{"id":"https://openalex.org/W4405935084","doi":"https://doi.org/10.1109/icm63406.2024.10815816","title":"Mid-Infrared Wavelength-Selective Absorbing Metasurfaces Based on Highly-doped Silicon Gratings","display_name":"Mid-Infrared Wavelength-Selective Absorbing Metasurfaces Based on Highly-doped Silicon Gratings","publication_year":2024,"publication_date":"2024-12-14","ids":{"openalex":"https://openalex.org/W4405935084","doi":"https://doi.org/10.1109/icm63406.2024.10815816"},"language":"en","primary_location":{"id":"doi:10.1109/icm63406.2024.10815816","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icm63406.2024.10815816","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2024 International Conference on Microelectronics (ICM)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111118097","display_name":"Kirollos Ernest Matta","orcid":null},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210154111","display_name":"Universit\u00e9 Gustave Eiffel","ror":"https://ror.org/03x42jk29","country_code":"FR","type":"education","lineage":["https://openalex.org/I4210154111"]},{"id":"https://openalex.org/I4387155313","display_name":"Laboratoire d'\u00e9lectronique, syst\u00e8mes de communication et microsyst\u00e8mes","ror":"https://ror.org/01m83bk32","country_code":null,"type":"facility","lineage":["https://openalex.org/I124158823","https://openalex.org/I1294671590","https://openalex.org/I4210134562","https://openalex.org/I4210154111","https://openalex.org/I4210156868","https://openalex.org/I4387155313"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Kirollos Ernest Matta","raw_affiliation_strings":["Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454","institution_ids":["https://openalex.org/I4387155313","https://openalex.org/I1294671590","https://openalex.org/I4210154111"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066699109","display_name":"Sreyash Sarkar","orcid":"https://orcid.org/0000-0003-0028-0287"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210154111","display_name":"Universit\u00e9 Gustave Eiffel","ror":"https://ror.org/03x42jk29","country_code":"FR","type":"education","lineage":["https://openalex.org/I4210154111"]},{"id":"https://openalex.org/I4387155313","display_name":"Laboratoire d'\u00e9lectronique, syst\u00e8mes de communication et microsyst\u00e8mes","ror":"https://ror.org/01m83bk32","country_code":null,"type":"facility","lineage":["https://openalex.org/I124158823","https://openalex.org/I1294671590","https://openalex.org/I4210134562","https://openalex.org/I4210154111","https://openalex.org/I4210156868","https://openalex.org/I4387155313"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Sreyash Sarkar","raw_affiliation_strings":["Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454","institution_ids":["https://openalex.org/I4387155313","https://openalex.org/I1294671590","https://openalex.org/I4210154111"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011972604","display_name":"Ahmed A. Elsayed","orcid":"https://orcid.org/0000-0002-8000-2713"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Ahmed Elsayed","raw_affiliation_strings":["Si-Ware Systems,Cairo,Egypt"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Si-Ware Systems,Cairo,Egypt","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026090468","display_name":"Fr\u00e9d\u00e9ric Marty","orcid":"https://orcid.org/0000-0002-9881-2036"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210154111","display_name":"Universit\u00e9 Gustave Eiffel","ror":"https://ror.org/03x42jk29","country_code":"FR","type":"education","lineage":["https://openalex.org/I4210154111"]},{"id":"https://openalex.org/I4387155313","display_name":"Laboratoire d'\u00e9lectronique, syst\u00e8mes de communication et microsyst\u00e8mes","ror":"https://ror.org/01m83bk32","country_code":null,"type":"facility","lineage":["https://openalex.org/I124158823","https://openalex.org/I1294671590","https://openalex.org/I4210134562","https://openalex.org/I4210154111","https://openalex.org/I4210156868","https://openalex.org/I4387155313"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Fr\u00e9d\u00e9ric Marty","raw_affiliation_strings":["Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454","institution_ids":["https://openalex.org/I4387155313","https://openalex.org/I1294671590","https://openalex.org/I4210154111"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102991864","display_name":"Armande Herv\u00e9","orcid":"https://orcid.org/0000-0002-6318-878X"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210154111","display_name":"Universit\u00e9 Gustave Eiffel","ror":"https://ror.org/03x42jk29","country_code":"FR","type":"education","lineage":["https://openalex.org/I4210154111"]},{"id":"https://openalex.org/I4387155313","display_name":"Laboratoire d'\u00e9lectronique, syst\u00e8mes de communication et microsyst\u00e8mes","ror":"https://ror.org/01m83bk32","country_code":null,"type":"facility","lineage":["https://openalex.org/I124158823","https://openalex.org/I1294671590","https://openalex.org/I4210134562","https://openalex.org/I4210154111","https://openalex.org/I4210156868","https://openalex.org/I4387155313"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Armande Herv\u00e9","raw_affiliation_strings":["Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454","institution_ids":["https://openalex.org/I4387155313","https://openalex.org/I1294671590","https://openalex.org/I4210154111"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5074022978","display_name":"Mazen Erfan","orcid":"https://orcid.org/0000-0002-5051-5614"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mazen Erfan","raw_affiliation_strings":["Si-Ware Systems,Cairo,Egypt"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Si-Ware Systems,Cairo,Egypt","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056838032","display_name":"Diaa Khalil","orcid":"https://orcid.org/0000-0002-2067-2002"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Diaa Khalil","raw_affiliation_strings":["Si-Ware Systems,Cairo,Egypt"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Si-Ware Systems,Cairo,Egypt","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000784917","display_name":"Yasser M. Sabry","orcid":"https://orcid.org/0000-0002-5385-4697"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yasser M. Sabry","raw_affiliation_strings":["Si-Ware Systems,Cairo,Egypt"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Si-Ware Systems,Cairo,Egypt","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5042634895","display_name":"Elyes Nefzaoui","orcid":"https://orcid.org/0000-0002-7544-0188"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210154111","display_name":"Universit\u00e9 Gustave Eiffel","ror":"https://ror.org/03x42jk29","country_code":"FR","type":"education","lineage":["https://openalex.org/I4210154111"]},{"id":"https://openalex.org/I4387155313","display_name":"Laboratoire d'\u00e9lectronique, syst\u00e8mes de communication et microsyst\u00e8mes","ror":"https://ror.org/01m83bk32","country_code":null,"type":"facility","lineage":["https://openalex.org/I124158823","https://openalex.org/I1294671590","https://openalex.org/I4210134562","https://openalex.org/I4210154111","https://openalex.org/I4210156868","https://openalex.org/I4387155313"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Elyes Nefzaoui","raw_affiliation_strings":["Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454","institution_ids":["https://openalex.org/I4387155313","https://openalex.org/I1294671590","https://openalex.org/I4210154111"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5067559568","display_name":"Tarik Bourouina","orcid":"https://orcid.org/0000-0003-2342-7149"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210154111","display_name":"Universit\u00e9 Gustave Eiffel","ror":"https://ror.org/03x42jk29","country_code":"FR","type":"education","lineage":["https://openalex.org/I4210154111"]},{"id":"https://openalex.org/I4387155313","display_name":"Laboratoire d'\u00e9lectronique, syst\u00e8mes de communication et microsyst\u00e8mes","ror":"https://ror.org/01m83bk32","country_code":null,"type":"facility","lineage":["https://openalex.org/I124158823","https://openalex.org/I1294671590","https://openalex.org/I4210134562","https://openalex.org/I4210154111","https://openalex.org/I4210156868","https://openalex.org/I4387155313"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Tarik Bourouina","raw_affiliation_strings":["Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ Gustave Eiffel,ESYCOM Lab, UMR 9007 CNRS,Marne-la-Vallée,France,77454","institution_ids":["https://openalex.org/I4387155313","https://openalex.org/I1294671590","https://openalex.org/I4210154111"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11383","display_name":"Advanced Antenna and Metasurface Technologies","score":0.9973000288009644,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11383","display_name":"Advanced Antenna and Metasurface Technologies","score":0.9973000288009644,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10245","display_name":"Metamaterials and Metasurfaces Applications","score":0.9961000084877014,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9790999889373779,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7271289229393005},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.7013206481933594},{"id":"https://openalex.org/keywords/doping","display_name":"Doping","score":0.6900652647018433},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.643578290939331},{"id":"https://openalex.org/keywords/infrared","display_name":"Infrared","score":0.6081132292747498},{"id":"https://openalex.org/keywords/wavelength","display_name":"Wavelength","score":0.585446298122406},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.5422242283821106},{"id":"https://openalex.org/keywords/diffraction-grating","display_name":"Diffraction grating","score":0.43416959047317505},{"id":"https://openalex.org/keywords/silicon-photonics","display_name":"Silicon photonics","score":0.4327641725540161},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.12445086240768433}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7271289229393005},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.7013206481933594},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.6900652647018433},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.643578290939331},{"id":"https://openalex.org/C158355884","wikidata":"https://www.wikidata.org/wiki/Q11388","display_name":"Infrared","level":2,"score":0.6081132292747498},{"id":"https://openalex.org/C6260449","wikidata":"https://www.wikidata.org/wiki/Q41364","display_name":"Wavelength","level":2,"score":0.585446298122406},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5422242283821106},{"id":"https://openalex.org/C126753812","wikidata":"https://www.wikidata.org/wiki/Q653294","display_name":"Diffraction grating","level":3,"score":0.43416959047317505},{"id":"https://openalex.org/C119423029","wikidata":"https://www.wikidata.org/wiki/Q3749103","display_name":"Silicon photonics","level":3,"score":0.4327641725540161},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.12445086240768433}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/icm63406.2024.10815816","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icm63406.2024.10815816","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2024 International Conference on Microelectronics (ICM)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1979740494","https://openalex.org/W1984388141","https://openalex.org/W2002190158","https://openalex.org/W2015726318","https://openalex.org/W2061192284","https://openalex.org/W2081524897","https://openalex.org/W2808013968"],"related_works":["https://openalex.org/W2374614594","https://openalex.org/W3013205429","https://openalex.org/W2391549584","https://openalex.org/W1599308342","https://openalex.org/W4245642471","https://openalex.org/W2362091980","https://openalex.org/W1986910690","https://openalex.org/W2884855369","https://openalex.org/W1849211454","https://openalex.org/W4235345709"],"abstract_inverted_index":{"We":[0],"experimentally":[1],"demonstrate":[2],"wavelength-selective":[3],"metasurfaces":[4],"operating":[5],"in":[6,21,49],"the":[7,22,50,56,62,66],"mid-infrared":[8],"spectral":[9],"range":[10],"extending":[11],"from":[12],"1000":[13],"to":[14],"25000":[15],"nm.":[16],"Resonant":[17],"peaks":[18],"are":[19],"observed":[20],"13000\u201317000":[23],"nm":[24],"range.":[25],"The":[26],"metasurface":[27],"consists":[28],"of":[29,36,45,58],"micrometer-scale":[30],"one":[31],"dimensional":[32],"periodic":[33],"gratings":[34,67],"made":[35],"highly-doped":[37],"silicon":[38],"using":[39],"conventional":[40],"ultra-violet":[41],"lithography,":[42],"taking":[43],"advantage":[44],"its":[46],"plasmonic":[47],"behavior":[48],"infrared.":[51],"Simulations":[52],"results":[53],"supports":[54],"understanding":[55],"effects":[57],"key":[59],"parameters":[60],"including":[61],"doping":[63],"concentration":[64],"and":[65],"period.":[68]},"counts_by_year":[{"year":2025,"cited_by_count":1}],"updated_date":"2026-07-15T18:14:33.161393","created_date":"2025-10-10T00:00:00"}