{"id":"https://openalex.org/W2084519450","doi":"https://doi.org/10.1109/icicdt.2013.6563295","title":"Improved modeling of isolated EDMOS in advanced CMOS technologies","display_name":"Improved modeling of isolated EDMOS in advanced CMOS technologies","publication_year":2013,"publication_date":"2013-05-01","ids":{"openalex":"https://openalex.org/W2084519450","doi":"https://doi.org/10.1109/icicdt.2013.6563295","mag":"2084519450"},"language":"en","primary_location":{"id":"doi:10.1109/icicdt.2013.6563295","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icicdt.2013.6563295","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of 2013 International Conference on IC Design & Technology (ICICDT)","raw_type":"proceedings-article"},"type":"preprint","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5058628762","display_name":"Antoine Litty","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":true,"raw_author_name":"Antoine Litty","raw_affiliation_strings":["STMicroelectronics, Crolles, FR","STMicroelectron., Crolles, France"],"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, FR","institution_ids":[]},{"raw_affiliation_string":"STMicroelectron., Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070137052","display_name":"S. Ortolland","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Sylvie Ortolland","raw_affiliation_strings":["STMicroelectronics, Crolles, France","STMicroelectron., Crolles, France"],"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]},{"raw_affiliation_string":"STMicroelectron., Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060338075","display_name":"S. Cristoloveanu","orcid":null},"institutions":[{"id":"https://openalex.org/I106785703","display_name":"Institut polytechnique de Grenoble","ror":"https://ror.org/05sbt2524","country_code":"FR","type":"education","lineage":["https://openalex.org/I106785703","https://openalex.org/I899635006"]},{"id":"https://openalex.org/I899635006","display_name":"Universit\u00e9 Grenoble Alpes","ror":"https://ror.org/02rx3b187","country_code":"FR","type":"education","lineage":["https://openalex.org/I899635006"]},{"id":"https://openalex.org/I2802525515","display_name":"Micro and Nanotechnology Innovation Centre","ror":"https://ror.org/035vrxy57","country_code":"FR","type":"facility","lineage":["https://openalex.org/I2802525515"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Sorin Cristoloveanu","raw_affiliation_strings":["IMEP-INP Grenoble, MINATEC, Grenoble, France","IMEP, INP Grenoble, Grenoble, France"],"affiliations":[{"raw_affiliation_string":"IMEP-INP Grenoble, MINATEC, Grenoble, France","institution_ids":["https://openalex.org/I106785703","https://openalex.org/I2802525515","https://openalex.org/I899635006"]},{"raw_affiliation_string":"IMEP, INP Grenoble, Grenoble, France","institution_ids":["https://openalex.org/I106785703"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033166967","display_name":"Helene Beckrich Ros","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Helene Beckrich Ros","raw_affiliation_strings":["STMicroelectronics, Crolles, France","STMicroelectron., Crolles, France"],"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]},{"raw_affiliation_string":"STMicroelectron., Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5060472357","display_name":"Dominique Golanski","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Dominique Golanski","raw_affiliation_strings":["STMicroelectronics, Crolles, France","STMicroelectron., Crolles, France"],"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]},{"raw_affiliation_string":"STMicroelectron., Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":["https://openalex.org/A5058628762"],"corresponding_institution_ids":["https://openalex.org/I4210104693"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.13444541,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"25","last_page":"28"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.8006483316421509},{"id":"https://openalex.org/keywords/spice","display_name":"Spice","score":0.7874651551246643},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.5587568283081055},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.5511849522590637},{"id":"https://openalex.org/keywords/semiconductor-device-modeling","display_name":"Semiconductor device modeling","score":0.5231198668479919},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"Silicon on insulator","score":0.43463799357414246},{"id":"https://openalex.org/keywords/macro","display_name":"Macro","score":0.43390321731567383},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.4278936982154846},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.42644429206848145},{"id":"https://openalex.org/keywords/bipolar-junction-transistor","display_name":"Bipolar junction transistor","score":0.41010552644729614},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3878723680973053},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.38763850927352905},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.36143454909324646},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.26863929629325867},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.1723872721195221}],"concepts":[{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.8006483316421509},{"id":"https://openalex.org/C2780077345","wikidata":"https://www.wikidata.org/wiki/Q16891888","display_name":"Spice","level":2,"score":0.7874651551246643},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.5587568283081055},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.5511849522590637},{"id":"https://openalex.org/C4775677","wikidata":"https://www.wikidata.org/wiki/Q7449393","display_name":"Semiconductor device modeling","level":3,"score":0.5231198668479919},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.43463799357414246},{"id":"https://openalex.org/C166955791","wikidata":"https://www.wikidata.org/wiki/Q629579","display_name":"Macro","level":2,"score":0.43390321731567383},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.4278936982154846},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.42644429206848145},{"id":"https://openalex.org/C23061349","wikidata":"https://www.wikidata.org/wiki/Q188946","display_name":"Bipolar junction transistor","level":4,"score":0.41010552644729614},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3878723680973053},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.38763850927352905},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.36143454909324646},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.26863929629325867},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.1723872721195221},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/icicdt.2013.6563295","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icicdt.2013.6563295","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of 2013 International Conference on IC Design & Technology (ICICDT)","raw_type":"proceedings-article"},{"id":"pmh:oai:HAL:hal-01022607v1","is_oa":false,"landing_page_url":"https://hal.science/hal-01022607","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL (Le Centre pour la Communication Scientifique Directe)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I1294671590","host_organization_name":"Centre National de la Recherche Scientifique","host_organization_lineage":["https://openalex.org/I1294671590"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ICICDT 2013 (International Conference on IC Design and Technology, May 2013, Pavia, Italy. pp.25-28, ⟨10.1109/ICICDT.2013.6563295⟩","raw_type":"Conference papers"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","id":"https://metadata.un.org/sdg/7","score":0.46000000834465027}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W1485591150","https://openalex.org/W1937244755","https://openalex.org/W1993525571","https://openalex.org/W2026242574","https://openalex.org/W2028054319","https://openalex.org/W2050703994","https://openalex.org/W2059318935","https://openalex.org/W2074598226","https://openalex.org/W2093286082","https://openalex.org/W2111304205","https://openalex.org/W2118621714","https://openalex.org/W2125983607","https://openalex.org/W2147762092","https://openalex.org/W2147988383","https://openalex.org/W2170247623","https://openalex.org/W6681986801"],"related_works":["https://openalex.org/W2798845339","https://openalex.org/W2912949236","https://openalex.org/W1545891137","https://openalex.org/W2945285759","https://openalex.org/W2798321569","https://openalex.org/W2615278662","https://openalex.org/W2057436168","https://openalex.org/W1989032443","https://openalex.org/W2036872982","https://openalex.org/W2980109916"],"abstract_inverted_index":{"Session":[0],"A":[1],"-":[2],"CAD":[3]},"counts_by_year":[{"year":2024,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}