{"id":"https://openalex.org/W4253419646","doi":"https://doi.org/10.1109/icpr.2004.1334122","title":"Depth vs. intensity: which is more important for face recognition?","display_name":"Depth vs. intensity: which is more important for face recognition?","publication_year":2004,"publication_date":"2004-01-01","ids":{"openalex":"https://openalex.org/W4253419646","doi":"https://doi.org/10.1109/icpr.2004.1334122"},"language":"en","primary_location":{"id":"doi:10.1109/icpr.2004.1334122","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icpr.2004.1334122","pdf_url":null,"source":{"id":"https://openalex.org/S4363608750","display_name":"Proceedings of the 17th International Conference on Pattern Recognition, 2004. ICPR 2004.","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 17th International Conference on Pattern Recognition, 2004. ICPR 2004.","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5103545973","display_name":"Chenghua Xu","orcid":null},"institutions":[{"id":"https://openalex.org/I4210112150","display_name":"Institute of Automation","ror":"https://ror.org/022c3hy66","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210112150"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Chenghua Xu","raw_affiliation_strings":["National Laboratory of Pattern Recognition, Institute of Automation, Chinese Academy and Sciences, Beijing, China"],"affiliations":[{"raw_affiliation_string":"National Laboratory of Pattern Recognition, Institute of Automation, Chinese Academy and Sciences, Beijing, China","institution_ids":["https://openalex.org/I4210112150"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5115589096","display_name":"Yunhong Wang","orcid":null},"institutions":[{"id":"https://openalex.org/I4210112150","display_name":"Institute of Automation","ror":"https://ror.org/022c3hy66","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210112150"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yunhong Wang","raw_affiliation_strings":["National Laboratory of Pattern Recognition, Institute of Automation, Chinese Academy and Sciences, Beijing, China"],"affiliations":[{"raw_affiliation_string":"National Laboratory of Pattern Recognition, Institute of Automation, Chinese Academy and Sciences, Beijing, China","institution_ids":["https://openalex.org/I4210112150"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111885963","display_name":"Tieniu Tan","orcid":null},"institutions":[{"id":"https://openalex.org/I4210112150","display_name":"Institute of Automation","ror":"https://ror.org/022c3hy66","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210112150"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Tieniu Tan","raw_affiliation_strings":["National Laboratory of Pattern Recognition, Institute of Automation, Chinese Academy and Sciences, Beijing, China"],"affiliations":[{"raw_affiliation_string":"National Laboratory of Pattern Recognition, Institute of Automation, Chinese Academy and Sciences, Beijing, China","institution_ids":["https://openalex.org/I4210112150"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5006199483","display_name":"Long Quan","orcid":"https://orcid.org/0000-0001-8148-1771"},"institutions":[{"id":"https://openalex.org/I200769079","display_name":"Hong Kong University of Science and Technology","ror":"https://ror.org/00q4vv597","country_code":"HK","type":"education","lineage":["https://openalex.org/I200769079"]}],"countries":["HK"],"is_corresponding":false,"raw_author_name":"Long Quan","raw_affiliation_strings":["Department of Computer Science, HKUST, Kowloon, Hong Kong, China"],"affiliations":[{"raw_affiliation_string":"Department of Computer Science, HKUST, Kowloon, Hong Kong, China","institution_ids":["https://openalex.org/I200769079"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5103545973"],"corresponding_institution_ids":["https://openalex.org/I4210112150"],"apc_list":null,"apc_paid":null,"fwci":1.00716909,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.77120536,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"342","last_page":"345 Vol.1"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10057","display_name":"Face and Expression Recognition","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10057","display_name":"Face and Expression Recognition","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11448","display_name":"Face recognition and analysis","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10828","display_name":"Biometric Identification and Security","score":0.9947999715805054,"subfield":{"id":"https://openalex.org/subfields/1711","display_name":"Signal Processing"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/facial-recognition-system","display_name":"Facial recognition system","score":0.8045701384544373},{"id":"https://openalex.org/keywords/intensity","display_name":"Intensity (physics)","score":0.7431277632713318},{"id":"https://openalex.org/keywords/face","display_name":"Face (sociological concept)","score":0.6919969916343689},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.680923581123352},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.6252591609954834},{"id":"https://openalex.org/keywords/work","display_name":"Work (physics)","score":0.49141061305999756},{"id":"https://openalex.org/keywords/pattern-recognition","display_name":"Pattern recognition (psychology)","score":0.48395922780036926},{"id":"https://openalex.org/keywords/work-intensity","display_name":"Work Intensity","score":0.42091432213783264},{"id":"https://openalex.org/keywords/computer-vision","display_name":"Computer vision","score":0.4044380784034729},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.10085955262184143},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.057106971740722656}],"concepts":[{"id":"https://openalex.org/C31510193","wikidata":"https://www.wikidata.org/wiki/Q1192553","display_name":"Facial recognition system","level":3,"score":0.8045701384544373},{"id":"https://openalex.org/C93038891","wikidata":"https://www.wikidata.org/wiki/Q1061524","display_name":"Intensity (physics)","level":2,"score":0.7431277632713318},{"id":"https://openalex.org/C2779304628","wikidata":"https://www.wikidata.org/wiki/Q3503480","display_name":"Face (sociological concept)","level":2,"score":0.6919969916343689},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.680923581123352},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.6252591609954834},{"id":"https://openalex.org/C18762648","wikidata":"https://www.wikidata.org/wiki/Q42213","display_name":"Work (physics)","level":2,"score":0.49141061305999756},{"id":"https://openalex.org/C153180895","wikidata":"https://www.wikidata.org/wiki/Q7148389","display_name":"Pattern recognition (psychology)","level":2,"score":0.48395922780036926},{"id":"https://openalex.org/C2776485689","wikidata":"https://www.wikidata.org/wiki/Q8034568","display_name":"Work Intensity","level":3,"score":0.42091432213783264},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.4044380784034729},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.10085955262184143},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.057106971740722656},{"id":"https://openalex.org/C36289849","wikidata":"https://www.wikidata.org/wiki/Q34749","display_name":"Social science","level":1,"score":0.0},{"id":"https://openalex.org/C144024400","wikidata":"https://www.wikidata.org/wiki/Q21201","display_name":"Sociology","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/icpr.2004.1334122","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icpr.2004.1334122","pdf_url":null,"source":{"id":"https://openalex.org/S4363608750","display_name":"Proceedings of the 17th International Conference on Pattern Recognition, 2004. ICPR 2004.","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 17th International Conference on Pattern Recognition, 2004. ICPR 2004.","raw_type":"proceedings-article"},{"id":"pmh:oai:repository.hkust.edu.hk:1783.1-27693","is_oa":false,"landing_page_url":"http://repository.hkust.edu.hk/ir/Record/1783.1-27693","pdf_url":null,"source":{"id":"https://openalex.org/S4306401796","display_name":"Rare & Special e-Zone (The Hong Kong University of Science and Technology)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I200769079","host_organization_name":"Hong Kong University of Science and Technology","host_organization_lineage":["https://openalex.org/I200769079"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"Conference paper"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/10","score":0.5,"display_name":"Reduced inequalities"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W151813871","https://openalex.org/W1989702938","https://openalex.org/W2000946162","https://openalex.org/W2063668481","https://openalex.org/W2087264103","https://openalex.org/W2138451337","https://openalex.org/W2139212933","https://openalex.org/W2158054470","https://openalex.org/W2160126058","https://openalex.org/W6606227381","https://openalex.org/W6666088626","https://openalex.org/W6682951330"],"related_works":["https://openalex.org/W1989039360","https://openalex.org/W2908959303","https://openalex.org/W2060029454","https://openalex.org/W1560697087","https://openalex.org/W2136485282","https://openalex.org/W2146295394","https://openalex.org/W2545171730","https://openalex.org/W2347601237","https://openalex.org/W2136321227","https://openalex.org/W1555987077"],"abstract_inverted_index":{"Both":[0],"depth":[1,20,44],"and":[2,22,26],"intensity":[3,23,50],"are":[4],"important":[5,48],"information":[6,45,51],"for":[7,52],"face":[8,16,69],"recognition.":[9,70],"In":[10],"this":[11],"paper,":[12],"based":[13],"on":[14,68],"3D":[15],"modelling,":[17],"we":[18],"extract":[19],"features":[21,24],"respectively,":[25],"further":[27],"compare":[28],"their":[29],"capacity":[30],"to":[31,64],"characterize":[32],"the":[33,55,65],"individuals":[34],"in":[35],"our":[36],"database,":[37],"3DPEF.":[38],"The":[39],"experimental":[40],"results":[41],"show":[42],"that":[43],"is":[46,60],"more":[47],"than":[49],"recognition":[53],"under":[54],"same":[56],"condition.":[57],"This":[58],"work":[59,67],"a":[61],"good":[62],"reference":[63],"future":[66]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-02-23T08:04:50.183275","created_date":"2025-10-10T00:00:00"}