{"id":"https://openalex.org/W4398765231","doi":"https://doi.org/10.1109/imw59701.2024.10536962","title":"Overcome the End of Life of 3D Flash Memory by Recovery Annealing, Aiming for Carbon Neutrality in Semiconductor Manufacturing","display_name":"Overcome the End of Life of 3D Flash Memory by Recovery Annealing, Aiming for Carbon Neutrality in Semiconductor Manufacturing","publication_year":2024,"publication_date":"2024-05-12","ids":{"openalex":"https://openalex.org/W4398765231","doi":"https://doi.org/10.1109/imw59701.2024.10536962"},"language":"en","primary_location":{"id":"doi:10.1109/imw59701.2024.10536962","is_oa":false,"landing_page_url":"http://dx.doi.org/10.1109/imw59701.2024.10536962","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2024 IEEE International Memory Workshop (IMW)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5003106477","display_name":"Hitomi Tanaka","orcid":null},"institutions":[{"id":"https://openalex.org/I4210158055","display_name":"The Memory Clinic","ror":"https://ror.org/0567gec15","country_code":"US","type":"healthcare","lineage":["https://openalex.org/I4210158055"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hitomi Tanaka","raw_affiliation_strings":["Institute of Memory Technology Research & Development"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Memory Technology Research & Development","institution_ids":["https://openalex.org/I4210158055"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028034286","display_name":"Hajime Sano","orcid":"https://orcid.org/0000-0002-0645-2521"},"institutions":[{"id":"https://openalex.org/I4210158055","display_name":"The Memory Clinic","ror":"https://ror.org/0567gec15","country_code":"US","type":"healthcare","lineage":["https://openalex.org/I4210158055"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hajime Sano","raw_affiliation_strings":["Institute of Memory Technology Research & Development"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Memory Technology Research & Development","institution_ids":["https://openalex.org/I4210158055"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008690719","display_name":"Reika Ichihara","orcid":"https://orcid.org/0000-0001-9016-5420"},"institutions":[{"id":"https://openalex.org/I4210158055","display_name":"The Memory Clinic","ror":"https://ror.org/0567gec15","country_code":"US","type":"healthcare","lineage":["https://openalex.org/I4210158055"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Reika Ichihara","raw_affiliation_strings":["Institute of Memory Technology Research & Development"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Memory Technology Research & Development","institution_ids":["https://openalex.org/I4210158055"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066166544","display_name":"Yuta Aiba","orcid":null},"institutions":[{"id":"https://openalex.org/I4210158055","display_name":"The Memory Clinic","ror":"https://ror.org/0567gec15","country_code":"US","type":"healthcare","lineage":["https://openalex.org/I4210158055"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yuta Aiba","raw_affiliation_strings":["Institute of Memory Technology Research & Development"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Memory Technology Research & Development","institution_ids":["https://openalex.org/I4210158055"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061427766","display_name":"Kazuma Hasegawa","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Kazuma Hasegawa","raw_affiliation_strings":["Kioxia Corporation,Memory Div.,Japan","Memory Div., Kioxia Corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kioxia Corporation,Memory Div.,Japan","institution_ids":[]},{"raw_affiliation_string":"Memory Div., Kioxia Corporation, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113227190","display_name":"Kana Kudo","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Kana Kudo","raw_affiliation_strings":["Kioxia Corporation,Memory Div.,Japan","Memory Div., Kioxia Corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kioxia Corporation,Memory Div.,Japan","institution_ids":[]},{"raw_affiliation_string":"Memory Div., Kioxia Corporation, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112556467","display_name":"C. Tokunaga","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Chieko Tokunaga","raw_affiliation_strings":["Kioxia Corporation,Sustainability Div.,Japan","Sustainability Div., Kioxia Corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kioxia Corporation,Sustainability Div.,Japan","institution_ids":[]},{"raw_affiliation_string":"Sustainability Div., Kioxia Corporation, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046475036","display_name":"Yasuhito Yoshimizu","orcid":null},"institutions":[{"id":"https://openalex.org/I4210158055","display_name":"The Memory Clinic","ror":"https://ror.org/0567gec15","country_code":"US","type":"healthcare","lineage":["https://openalex.org/I4210158055"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yasuhito Yoshimizu","raw_affiliation_strings":["Institute of Memory Technology Research & Development"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Memory Technology Research & Development","institution_ids":["https://openalex.org/I4210158055"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052061989","display_name":"Fumie Kikushima","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Fumie Kikushima","raw_affiliation_strings":["Kioxia Corporation,Memory Div.,Japan","Memory Div., Kioxia Corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kioxia Corporation,Memory Div.,Japan","institution_ids":[]},{"raw_affiliation_string":"Memory Div., Kioxia Corporation, Japan","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103028848","display_name":"T. Sanuki","orcid":"https://orcid.org/0000-0003-2450-3684"},"institutions":[{"id":"https://openalex.org/I4210158055","display_name":"The Memory Clinic","ror":"https://ror.org/0567gec15","country_code":"US","type":"healthcare","lineage":["https://openalex.org/I4210158055"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Tomoya Sanuki","raw_affiliation_strings":["Institute of Memory Technology Research & Development"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Memory Technology Research & Development","institution_ids":["https://openalex.org/I4210158055"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":10,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.5569,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.64786469,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":98},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9546999931335449,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9546999931335449,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.9485999941825867,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9199000000953674,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/neutrality","display_name":"Neutrality","score":0.7461214661598206},{"id":"https://openalex.org/keywords/annealing","display_name":"Annealing (glass)","score":0.7092752456665039},{"id":"https://openalex.org/keywords/semiconductor","display_name":"Semiconductor","score":0.5351622700691223},{"id":"https://openalex.org/keywords/flash-memory","display_name":"Flash memory","score":0.4997105598449707},{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.48988908529281616},{"id":"https://openalex.org/keywords/flash","display_name":"Flash (photography)","score":0.47094571590423584},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.4542132616043091},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.42720815539360046},{"id":"https://openalex.org/keywords/carbon-neutrality","display_name":"Carbon neutrality","score":0.4138525724411011},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.3450697064399719},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.2850490212440491},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.23339393734931946},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.22571980953216553},{"id":"https://openalex.org/keywords/metallurgy","display_name":"Metallurgy","score":0.13977673649787903},{"id":"https://openalex.org/keywords/political-science","display_name":"Political science","score":0.1041308343410492},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.06833133101463318}],"concepts":[{"id":"https://openalex.org/C2779581858","wikidata":"https://www.wikidata.org/wiki/Q9049677","display_name":"Neutrality","level":2,"score":0.7461214661598206},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7092752456665039},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.5351622700691223},{"id":"https://openalex.org/C2776531357","wikidata":"https://www.wikidata.org/wiki/Q174077","display_name":"Flash memory","level":2,"score":0.4997105598449707},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.48988908529281616},{"id":"https://openalex.org/C2777526259","wikidata":"https://www.wikidata.org/wiki/Q221836","display_name":"Flash (photography)","level":2,"score":0.47094571590423584},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4542132616043091},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.42720815539360046},{"id":"https://openalex.org/C126172416","wikidata":"https://www.wikidata.org/wiki/Q1774424","display_name":"Carbon neutrality","level":3,"score":0.4138525724411011},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3450697064399719},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.2850490212440491},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.23339393734931946},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.22571980953216553},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.13977673649787903},{"id":"https://openalex.org/C17744445","wikidata":"https://www.wikidata.org/wiki/Q36442","display_name":"Political science","level":0,"score":0.1041308343410492},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.06833133101463318},{"id":"https://openalex.org/C199539241","wikidata":"https://www.wikidata.org/wiki/Q7748","display_name":"Law","level":1,"score":0.0},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.0},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.0},{"id":"https://openalex.org/C188573790","wikidata":"https://www.wikidata.org/wiki/Q12705","display_name":"Renewable energy","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/imw59701.2024.10536962","is_oa":false,"landing_page_url":"http://dx.doi.org/10.1109/imw59701.2024.10536962","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2024 IEEE International Memory Workshop (IMW)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Responsible consumption and production","id":"https://metadata.un.org/sdg/12","score":0.41999998688697815}],"awards":[],"funders":[{"id":"https://openalex.org/F4320307793","display_name":"Western Digital","ror":"https://ror.org/02hqwnx33"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":10,"referenced_works":["https://openalex.org/W2062972279","https://openalex.org/W2333497294","https://openalex.org/W2921939106","https://openalex.org/W3006225063","https://openalex.org/W3162708822","https://openalex.org/W3208629838","https://openalex.org/W4313395349","https://openalex.org/W4380302652","https://openalex.org/W4385212842","https://openalex.org/W4388264823"],"related_works":["https://openalex.org/W3206608942","https://openalex.org/W4317860832","https://openalex.org/W2116397085","https://openalex.org/W2535372975","https://openalex.org/W2017101954","https://openalex.org/W2537636062","https://openalex.org/W1594494193","https://openalex.org/W2378293894","https://openalex.org/W2135436866","https://openalex.org/W1994190181"],"abstract_inverted_index":{"In":[0],"this":[1],"work,":[2],"we":[3],"report":[4],"a":[5],"novel":[6],"approach":[7],"using":[8],"thermal":[9,40],"annealing":[10,41,67,102,113,120],"to":[11,19,45,135],"recover":[12,85],"the":[13,32,37,46,54,86,89,98],"degradation":[14,87],"of":[15,36,88,101,124],"cell":[16,38,90],"characteristics":[17,91],"due":[18],"program/erase":[20],"(P/E)":[21],"cycling":[22,62,110],"in":[23,53],"3D":[24,125],"flash":[25,126],"memory.":[26],"To":[27],"achieve":[28,122],"an":[29],"effective":[30],"recovery,":[31],"threshold":[33],"voltage":[34],"(Vth)":[35],"during":[39,141],"should":[42],"be":[43],"close":[44],"neutral":[47],"Vth":[48],"level,":[49],"at":[50,75,81,114],"which":[51],"defects":[52],"tunnel":[55],"dielectric":[56],"layer":[57],"(TNL)":[58],"generated":[59],"by":[60,93,137],"P/E":[61,95,109],"are":[63],"electrically":[64],"empty.":[65],"Optimized":[66,118],"temperatures":[68],"and":[69,111],"times,":[70],"specifically":[71],"3":[72],"hours":[73],"(h)":[74],"200":[76],"\u00b0C":[77],"or":[78],"7":[79],"h":[80],"150":[82],"\u00b0C,":[83],"effectively":[84],"caused":[92],"10k":[94,108],"cycling.":[96],"Furthermore,":[97],"recovery":[99,112,119],"effect":[100],"is":[103],"valid":[104],"even":[105],"after":[106],"repeating":[107],"least":[115],"5":[116],"times.":[117],"can":[121],"reuse":[123],"memory":[127],"that":[128],"have":[129],"reached":[130],"their":[131],"end-of-life":[132],"(EOL),":[133],"contributing":[134],"sustainability":[136],"reducing":[138],"CO2":[139],"emissions":[140],"product":[142],"manufacturing.":[143]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}