{"id":"https://openalex.org/W2129319535","doi":"https://doi.org/10.1109/isic.2002.1157854","title":"Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing","display_name":"Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing","publication_year":2003,"publication_date":"2003-06-25","ids":{"openalex":"https://openalex.org/W2129319535","doi":"https://doi.org/10.1109/isic.2002.1157854","mag":"2129319535"},"language":"en","primary_location":{"id":"doi:10.1109/isic.2002.1157854","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isic.2002.1157854","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the IEEE Internatinal Symposium on Intelligent Control","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5016610042","display_name":"Liu Da","orcid":"https://orcid.org/0000-0002-3086-5078"},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":true,"raw_author_name":"L. Da","raw_affiliation_strings":["Department of Electrical and Computer Engineering, National University of Singapore, Singapore"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, National University of Singapore, Singapore","institution_ids":["https://openalex.org/I165932596"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075573572","display_name":"Vimal Kumar","orcid":null},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"V.G. Kumar","raw_affiliation_strings":["Department of Electrical and Computer Engineering, National University of Singapore, Singapore"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, National University of Singapore, Singapore","institution_ids":["https://openalex.org/I165932596"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085887197","display_name":"Arthur Tay","orcid":"https://orcid.org/0000-0002-3197-2369"},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"A. Tay","raw_affiliation_strings":["Department of Electrical and Computer Engineering, National University of Singapore, Singapore"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, National University of Singapore, Singapore","institution_ids":["https://openalex.org/I165932596"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017493688","display_name":"Abdullah Al Mamun","orcid":"https://orcid.org/0000-0001-8597-8590"},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"A. Al Mamun","raw_affiliation_strings":["Department of Electrical and Computer Engineering, National University of Singapore, Singapore"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, National University of Singapore, Singapore","institution_ids":["https://openalex.org/I165932596"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046913722","display_name":"Weng Khuen Ho","orcid":"https://orcid.org/0000-0001-5733-3007"},"institutions":[{"id":"https://openalex.org/I165932596","display_name":"National University of Singapore","ror":"https://ror.org/01tgyzw49","country_code":"SG","type":"education","lineage":["https://openalex.org/I165932596"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Weng Khuen Ho","raw_affiliation_strings":["Department of Electrical and Computer Engineering, National University of Singapore, Singapore"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, National University of Singapore, Singapore","institution_ids":["https://openalex.org/I165932596"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5006935957","display_name":"A. See","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A. See","raw_affiliation_strings":["Chartered Semiconductor Manufacturing Private Limited, Singapore"],"affiliations":[{"raw_affiliation_string":"Chartered Semiconductor Manufacturing Private Limited, Singapore","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5068689827","display_name":"Lap Ki Chan","orcid":"https://orcid.org/0000-0001-8836-4914"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"L. Chan","raw_affiliation_strings":["Chartered Semiconductor Manufacturing Private Limited, Singapore"],"affiliations":[{"raw_affiliation_string":"Chartered Semiconductor Manufacturing Private Limited, Singapore","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":7,"corresponding_author_ids":["https://openalex.org/A5016610042"],"corresponding_institution_ids":["https://openalex.org/I165932596"],"apc_list":null,"apc_paid":null,"fwci":0.6079,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.71523915,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"740","last_page":"745"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10188","display_name":"Advanced machining processes and optimization","score":0.996999979019165,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12282","display_name":"Mineral Processing and Grinding","score":0.9925000071525574,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.8552023768424988},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.8315035700798035},{"id":"https://openalex.org/keywords/polishing","display_name":"Polishing","score":0.8131014704704285},{"id":"https://openalex.org/keywords/chemical-mechanical-planarization","display_name":"Chemical-mechanical planarization","score":0.7881572246551514},{"id":"https://openalex.org/keywords/semiconductor","display_name":"Semiconductor","score":0.5945112705230713},{"id":"https://openalex.org/keywords/process-control","display_name":"Process control","score":0.5859898924827576},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5582162141799927},{"id":"https://openalex.org/keywords/controller","display_name":"Controller (irrigation)","score":0.5564579367637634},{"id":"https://openalex.org/keywords/wafer-fabrication","display_name":"Wafer fabrication","score":0.5284074544906616},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.4861850142478943},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4359327256679535},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.4164186120033264},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.41291293501853943},{"id":"https://openalex.org/keywords/process-engineering","display_name":"Process engineering","score":0.4084859788417816},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.36695611476898193},{"id":"https://openalex.org/keywords/manufacturing-engineering","display_name":"Manufacturing engineering","score":0.3539500832557678},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3436518609523773},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.25298771262168884}],"concepts":[{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.8552023768424988},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.8315035700798035},{"id":"https://openalex.org/C138113353","wikidata":"https://www.wikidata.org/wiki/Q611639","display_name":"Polishing","level":2,"score":0.8131014704704285},{"id":"https://openalex.org/C180088628","wikidata":"https://www.wikidata.org/wiki/Q1069404","display_name":"Chemical-mechanical planarization","level":3,"score":0.7881572246551514},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.5945112705230713},{"id":"https://openalex.org/C155386361","wikidata":"https://www.wikidata.org/wiki/Q1649571","display_name":"Process control","level":3,"score":0.5859898924827576},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5582162141799927},{"id":"https://openalex.org/C203479927","wikidata":"https://www.wikidata.org/wiki/Q5165939","display_name":"Controller (irrigation)","level":2,"score":0.5564579367637634},{"id":"https://openalex.org/C35750839","wikidata":"https://www.wikidata.org/wiki/Q7959421","display_name":"Wafer fabrication","level":3,"score":0.5284074544906616},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.4861850142478943},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4359327256679535},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.4164186120033264},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.41291293501853943},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.4084859788417816},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.36695611476898193},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.3539500832557678},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3436518609523773},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.25298771262168884},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C6557445","wikidata":"https://www.wikidata.org/wiki/Q173113","display_name":"Agronomy","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/isic.2002.1157854","is_oa":false,"landing_page_url":"https://doi.org/10.1109/isic.2002.1157854","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the IEEE Internatinal Symposium on Intelligent Control","raw_type":"proceedings-article"},{"id":"pmh:oai:scholarbank.nus.edu.sg:10635/71699","is_oa":false,"landing_page_url":"http://scholarbank.nus.edu.sg/handle/10635/71699","pdf_url":null,"source":{"id":"https://openalex.org/S7407052290","display_name":"National University of Singapore","issn_l":null,"issn":[],"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Scopus","raw_type":"Conference Paper"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W1546756991","https://openalex.org/W1585827785","https://openalex.org/W1782168110","https://openalex.org/W1968224762","https://openalex.org/W2050174805","https://openalex.org/W2104897439","https://openalex.org/W2118806609","https://openalex.org/W2130697405","https://openalex.org/W2133416631","https://openalex.org/W2147336344","https://openalex.org/W2154180415","https://openalex.org/W2170909262","https://openalex.org/W2171057431","https://openalex.org/W2789525605","https://openalex.org/W4230715394","https://openalex.org/W4250223708"],"related_works":["https://openalex.org/W2378882722","https://openalex.org/W1983603153","https://openalex.org/W2170726572","https://openalex.org/W2146435486","https://openalex.org/W2006086900","https://openalex.org/W1483119123","https://openalex.org/W2377558694","https://openalex.org/W2394172622","https://openalex.org/W4299738564","https://openalex.org/W1594978932"],"abstract_inverted_index":{"Chemical":[0],"mechanical":[1],"polishing":[2],"(CMP)":[3],"has":[4],"become,":[5],"in":[6,17,32,49,95],"a":[7,82],"few":[8],"short":[9],"years,":[10],"an":[11],"indispensable":[12],"semiconductor":[13,51],"processing":[14],"module":[15],"used":[16],"fabrication":[18],"facilities":[19],"worldwide.":[20],"The":[21,54],"lack":[22],"of":[23,26,30,59,75,92],"in-situ":[24],"measurements":[25],"the":[27,35,45,65,73,96],"product":[28],"qualities":[29],"interest,":[31],"this":[33,69],"case,":[34],"surface":[36],"thickness":[37],"uniformity,":[38],"makes":[39],"Run":[40],"to":[41,63,102],"run":[42],"(R2R)":[43],"control":[44,61,64,78,105],"only":[46],"viable":[47],"scheme":[48],"most":[50],"manufacturing":[52],"processes.":[53],"literature":[55],"contains":[56],"many":[57],"variations":[58],"R2R":[60,77,104],"schemes":[62,79],"CMP":[66],"process.":[67],"In":[68],"paper,":[70],"we":[71],"analyze":[72],"performance":[74],"these":[76],"and":[80],"proposed":[81],"self-tuning":[83],"predictor-corrector":[84],"controller":[85],"(PCC).":[86],"Initial":[87],"simulation":[88],"results":[89],"depicts":[90],"order":[91],"magnitude":[93],"improvement":[94],"within":[97],"wafer":[98],"uniformity":[99],"as":[100],"compared":[101],"traditional":[103],"schemes.":[106]},"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-04-04T16:13:02.066488","created_date":"2025-10-10T00:00:00"}