{"id":"https://openalex.org/W2166862857","doi":"https://doi.org/10.1109/iscas.2005.1465432","title":"Characterization of Laser-Induced Photoexcitation Effect on a Surrounding CMOS Ring Oscillator","display_name":"Characterization of Laser-Induced Photoexcitation Effect on a Surrounding CMOS Ring Oscillator","publication_year":2005,"publication_date":"2005-07-27","ids":{"openalex":"https://openalex.org/W2166862857","doi":"https://doi.org/10.1109/iscas.2005.1465432","mag":"2166862857"},"language":"en","primary_location":{"id":"doi:10.1109/iscas.2005.1465432","is_oa":false,"landing_page_url":"https://doi.org/10.1109/iscas.2005.1465432","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2005 IEEE International Symposium on Circuits and Systems","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5059671237","display_name":"Graham Wild","orcid":"https://orcid.org/0000-0003-1223-4675"},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"G. Wild","raw_affiliation_strings":["Electrical Engineering Department, Ecole Polytechnique de Montreal, Montreal, QUE, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electrical Engineering Department, Ecole Polytechnique de Montreal, Montreal, QUE, Canada","institution_ids":["https://openalex.org/I45683168"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038488044","display_name":"Yvon Savaria","orcid":"https://orcid.org/0000-0002-3404-9959"},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Y. Savaria","raw_affiliation_strings":["Electrical Engineering Department, Ecole Polytechnique de Montreal, Montreal, QUE, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electrical Engineering Department, Ecole Polytechnique de Montreal, Montreal, QUE, Canada","institution_ids":["https://openalex.org/I45683168"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5028245112","display_name":"Michel Meunier","orcid":"https://orcid.org/0000-0002-2398-5602"},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"M. Meunier","raw_affiliation_strings":["Engineering Physics Department, Ecole Polytechnique de Montreal, Montreal, QUE, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Physics Department, Ecole Polytechnique de Montreal, Montreal, QUE, Canada","institution_ids":["https://openalex.org/I45683168"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I45683168"],"apc_list":null,"apc_paid":null,"fwci":0.5402,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.68788339,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"4274","issue":null,"first_page":"3696","last_page":"3699"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13869","display_name":"Ocular and Laser Science Research","score":0.9957000017166138,"subfield":{"id":"https://openalex.org/subfields/2731","display_name":"Ophthalmology"},"field":{"id":"https://openalex.org/fields/27","display_name":"Medicine"},"domain":{"id":"https://openalex.org/domains/4","display_name":"Health Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.9950000047683716,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photoexcitation","display_name":"Photoexcitation","score":0.8994842767715454},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6763947010040283},{"id":"https://openalex.org/keywords/laser","display_name":"Laser","score":0.6739618182182312},{"id":"https://openalex.org/keywords/ring-oscillator","display_name":"Ring oscillator","score":0.639187216758728},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6103389263153076},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.5991500616073608},{"id":"https://openalex.org/keywords/ring-laser","display_name":"Ring laser","score":0.531308650970459},{"id":"https://openalex.org/keywords/laser-power-scaling","display_name":"Laser power scaling","score":0.4593539237976074},{"id":"https://openalex.org/keywords/resistor","display_name":"Resistor","score":0.4354398548603058},{"id":"https://openalex.org/keywords/characterization","display_name":"Characterization (materials science)","score":0.4223257005214691},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.29349327087402344},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2261192500591278},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.16411849856376648},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.11787796020507812},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.10029777884483337},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.09326064586639404},{"id":"https://openalex.org/keywords/excitation","display_name":"Excitation","score":0.08140328526496887}],"concepts":[{"id":"https://openalex.org/C155220765","wikidata":"https://www.wikidata.org/wiki/Q16905737","display_name":"Photoexcitation","level":3,"score":0.8994842767715454},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6763947010040283},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.6739618182182312},{"id":"https://openalex.org/C104111718","wikidata":"https://www.wikidata.org/wiki/Q2153973","display_name":"Ring oscillator","level":3,"score":0.639187216758728},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6103389263153076},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.5991500616073608},{"id":"https://openalex.org/C2781004256","wikidata":"https://www.wikidata.org/wiki/Q7334775","display_name":"Ring laser","level":3,"score":0.531308650970459},{"id":"https://openalex.org/C200649887","wikidata":"https://www.wikidata.org/wiki/Q17154544","display_name":"Laser power scaling","level":3,"score":0.4593539237976074},{"id":"https://openalex.org/C137488568","wikidata":"https://www.wikidata.org/wiki/Q5321","display_name":"Resistor","level":3,"score":0.4354398548603058},{"id":"https://openalex.org/C2780841128","wikidata":"https://www.wikidata.org/wiki/Q5073781","display_name":"Characterization (materials science)","level":2,"score":0.4223257005214691},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.29349327087402344},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2261192500591278},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.16411849856376648},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.11787796020507812},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.10029777884483337},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.09326064586639404},{"id":"https://openalex.org/C83581075","wikidata":"https://www.wikidata.org/wiki/Q1361503","display_name":"Excitation","level":2,"score":0.08140328526496887}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/iscas.2005.1465432","is_oa":false,"landing_page_url":"https://doi.org/10.1109/iscas.2005.1465432","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2005 IEEE International Symposium on Circuits and Systems","raw_type":"proceedings-article"},{"id":"pmh:oai:publications.polymtl.ca:23552","is_oa":false,"landing_page_url":"https://publications.polymtl.ca/23552/","pdf_url":null,"source":{"id":"https://openalex.org/S4306401013","display_name":"PolyPublie (\u00c9cole Polytechnique de Montr\u00e9al)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I45683168","host_organization_name":"Polytechnique Montr\u00e9al","host_organization_lineage":["https://openalex.org/I45683168"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"Communication de conf\u00e9rence"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.7799999713897705,"id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[{"id":"https://openalex.org/F4320310709","display_name":"CMC Microsystems","ror":"https://ror.org/03k70ea39"},{"id":"https://openalex.org/F4320334593","display_name":"Natural Sciences and Engineering Research Council of Canada","ror":"https://ror.org/01h531d29"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W1552527487","https://openalex.org/W2025074864","https://openalex.org/W2048527012","https://openalex.org/W2100867759","https://openalex.org/W2122268170","https://openalex.org/W2231375407","https://openalex.org/W4254673335","https://openalex.org/W4255071723","https://openalex.org/W7058301593"],"related_works":["https://openalex.org/W1969116347","https://openalex.org/W2982163074","https://openalex.org/W4251045388","https://openalex.org/W2080207557","https://openalex.org/W2057365859","https://openalex.org/W1980611856","https://openalex.org/W2925031685","https://openalex.org/W2087313850","https://openalex.org/W2012368350","https://openalex.org/W4304695563"],"abstract_inverted_index":{"The":[0],"use":[1],"of":[2,13,17,51,108],"laser":[3,19,43,103],"trimming":[4],"techniques":[5],"with":[6,41],"conventional":[7],"CMOS":[8,90],"processes":[9],"requires":[10],"thorough":[11],"understanding":[12],"the":[14,28,69,102,109,116],"electrical":[15,121],"consequences":[16],"a":[18,33,42,47,52,105],"pulse":[20],"on":[21,27,32,46],"surrounding":[22],"sensitive":[23],"devices.":[24],"A":[25,76],"study":[26],"laser-induced":[29],"photoexcitation":[30,117],"effect":[31,118],"ring-oscillator":[34],"has":[35,64,83,98],"been":[36,65,84,99],"performed.":[37],"Experiments":[38],"are":[39,95],"performed":[40],"beam":[44],"focused":[45],"diffusible":[48],"resistor":[49],"made":[50],"n-doped":[53],"gap":[54],"between":[55],"two":[56],"highly":[57],"p-doped":[58],"regions.":[59],"An":[60,112],"in-situ":[61],"characterization":[62],"technique":[63],"used":[66],"to":[67,114],"get":[68],"laser's":[70],"power":[71],"profile":[72],"under":[73],"dielectric":[74],"layers.":[75],"novel":[77],"frequency-monitoring":[78],"circuit":[79],"is":[80,125],"presented.":[81,96,126],"It":[82,97],"manufactured":[85],"in":[86],"0.18":[87],"/spl":[88],"mu/m":[89],"technology":[91],"and":[92,122],"experimental":[93],"results":[94],"measured":[100],"that":[101],"causes":[104],"28%":[106],"change":[107],"oscillating":[110],"frequency.":[111],"approach":[113],"model":[115],"using":[119],"combined":[120],"physical":[123],"simulations":[124]},"counts_by_year":[],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}