{"id":"https://openalex.org/W2572212840","doi":"https://doi.org/10.1109/icsens.2016.7808512","title":"An oxide electrothermal filter in standard CMOS","display_name":"An oxide electrothermal filter in standard CMOS","publication_year":2016,"publication_date":"2016-10-01","ids":{"openalex":"https://openalex.org/W2572212840","doi":"https://doi.org/10.1109/icsens.2016.7808512","mag":"2572212840"},"language":"en","primary_location":{"id":"doi:10.1109/icsens.2016.7808512","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icsens.2016.7808512","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2016 IEEE SENSORS","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5041750327","display_name":"Lorenzo Pedal\u00e0","orcid":null},"institutions":[{"id":"https://openalex.org/I98358874","display_name":"Delft University of Technology","ror":"https://ror.org/02e2c7k09","country_code":"NL","type":"education","lineage":["https://openalex.org/I98358874"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Lorenzo Pedala","raw_affiliation_strings":["Electronic Instrumentation Lab, Delft University of Technology, Delft, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronic Instrumentation Lab, Delft University of Technology, Delft, The Netherlands","institution_ids":["https://openalex.org/I98358874"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062147405","display_name":"U\u011fur S\u00f6nmez","orcid":null},"institutions":[{"id":"https://openalex.org/I98358874","display_name":"Delft University of Technology","ror":"https://ror.org/02e2c7k09","country_code":"NL","type":"education","lineage":["https://openalex.org/I98358874"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Ugur Sonmez","raw_affiliation_strings":["Electronic Instrumentation Lab, Delft University of Technology, Delft, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronic Instrumentation Lab, Delft University of Technology, Delft, The Netherlands","institution_ids":["https://openalex.org/I98358874"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101784340","display_name":"Fabio Sebastiano","orcid":"https://orcid.org/0000-0002-8489-9409"},"institutions":[{"id":"https://openalex.org/I98358874","display_name":"Delft University of Technology","ror":"https://ror.org/02e2c7k09","country_code":"NL","type":"education","lineage":["https://openalex.org/I98358874"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Fabio Sebastiano","raw_affiliation_strings":["Technische Universiteit Delft, Delft, Zuid-Holland, NL"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Technische Universiteit Delft, Delft, Zuid-Holland, NL","institution_ids":["https://openalex.org/I98358874"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5029302924","display_name":"Kofi A. A. Makinwa","orcid":"https://orcid.org/0000-0002-2992-5467"},"institutions":[{"id":"https://openalex.org/I98358874","display_name":"Delft University of Technology","ror":"https://ror.org/02e2c7k09","country_code":"NL","type":"education","lineage":["https://openalex.org/I98358874"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Kofi A. A. Makinwa","raw_affiliation_strings":["Electronic Instrumentation Lab, Delft University of Technology, Delft, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronic Instrumentation Lab, Delft University of Technology, Delft, The Netherlands","institution_ids":["https://openalex.org/I98358874"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111686659","display_name":"K. Nagaraj","orcid":null},"institutions":[{"id":"https://openalex.org/I74760111","display_name":"Texas Instruments (United States)","ror":"https://ror.org/03vsmv677","country_code":"US","type":"company","lineage":["https://openalex.org/I74760111"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Krishnaswamy Nagaraj","raw_affiliation_strings":["Texas Instruments, Dallas, Texas"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Texas Instruments, Dallas, Texas","institution_ids":["https://openalex.org/I74760111"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5016998074","display_name":"Joon-Sung Park","orcid":"https://orcid.org/0000-0003-4740-3061"},"institutions":[{"id":"https://openalex.org/I74760111","display_name":"Texas Instruments (United States)","ror":"https://ror.org/03vsmv677","country_code":"US","type":"company","lineage":["https://openalex.org/I74760111"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Joonsung Park","raw_affiliation_strings":["Texas Instruments, Dallas, Texas"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Texas Instruments, Dallas, Texas","institution_ids":["https://openalex.org/I74760111"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":6,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.3501,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.66066944,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"3"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13251","display_name":"Electrical and Thermal Properties of Materials","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.9973000288009644,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.7170799970626831},{"id":"https://openalex.org/keywords/oxide","display_name":"Oxide","score":0.6405612230300903},{"id":"https://openalex.org/keywords/shallow-trench-isolation","display_name":"Shallow trench isolation","score":0.6089100241661072},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"Silicon on insulator","score":0.5954532623291016},{"id":"https://openalex.org/keywords/trim","display_name":"Trim","score":0.5706745982170105},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5628317594528198},{"id":"https://openalex.org/keywords/filter","display_name":"Filter (signal processing)","score":0.4508854150772095},{"id":"https://openalex.org/keywords/chip","display_name":"Chip","score":0.4266997277736664},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.40154504776000977},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.3789949417114258},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3069882392883301},{"id":"https://openalex.org/keywords/trench","display_name":"Trench","score":0.2913912534713745},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.26651477813720703},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.22721385955810547},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.2010149359703064},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.1311751902103424}],"concepts":[{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.7170799970626831},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.6405612230300903},{"id":"https://openalex.org/C105066941","wikidata":"https://www.wikidata.org/wiki/Q1424524","display_name":"Shallow trench isolation","level":4,"score":0.6089100241661072},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.5954532623291016},{"id":"https://openalex.org/C88611116","wikidata":"https://www.wikidata.org/wiki/Q957004","display_name":"Trim","level":2,"score":0.5706745982170105},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5628317594528198},{"id":"https://openalex.org/C106131492","wikidata":"https://www.wikidata.org/wiki/Q3072260","display_name":"Filter (signal processing)","level":2,"score":0.4508854150772095},{"id":"https://openalex.org/C165005293","wikidata":"https://www.wikidata.org/wiki/Q1074500","display_name":"Chip","level":2,"score":0.4266997277736664},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.40154504776000977},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3789949417114258},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3069882392883301},{"id":"https://openalex.org/C155310634","wikidata":"https://www.wikidata.org/wiki/Q1852785","display_name":"Trench","level":3,"score":0.2913912534713745},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.26651477813720703},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.22721385955810547},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2010149359703064},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1311751902103424},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/icsens.2016.7808512","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icsens.2016.7808512","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2016 IEEE SENSORS","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W2015063649","https://openalex.org/W2037271313","https://openalex.org/W2289639630","https://openalex.org/W2570381698","https://openalex.org/W4252772108"],"related_works":["https://openalex.org/W2483447122","https://openalex.org/W4205838487","https://openalex.org/W4320062971","https://openalex.org/W4206542901","https://openalex.org/W392191687","https://openalex.org/W2981398533","https://openalex.org/W2950853109","https://openalex.org/W3144162093","https://openalex.org/W3127798286","https://openalex.org/W2163465895"],"abstract_inverted_index":{"Due":[0],"to":[1,37,46,83],"their":[2],"relatively":[3],"stable":[4],"phase":[5,22,71],"shift":[6],"over":[7],"temperature,":[8],"electrothermal":[9],"filters":[10],"(ETFs)":[11],"with":[12],"an":[13,48,59],"oxide":[14,33,60],"heat":[15,50],"path":[16],"have":[17],"been":[18],"used":[19,45,87],"as":[20,88],"on-chip":[21],"references,":[23],"e.g.":[24],"for":[25,55,91,119],"thermal":[26],"diffusivity":[27],"(TD)":[28],"temperature":[29,94,100],"sensors.":[30],"However,":[31],"previous":[32],"ETFs":[34],"were":[35],"limited":[36],"SOI":[38,120],"processes,":[39],"whose":[40],"deep-trench":[41],"isolation":[42],"could":[43],"be":[44],"create":[47],"oxide-dominated":[49],"path.":[51],"This":[52,110],"paper":[53],"describes,":[54],"the":[56,116,123],"first":[57],"time,":[58],"ETF":[61],"realized":[62],"in":[63],"a":[64,70,89,92,99],"bulk":[65],"CMOS":[66,124],"process.":[67],"It":[68],"achieves":[69],"spread":[72,102,117],"of":[73,103],"0.6":[74],"%":[75],"(3":[76,106],"sigma,":[77,107],"no":[78,108],"trim)":[79],"from":[80],"\u221240":[81],"\u00b0C":[82,105],"125":[84],"\u00b0C.":[85],"When":[86],"reference":[90],"TD":[93],"sensor,":[95],"this":[96],"translates":[97],"into":[98],"sensing":[101],"\u00b12.7":[104],"trim).":[109],"is":[111],"1.8":[112],"times":[113],"less":[114],"than":[115],"reported":[118],"implementations,":[121],"making":[122],"variant":[125],"not":[126],"only":[127],"feasible,":[128],"but":[129],"also":[130],"competitive.":[131]},"counts_by_year":[{"year":2020,"cited_by_count":2},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}