{"id":"https://openalex.org/W2945986911","doi":"https://doi.org/10.1109/irps.2019.8720416","title":"Study of the Mechanical Stress Impact on Silicide Contact Resistance by 4-Point Bending","display_name":"Study of the Mechanical Stress Impact on Silicide Contact Resistance by 4-Point Bending","publication_year":2019,"publication_date":"2019-03-01","ids":{"openalex":"https://openalex.org/W2945986911","doi":"https://doi.org/10.1109/irps.2019.8720416","mag":"2945986911"},"language":"en","primary_location":{"id":"doi:10.1109/irps.2019.8720416","is_oa":false,"landing_page_url":"https://doi.org/10.1109/irps.2019.8720416","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2019 IEEE International Reliability Physics Symposium (IRPS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5084886436","display_name":"Yefan Liu","orcid":"https://orcid.org/0000-0002-0783-6148"},"institutions":[{"id":"https://openalex.org/I99464096","display_name":"KU Leuven","ror":"https://ror.org/05f950310","country_code":"BE","type":"education","lineage":["https://openalex.org/I99464096"]}],"countries":["BE"],"is_corresponding":true,"raw_author_name":"Yefan Liu","raw_affiliation_strings":["Department of Materials Engineering, KU Leuven, Kasteelpark Arenberg 44, Leuven, Belgium"],"affiliations":[{"raw_affiliation_string":"Department of Materials Engineering, KU Leuven, Kasteelpark Arenberg 44, Leuven, Belgium","institution_ids":["https://openalex.org/I99464096"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076194686","display_name":"Hao Yu","orcid":"https://orcid.org/0000-0002-1976-0259"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Hao Yu","raw_affiliation_strings":["IMEC; Kapeldreef 75 Leuven Belgium"],"affiliations":[{"raw_affiliation_string":"IMEC; Kapeldreef 75 Leuven Belgium","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028833616","display_name":"Gaspard Hiblot","orcid":"https://orcid.org/0000-0002-3869-965X"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Gaspard Hiblot","raw_affiliation_strings":["IMEC; Kapeldreef 75 Leuven Belgium"],"affiliations":[{"raw_affiliation_string":"IMEC; Kapeldreef 75 Leuven Belgium","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050420311","display_name":"Anastasiia Kruv","orcid":"https://orcid.org/0000-0002-0210-4941"},"institutions":[{"id":"https://openalex.org/I99464096","display_name":"KU Leuven","ror":"https://ror.org/05f950310","country_code":"BE","type":"education","lineage":["https://openalex.org/I99464096"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Anastasiia Kruv","raw_affiliation_strings":["Department of Materials Engineering, KU Leuven, Kasteelpark Arenberg 44, Leuven, Belgium"],"affiliations":[{"raw_affiliation_string":"Department of Materials Engineering, KU Leuven, Kasteelpark Arenberg 44, Leuven, Belgium","institution_ids":["https://openalex.org/I99464096"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5037463600","display_name":"Marc Schaekers","orcid":"https://orcid.org/0000-0002-1496-7816"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Marc Schaekers","raw_affiliation_strings":["IMEC; Kapeldreef 75 Leuven Belgium"],"affiliations":[{"raw_affiliation_string":"IMEC; Kapeldreef 75 Leuven Belgium","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065113949","display_name":"Naoto Horiguchi","orcid":"https://orcid.org/0000-0001-5490-0416"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Naoto Horiguchi","raw_affiliation_strings":["IMEC; Kapeldreef 75 Leuven Belgium"],"affiliations":[{"raw_affiliation_string":"IMEC; Kapeldreef 75 Leuven Belgium","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050757937","display_name":"Dimitrios Velenis","orcid":"https://orcid.org/0000-0001-7947-8098"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Dimitrios Velenis","raw_affiliation_strings":["IMEC; Kapeldreef 75 Leuven Belgium"],"affiliations":[{"raw_affiliation_string":"IMEC; Kapeldreef 75 Leuven Belgium","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5073310038","display_name":"Ingrid De Wolf","orcid":"https://orcid.org/0000-0003-3822-5953"},"institutions":[{"id":"https://openalex.org/I99464096","display_name":"KU Leuven","ror":"https://ror.org/05f950310","country_code":"BE","type":"education","lineage":["https://openalex.org/I99464096"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Ingrid De Wolf","raw_affiliation_strings":["Department of Materials Engineering, KU Leuven, Kasteelpark Arenberg 44, Leuven, Belgium"],"affiliations":[{"raw_affiliation_string":"Department of Materials Engineering, KU Leuven, Kasteelpark Arenberg 44, Leuven, Belgium","institution_ids":["https://openalex.org/I99464096"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":8,"corresponding_author_ids":["https://openalex.org/A5084886436"],"corresponding_institution_ids":["https://openalex.org/I99464096"],"apc_list":null,"apc_paid":null,"fwci":0.1509,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.51551098,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":93},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"5"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9991000294685364,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9937999844551086,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicide","display_name":"Silicide","score":0.8367206454277039},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7886081337928772},{"id":"https://openalex.org/keywords/contact-resistance","display_name":"Contact resistance","score":0.6798530220985413},{"id":"https://openalex.org/keywords/schottky-barrier","display_name":"Schottky barrier","score":0.6712285280227661},{"id":"https://openalex.org/keywords/stress","display_name":"Stress (linguistics)","score":0.6282780170440674},{"id":"https://openalex.org/keywords/bending","display_name":"Bending","score":0.5223444700241089},{"id":"https://openalex.org/keywords/schottky-diode","display_name":"Schottky diode","score":0.5061008334159851},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.46758246421813965},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.37168949842453003},{"id":"https://openalex.org/keywords/diode","display_name":"Diode","score":0.2532680630683899},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.25232070684432983}],"concepts":[{"id":"https://openalex.org/C2780901251","wikidata":"https://www.wikidata.org/wiki/Q426473","display_name":"Silicide","level":3,"score":0.8367206454277039},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7886081337928772},{"id":"https://openalex.org/C123671423","wikidata":"https://www.wikidata.org/wiki/Q332329","display_name":"Contact resistance","level":3,"score":0.6798530220985413},{"id":"https://openalex.org/C16115445","wikidata":"https://www.wikidata.org/wiki/Q2391942","display_name":"Schottky barrier","level":3,"score":0.6712285280227661},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.6282780170440674},{"id":"https://openalex.org/C87210426","wikidata":"https://www.wikidata.org/wiki/Q1072476","display_name":"Bending","level":2,"score":0.5223444700241089},{"id":"https://openalex.org/C205200001","wikidata":"https://www.wikidata.org/wiki/Q176066","display_name":"Schottky diode","level":3,"score":0.5061008334159851},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.46758246421813965},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.37168949842453003},{"id":"https://openalex.org/C78434282","wikidata":"https://www.wikidata.org/wiki/Q11656","display_name":"Diode","level":2,"score":0.2532680630683899},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.25232070684432983},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/irps.2019.8720416","is_oa":false,"landing_page_url":"https://doi.org/10.1109/irps.2019.8720416","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2019 IEEE International Reliability Physics Symposium (IRPS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.8799999952316284,"id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":14,"referenced_works":["https://openalex.org/W1970615921","https://openalex.org/W2029611224","https://openalex.org/W2031546897","https://openalex.org/W2055616604","https://openalex.org/W2063263662","https://openalex.org/W2070768625","https://openalex.org/W2086742878","https://openalex.org/W2167903456","https://openalex.org/W2317953216","https://openalex.org/W2545944103","https://openalex.org/W2610394189","https://openalex.org/W2793929338","https://openalex.org/W2912296375","https://openalex.org/W6729588645"],"related_works":["https://openalex.org/W1901004128","https://openalex.org/W2085708621","https://openalex.org/W2009250851","https://openalex.org/W1979077414","https://openalex.org/W2378987484","https://openalex.org/W2017289849","https://openalex.org/W2064911338","https://openalex.org/W1880528517","https://openalex.org/W2034914415","https://openalex.org/W2945986911"],"abstract_inverted_index":{"In":[0],"this":[1],"work,":[2],"externally":[3],"applied":[4],"mechanical":[5],"stress":[6,30,41],"impact":[7,31,42,47],"on":[8,32,43,48],"silicide":[9,33,50,82],"contact":[10,34,103],"resistance":[11,35,104],"is":[12,36,59,76],"studied":[13,55],"by":[14],"in-situ":[15],"probing":[16],"in":[17],"four-point":[18],"bending":[19],"(4pb)of":[20],"a":[21,71],"circular":[22],"transmission":[23],"line":[24],"model":[25,73],"(CTLM)test":[26],"structure.":[27],"Much":[28],"less":[29],"found":[37],"compared":[38,79],"to":[39,62,92],"the":[40,63,69,81,93,102],"n-Si":[44],"mobility.":[45],"Stress":[46],"two":[49],"contacts":[51],"(Ti/n-Si":[52],"and":[53,56,78,99],"La/n-Si)is":[54],"different":[57],"behavior":[58],"observed":[60],"due":[61],"Schottky":[64,96],"barrier":[65,97],"difference.":[66],"To":[67],"explain":[68],"phenomenon,":[70],"TCAD":[72],"of":[74,87,95],"CTLM":[75],"implemented":[77],"with":[80],"diode":[83],"measurement.":[84],"The":[85],"shifts":[86],"band":[88],"energy":[89],"level":[90],"contribute":[91],"change":[94],"height":[98],"hence":[100],"induce":[101],"variation.":[105]},"counts_by_year":[{"year":2021,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}