97,101,107,110,114,117,120,162,168,178,193,196,202,211,251,256],"harsh":[15],"industrial":[16],"environments.":[17],"To":[18],"pass":[19],"CISPR":[21],"32":[22],"Class-B":[23],"EMI":[24,63],"standard,":[25],"a":[26,30,157,265,272,284],"4-layer":[27],"PCB":[28,54],"with":[29,264],"stitching":[31],"capacitor":[32],"implemented":[33],"by":[34,79,155,192],"internal":[36],"layers":[37],"commonly":[39],"required":[40],"[1],":[41],"which":[42,189],"greatly":[43,249],"increases":[44],"cost":[46],"of":[47,53,96,104,109,113,170,180,195],"system":[49],"and":[50,106,119,127,166,208,230,255,288],"effort":[52],"layout.":[55],"Therefore,":[56],"low-cost":[57],"circuit":[58,257],"techniques":[59],"can":[61,151,236],"reduce":[62,137,240,277],"at":[64,116],"source":[66],"highly":[68],"desirable.":[69],"As":[70],"shown":[71],"Fig.":[73],"14.7.1,":[74],"input-to-output":[75],"dipole":[76],"radiation":[77],"caused":[78],"common-mode":[81],"(CM)":[82],"current":[83],"I":[84,138,171,241,278],"<inf":[85,93,124,129,139,144,148,172,182,186,220,224,242,279],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[86,94,125,130,140,145,149,173,183,187,221,225,243,280],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">CM</inf>":[87,141,146,174,184,222,244,281],"across":[88],"parasitic":[90],"capacitance":[91],"C":[92],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">P</inf>":[95],"isolation":[98],"barrier":[99],"predominant":[102],"mechanism":[103],"EMI,":[105],"fluctuation":[108],"CM":[111],"voltages":[112],"transformer":[115],"primary":[118],"secondary":[121],"side,":[122,165],"V":[123,128,143,181,219],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">CM_PRI</inf>":[126],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">CM_SEC</inf>":[131],",":[132],"should":[133],"be":[134,152,237],"suppressed":[135],"to":[136,239,270,276],".":[142,282],"_":[147,185,223],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">SEC</inf>":[150],"kept":[153],"quiet":[154],"adopting":[156],"symmetrical":[158,274],"full-bridge":[159],"rectifier":[160],"receiver":[163],"(RX)":[164],"thus":[167],"amplitude":[169],"mainly":[175],"depends":[176],"on":[177],"fluctuations":[179],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">PRI</inf>":[188,226],"determined":[191],"topology":[194,215,263],"transmitter":[197],"(TX).":[198],"Unfortunately,":[199],"when":[200],"using":[201],"LC-tank":[203],"oscillator":[204],"adopted":[205],"[2]":[207],"[3],":[209],"or":[210],"leakage-inductance-resonant":[212],"flyback":[213],"(LiRF)":[214],"proposed":[216,269],"[4],":[218],"suffers":[227],"from":[228],"large":[229],"quick":[231],"fluctuations.":[232],"Frequency":[233],"hopping":[234],"technique":[235],"employed":[238],"[2],":[245],"but":[246],"it":[247],"will":[248],"increase":[250],"output":[252],"voltage":[253],"ripple":[254],"complexity.":[258],"In":[259],"[5],":[260],"an":[261],"LLCC":[262],"multistage":[266],"pre-driver":[267],"form":[271],"more":[273],"structure":[275],"However,":[283],"costly":[285],"magnetic-core":[286],"micro-transformer":[287],"two":[289],"extra":[290],"external":[291],"capacitors":[292],"needed.":[294]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":10},{"year":2024,"cited_by_count":9},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":2}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}