{"id":"https://openalex.org/W2035885601","doi":"https://doi.org/10.1109/isscc.2008.4523056","title":"Low-Crosstalk and Low-Dark-Current CMOS Image-Sensor Technology Using a Hole-Based Detector","display_name":"Low-Crosstalk and Low-Dark-Current CMOS Image-Sensor Technology Using a Hole-Based Detector","publication_year":2008,"publication_date":"2008-02-01","ids":{"openalex":"https://openalex.org/W2035885601","doi":"https://doi.org/10.1109/isscc.2008.4523056","mag":"2035885601"},"language":"en","primary_location":{"id":"doi:10.1109/isscc.2008.4523056","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isscc.2008.4523056","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2008 IEEE International Solid-State Circuits Conference - Digest of Technical Papers","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5086920909","display_name":"Eric Stevens","orcid":null},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]},{"id":"https://openalex.org/I4210140030","display_name":"Eastman Chemical Company (United States)","ror":"https://ror.org/053ng1p06","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140030"]},{"id":"https://openalex.org/I4210159451","display_name":"Kodak (United States)","ror":"https://ror.org/04rn3ph18","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159451"]}],"countries":["JP","US"],"is_corresponding":false,"raw_author_name":"Eric Stevens","raw_affiliation_strings":["Eastman Kodak (Japan) Limited, Rochester, NY, USA","Eastman Kodak,Rochester, NY"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak (Japan) Limited, Rochester, NY, USA","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak,Rochester, NY","institution_ids":["https://openalex.org/I4210140030","https://openalex.org/I4210159451"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5029088800","display_name":"Hirofumi Komori","orcid":null},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hirofumi Komori","raw_affiliation_strings":["Eastman Kodak, Inc., Yokohama, Japan","Eastman Kodak, Yokohama, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak, Inc., Yokohama, Japan","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak, Yokohama, Japan","institution_ids":["https://openalex.org/I4210094723"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088315010","display_name":"Hung Q. Doan","orcid":"https://orcid.org/0000-0002-4715-0562"},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]},{"id":"https://openalex.org/I4210140030","display_name":"Eastman Chemical Company (United States)","ror":"https://ror.org/053ng1p06","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140030"]},{"id":"https://openalex.org/I4210159451","display_name":"Kodak (United States)","ror":"https://ror.org/04rn3ph18","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159451"]}],"countries":["JP","US"],"is_corresponding":false,"raw_author_name":"Hung Doan","raw_affiliation_strings":["Eastman Kodak (Japan) Limited, Rochester, NY, USA","Eastman Kodak,Rochester, NY"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak (Japan) Limited, Rochester, NY, USA","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak,Rochester, NY","institution_ids":["https://openalex.org/I4210140030","https://openalex.org/I4210159451"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079460288","display_name":"Hiroaki Fujita","orcid":"https://orcid.org/0000-0002-3259-7054"},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]},{"id":"https://openalex.org/I4210140030","display_name":"Eastman Chemical Company (United States)","ror":"https://ror.org/053ng1p06","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140030"]},{"id":"https://openalex.org/I4210159451","display_name":"Kodak (United States)","ror":"https://ror.org/04rn3ph18","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159451"]}],"countries":["JP","US"],"is_corresponding":false,"raw_author_name":"Hiroaki Fujita","raw_affiliation_strings":["Eastman Kodak (Japan) Limited, Rochester, NY, USA","Eastman Kodak,Rochester, NY"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak (Japan) Limited, Rochester, NY, USA","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak,Rochester, NY","institution_ids":["https://openalex.org/I4210140030","https://openalex.org/I4210159451"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017166476","display_name":"Jeffery Kyan","orcid":null},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]},{"id":"https://openalex.org/I4210140030","display_name":"Eastman Chemical Company (United States)","ror":"https://ror.org/053ng1p06","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140030"]},{"id":"https://openalex.org/I4210159451","display_name":"Kodak (United States)","ror":"https://ror.org/04rn3ph18","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159451"]}],"countries":["JP","US"],"is_corresponding":false,"raw_author_name":"Jeffery Kyan","raw_affiliation_strings":["Eastman Kodak (Japan) Limited, Rochester, NY, USA","Eastman Kodak,Rochester, NY"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak (Japan) Limited, Rochester, NY, USA","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak,Rochester, NY","institution_ids":["https://openalex.org/I4210140030","https://openalex.org/I4210159451"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108219448","display_name":"Christopher Parks","orcid":null},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]},{"id":"https://openalex.org/I4210140030","display_name":"Eastman Chemical Company (United States)","ror":"https://ror.org/053ng1p06","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140030"]},{"id":"https://openalex.org/I4210159451","display_name":"Kodak (United States)","ror":"https://ror.org/04rn3ph18","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159451"]}],"countries":["JP","US"],"is_corresponding":false,"raw_author_name":"Christopher Parks","raw_affiliation_strings":["Eastman Kodak (Japan) Limited, Rochester, NY, USA","Eastman Kodak,Rochester, NY"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak (Japan) Limited, Rochester, NY, USA","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak,Rochester, NY","institution_ids":["https://openalex.org/I4210140030","https://openalex.org/I4210159451"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102722246","display_name":"Gang Shi","orcid":"https://orcid.org/0000-0002-3879-0111"},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]},{"id":"https://openalex.org/I4210140030","display_name":"Eastman Chemical Company (United States)","ror":"https://ror.org/053ng1p06","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140030"]},{"id":"https://openalex.org/I4210159451","display_name":"Kodak (United States)","ror":"https://ror.org/04rn3ph18","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159451"]}],"countries":["JP","US"],"is_corresponding":false,"raw_author_name":"Gang Shi","raw_affiliation_strings":["Eastman Kodak (Japan) Limited, Rochester, NY, USA","Eastman Kodak,Rochester, NY"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak (Japan) Limited, Rochester, NY, USA","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak,Rochester, NY","institution_ids":["https://openalex.org/I4210140030","https://openalex.org/I4210159451"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007186970","display_name":"C. Tivarus","orcid":null},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]},{"id":"https://openalex.org/I4210140030","display_name":"Eastman Chemical Company (United States)","ror":"https://ror.org/053ng1p06","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140030"]},{"id":"https://openalex.org/I4210159451","display_name":"Kodak (United States)","ror":"https://ror.org/04rn3ph18","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159451"]}],"countries":["JP","US"],"is_corresponding":false,"raw_author_name":"Cristian Tivarus","raw_affiliation_strings":["Eastman Kodak (Japan) Limited, Rochester, NY, USA","Eastman Kodak,Rochester, NY"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak (Japan) Limited, Rochester, NY, USA","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak,Rochester, NY","institution_ids":["https://openalex.org/I4210140030","https://openalex.org/I4210159451"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101913769","display_name":"Jian Wu","orcid":"https://orcid.org/0000-0003-4518-7027"},"institutions":[{"id":"https://openalex.org/I4210094723","display_name":"Kodak (Japan)","ror":"https://ror.org/00tee0349","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210094723","https://openalex.org/I4210159451"]},{"id":"https://openalex.org/I4210140030","display_name":"Eastman Chemical Company (United States)","ror":"https://ror.org/053ng1p06","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140030"]},{"id":"https://openalex.org/I4210159451","display_name":"Kodak (United States)","ror":"https://ror.org/04rn3ph18","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159451"]}],"countries":["JP","US"],"is_corresponding":false,"raw_author_name":"Jian Wu","raw_affiliation_strings":["Eastman Kodak (Japan) Limited, Rochester, NY, USA","Eastman Kodak,Rochester, NY"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eastman Kodak (Japan) Limited, Rochester, NY, USA","institution_ids":["https://openalex.org/I4210094723"]},{"raw_affiliation_string":"Eastman Kodak,Rochester, NY","institution_ids":["https://openalex.org/I4210140030","https://openalex.org/I4210159451"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":9,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":3.0526,"has_fulltext":false,"cited_by_count":35,"citation_normalized_percentile":{"value":0.90972343,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":99},"biblio":{"volume":"25","issue":null,"first_page":"60","last_page":"595"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12389","display_name":"Infrared Target Detection Methodologies","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13114","display_name":"Image Processing Techniques and Applications","score":0.9894999861717224,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/image-sensor","display_name":"Image sensor","score":0.748700737953186},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.7275403141975403},{"id":"https://openalex.org/keywords/crosstalk","display_name":"Crosstalk","score":0.6762646436691284},{"id":"https://openalex.org/keywords/dark-current","display_name":"Dark current","score":0.5992082357406616},{"id":"https://openalex.org/keywords/pixel","display_name":"Pixel","score":0.5823560357093811},{"id":"https://openalex.org/keywords/detector","display_name":"Detector","score":0.5514522194862366},{"id":"https://openalex.org/keywords/optical-transfer-function","display_name":"Optical transfer function","score":0.5466166734695435},{"id":"https://openalex.org/keywords/correlated-double-sampling","display_name":"Correlated double sampling","score":0.5173249244689941},{"id":"https://openalex.org/keywords/diagonal","display_name":"Diagonal","score":0.4524562954902649},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.45070880651474},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4281180500984192},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4100736975669861},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.38011765480041504},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.37620070576667786},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.24903646111488342},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.21986344456672668},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.07074475288391113}],"concepts":[{"id":"https://openalex.org/C76935873","wikidata":"https://www.wikidata.org/wiki/Q209121","display_name":"Image sensor","level":2,"score":0.748700737953186},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.7275403141975403},{"id":"https://openalex.org/C169822122","wikidata":"https://www.wikidata.org/wiki/Q230187","display_name":"Crosstalk","level":2,"score":0.6762646436691284},{"id":"https://openalex.org/C180651308","wikidata":"https://www.wikidata.org/wiki/Q1265973","display_name":"Dark current","level":3,"score":0.5992082357406616},{"id":"https://openalex.org/C160633673","wikidata":"https://www.wikidata.org/wiki/Q355198","display_name":"Pixel","level":2,"score":0.5823560357093811},{"id":"https://openalex.org/C94915269","wikidata":"https://www.wikidata.org/wiki/Q1834857","display_name":"Detector","level":2,"score":0.5514522194862366},{"id":"https://openalex.org/C175231954","wikidata":"https://www.wikidata.org/wiki/Q1942321","display_name":"Optical transfer function","level":2,"score":0.5466166734695435},{"id":"https://openalex.org/C118277053","wikidata":"https://www.wikidata.org/wiki/Q5172837","display_name":"Correlated double sampling","level":4,"score":0.5173249244689941},{"id":"https://openalex.org/C130367717","wikidata":"https://www.wikidata.org/wiki/Q189791","display_name":"Diagonal","level":2,"score":0.4524562954902649},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.45070880651474},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4281180500984192},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4100736975669861},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.38011765480041504},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.37620070576667786},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.24903646111488342},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.21986344456672668},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.07074475288391113},{"id":"https://openalex.org/C194257627","wikidata":"https://www.wikidata.org/wiki/Q211554","display_name":"Amplifier","level":3,"score":0.0},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/isscc.2008.4523056","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isscc.2008.4523056","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2008 IEEE International Solid-State Circuits Conference - Digest of Technical Papers","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.6899999976158142,"display_name":"Affordable and clean energy","id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":10,"referenced_works":["https://openalex.org/W1517606245","https://openalex.org/W2005852137","https://openalex.org/W2011811347","https://openalex.org/W2043729624","https://openalex.org/W2104903930","https://openalex.org/W2148315495","https://openalex.org/W3132989514","https://openalex.org/W6675550697","https://openalex.org/W6682157745","https://openalex.org/W6791529683"],"related_works":["https://openalex.org/W2346456779","https://openalex.org/W3215112777","https://openalex.org/W3137255043","https://openalex.org/W2040307044","https://openalex.org/W1990138130","https://openalex.org/W1963996011","https://openalex.org/W1990739855","https://openalex.org/W2777508220","https://openalex.org/W2170745046","https://openalex.org/W2611369832"],"abstract_inverted_index":{"As":[0],"the":[1,28,34,41,45,52,70],"pixel":[2],"size":[3],"of":[4,30,40],"CMOS":[5,22],"image":[6,36],"sensors":[7],"(CIS)":[8],"shrink,":[9],"problems":[10,74],"associated":[11],"with":[12],"crosstalk":[13,26],"become":[14],"more":[15],"severe":[16],"for":[17,64,87,92],"devices":[18,90],"built":[19],"using":[20],"mainstream":[21],"processing.":[23],"This":[24],"high":[25],"increases":[27],"amount":[29],"noise":[31],"added":[32],"to":[33,72,77,79],"final":[35],"(via":[37],"an":[38],"increase":[39],"off-diagonal":[42],"terms":[43],"in":[44],"color":[46],"correction":[47],"matrix":[48],"(CCM))":[49],"and":[50],"degrades":[51],"modulation":[53],"transfer":[54],"function":[55],"(MTF).":[56],"Reducing":[57],"dark":[58],"current":[59],"has":[60,75],"also":[61],"been":[62,76,85],"challenging":[63],"such":[65],"CIS":[66],"imagers.":[67],"At":[68],"present,":[69],"solution":[71],"these":[73],"switch":[78],"n-type":[80],"substrates":[81],"since":[82],"they":[83],"have":[84],"used":[86],"interline":[88],"charge-coupled":[89],"(CCDs)":[91],"decades.":[93]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":2},{"year":2020,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":5},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":6}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}