{"id":"https://openalex.org/W2153778369","doi":"https://doi.org/10.1109/isqed.2011.5770763","title":"Lithography-aware layout modification considering performance impact","display_name":"Lithography-aware layout modification considering performance impact","publication_year":2011,"publication_date":"2011-03-01","ids":{"openalex":"https://openalex.org/W2153778369","doi":"https://doi.org/10.1109/isqed.2011.5770763","mag":"2153778369"},"language":"en","primary_location":{"id":"doi:10.1109/isqed.2011.5770763","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isqed.2011.5770763","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2011 12th International Symposium on Quality Electronic Design","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100461085","display_name":"Hongbo Zhang","orcid":"https://orcid.org/0000-0001-7259-5419"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Hongbo Zhang","raw_affiliation_strings":["Department of ECE, University of Illinois, Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"Department of ECE, University of Illinois, Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069931478","display_name":"Yuelin Du","orcid":null},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yuelin Du","raw_affiliation_strings":["Department of ECE, University of Illinois, Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"Department of ECE, University of Illinois, Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053378706","display_name":"Martin D. F. Wong","orcid":"https://orcid.org/0000-0001-8274-9688"},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Martin D. F. Wong","raw_affiliation_strings":["Department of ECE, University of Illinois, Urbana-Champaign, USA"],"affiliations":[{"raw_affiliation_string":"Department of ECE, University of Illinois, Urbana-Champaign, USA","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5061862022","display_name":"Kai-Yuan Chao","orcid":"https://orcid.org/0009-0006-1057-1319"},"institutions":[{"id":"https://openalex.org/I4210104622","display_name":"Intel (Israel)","ror":"https://ror.org/027t2s119","country_code":"IL","type":"company","lineage":["https://openalex.org/I1343180700","https://openalex.org/I4210104622"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Kai-Yuan Chao","raw_affiliation_strings":["Intel Corporation, Israel"],"affiliations":[{"raw_affiliation_string":"Intel Corporation, Israel","institution_ids":["https://openalex.org/I4210104622"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5100461085"],"corresponding_institution_ids":["https://openalex.org/I157725225"],"apc_list":null,"apc_paid":null,"fwci":1.3248,"has_fulltext":false,"cited_by_count":10,"citation_normalized_percentile":{"value":0.83362449,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":"6925","issue":null,"first_page":"1","last_page":"5"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6768944263458252},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6322765946388245},{"id":"https://openalex.org/keywords/integrated-circuit-layout","display_name":"Integrated circuit layout","score":0.5051799416542053},{"id":"https://openalex.org/keywords/physical-design","display_name":"Physical design","score":0.49229609966278076},{"id":"https://openalex.org/keywords/power-consumption","display_name":"Power consumption","score":0.4839920997619629},{"id":"https://openalex.org/keywords/extension","display_name":"Extension (predicate logic)","score":0.42337700724601746},{"id":"https://openalex.org/keywords/node","display_name":"Node (physics)","score":0.4179299771785736},{"id":"https://openalex.org/keywords/integrated-circuit-design","display_name":"Integrated circuit design","score":0.4148111045360565},{"id":"https://openalex.org/keywords/circuit-design","display_name":"Circuit design","score":0.40869706869125366},{"id":"https://openalex.org/keywords/power","display_name":"Power (physics)","score":0.4041365087032318},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.3943560719490051},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.27532875537872314},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.21706622838974},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.197627991437912}],"concepts":[{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6768944263458252},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6322765946388245},{"id":"https://openalex.org/C2765594","wikidata":"https://www.wikidata.org/wiki/Q2624187","display_name":"Integrated circuit layout","level":3,"score":0.5051799416542053},{"id":"https://openalex.org/C188817802","wikidata":"https://www.wikidata.org/wiki/Q13426855","display_name":"Physical design","level":3,"score":0.49229609966278076},{"id":"https://openalex.org/C2984118289","wikidata":"https://www.wikidata.org/wiki/Q29954","display_name":"Power consumption","level":3,"score":0.4839920997619629},{"id":"https://openalex.org/C2778029271","wikidata":"https://www.wikidata.org/wiki/Q5421931","display_name":"Extension (predicate logic)","level":2,"score":0.42337700724601746},{"id":"https://openalex.org/C62611344","wikidata":"https://www.wikidata.org/wiki/Q1062658","display_name":"Node (physics)","level":2,"score":0.4179299771785736},{"id":"https://openalex.org/C74524168","wikidata":"https://www.wikidata.org/wiki/Q1074539","display_name":"Integrated circuit design","level":2,"score":0.4148111045360565},{"id":"https://openalex.org/C190560348","wikidata":"https://www.wikidata.org/wiki/Q3245116","display_name":"Circuit design","level":2,"score":0.40869706869125366},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.4041365087032318},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3943560719490051},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.27532875537872314},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.21706622838974},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.197627991437912},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C66938386","wikidata":"https://www.wikidata.org/wiki/Q633538","display_name":"Structural engineering","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C142362112","wikidata":"https://www.wikidata.org/wiki/Q735","display_name":"Art","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C153349607","wikidata":"https://www.wikidata.org/wiki/Q36649","display_name":"Visual arts","level":1,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/isqed.2011.5770763","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isqed.2011.5770763","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2011 12th International Symposium on Quality Electronic Design","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy","score":0.6800000071525574}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W1975356894","https://openalex.org/W1983069902","https://openalex.org/W2016669084","https://openalex.org/W2071589594","https://openalex.org/W2100344939","https://openalex.org/W3144063603","https://openalex.org/W6668356502","https://openalex.org/W6674862444"],"related_works":["https://openalex.org/W4321510758","https://openalex.org/W2376028644","https://openalex.org/W2070475173","https://openalex.org/W4389672975","https://openalex.org/W2109207559","https://openalex.org/W1987513258","https://openalex.org/W4391382037","https://openalex.org/W2138401961","https://openalex.org/W2036121598","https://openalex.org/W1965232212"],"abstract_inverted_index":{"As":[0],"regular":[1],"design":[2,12],"rules":[3],"become":[4],"necessary":[5],"in":[6,93],"sub-45nm":[7],"node":[8],"circuit":[9,77,133],"design,":[10,25],"1-D":[11,24],"has":[13,18],"shown":[14],"its":[15],"advantages":[16],"and":[17,58,73,79,88,94,129,132,145],"drawn":[19],"intensive":[20],"research":[21],"interest.":[22],"In":[23,106],"line-end":[26,56,119],"gaps":[27],"are":[28],"the":[29,49,70,101,124,136,139],"main":[30],"sources":[31],"of":[32,48,69,103,126,138],"printing":[33],"difficulties.":[34],"Recently,":[35],"we":[36,109],"demonstrated":[37],"that":[38,62],"printability":[39],"can":[40],"be":[41],"significantly":[42],"improved":[43],"by":[44],"intelligent":[45],"(litho-aware)":[46],"rearrangement":[47],"gap":[50],"distribution":[51],"with":[52],"techniques":[53,65],"such":[54],"as":[55],"extension":[57],"dummy":[59],"insertion.":[60],"Note":[61],"poly/gate":[63],"redistribution":[64,113],"require":[66],"layout":[67,72],"modification":[68],"original":[71],"thus":[74],"will":[75],"impact":[76],"performance":[78,87],"power":[80,89],"consumption.":[81],"Such":[82],"potentially":[83],"undesirable":[84],"impacts":[85],"on":[86,118],"were":[90],"not":[91],"considered":[92],"deserve":[95],"a":[96],"careful":[97],"investigation,":[98],"which":[99,115],"is":[100],"subject":[102],"our":[104,127],"study.":[105],"this":[107],"paper,":[108],"present":[110],"performance-driven":[111],"gate":[112],"algorithms":[114],"consider":[116],"bounds":[117],"extension.":[120],"Experimental":[121],"results":[122],"demonstrate":[123],"feasibility":[125],"algorithms,":[128],"lithography":[130],"simulation":[131],"analysis":[134],"show":[135],"trend":[137],"trade":[140],"off":[141],"between":[142],"printability,":[143],"delay,":[144],"power.":[146]},"counts_by_year":[{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":3},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":2}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}