{"id":"https://openalex.org/W1553931271","doi":"https://doi.org/10.1109/icton.2015.7193356","title":"Fabrication and characterization of integrated photonics structures on GaN-Based photonic crystal membranes grown on silicon","display_name":"Fabrication and characterization of integrated photonics structures on GaN-Based photonic crystal membranes grown on silicon","publication_year":2015,"publication_date":"2015-07-01","ids":{"openalex":"https://openalex.org/W1553931271","doi":"https://doi.org/10.1109/icton.2015.7193356","mag":"1553931271"},"language":"en","primary_location":{"id":"doi:10.1109/icton.2015.7193356","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icton.2015.7193356","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 17th International Conference on Transparent Optical Networks (ICTON)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5081251081","display_name":"R. Houdr\u00e9","orcid":"https://orcid.org/0000-0003-3348-506X"},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":true,"raw_author_name":"R. Houdr\u00e9","raw_affiliation_strings":["Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland"],"affiliations":[{"raw_affiliation_string":"Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071553040","display_name":"Noelia Vico Trivi\u00f1o","orcid":null},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"N. Vico Trivi\u00f1o","raw_affiliation_strings":["Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland"],"affiliations":[{"raw_affiliation_string":"Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073536006","display_name":"Ulagalandha Perumal Dharanipathy","orcid":null},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"U. Dharanipathy","raw_affiliation_strings":["Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland"],"affiliations":[{"raw_affiliation_string":"Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017853795","display_name":"Mohmoud Mohamed","orcid":"https://orcid.org/0000-0002-7237-0727"},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"M.S. Mohamed","raw_affiliation_strings":["Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland"],"affiliations":[{"raw_affiliation_string":"Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014321520","display_name":"J.\u2010F. Carlin","orcid":"https://orcid.org/0000-0002-6140-7723"},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"J.F. Carlin","raw_affiliation_strings":["Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland"],"affiliations":[{"raw_affiliation_string":"Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5040568622","display_name":"N. Grandjean","orcid":"https://orcid.org/0000-0003-3610-981X"},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"N. Grandjean","raw_affiliation_strings":["Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland"],"affiliations":[{"raw_affiliation_string":"Institut de Physique de la Matière Condensée, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland","institution_ids":["https://openalex.org/I5124864"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5081251081"],"corresponding_institution_ids":["https://openalex.org/I5124864"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.02530529,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"1"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10666","display_name":"Photonic Crystals and Applications","score":0.993399977684021,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10666","display_name":"Photonic Crystals and Applications","score":0.993399977684021,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.9901000261306763,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9896000027656555,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.8610346913337708},{"id":"https://openalex.org/keywords/photonic-crystal","display_name":"Photonic crystal","score":0.8345836400985718},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7603169679641724},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6854691505432129},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.6802898049354553},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.5879329442977905},{"id":"https://openalex.org/keywords/photonics","display_name":"Photonics","score":0.584126353263855},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.5736039876937866},{"id":"https://openalex.org/keywords/dry-etching","display_name":"Dry etching","score":0.5726247429847717},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.5226818919181824},{"id":"https://openalex.org/keywords/characterization","display_name":"Characterization (materials science)","score":0.4647125005722046},{"id":"https://openalex.org/keywords/quantum-well","display_name":"Quantum well","score":0.4320123791694641},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.3244694769382477},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.27874910831451416},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.17616057395935059},{"id":"https://openalex.org/keywords/laser","display_name":"Laser","score":0.12302297353744507}],"concepts":[{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.8610346913337708},{"id":"https://openalex.org/C75302062","wikidata":"https://www.wikidata.org/wiki/Q900150","display_name":"Photonic crystal","level":2,"score":0.8345836400985718},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7603169679641724},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6854691505432129},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.6802898049354553},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.5879329442977905},{"id":"https://openalex.org/C20788544","wikidata":"https://www.wikidata.org/wiki/Q467054","display_name":"Photonics","level":2,"score":0.584126353263855},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5736039876937866},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.5726247429847717},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5226818919181824},{"id":"https://openalex.org/C2780841128","wikidata":"https://www.wikidata.org/wiki/Q5073781","display_name":"Characterization (materials science)","level":2,"score":0.4647125005722046},{"id":"https://openalex.org/C29169072","wikidata":"https://www.wikidata.org/wiki/Q521166","display_name":"Quantum well","level":3,"score":0.4320123791694641},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3244694769382477},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.27874910831451416},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.17616057395935059},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.12302297353744507},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/icton.2015.7193356","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icton.2015.7193356","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 17th International Conference on Transparent Optical Networks (ICTON)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2166935850","https://openalex.org/W806091262","https://openalex.org/W2044100285","https://openalex.org/W2011415744","https://openalex.org/W2103536379","https://openalex.org/W2075266588","https://openalex.org/W2135099569","https://openalex.org/W4375810091","https://openalex.org/W4307818291","https://openalex.org/W1981823593"],"abstract_inverted_index":{"The":[0,22,36,61],"fabrication":[1,37],"and":[2,28,34,50,56],"characterization":[3],"of":[4,44],"free-standing":[5],"hybrid":[6],"GaN":[7,45],"photonic":[8,31],"structures":[9,23],"operating":[10],"at":[11,89,93],"1.55":[12],"\u00b5m":[13],"or":[14],"in":[15],"the":[16,42,72],"visible":[17,73],"range":[18],"will":[19],"be":[20],"discussed.":[21],"are":[24,59],"self-supported":[25],"by":[26],"tethers":[27],"coupled":[29],"to":[30,87],"crystal":[32],"waveguides":[33,55],"cavities.":[35],"process":[38],"is":[39],"based":[40],"on":[41,46],"growth":[43],"Si,":[47],"e-beam":[48],"lithography":[49],"dry":[51],"etching.":[52],"W1":[53],"PhC":[54],"L3":[57],"cavities":[58,62],"investigated.":[60],"exhibit":[63,81],"quality":[64],"factors":[65,85],"as":[66,68],"high":[67],"\u223c":[69,90],"5400.":[70],"In":[71],"range,":[74],"L7-type":[75],"cavity":[76],"with":[77,83],"InGaN/GaN":[78],"quantum":[79],"wells":[80],"modes":[82],"Q":[84],"up":[86],"5200":[88],"420":[91],"nm":[92],"10":[94],"K.":[95]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}