{"id":"https://openalex.org/W1495366580","doi":"https://doi.org/10.1109/iscas.2006.1693221","title":"A 3V 110uW 3.lppm/\u00b0C Curvature-Compensated CMOS Bandgap Reference","display_name":"A 3V 110uW 3.lppm/\u00b0C Curvature-Compensated CMOS Bandgap Reference","publication_year":2006,"publication_date":"2006-09-22","ids":{"openalex":"https://openalex.org/W1495366580","doi":"https://doi.org/10.1109/iscas.2006.1693221","mag":"1495366580"},"language":"en","primary_location":{"id":"doi:10.1109/iscas.2006.1693221","is_oa":false,"landing_page_url":"https://doi.org/10.1109/iscas.2006.1693221","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2006 IEEE International Symposium on Circuits and Systems","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100804380","display_name":"Xiaokang Guan","orcid":"https://orcid.org/0009-0002-1582-6561"},"institutions":[{"id":"https://openalex.org/I180949307","display_name":"Illinois Institute of Technology","ror":"https://ror.org/037t3ry66","country_code":"US","type":"education","lineage":["https://openalex.org/I180949307"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Xiaokang Guan","raw_affiliation_strings":["Illinois Institute of Technology, Chicago, IL, USA",", Illinois Institute of Technology, Chicago, IL"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Illinois Institute of Technology, Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]},{"raw_affiliation_string":", Illinois Institute of Technology, Chicago, IL","institution_ids":["https://openalex.org/I180949307"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060916409","display_name":"A. Wang","orcid":null},"institutions":[{"id":"https://openalex.org/I180949307","display_name":"Illinois Institute of Technology","ror":"https://ror.org/037t3ry66","country_code":"US","type":"education","lineage":["https://openalex.org/I180949307"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. Wang","raw_affiliation_strings":["Illinois Institute of Technology, Chicago, IL, USA",", Illinois Institute of Technology, Chicago, IL"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Illinois Institute of Technology, Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]},{"raw_affiliation_string":", Illinois Institute of Technology, Chicago, IL","institution_ids":["https://openalex.org/I180949307"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015384556","display_name":"A. Ishikawa","orcid":"https://orcid.org/0000-0002-3561-5633"},"institutions":[{"id":"https://openalex.org/I4210102907","display_name":"Asahi Kasei (Japan)","ror":"https://ror.org/018wp0236","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210102907"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"A. Ishikawa","raw_affiliation_strings":["Kaoru Takasuka, Asahi Kasei MicroSystem Company Limited, Atsugi, Japan","[Kaoru Takasuka, Asahi Kasei MicroSystem Company Limited, Atsugi, Japan]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kaoru Takasuka, Asahi Kasei MicroSystem Company Limited, Atsugi, Japan","institution_ids":["https://openalex.org/I4210102907"]},{"raw_affiliation_string":"[Kaoru Takasuka, Asahi Kasei MicroSystem Company Limited, Atsugi, Japan]","institution_ids":["https://openalex.org/I4210102907"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113609422","display_name":"Shigehiko Tamura","orcid":null},"institutions":[{"id":"https://openalex.org/I4210102907","display_name":"Asahi Kasei (Japan)","ror":"https://ror.org/018wp0236","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210102907"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Tamura","raw_affiliation_strings":["[Kaoru Takasuka, Asahi Kasei MicroSystem Company Limited, Atsugi, Japan]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"[Kaoru Takasuka, Asahi Kasei MicroSystem Company Limited, Atsugi, Japan]","institution_ids":["https://openalex.org/I4210102907"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050364660","display_name":"K. Takasuka","orcid":null},"institutions":[{"id":"https://openalex.org/I4210102907","display_name":"Asahi Kasei (Japan)","ror":"https://ror.org/018wp0236","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210102907"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Takasuka","raw_affiliation_strings":["[Kaoru Takasuka, Asahi Kasei MicroSystem Company Limited, Atsugi, Japan]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"[Kaoru Takasuka, Asahi Kasei MicroSystem Company Limited, Atsugi, Japan]","institution_ids":["https://openalex.org/I4210102907"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100356877","display_name":"Zhihua Wang","orcid":"https://orcid.org/0000-0002-3093-1979"},"institutions":[{"id":"https://openalex.org/I99065089","display_name":"Tsinghua University","ror":"https://ror.org/03cve4549","country_code":"CN","type":"education","lineage":["https://openalex.org/I99065089"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zhihua Wang","raw_affiliation_strings":["Tsinghua University, Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tsinghua University, Beijing, China","institution_ids":["https://openalex.org/I99065089"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5115594767","display_name":"Chun Zhang","orcid":"https://orcid.org/0000-0001-7041-6958"},"institutions":[{"id":"https://openalex.org/I99065089","display_name":"Tsinghua University","ror":"https://ror.org/03cve4549","country_code":"CN","type":"education","lineage":["https://openalex.org/I99065089"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Chun Zhang","raw_affiliation_strings":["Tsinghua University, Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tsinghua University, Beijing, China","institution_ids":["https://openalex.org/I99065089"]}]}],"institutions":[],"countries_distinct_count":3,"institutions_distinct_count":7,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.04657727,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"2861","last_page":"2864"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10323","display_name":"Analog and Mixed-Signal Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10323","display_name":"Analog and Mixed-Signal Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11417","display_name":"Advancements in PLL and VCO Technologies","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","score":0.998199999332428,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/bandgap-voltage-reference","display_name":"Bandgap voltage reference","score":0.8909116387367249},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.7479299902915955},{"id":"https://openalex.org/keywords/power-supply-rejection-ratio","display_name":"Power supply rejection ratio","score":0.5764704942703247},{"id":"https://openalex.org/keywords/trimming","display_name":"Trimming","score":0.5724562406539917},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.5457212328910828},{"id":"https://openalex.org/keywords/temperature-coefficient","display_name":"Temperature coefficient","score":0.5442408323287964},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.4910869598388672},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.4654947519302368},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4575762450695038},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.4191249907016754},{"id":"https://openalex.org/keywords/noise","display_name":"Noise (video)","score":0.4163896441459656},{"id":"https://openalex.org/keywords/voltage-reference","display_name":"Voltage reference","score":0.3789810538291931},{"id":"https://openalex.org/keywords/amplifier","display_name":"Amplifier","score":0.1537603735923767},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1491592824459076},{"id":"https://openalex.org/keywords/dropout-voltage","display_name":"Dropout voltage","score":0.09884443879127502},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.08974361419677734}],"concepts":[{"id":"https://openalex.org/C127033052","wikidata":"https://www.wikidata.org/wiki/Q48635","display_name":"Bandgap voltage reference","level":5,"score":0.8909116387367249},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.7479299902915955},{"id":"https://openalex.org/C15892472","wikidata":"https://www.wikidata.org/wiki/Q1482413","display_name":"Power supply rejection ratio","level":4,"score":0.5764704942703247},{"id":"https://openalex.org/C56951928","wikidata":"https://www.wikidata.org/wiki/Q3539213","display_name":"Trimming","level":2,"score":0.5724562406539917},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.5457212328910828},{"id":"https://openalex.org/C16643434","wikidata":"https://www.wikidata.org/wiki/Q898642","display_name":"Temperature coefficient","level":2,"score":0.5442408323287964},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.4910869598388672},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.4654947519302368},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4575762450695038},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4191249907016754},{"id":"https://openalex.org/C99498987","wikidata":"https://www.wikidata.org/wiki/Q2210247","display_name":"Noise (video)","level":3,"score":0.4163896441459656},{"id":"https://openalex.org/C44351266","wikidata":"https://www.wikidata.org/wiki/Q1465532","display_name":"Voltage reference","level":3,"score":0.3789810538291931},{"id":"https://openalex.org/C194257627","wikidata":"https://www.wikidata.org/wiki/Q211554","display_name":"Amplifier","level":3,"score":0.1537603735923767},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1491592824459076},{"id":"https://openalex.org/C15032970","wikidata":"https://www.wikidata.org/wiki/Q851210","display_name":"Dropout voltage","level":4,"score":0.09884443879127502},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.08974361419677734},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/iscas.2006.1693221","is_oa":false,"landing_page_url":"https://doi.org/10.1109/iscas.2006.1693221","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2006 IEEE International Symposium on Circuits and Systems","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","score":0.8799999952316284,"display_name":"Affordable and clean energy"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W1504370941","https://openalex.org/W2146255617","https://openalex.org/W2164546195"],"related_works":["https://openalex.org/W3004564537","https://openalex.org/W2393887177","https://openalex.org/W2544323617","https://openalex.org/W2354567683","https://openalex.org/W2091010831","https://openalex.org/W2384491229","https://openalex.org/W2370976371","https://openalex.org/W1970992322","https://openalex.org/W2359862740","https://openalex.org/W2351074943"],"abstract_inverted_index":{"This":[0],"paper":[1],"presents":[2],"a":[3,27,41,68],"curvature-compensated":[4],"bandgap":[5],"reference":[6],"(BGR)":[7],"circuit":[8,17,66],"implemented":[9],"in":[10],"0.35":[11],"/spl":[12,59,72],"mu/m":[13],"CMOS":[14],"technology.":[15],"The":[16,64],"delivers":[18],"an":[19,53],"output":[20,54],"voltage":[21],"of":[22,30,46,57,70],"1.09":[23],"V":[24,81],"and":[25,52,74],"achieves":[26],"temperature":[28],"coefficient":[29],"3.1":[31],"ppm//spl":[32],"deg/C":[33],"over":[34],"[-20/spl":[35],"deg/C,":[36],"100/spl":[37],"deg/C]":[38],"after":[39],"trimming,":[40],"power":[42,76],"supply":[43,77],"rejection":[44],"ratio":[45],"-80":[47],"dB":[48],"at":[49,61],"1":[50,62],"KHz":[51],"noise":[55],"level":[56],"1.43":[58],"mu/V/sqrt(Hz)":[60],"KHz.":[63],"BGR":[65],"consumes":[67],"current":[69],"37":[71],"mu/A":[73],"the":[75],"ranges":[78],"from":[79],"1.5":[80],"to":[82],"3.3":[83],"V.":[84]},"counts_by_year":[{"year":2014,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}