{"id":"https://openalex.org/W4410394364","doi":"https://doi.org/10.1109/irps48204.2025.10982985","title":"Hot Carrier Degradation and performance boost on Si Channel nFET Gate-All-Around Nanosheet Devices","display_name":"Hot Carrier Degradation and performance boost on Si Channel nFET Gate-All-Around Nanosheet Devices","publication_year":2025,"publication_date":"2025-03-30","ids":{"openalex":"https://openalex.org/W4410394364","doi":"https://doi.org/10.1109/irps48204.2025.10982985"},"language":"en","primary_location":{"id":"doi:10.1109/irps48204.2025.10982985","is_oa":false,"landing_page_url":"https://doi.org/10.1109/irps48204.2025.10982985","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 IEEE International Reliability Physics Symposium (IRPS)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5110795087","display_name":"Huimei Zhou","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"H. Zhou","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019725359","display_name":"Mohammad Hasanuzzaman","orcid":"https://orcid.org/0000-0002-3195-6780"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Hasanuzzaman","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108222777","display_name":"S. D. Suk","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. D. Suk","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5093876751","display_name":"S. Emans","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Emans","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5078034212","display_name":"Shariq Siddiqui","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Siddiqui","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050343682","display_name":"Robert R. Robison","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R. Robison","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015010150","display_name":"Reinaldo A. Vega","orcid":"https://orcid.org/0000-0001-6407-0081"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R. Vega","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063827865","display_name":"M. Wang","orcid":"https://orcid.org/0009-0000-9057-1007"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Wang","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004394661","display_name":"Yasir Sulehria","orcid":"https://orcid.org/0009-0007-2241-529X"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Y. Sulehria","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004143066","display_name":"Shinichi Mochizuki","orcid":"https://orcid.org/0000-0001-9832-5070"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Mochizuki","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110666214","display_name":"Curtis Durfee","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C. Durfee","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113785955","display_name":"Oleg Gluschenkov","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"O. Gluschenkov","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5106807997","display_name":"Niki Fokas","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"N. Fokas","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5029256958","display_name":"Gaurav Bajpai","orcid":"https://orcid.org/0000-0001-9998-4123"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"G. Bajpai","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010808355","display_name":"E. Leobandung","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"E. Leobandung","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048281953","display_name":"R. Mo","orcid":"https://orcid.org/0009-0008-9918-5901"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R. Mo","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111941266","display_name":"R. Krishnan","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R. Krishnan","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103148550","display_name":"Kenji Okada","orcid":"https://orcid.org/0000-0003-0638-5362"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"K. Okada","raw_affiliation_strings":["Rapidus US,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Rapidus US,Albany,NY,USA,12203","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109085559","display_name":"H. Miki","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"H. Miki","raw_affiliation_strings":["Rapidus US,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Rapidus US,Albany,NY,USA,12203","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081530492","display_name":"L. Qin","orcid":"https://orcid.org/0009-0009-1886-2956"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"L. Qin","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111665844","display_name":"Craig Child","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C. Child","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071439411","display_name":"T. Standaert","orcid":"https://orcid.org/0009-0009-0132-4262"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"T. Standaert","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063978124","display_name":"K. Zhao","orcid":"https://orcid.org/0009-0008-2556-5784"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"K. Zhao","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083512717","display_name":"Dongwoo Sohn","orcid":"https://orcid.org/0000-0002-2476-5548"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. Sohn","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065649613","display_name":"Yoshiki Fukuzaki","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Y. Fukuzaki","raw_affiliation_strings":["Rapidus US,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Rapidus US,Albany,NY,USA,12203","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083562316","display_name":"Kazuyuki Tomida","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"K. Tomida","raw_affiliation_strings":["Rapidus US,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Rapidus US,Albany,NY,USA,12203","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053443919","display_name":"Dechao Guo","orcid":"https://orcid.org/0000-0003-1727-0798"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. Guo","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5071369491","display_name":"H. Bu","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"H. Bu","raw_affiliation_strings":["Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Technology R&D., IBM Semiconductors, IBM Research,Albany,NY,USA,12203","institution_ids":["https://openalex.org/I1341412227"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.09447043,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"8"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9991999864578247,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.9926999807357788,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/nanosheet","display_name":"Nanosheet","score":0.8471412062644958},{"id":"https://openalex.org/keywords/degradation","display_name":"Degradation (telecommunications)","score":0.8016598224639893},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7361737489700317},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6152684688568115},{"id":"https://openalex.org/keywords/channel","display_name":"Channel (broadcasting)","score":0.5142492651939392},{"id":"https://openalex.org/keywords/logic-gate","display_name":"Logic gate","score":0.49714210629463196},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.42675596475601196},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3140425682067871},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.16580036282539368},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.12771663069725037}],"concepts":[{"id":"https://openalex.org/C51967427","wikidata":"https://www.wikidata.org/wiki/Q17148232","display_name":"Nanosheet","level":2,"score":0.8471412062644958},{"id":"https://openalex.org/C2779679103","wikidata":"https://www.wikidata.org/wiki/Q5251805","display_name":"Degradation (telecommunications)","level":2,"score":0.8016598224639893},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7361737489700317},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6152684688568115},{"id":"https://openalex.org/C127162648","wikidata":"https://www.wikidata.org/wiki/Q16858953","display_name":"Channel (broadcasting)","level":2,"score":0.5142492651939392},{"id":"https://openalex.org/C131017901","wikidata":"https://www.wikidata.org/wiki/Q170451","display_name":"Logic gate","level":2,"score":0.49714210629463196},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.42675596475601196},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3140425682067871},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16580036282539368},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.12771663069725037}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/irps48204.2025.10982985","is_oa":false,"landing_page_url":"https://doi.org/10.1109/irps48204.2025.10982985","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 IEEE International Reliability Physics Symposium (IRPS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.4300000071525574,"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W1573617500","https://openalex.org/W2005494397","https://openalex.org/W2744406216","https://openalex.org/W2785613960","https://openalex.org/W2945154544","https://openalex.org/W2970796140","https://openalex.org/W2999265350","https://openalex.org/W3038337678","https://openalex.org/W3048866191","https://openalex.org/W3159183037","https://openalex.org/W3195454096","https://openalex.org/W4225322522","https://openalex.org/W4226205063","https://openalex.org/W4226445732","https://openalex.org/W4286375111","https://openalex.org/W4376606672"],"related_works":["https://openalex.org/W3119082211","https://openalex.org/W3091852196","https://openalex.org/W4400260568","https://openalex.org/W2084951691","https://openalex.org/W4388294765","https://openalex.org/W3206721946","https://openalex.org/W798086848","https://openalex.org/W2338175038","https://openalex.org/W2957838220","https://openalex.org/W4378175765"],"abstract_inverted_index":{"In":[0],"this":[1],"paper,":[2],"hot":[3,26,64],"carrier":[4,27,65],"reliability":[5,53,83],"on":[6,115,155],"ultra-scaled":[7],"gate":[8],"length":[9],"(Lg)":[10],"substrate-isolated":[11],"Gate-All-Around":[12],"(GAA)":[13],"nanosheet":[14],"(NS)":[15],"transistors":[16,158,211],"is":[17,33,44,47,70,153,200],"studied":[18],"for":[19,49,57,96,133,202,232],"the":[20,130,213],"first":[21],"time.":[22],"Detailed":[23],"characterization":[24],"of":[25,60,129,138,151],"degradation":[28],"(HCD)":[29],"under":[30,72],"Mid-Vgand":[31],"High-Vg":[32],"performed":[34,154],"and":[35,41,54,82,106,118,125,163,225],"investigated.":[36],"HCD":[37,110,152,181],"impact":[38],"from":[39,187,192],"interface":[40],"oxide":[42,51],"traps":[43,191],"decoupled,":[45],"which":[46],"critical":[48,85],"improving":[50],"quality,":[52],"interface/junction":[55],"optimization":[56],"a":[58,93,142,170],"variety":[59],"circuit":[61],"applications.":[62],"Robust":[63],"injection":[66],"(HCI)":[67],"End-of-Life":[68],"(EOL)":[69],"achieved":[71],"both":[73],"stress":[74],"condition":[75],"after":[76],"self-heating":[77],"correction":[78],"(SHC).":[79],"Performance":[80],"boost":[81,204],"are":[84],"to":[86,103,109,144],"technology":[87,117,233],"development.":[88],"Inner":[89],"spacer":[90,185],"(IS),":[91],"as":[92],"unique":[94],"module":[95],"GAA":[97,156,209],"NS":[98,157,210],"architecture,":[99],"generates":[100],"more":[101,223],"challenges":[102],"performance":[104,134,146,203,217,237],"boost,":[105],"its":[107],"sensitivity":[108,182],"has":[111],"never":[112],"been":[113],"evaluated":[114],"3nm":[116],"beyond.":[119],"For":[120],"IS":[121,160,175,194,206],"thickness":[122],"(THK)":[123],"reduction":[124,162,177],"junction":[126,164,214],"optimization,":[127],"two":[128],"key":[131],"elements":[132],"improvement":[135,199,218],"[16],":[136],"design":[137],"experiments":[139],"(DOE)s":[140],"demonstrates":[141],"path":[143],"achieve":[145],"step":[147],"up.":[148],"Thorough":[149],"study":[150],"with":[159,169,205,212,219,235],"THK":[161,176,186,207],"DOEs,":[165],"followed":[166],"by":[167],"comparison":[168],"reference":[171],"result":[172],"(Ref.).":[173],"The":[174],"DOE":[178,215],"shows":[179],"higher":[180],"than":[183],"conventional":[184],"FinFET":[188],"[17].":[189],"Additional":[190],"thinner":[193],"suggest":[195],"that":[196],"material":[197],"quality":[198],"required":[201],"engineering.":[208],"show":[216],"mitigated":[220],"HCD,":[221],"suggesting":[222],"overlap":[224],"abrupt":[226],"junctions":[227],"give":[228],"HCI":[229],"EOL":[230],"margin":[231],"qualification":[234],"additional":[236],"boost.":[238]},"counts_by_year":[],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}