{"id":"https://openalex.org/W4410394768","doi":"https://doi.org/10.1109/irps48204.2025.10983832","title":"A Novel D<sub>2</sub> Plasma Treatment for Defect Passivation: From Modeling to Process Optimization","display_name":"A Novel D<sub>2</sub> Plasma Treatment for Defect Passivation: From Modeling to Process Optimization","publication_year":2025,"publication_date":"2025-03-30","ids":{"openalex":"https://openalex.org/W4410394768","doi":"https://doi.org/10.1109/irps48204.2025.10983832"},"language":"en","primary_location":{"id":"doi:10.1109/irps48204.2025.10983832","is_oa":false,"landing_page_url":"https://doi.org/10.1109/irps48204.2025.10983832","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 IEEE International Reliability Physics Symposium (IRPS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5005350888","display_name":"Sara Vecchi","orcid":"https://orcid.org/0000-0002-0260-3003"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Sara Vecchi","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072169536","display_name":"V. Bhosle","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Vikram Bhosle","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5067894258","display_name":"Andrea Palmieri","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Andrea Palmieri","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071276512","display_name":"Davide Cornigli","orcid":"https://orcid.org/0000-0002-1683-5200"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Davide Cornigli","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088328469","display_name":"Fabrizio Buscemi","orcid":"https://orcid.org/0000-0002-2038-932X"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Fabrizio Buscemi","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083166491","display_name":"Andrea Padovani","orcid":"https://orcid.org/0000-0003-1145-5257"},"institutions":[{"id":"https://openalex.org/I122346577","display_name":"University of Modena and Reggio Emilia","ror":"https://ror.org/02d4c4y02","country_code":"IT","type":"education","lineage":["https://openalex.org/I122346577"]},{"id":"https://openalex.org/I4210161797","display_name":"Ferrari (Italy)","ror":"https://ror.org/05p859a12","country_code":"IT","type":"company","lineage":["https://openalex.org/I4210161797"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Andrea Padovani","raw_affiliation_strings":["University of Modena and Reggio Emilia,Dipartimento di Ingegneria Enzo Ferrari (DIEF),Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Modena and Reggio Emilia,Dipartimento di Ingegneria Enzo Ferrari (DIEF),Italy","institution_ids":["https://openalex.org/I122346577","https://openalex.org/I4210161797"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014751036","display_name":"Deven Raj","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Deven Raj","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004647218","display_name":"Andrew Cockburn","orcid":"https://orcid.org/0000-0001-8860-8798"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Andrew Cockburn","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5031715584","display_name":"L. Dat\u00e9","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Lucien Date","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062522713","display_name":"Gaurav Thareja","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Gaurav Thareja","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101843557","display_name":"F. Nardi","orcid":"https://orcid.org/0009-0003-0537-5442"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Federico Nardi","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5003731777","display_name":"Luca Larcher","orcid":"https://orcid.org/0000-0002-9139-349X"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Luca Larcher","raw_affiliation_strings":["Applied Materials Inc.,CA,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials Inc.,CA,USA","institution_ids":["https://openalex.org/I193427800"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":12,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.10118447,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"5"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9677000045776367,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9677000045776367,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.960099995136261,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9564999938011169,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/passivation","display_name":"Passivation","score":0.8327596187591553},{"id":"https://openalex.org/keywords/plasma","display_name":"Plasma","score":0.5942038297653198},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5531083345413208},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.4698466360569},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.42129069566726685},{"id":"https://openalex.org/keywords/process-optimization","display_name":"Process optimization","score":0.42094850540161133},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.33215174078941345},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.23699617385864258},{"id":"https://openalex.org/keywords/chemical-engineering","display_name":"Chemical engineering","score":0.20877361297607422},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.14539647102355957},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.12047046422958374},{"id":"https://openalex.org/keywords/operating-system","display_name":"Operating system","score":0.0774918794631958},{"id":"https://openalex.org/keywords/nuclear-physics","display_name":"Nuclear physics","score":0.0671776533126831}],"concepts":[{"id":"https://openalex.org/C33574316","wikidata":"https://www.wikidata.org/wiki/Q917260","display_name":"Passivation","level":3,"score":0.8327596187591553},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.5942038297653198},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5531083345413208},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4698466360569},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.42129069566726685},{"id":"https://openalex.org/C115952470","wikidata":"https://www.wikidata.org/wiki/Q332172","display_name":"Process optimization","level":2,"score":0.42094850540161133},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.33215174078941345},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.23699617385864258},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.20877361297607422},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.14539647102355957},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.12047046422958374},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0774918794631958},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0671776533126831},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/irps48204.2025.10983832","is_oa":false,"landing_page_url":"https://doi.org/10.1109/irps48204.2025.10983832","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 IEEE International Reliability Physics Symposium (IRPS)","raw_type":"proceedings-article"},{"id":"pmh:oai:iris.unimore.it:11380/1378351","is_oa":false,"landing_page_url":"https://hdl.handle.net/11380/1378351","pdf_url":null,"source":{"id":"https://openalex.org/S4306400718","display_name":"IRIS UNIMORE (University of Modena and Reggio Emilia)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I122346577","host_organization_name":"University of Modena and Reggio Emilia","host_organization_lineage":["https://openalex.org/I122346577"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"info:eu-repo/semantics/conferenceObject"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.6299999952316284,"id":"https://metadata.un.org/sdg/2","display_name":"Zero hunger"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":14,"referenced_works":["https://openalex.org/W1994163260","https://openalex.org/W2003645630","https://openalex.org/W2005442712","https://openalex.org/W2009044646","https://openalex.org/W2017285232","https://openalex.org/W2020371637","https://openalex.org/W2151860561","https://openalex.org/W2327662802","https://openalex.org/W2523795688","https://openalex.org/W2796151548","https://openalex.org/W2912961936","https://openalex.org/W2918362456","https://openalex.org/W3137159278","https://openalex.org/W4226354697"],"related_works":["https://openalex.org/W2893117232","https://openalex.org/W2368982584","https://openalex.org/W957405543","https://openalex.org/W2100154643","https://openalex.org/W81629128","https://openalex.org/W2326159057","https://openalex.org/W1965743066","https://openalex.org/W1979157137","https://openalex.org/W1973707249","https://openalex.org/W2953472363"],"abstract_inverted_index":{"We":[0],"present":[1],"a":[2,18,26,60],"novel":[3],"deuterium":[4],"(D2)":[5],"plasma":[6,53],"treatment":[7,54],"process":[8,55,73],"for":[9],"interface":[10],"passivation":[11,78],"that":[12],"leads":[13],"to":[14,75],"reliability":[15,31],"improvement":[16],"under":[17],"low":[19],"thermal":[20],"budget.":[21],"Specifically,":[22],"physics-based":[23],"simulations":[24],"revealed":[25],"marked":[27],"enhancement":[28],"of":[29],"key":[30],"phenomena":[32],"such":[33],"as":[34],"leakage":[35],"current,":[36],"Negative":[37],"Bias":[38],"Temperature":[39],"Instability":[40],"(NBTI)":[41],"and":[42,79],"Voltage-Dependent":[43],"Dielectric":[44],"Breakdown":[45],"(VDDB),":[46],"also":[47],"confirmed":[48],"by":[49],"experiments.":[50],"Furthermore,":[51],"the":[52,65,72,76,80],"optimization":[56],"is":[57],"accelerated":[58],"through":[59],"physical":[61],"model":[62],"based":[63],"on":[64],"Ginestra":[66],"\u2122":[67],"simulation":[68],"platform,":[69],"which":[70],"connects":[71],"conditions":[74],"defect":[77],"best":[81],"device":[82],"reliability.":[83]},"counts_by_year":[],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}