{"id":"https://openalex.org/W4281557972","doi":"https://doi.org/10.1109/imw52921.2022.9779296","title":"Recognition Accuracy Enhancement using Interface Control with Weight Variation-Lowering in Analog Computation-in-Memory","display_name":"Recognition Accuracy Enhancement using Interface Control with Weight Variation-Lowering in Analog Computation-in-Memory","publication_year":2022,"publication_date":"2022-05-01","ids":{"openalex":"https://openalex.org/W4281557972","doi":"https://doi.org/10.1109/imw52921.2022.9779296"},"language":"en","primary_location":{"id":"doi:10.1109/imw52921.2022.9779296","is_oa":false,"landing_page_url":"https://doi.org/10.1109/imw52921.2022.9779296","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2022 IEEE International Memory Workshop (IMW)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5055730744","display_name":"Sangsu Park","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Sangsu Park","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089439025","display_name":"Gyonhui Lee","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Gyonhui Lee","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113644300","display_name":"Youngjae Kwon","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Youngjae Kwon","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113954472","display_name":"Dong Ik Suh","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Dong Ik Suh","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064294386","display_name":"Hanwool Lee","orcid":"https://orcid.org/0000-0002-8990-6022"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hanwool Lee","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051964804","display_name":"Sangeun Je","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sangeun Je","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100689148","display_name":"Dabin Kim","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Dabin Kim","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041552777","display_name":"Dohan Lee","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Dohan Lee","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109214832","display_name":"Seung\u2010Wook Ryu","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seungwook Ryu","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007283830","display_name":"Seungbum Kim","orcid":"https://orcid.org/0000-0001-8474-6536"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seungbum Kim","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045299073","display_name":"Euiseok Kim","orcid":"https://orcid.org/0000-0002-4223-0221"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Euiseok Kim","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100741439","display_name":"Sunghoon Lee","orcid":"https://orcid.org/0000-0002-3592-388X"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sunghoon Lee","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028401087","display_name":"Kyoung Park","orcid":"https://orcid.org/0000-0003-2319-9449"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kyoung Park","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000341704","display_name":"Seho Lee","orcid":"https://orcid.org/0000-0001-7125-6271"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seho Lee","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088100619","display_name":"Myung-Hee Na","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Myung-Hee Na","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5061990786","display_name":"Seonyong Cha","orcid":"https://orcid.org/0000-0002-9957-8931"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seonyong Cha","raw_affiliation_strings":["SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea"],"affiliations":[{"raw_affiliation_string":"SK hynix Inc.,R&D Division,Icheon,Gyeonggi-do,South Korea","institution_ids":["https://openalex.org/I134353371"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":16,"corresponding_author_ids":["https://openalex.org/A5055730744"],"corresponding_institution_ids":["https://openalex.org/I134353371"],"apc_list":null,"apc_paid":null,"fwci":0.183,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.46070617,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":94,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"3"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","score":0.9975000023841858,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.9972000122070312,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6902137398719788},{"id":"https://openalex.org/keywords/computation","display_name":"Computation","score":0.6687866449356079},{"id":"https://openalex.org/keywords/resistive-touchscreen","display_name":"Resistive touchscreen","score":0.5967037677764893},{"id":"https://openalex.org/keywords/resistive-random-access-memory","display_name":"Resistive random-access memory","score":0.5721203088760376},{"id":"https://openalex.org/keywords/convergence","display_name":"Convergence (economics)","score":0.5550124645233154},{"id":"https://openalex.org/keywords/variation","display_name":"Variation (astronomy)","score":0.5499534010887146},{"id":"https://openalex.org/keywords/synaptic-weight","display_name":"Synaptic weight","score":0.4736182391643524},{"id":"https://openalex.org/keywords/interface","display_name":"Interface (matter)","score":0.4662873446941376},{"id":"https://openalex.org/keywords/rate-of-convergence","display_name":"Rate of convergence","score":0.4556087255477905},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.34036338329315186},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.3179563283920288},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.2088574767112732},{"id":"https://openalex.org/keywords/artificial-neural-network","display_name":"Artificial neural network","score":0.1445818841457367},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.137172669172287},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.11953821778297424},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.1091795563697815},{"id":"https://openalex.org/keywords/parallel-computing","display_name":"Parallel computing","score":0.10897549986839294},{"id":"https://openalex.org/keywords/key","display_name":"Key (lock)","score":0.08866941928863525}],"concepts":[{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6902137398719788},{"id":"https://openalex.org/C45374587","wikidata":"https://www.wikidata.org/wiki/Q12525525","display_name":"Computation","level":2,"score":0.6687866449356079},{"id":"https://openalex.org/C6899612","wikidata":"https://www.wikidata.org/wiki/Q852911","display_name":"Resistive touchscreen","level":2,"score":0.5967037677764893},{"id":"https://openalex.org/C182019814","wikidata":"https://www.wikidata.org/wiki/Q1143830","display_name":"Resistive random-access memory","level":3,"score":0.5721203088760376},{"id":"https://openalex.org/C2777303404","wikidata":"https://www.wikidata.org/wiki/Q759757","display_name":"Convergence (economics)","level":2,"score":0.5550124645233154},{"id":"https://openalex.org/C2778334786","wikidata":"https://www.wikidata.org/wiki/Q1586270","display_name":"Variation (astronomy)","level":2,"score":0.5499534010887146},{"id":"https://openalex.org/C66949984","wikidata":"https://www.wikidata.org/wiki/Q7662043","display_name":"Synaptic weight","level":3,"score":0.4736182391643524},{"id":"https://openalex.org/C113843644","wikidata":"https://www.wikidata.org/wiki/Q901882","display_name":"Interface (matter)","level":4,"score":0.4662873446941376},{"id":"https://openalex.org/C57869625","wikidata":"https://www.wikidata.org/wiki/Q1783502","display_name":"Rate of convergence","level":3,"score":0.4556087255477905},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.34036338329315186},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.3179563283920288},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.2088574767112732},{"id":"https://openalex.org/C50644808","wikidata":"https://www.wikidata.org/wiki/Q192776","display_name":"Artificial neural network","level":2,"score":0.1445818841457367},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.137172669172287},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.11953821778297424},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.1091795563697815},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.10897549986839294},{"id":"https://openalex.org/C26517878","wikidata":"https://www.wikidata.org/wiki/Q228039","display_name":"Key (lock)","level":2,"score":0.08866941928863525},{"id":"https://openalex.org/C44870925","wikidata":"https://www.wikidata.org/wiki/Q37547","display_name":"Astrophysics","level":1,"score":0.0},{"id":"https://openalex.org/C129307140","wikidata":"https://www.wikidata.org/wiki/Q6795880","display_name":"Maximum bubble pressure method","level":3,"score":0.0},{"id":"https://openalex.org/C162324750","wikidata":"https://www.wikidata.org/wiki/Q8134","display_name":"Economics","level":0,"score":0.0},{"id":"https://openalex.org/C157915830","wikidata":"https://www.wikidata.org/wiki/Q2928001","display_name":"Bubble","level":2,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C50522688","wikidata":"https://www.wikidata.org/wiki/Q189833","display_name":"Economic growth","level":1,"score":0.0},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.0},{"id":"https://openalex.org/C38652104","wikidata":"https://www.wikidata.org/wiki/Q3510521","display_name":"Computer security","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/imw52921.2022.9779296","is_oa":false,"landing_page_url":"https://doi.org/10.1109/imw52921.2022.9779296","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2022 IEEE International Memory Workshop (IMW)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W1993932725","https://openalex.org/W2026145098","https://openalex.org/W2132563832","https://openalex.org/W2289252105","https://openalex.org/W2508602506","https://openalex.org/W2613205562","https://openalex.org/W2662553141","https://openalex.org/W2979706619","https://openalex.org/W3043459006"],"related_works":["https://openalex.org/W2545245183","https://openalex.org/W2054635671","https://openalex.org/W2017425642","https://openalex.org/W2350916061","https://openalex.org/W1970117475","https://openalex.org/W3161624601","https://openalex.org/W2611512961","https://openalex.org/W2078381924","https://openalex.org/W2386430105","https://openalex.org/W2199653281"],"abstract_inverted_index":{"As":[0],"AI":[1],"technology":[2],"develops,":[3],"it":[4],"is":[5],"necessary":[6],"to":[7],"verify":[8],"the":[9,25,31,34,39,80],"technical":[10],"feasibility":[11],"of":[12,27,33,41,56,85],"Memory-Centric":[13],"convergence":[14],"technology.":[15],"Previously":[16],"investigated":[17],"resistive":[18,63,87],"synaptic":[19,64,88],"devices":[20],"(RSDs)":[21],"can":[22,76],"successfully":[23],"mimic":[24],"function":[26],"biological":[28],"synapses.":[29],"However,":[30],"effect":[32],"system":[35],"recognition":[36],"rate":[37],"reflecting":[38],"variation":[40,59],"16":[42],"weight":[43,58],"states":[44],"has":[45],"not":[46],"been":[47],"studied":[48],"yet.":[49],"In":[50],"this":[51],"article,":[52],"we":[53],"perform":[54],"simulations":[55],"various":[57],"sets":[60],"through":[61],"real":[62],"device":[65,89],"(RSD)":[66],"engineering":[67],"in":[68],"Analog":[69],"Computation-in-Memory":[70],"(ACiM)":[71],"system.":[72],"These":[73],"simulation":[74],"results":[75],"provide":[77],"guidelines":[78],"for":[79,90],"continued":[81],"design":[82],"and":[83],"optimization":[84],"a":[86],"realizing":[91],"ACiM.":[92]},"counts_by_year":[{"year":2024,"cited_by_count":2}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}