{"id":"https://openalex.org/W1507499037","doi":"https://doi.org/10.1109/icicdt.2015.7165908","title":"I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration","display_name":"I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration","publication_year":2015,"publication_date":"2015-06-01","ids":{"openalex":"https://openalex.org/W1507499037","doi":"https://doi.org/10.1109/icicdt.2015.7165908","mag":"1507499037"},"language":"en","primary_location":{"id":"doi:10.1109/icicdt.2015.7165908","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icicdt.2015.7165908","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 International Conference on IC Design & Technology (ICICDT)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5090570441","display_name":"R. Ritzenthaler","orcid":"https://orcid.org/0000-0002-8615-3272"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":true,"raw_author_name":"R. Ritzenthaler","raw_affiliation_strings":["imec, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"affiliations":[{"raw_affiliation_string":"imec, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004538088","display_name":"T. Schram","orcid":"https://orcid.org/0000-0003-1533-7055"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"T. Schram","raw_affiliation_strings":["imec, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"affiliations":[{"raw_affiliation_string":"imec, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5047924068","display_name":"M. J. Cho","orcid":null},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"M. J. Cho","raw_affiliation_strings":["imec, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"affiliations":[{"raw_affiliation_string":"imec, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111996467","display_name":"A. Mocuta","orcid":null},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"A. Mocuta","raw_affiliation_strings":["imec, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"affiliations":[{"raw_affiliation_string":"imec, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065113949","display_name":"Naoto Horiguchi","orcid":"https://orcid.org/0000-0001-5490-0416"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"N. Horiguchi","raw_affiliation_strings":["imec, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"affiliations":[{"raw_affiliation_string":"imec, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050315289","display_name":"Aaron Thean","orcid":"https://orcid.org/0000-0003-2418-6404"},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"A. V.-Y. Thean","raw_affiliation_strings":["imec, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"affiliations":[{"raw_affiliation_string":"imec, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019510660","display_name":"A. Spessot","orcid":"https://orcid.org/0000-0003-2381-0121"},"institutions":[{"id":"https://openalex.org/I11912373","display_name":"Micron (United States)","ror":"https://ror.org/02fv52296","country_code":"US","type":"company","lineage":["https://openalex.org/I11912373"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. Spessot","raw_affiliation_strings":["Micron Technology Belgium, Leuven, Belgium","Micron Technology Belgium, imec Campus, Kapeldreef 75,3001 Leuven, Belgium"],"affiliations":[{"raw_affiliation_string":"Micron Technology Belgium, Leuven, Belgium","institution_ids":[]},{"raw_affiliation_string":"Micron Technology Belgium, imec Campus, Kapeldreef 75,3001 Leuven, Belgium","institution_ids":["https://openalex.org/I11912373"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108443068","display_name":"C. Caillat","orcid":null},"institutions":[{"id":"https://openalex.org/I11912373","display_name":"Micron (United States)","ror":"https://ror.org/02fv52296","country_code":"US","type":"company","lineage":["https://openalex.org/I11912373"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C. Caillat","raw_affiliation_strings":["Micron Technology Belgium, Leuven, Belgium","Micron Technology Belgium, imec Campus, Kapeldreef 75,3001 Leuven, Belgium"],"affiliations":[{"raw_affiliation_string":"Micron Technology Belgium, Leuven, Belgium","institution_ids":[]},{"raw_affiliation_string":"Micron Technology Belgium, imec Campus, Kapeldreef 75,3001 Leuven, Belgium","institution_ids":["https://openalex.org/I11912373"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028923484","display_name":"M. Aoulaiche","orcid":null},"institutions":[{"id":"https://openalex.org/I11912373","display_name":"Micron (United States)","ror":"https://ror.org/02fv52296","country_code":"US","type":"company","lineage":["https://openalex.org/I11912373"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Aoulaiche","raw_affiliation_strings":["Micron Technology Belgium, Leuven, Belgium","Micron Technology Belgium, imec Campus, Kapeldreef 75,3001 Leuven, Belgium"],"affiliations":[{"raw_affiliation_string":"Micron Technology Belgium, Leuven, Belgium","institution_ids":[]},{"raw_affiliation_string":"Micron Technology Belgium, imec Campus, Kapeldreef 75,3001 Leuven, Belgium","institution_ids":["https://openalex.org/I11912373"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113576343","display_name":"P. Fazan","orcid":null},"institutions":[{"id":"https://openalex.org/I11912373","display_name":"Micron (United States)","ror":"https://ror.org/02fv52296","country_code":"US","type":"company","lineage":["https://openalex.org/I11912373"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"P. Fazan","raw_affiliation_strings":["Micron Technology Belgium, Leuven, Belgium","Micron Technology Belgium, imec Campus, Kapeldreef 75,3001 Leuven, Belgium"],"affiliations":[{"raw_affiliation_string":"Micron Technology Belgium, Leuven, Belgium","institution_ids":[]},{"raw_affiliation_string":"Micron Technology Belgium, imec Campus, Kapeldreef 75,3001 Leuven, Belgium","institution_ids":["https://openalex.org/I11912373"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113772202","display_name":"K. B. Noh","orcid":null},"institutions":[{"id":"https://openalex.org/I4210112278","display_name":"SK Group (Japan)","ror":"https://ror.org/02axkyn34","country_code":"JP","type":"company","lineage":["https://openalex.org/I134353371","https://openalex.org/I4210112278"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. B. Noh","raw_affiliation_strings":["Assignee at imec from SK-Hynix","imec from SK-Hynix"],"affiliations":[{"raw_affiliation_string":"Assignee at imec from SK-Hynix","institution_ids":["https://openalex.org/I4210112278"]},{"raw_affiliation_string":"imec from SK-Hynix","institution_ids":["https://openalex.org/I4210112278"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5108529548","display_name":"Yunik Son","orcid":null},"institutions":[{"id":"https://openalex.org/I4210112278","display_name":"SK Group (Japan)","ror":"https://ror.org/02axkyn34","country_code":"JP","type":"company","lineage":["https://openalex.org/I134353371","https://openalex.org/I4210112278"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Son","raw_affiliation_strings":["Assignee at imec from SK-Hynix","imec from SK-Hynix"],"affiliations":[{"raw_affiliation_string":"Assignee at imec from SK-Hynix","institution_ids":["https://openalex.org/I4210112278"]},{"raw_affiliation_string":"imec from SK-Hynix","institution_ids":["https://openalex.org/I4210112278"]}]}],"institutions":[],"countries_distinct_count":3,"institutions_distinct_count":12,"corresponding_author_ids":["https://openalex.org/A5090570441"],"corresponding_institution_ids":["https://openalex.org/I4210114974"],"apc_list":null,"apc_paid":null,"fwci":0.1973,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.55492023,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12588","display_name":"Electronic and Structural Properties of Oxides","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6407886147499084},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5861467123031616},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.5660970211029053},{"id":"https://openalex.org/keywords/stack","display_name":"Stack (abstract data type)","score":0.5125963091850281},{"id":"https://openalex.org/keywords/gate-voltage","display_name":"Gate voltage","score":0.503694474697113},{"id":"https://openalex.org/keywords/gate-oxide","display_name":"Gate oxide","score":0.5020246505737305},{"id":"https://openalex.org/keywords/oxide","display_name":"Oxide","score":0.5006372928619385},{"id":"https://openalex.org/keywords/and-gate","display_name":"AND gate","score":0.49537789821624756},{"id":"https://openalex.org/keywords/diffusion","display_name":"Diffusion","score":0.4747928977012634},{"id":"https://openalex.org/keywords/channel","display_name":"Channel (broadcasting)","score":0.46339017152786255},{"id":"https://openalex.org/keywords/threshold-voltage","display_name":"Threshold voltage","score":0.4625989496707916},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.44929754734039307},{"id":"https://openalex.org/keywords/metal-gate","display_name":"Metal gate","score":0.44633492827415466},{"id":"https://openalex.org/keywords/logic-gate","display_name":"Logic gate","score":0.43766576051712036},{"id":"https://openalex.org/keywords/work-function","display_name":"Work function","score":0.4114108383655548},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.40865328907966614},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.33544886112213135},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.3224157691001892},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.2647022008895874},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.17735180258750916},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.16997170448303223},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.09795442223548889}],"concepts":[{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6407886147499084},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5861467123031616},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.5660970211029053},{"id":"https://openalex.org/C9395851","wikidata":"https://www.wikidata.org/wiki/Q177929","display_name":"Stack (abstract data type)","level":2,"score":0.5125963091850281},{"id":"https://openalex.org/C2984119601","wikidata":"https://www.wikidata.org/wiki/Q1754002","display_name":"Gate voltage","level":4,"score":0.503694474697113},{"id":"https://openalex.org/C2361726","wikidata":"https://www.wikidata.org/wiki/Q5527031","display_name":"Gate oxide","level":4,"score":0.5020246505737305},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5006372928619385},{"id":"https://openalex.org/C10418432","wikidata":"https://www.wikidata.org/wiki/Q560370","display_name":"AND gate","level":3,"score":0.49537789821624756},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.4747928977012634},{"id":"https://openalex.org/C127162648","wikidata":"https://www.wikidata.org/wiki/Q16858953","display_name":"Channel (broadcasting)","level":2,"score":0.46339017152786255},{"id":"https://openalex.org/C195370968","wikidata":"https://www.wikidata.org/wiki/Q1754002","display_name":"Threshold voltage","level":4,"score":0.4625989496707916},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.44929754734039307},{"id":"https://openalex.org/C51140833","wikidata":"https://www.wikidata.org/wiki/Q6822740","display_name":"Metal gate","level":5,"score":0.44633492827415466},{"id":"https://openalex.org/C131017901","wikidata":"https://www.wikidata.org/wiki/Q170451","display_name":"Logic gate","level":2,"score":0.43766576051712036},{"id":"https://openalex.org/C115235246","wikidata":"https://www.wikidata.org/wiki/Q783800","display_name":"Work function","level":3,"score":0.4114108383655548},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.40865328907966614},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.33544886112213135},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3224157691001892},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.2647022008895874},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.17735180258750916},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.16997170448303223},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.09795442223548889},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/icicdt.2015.7165908","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icicdt.2015.7165908","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 International Conference on IC Design & Technology (ICICDT)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.46000000834465027,"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W2090918501","https://openalex.org/W2139748598","https://openalex.org/W2165063925","https://openalex.org/W2314518156","https://openalex.org/W2507016108","https://openalex.org/W2572376319","https://openalex.org/W4255896972"],"related_works":["https://openalex.org/W2369525038","https://openalex.org/W1984159254","https://openalex.org/W2143757641","https://openalex.org/W2467475793","https://openalex.org/W2811342899","https://openalex.org/W4240357461","https://openalex.org/W3197208856","https://openalex.org/W2335244518","https://openalex.org/W2936397156","https://openalex.org/W2071764392"],"abstract_inverted_index":{"In":[0],"this":[1],"work,":[2],"the":[3,6,74],"potential":[4],"of":[5,48],"recently":[7],"demonstrated":[8],"D&GR":[9,24,44],"(Diffusion":[10],"&":[11],"Gate":[12],"Replacement,":[13],"[5])":[14],"for":[15,31,79],"thick":[16,83],"oxide":[17,84],"I/O":[18,32,95],"devices":[19,33,96],"integration":[20,25,71],"is":[21,34,86,90],"investigated.":[22],"A":[23],"flow":[26,45],"compliant":[27],"with":[28,36,39],"EOT":[29],"requirements":[30],"demonstrated,":[35,67],"no":[37],"penalty":[38],"regard":[40],"to":[41,63],"HKMG":[42,94],"Non":[43],"in":[46],"terms":[47],"short":[49],"channel":[50],"effects":[51],"and":[52,68,82,98],"intrinsic":[53],"transistor":[54],"performance.":[55],"Threshold":[56],"voltage":[57],"tuning":[58],"options":[59],"from":[60,104],"150":[61],"up":[62],"300":[64],"mV":[65],"are":[66],"one":[69],"preferred":[70],"route":[72],"(keeping":[73],"same":[75],"work":[76],"function":[77],"shifters":[78],"both":[80],"thin":[81],"devices)":[85],"highlighted.":[87],"Finally,":[88],"it":[89],"also":[91],"shown":[92],"that":[93],"(D&GR":[97],"non":[99],"D&GR)":[100],"do":[101],"not":[102],"suffer":[103],"reverse":[105],"narrow":[106],"gate":[107],"width":[108],"effects.":[109]},"counts_by_year":[{"year":2018,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}