{"id":"https://openalex.org/W2067112843","doi":"https://doi.org/10.1109/isscc.2011.5746262","title":"A 14Gb/s high-swing thin-oxide device SST TX in 45nm CMOS SOI","display_name":"A 14Gb/s high-swing thin-oxide device SST TX in 45nm CMOS SOI","publication_year":2011,"publication_date":"2011-02-01","ids":{"openalex":"https://openalex.org/W2067112843","doi":"https://doi.org/10.1109/isscc.2011.5746262","mag":"2067112843"},"language":"en","primary_location":{"id":"doi:10.1109/isscc.2011.5746262","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isscc.2011.5746262","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2011 IEEE International Solid-State Circuits Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5028644477","display_name":"Christian Menolfi","orcid":null},"institutions":[{"id":"https://openalex.org/I4210126328","display_name":"IBM Research - Zurich","ror":"https://ror.org/02js37d36","country_code":"CH","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115","https://openalex.org/I4210126328"]}],"countries":["CH"],"is_corresponding":true,"raw_author_name":"Christian Menolfi","raw_affiliation_strings":["IBM Zurich Research Laboratory, Rueschlikon, Switzerland","IBM Zurich Research Laboratory Rueschlikon, Switzerland"],"affiliations":[{"raw_affiliation_string":"IBM Zurich Research Laboratory, Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]},{"raw_affiliation_string":"IBM Zurich Research Laboratory Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084903090","display_name":"Thomas Toifl","orcid":"https://orcid.org/0000-0002-6448-1961"},"institutions":[{"id":"https://openalex.org/I4210126328","display_name":"IBM Research - Zurich","ror":"https://ror.org/02js37d36","country_code":"CH","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115","https://openalex.org/I4210126328"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Thomas Toifl","raw_affiliation_strings":["IBM Zurich Research Laboratory, Rueschlikon, Switzerland","IBM Zurich Research Laboratory Rueschlikon, Switzerland"],"affiliations":[{"raw_affiliation_string":"IBM Zurich Research Laboratory, Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]},{"raw_affiliation_string":"IBM Zurich Research Laboratory Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041577704","display_name":"Michael Rueegg","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Michael Rueegg","raw_affiliation_strings":["Miromico, Zurich, Switzerland"],"affiliations":[{"raw_affiliation_string":"Miromico, Zurich, Switzerland","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032768794","display_name":"Matthias Br\u00e4endli","orcid":"https://orcid.org/0000-0003-1995-7593"},"institutions":[{"id":"https://openalex.org/I4210126328","display_name":"IBM Research - Zurich","ror":"https://ror.org/02js37d36","country_code":"CH","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115","https://openalex.org/I4210126328"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Matthias Braendli","raw_affiliation_strings":["IBM Zurich Research Laboratory, Rueschlikon, Switzerland","IBM Zurich Research Laboratory Rueschlikon, Switzerland"],"affiliations":[{"raw_affiliation_string":"IBM Zurich Research Laboratory, Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]},{"raw_affiliation_string":"IBM Zurich Research Laboratory Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053177533","display_name":"P. Buchmann","orcid":"https://orcid.org/0000-0001-7207-1287"},"institutions":[{"id":"https://openalex.org/I4210126328","display_name":"IBM Research - Zurich","ror":"https://ror.org/02js37d36","country_code":"CH","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115","https://openalex.org/I4210126328"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Peter Buchmann","raw_affiliation_strings":["IBM Zurich Research Laboratory, Rueschlikon, Switzerland","IBM Zurich Research Laboratory Rueschlikon, Switzerland"],"affiliations":[{"raw_affiliation_string":"IBM Zurich Research Laboratory, Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]},{"raw_affiliation_string":"IBM Zurich Research Laboratory Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085908094","display_name":"Marcel Kossel","orcid":"https://orcid.org/0000-0003-3053-2422"},"institutions":[{"id":"https://openalex.org/I4210126328","display_name":"IBM Research - Zurich","ror":"https://ror.org/02js37d36","country_code":"CH","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115","https://openalex.org/I4210126328"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Marcel Kossel","raw_affiliation_strings":["IBM Zurich Research Laboratory, Rueschlikon, Switzerland","IBM Zurich Research Laboratory Rueschlikon, Switzerland"],"affiliations":[{"raw_affiliation_string":"IBM Zurich Research Laboratory, Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]},{"raw_affiliation_string":"IBM Zurich Research Laboratory Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5088828887","display_name":"Thomas Morf","orcid":"https://orcid.org/0000-0002-2712-6653"},"institutions":[{"id":"https://openalex.org/I4210126328","display_name":"IBM Research - Zurich","ror":"https://ror.org/02js37d36","country_code":"CH","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115","https://openalex.org/I4210126328"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Thomas Morf","raw_affiliation_strings":["IBM Zurich Research Laboratory, Rueschlikon, Switzerland","IBM Zurich Research Laboratory Rueschlikon, Switzerland"],"affiliations":[{"raw_affiliation_string":"IBM Zurich Research Laboratory, Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]},{"raw_affiliation_string":"IBM Zurich Research Laboratory Rueschlikon, Switzerland","institution_ids":["https://openalex.org/I4210126328"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":7,"corresponding_author_ids":["https://openalex.org/A5028644477"],"corresponding_institution_ids":["https://openalex.org/I4210126328"],"apc_list":null,"apc_paid":null,"fwci":2.6496,"has_fulltext":false,"cited_by_count":27,"citation_normalized_percentile":{"value":0.90440339,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"156","last_page":"158"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9987999796867371,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.7536917328834534},{"id":"https://openalex.org/keywords/swing","display_name":"Swing","score":0.7492597699165344},{"id":"https://openalex.org/keywords/pmos-logic","display_name":"PMOS logic","score":0.7240840792655945},{"id":"https://openalex.org/keywords/nmos-logic","display_name":"NMOS logic","score":0.6557105183601379},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.5487712621688843},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.539899468421936},{"id":"https://openalex.org/keywords/low-voltage","display_name":"Low voltage","score":0.46884194016456604},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4526585638523102},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.40975096821784973},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3377675414085388},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.22892561554908752}],"concepts":[{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.7536917328834534},{"id":"https://openalex.org/C65655974","wikidata":"https://www.wikidata.org/wiki/Q14867674","display_name":"Swing","level":2,"score":0.7492597699165344},{"id":"https://openalex.org/C27050352","wikidata":"https://www.wikidata.org/wiki/Q173605","display_name":"PMOS logic","level":4,"score":0.7240840792655945},{"id":"https://openalex.org/C197162436","wikidata":"https://www.wikidata.org/wiki/Q83908","display_name":"NMOS logic","level":4,"score":0.6557105183601379},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.5487712621688843},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.539899468421936},{"id":"https://openalex.org/C128624480","wikidata":"https://www.wikidata.org/wiki/Q1504817","display_name":"Low voltage","level":3,"score":0.46884194016456604},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4526585638523102},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.40975096821784973},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3377675414085388},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.22892561554908752},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/isscc.2011.5746262","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isscc.2011.5746262","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2011 IEEE International Solid-State Circuits Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","score":0.800000011920929,"display_name":"Affordable and clean energy"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2103806711","https://openalex.org/W2136801359","https://openalex.org/W2143905108"],"related_works":["https://openalex.org/W4386261925","https://openalex.org/W2082944690","https://openalex.org/W2263373136","https://openalex.org/W2023334077","https://openalex.org/W2005494397","https://openalex.org/W1811213809","https://openalex.org/W1914349328","https://openalex.org/W2160067645","https://openalex.org/W2730314563","https://openalex.org/W2058541779"],"abstract_inverted_index":{"The":[0,81],"limited":[1],"supply":[2,23,142],"voltage":[3,49,160],"of":[4,12,152],"today's":[5],"state-of-the-art":[6],"CMOS":[7],"technologies":[8],"makes":[9],"the":[10,19,117,146,149,153],"design":[11],"high-speed":[13,53],"transmitters":[14],"at":[15],"signaling":[16],"swings":[17],"above":[18],"typical":[20],"1":[21],"V":[22],"a":[24,87,92,129,140,158],"challenging":[25],"task.":[26],"Higher-voltage":[27],"TX":[28,96,132],"amplitude":[29],"is":[30,55,86],"not":[31],"only":[32],"required":[33],"in":[34,43,65,91],"older":[35],"I/O":[36,63,95],"standards":[37,64],"and":[38,112,123,138,148],"legacy":[39],"applications,":[40],"but":[41],"also":[42,59],"emerging":[44],"electro-optical":[45],"extensions":[46],"where":[47,67],"high":[48,108],"swing":[50,58],"combined":[51],"with":[52,157],"operation":[54],"desired.":[56],"Higher":[57],"helps":[60],"meet":[61],"certain":[62],"applications":[66],"losses":[68],"introduced":[69],"by":[70],"high-density":[71],"package":[72],"constraints":[73],"can":[74],"be":[75],"compensat":[76],"ed":[77],"to":[78,98],"some":[79],"extent.":[80],"source-series":[82],"terminated":[83],"(SST)":[84],"driver":[85,119],"versatile":[88],"building":[89],"block":[90],"multi":[93],"standard":[94],"thanks":[97],"its":[99,104],"potential":[100],"for":[101,144],"low-power":[102],"operation,":[103],"low":[105],"area":[106],"consumption,":[107],"CMOS-style":[109],"circuit":[110],"content,":[111],"flexible":[113],"termination":[114],"capability.":[115],"Also,":[116],"SST":[118,131],"supports":[120],"single-ended":[121],"output":[122,154],"differential":[124],"operation.":[125],"This":[126],"contribution":[127],"presents":[128],"high-swing":[130],"based":[133],"entirely":[134],"on":[135],"thin-oxide":[136],"devices":[137],"using":[139],"split":[141],"approach":[143],"driving":[145],"NMOS":[147],"PMOS":[150],"branches":[151],"driver,":[155],"along":[156],"static":[159],"protection":[161],"scheme.":[162]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":5},{"year":2015,"cited_by_count":3},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":6},{"year":2012,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}
