{"id":"https://openalex.org/W2947447190","doi":"https://doi.org/10.1109/icmech.2019.8722885","title":"Active Cantilevers with Diamond-Tip for Field Emission Scanning Probe Lithography and Imaging","display_name":"Active Cantilevers with Diamond-Tip for Field Emission Scanning Probe Lithography and Imaging","publication_year":2019,"publication_date":"2019-03-01","ids":{"openalex":"https://openalex.org/W2947447190","doi":"https://doi.org/10.1109/icmech.2019.8722885","mag":"2947447190"},"language":"en","primary_location":{"id":"doi:10.1109/icmech.2019.8722885","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icmech.2019.8722885","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2019 IEEE International Conference on Mechatronics (ICM)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5008336815","display_name":"Martin Hofmann","orcid":"https://orcid.org/0000-0002-4440-3317"},"institutions":[{"id":"https://openalex.org/I119449181","display_name":"Technische Universit\u00e4t Ilmenau","ror":"https://ror.org/01weqhp73","country_code":"DE","type":"education","lineage":["https://openalex.org/I119449181"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"Martin Hofmann","raw_affiliation_strings":["Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany"],"affiliations":[{"raw_affiliation_string":"Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany","institution_ids":["https://openalex.org/I119449181"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045387608","display_name":"Stephan Mechold","orcid":"https://orcid.org/0009-0005-9572-2579"},"institutions":[{"id":"https://openalex.org/I119449181","display_name":"Technische Universit\u00e4t Ilmenau","ror":"https://ror.org/01weqhp73","country_code":"DE","type":"education","lineage":["https://openalex.org/I119449181"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Stephan Mechold","raw_affiliation_strings":["Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany"],"affiliations":[{"raw_affiliation_string":"Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany","institution_ids":["https://openalex.org/I119449181"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001423843","display_name":"Mathias Holz","orcid":"https://orcid.org/0000-0003-4526-5726"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mathias Holz","raw_affiliation_strings":["nano analytik GmbH, Ilmernau, Germany"],"affiliations":[{"raw_affiliation_string":"nano analytik GmbH, Ilmernau, Germany","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100642306","display_name":"Ahmad Ahmad","orcid":"https://orcid.org/0009-0004-7137-7603"},"institutions":[{"id":"https://openalex.org/I119449181","display_name":"Technische Universit\u00e4t Ilmenau","ror":"https://ror.org/01weqhp73","country_code":"DE","type":"education","lineage":["https://openalex.org/I119449181"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Ahmad Ahmad","raw_affiliation_strings":["Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany"],"affiliations":[{"raw_affiliation_string":"Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany","institution_ids":["https://openalex.org/I119449181"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038026095","display_name":"Tzvetan Ivanonv","orcid":null},"institutions":[{"id":"https://openalex.org/I119449181","display_name":"Technische Universit\u00e4t Ilmenau","ror":"https://ror.org/01weqhp73","country_code":"DE","type":"education","lineage":["https://openalex.org/I119449181"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Tzvetan Ivanonv","raw_affiliation_strings":["Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany"],"affiliations":[{"raw_affiliation_string":"Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany","institution_ids":["https://openalex.org/I119449181"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5057705318","display_name":"Ivo W. Rangelow","orcid":"https://orcid.org/0000-0002-1487-1486"},"institutions":[{"id":"https://openalex.org/I119449181","display_name":"Technische Universit\u00e4t Ilmenau","ror":"https://ror.org/01weqhp73","country_code":"DE","type":"education","lineage":["https://openalex.org/I119449181"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Ivo W. Rangelow","raw_affiliation_strings":["Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany"],"affiliations":[{"raw_affiliation_string":"Department Micro and Nanoelectronic Systems, University of Technology Ilmenau, Ilmernau, Germany","institution_ids":["https://openalex.org/I119449181"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5008336815"],"corresponding_institution_ids":["https://openalex.org/I119449181"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.0616983,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"123","last_page":"128"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10923","display_name":"Force Microscopy Techniques and Applications","score":1.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10923","display_name":"Force Microscopy Techniques and Applications","score":1.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.9271330833435059},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.7281408309936523},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7188712358474731},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.6630687713623047},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.6431743502616882},{"id":"https://openalex.org/keywords/field-electron-emission","display_name":"Field electron emission","score":0.6404157876968384},{"id":"https://openalex.org/keywords/diamond","display_name":"Diamond","score":0.6218116283416748},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.5943505167961121},{"id":"https://openalex.org/keywords/plasma-etching","display_name":"Plasma etching","score":0.5751473903656006},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.560858964920044},{"id":"https://openalex.org/keywords/x-ray-lithography","display_name":"X-ray lithography","score":0.5571134090423584},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.5248185396194458},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4913538992404938},{"id":"https://openalex.org/keywords/nanolithography","display_name":"Nanolithography","score":0.4832221269607544},{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.4392551779747009},{"id":"https://openalex.org/keywords/substrate","display_name":"Substrate (aquarium)","score":0.4249250888824463},{"id":"https://openalex.org/keywords/electron","display_name":"Electron","score":0.1042458713054657},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.09370163083076477}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9271330833435059},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7281408309936523},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7188712358474731},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.6630687713623047},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.6431743502616882},{"id":"https://openalex.org/C121029787","wikidata":"https://www.wikidata.org/wiki/Q902877","display_name":"Field electron emission","level":3,"score":0.6404157876968384},{"id":"https://openalex.org/C2776921476","wikidata":"https://www.wikidata.org/wiki/Q5283","display_name":"Diamond","level":2,"score":0.6218116283416748},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5943505167961121},{"id":"https://openalex.org/C107187091","wikidata":"https://www.wikidata.org/wiki/Q2392011","display_name":"Plasma etching","level":4,"score":0.5751473903656006},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.560858964920044},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.5571134090423584},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.5248185396194458},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4913538992404938},{"id":"https://openalex.org/C162117346","wikidata":"https://www.wikidata.org/wiki/Q1106386","display_name":"Nanolithography","level":4,"score":0.4832221269607544},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.4392551779747009},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.4249250888824463},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.1042458713054657},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.09370163083076477},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/icmech.2019.8722885","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icmech.2019.8722885","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2019 IEEE International Conference on Mechatronics (ICM)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320879","display_name":"Deutsche Forschungsgemeinschaft","ror":"https://ror.org/018mejw64"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":35,"referenced_works":["https://openalex.org/W1835083517","https://openalex.org/W1908813228","https://openalex.org/W1976268392","https://openalex.org/W1987480997","https://openalex.org/W1994584923","https://openalex.org/W1999813067","https://openalex.org/W2005919784","https://openalex.org/W2009165706","https://openalex.org/W2011740898","https://openalex.org/W2019077128","https://openalex.org/W2020168982","https://openalex.org/W2023588273","https://openalex.org/W2029974363","https://openalex.org/W2045553774","https://openalex.org/W2061356493","https://openalex.org/W2069572181","https://openalex.org/W2071671291","https://openalex.org/W2076210646","https://openalex.org/W2081759634","https://openalex.org/W2089984499","https://openalex.org/W2100038262","https://openalex.org/W2102986313","https://openalex.org/W2103675411","https://openalex.org/W2118286703","https://openalex.org/W2133853896","https://openalex.org/W2177533236","https://openalex.org/W2233567740","https://openalex.org/W2328496354","https://openalex.org/W2465295220","https://openalex.org/W2548529836","https://openalex.org/W2790424380","https://openalex.org/W2797285473","https://openalex.org/W2894821823","https://openalex.org/W2897741988","https://openalex.org/W2898777390"],"related_works":["https://openalex.org/W2035221585","https://openalex.org/W2516408400","https://openalex.org/W2044824382","https://openalex.org/W1983243898","https://openalex.org/W2050029673","https://openalex.org/W2099232164","https://openalex.org/W1989927561","https://openalex.org/W1755784680","https://openalex.org/W2242337755","https://openalex.org/W2075721396"],"abstract_inverted_index":{"High":[0],"performance":[1],"single":[2,35],"nanometer":[3],"lithography":[4,74],"is":[5,57],"an":[6,60],"enabling":[7],"technology":[8],"for":[9,59,101,116],"beyond":[10],"CMOS":[11],"devices.":[12,39],"In":[13,69,84],"this":[14,70],"terms":[15],"a":[16],"novel":[17],"mask-":[18],"and":[19,37],"development-less":[20],"patterning":[21],"scheme":[22],"by":[23,48],"using":[24,49],"Field":[25],"Emission":[26],"Scanning":[27],"Probe":[28],"Lithography":[29],"(FE-SPL)":[30],"in":[31,78],"order":[32,85],"to":[33,43,86],"realize":[34],"electron":[36],"quantum":[38],"This":[40],"work":[41,71],"aims":[42],"manufacture":[44],"nanostructures":[45],"into":[46,64,92],"resists":[47,118],"FE-SPL,":[50],"whereas":[51],"plasma":[52],"etching":[53,106],"at":[54],"cryogenic":[55,104],"temperatures":[56],"applied":[58],"efficient":[61],"pattern":[62],"transfer":[63,87],"the":[65,72,88,93,96,102,117],"bottom":[66],"Si":[67,94],"substrate.":[68],"optimized":[73],"with":[75],"diamond":[76],"tips":[77],"10nm":[79],"4-":[80],"methyl-":[81],"1-":[82],"acetoxycalix(6,8)arene.":[83],"generated":[89],"nano-scale":[90],"patterns":[91],"sample,":[95],"silicon-to-resist":[97,111],"selectivity":[98,112],"of":[99,113],"calixarene,":[100],"anisotropic":[103],"dry":[105],"process":[107],"was":[108,119],"investigated.":[109],"A":[110],"about":[114],"4:1":[115],"found.":[120]},"counts_by_year":[{"year":2024,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}