{"id":"https://openalex.org/W2081937668","doi":"https://doi.org/10.1109/icicdt.2012.6232871","title":"O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction","display_name":"O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction","publication_year":2012,"publication_date":"2012-05-01","ids":{"openalex":"https://openalex.org/W2081937668","doi":"https://doi.org/10.1109/icicdt.2012.6232871","mag":"2081937668"},"language":"en","primary_location":{"id":"doi:10.1109/icicdt.2012.6232871","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icicdt.2012.6232871","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 IEEE International Conference on IC Design & Technology","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5080344547","display_name":"Rani S. Ghaida","orcid":null},"institutions":[{"id":"https://openalex.org/I161318765","display_name":"University of California, Los Angeles","ror":"https://ror.org/046rm7j60","country_code":"US","type":"education","lineage":["https://openalex.org/I161318765"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Rani S. Ghaida","raw_affiliation_strings":["UCLA, Electrical Engineering Dept","UCLA, Electrical Engineering Dept., USA"],"affiliations":[{"raw_affiliation_string":"UCLA, Electrical Engineering Dept","institution_ids":[]},{"raw_affiliation_string":"UCLA, Electrical Engineering Dept., USA","institution_ids":["https://openalex.org/I161318765"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113938530","display_name":"Kanak Agarwal","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},{"id":"https://openalex.org/I4210156936","display_name":"IBM Research - Austin","ror":"https://ror.org/05gjbbg60","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115","https://openalex.org/I4210156936"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Kanak B. Agarwal","raw_affiliation_strings":["IBM Corp., Austin Research Lab","IBM Corp., Austin Research Lab, USA"],"affiliations":[{"raw_affiliation_string":"IBM Corp., Austin Research Lab","institution_ids":["https://openalex.org/I4210156936"]},{"raw_affiliation_string":"IBM Corp., Austin Research Lab, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046886936","display_name":"Sani Nassif","orcid":"https://orcid.org/0000-0002-5096-4794"},"institutions":[{"id":"https://openalex.org/I4210156936","display_name":"IBM Research - Austin","ror":"https://ror.org/05gjbbg60","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115","https://openalex.org/I4210156936"]},{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Sani R. Nassif","raw_affiliation_strings":["IBM Corp., Austin Research Lab","IBM Corp., Austin Research Lab, USA"],"affiliations":[{"raw_affiliation_string":"IBM Corp., Austin Research Lab","institution_ids":["https://openalex.org/I4210156936"]},{"raw_affiliation_string":"IBM Corp., Austin Research Lab, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5049765501","display_name":"Xin Yuan","orcid":"https://orcid.org/0000-0002-9167-1613"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Xin Yuan","raw_affiliation_strings":["IBM Corp., San Jose","IBM Corporation, San Jose, USA"],"affiliations":[{"raw_affiliation_string":"IBM Corp., San Jose","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Corporation, San Jose, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073775409","display_name":"Lars W. Liebmann","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Lars W. Liebmann","raw_affiliation_strings":["UCLA, Electrical Engineering Dept","IBM Corp., Semiconductor Research & Development Center, USA"],"affiliations":[{"raw_affiliation_string":"UCLA, Electrical Engineering Dept","institution_ids":[]},{"raw_affiliation_string":"IBM Corp., Semiconductor Research & Development Center, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5084229134","display_name":"Puneet Gupta","orcid":"https://orcid.org/0000-0002-6188-1134"},"institutions":[{"id":"https://openalex.org/I161318765","display_name":"University of California, Los Angeles","ror":"https://ror.org/046rm7j60","country_code":"US","type":"education","lineage":["https://openalex.org/I161318765"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Puneet Gupta","raw_affiliation_strings":["UCLA, Electrical Engineering Dept","UCLA, Electrical Engineering Dept., USA"],"affiliations":[{"raw_affiliation_string":"UCLA, Electrical Engineering Dept","institution_ids":[]},{"raw_affiliation_string":"UCLA, Electrical Engineering Dept., USA","institution_ids":["https://openalex.org/I161318765"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5080344547"],"corresponding_institution_ids":["https://openalex.org/I161318765"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.13657608,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"7974","issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6498275399208069},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.634970486164093},{"id":"https://openalex.org/keywords/multiple-patterning","display_name":"Multiple patterning","score":0.603098452091217},{"id":"https://openalex.org/keywords/macro","display_name":"Macro","score":0.48304468393325806},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.33066707849502563},{"id":"https://openalex.org/keywords/distributed-computing","display_name":"Distributed computing","score":0.3266793191432953},{"id":"https://openalex.org/keywords/parallel-computing","display_name":"Parallel computing","score":0.3248642683029175},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.26922839879989624},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.18331432342529297},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.17002525925636292},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.08939370512962341},{"id":"https://openalex.org/keywords/programming-language","display_name":"Programming language","score":0.08691281080245972}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6498275399208069},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.634970486164093},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.603098452091217},{"id":"https://openalex.org/C166955791","wikidata":"https://www.wikidata.org/wiki/Q629579","display_name":"Macro","level":2,"score":0.48304468393325806},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.33066707849502563},{"id":"https://openalex.org/C120314980","wikidata":"https://www.wikidata.org/wiki/Q180634","display_name":"Distributed computing","level":1,"score":0.3266793191432953},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.3248642683029175},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.26922839879989624},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.18331432342529297},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.17002525925636292},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.08939370512962341},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.08691281080245972},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/icicdt.2012.6232871","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icicdt.2012.6232871","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2012 IEEE International Conference on IC Design & Technology","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.6299999952316284,"display_name":"Peace, Justice and strong institutions","id":"https://metadata.un.org/sdg/16"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":28,"referenced_works":["https://openalex.org/W1974376306","https://openalex.org/W1980290801","https://openalex.org/W2009102457","https://openalex.org/W2013251580","https://openalex.org/W2018868256","https://openalex.org/W2047394675","https://openalex.org/W2057317577","https://openalex.org/W2067065170","https://openalex.org/W2082525005","https://openalex.org/W2090109439","https://openalex.org/W2094370252","https://openalex.org/W2108352706","https://openalex.org/W2152190733","https://openalex.org/W2153245554","https://openalex.org/W2156916628","https://openalex.org/W2159287000","https://openalex.org/W2175772671","https://openalex.org/W3142820954","https://openalex.org/W3149715914","https://openalex.org/W3150135088","https://openalex.org/W4238726164","https://openalex.org/W4245120272","https://openalex.org/W6643693107","https://openalex.org/W6652691047","https://openalex.org/W6667085052","https://openalex.org/W6671213698","https://openalex.org/W6673907574","https://openalex.org/W6683094081"],"related_works":["https://openalex.org/W2140942945","https://openalex.org/W2541440459","https://openalex.org/W2050847819","https://openalex.org/W2115795789","https://openalex.org/W2000620740","https://openalex.org/W2025251804","https://openalex.org/W1975854055","https://openalex.org/W2032413298","https://openalex.org/W2062836254","https://openalex.org/W2089781659"],"abstract_inverted_index":{"The":[0,23,61,88,154,180],"use":[1],"of":[2,20,27,51,65],"multiple":[3,28,106],"patterning":[4,29,112],"optical":[5],"lithography":[6,21],"for":[7,48,96,136,151,177,196,208],"sub-20nm":[8],"technologies":[9,99],"has":[10],"become":[11],"inevitable":[12],"with":[13,219],"delays":[14],"in":[15,39,122,128,174,225],"adopting":[16],"the":[17,49,119,145,199,212],"next":[18],"generation":[19],"systems.":[22],"biggest":[24],"technical":[25],"challenge":[26],"is":[30,90,139,157],"failure":[31],"to":[32,125,141],"reach":[33],"a":[34,45,160,187,220],"manufacturable":[35],"layout-coloring":[36,134],"solution,":[37],"especially":[38],"dense":[40],"layouts.":[41],"This":[42],"paper":[43,124],"offers":[44],"post-layout":[46],"solution":[47],"removal":[50],"conflicts,":[52],"i.e.,":[53],"patterns":[54],"that":[55],"cannot":[56],"be":[57,94],"colored":[58],"without":[59,192,204],"violations.":[60],"proposed":[62,120],"method":[63,89,121,181,200,213],"consists":[64],"three":[66],"steps":[67],"essentially:":[68],"layout":[69,79],"coloring,":[70],"exposure":[71],"layers":[72],"and":[73,83,92,109,148],"geometric":[74],"rules":[75,85],"definition,":[76],"and,":[77],"finally,":[78],"legalization":[80],"using":[81],"compaction":[82],"multiple-patterning":[84,98,152,194],"as":[86,159],"constraints.":[87],"general":[91],"can":[93],"used":[95],"different":[97],"including":[100],"LELE":[101],"double-patterning":[102],"(DP),":[103],"tripe/multiple-patterning":[104],"(i.e.,":[105],"litho-etch":[107],"steps),":[108],"self-aligned":[110],"double":[111],"(SADP).":[113],"For":[114],"demonstration":[115],"purposes,":[116],"we":[117],"apply":[118],"this":[123],"remove":[126],"conflicts":[127,203,217],"DP.":[129],"We":[130],"offer":[131],"an":[132,166],"O(n)":[133],"algorithm":[135],"DP,":[137],"which":[138,164],"up":[140],"200X":[142],"faster":[143],"than":[144,171],"ILP-based":[146],"approach,":[147],"extend":[149],"it":[150],"(MP).":[153],"conflict-removal":[155],"problem":[156],"formulated":[158],"linear":[161],"program":[162],"(LP),":[163],"permits":[165],"extremely":[167],"fast":[168],"run-time":[169],"(less":[170],"1":[172],"minute":[173],"real":[175],"time":[176],"macro":[178],"layout).":[179],"was":[182],"tested":[183],"on":[184],"cells":[185],"from":[186],"commercial":[188],"22nm":[189],"library":[190],"designed":[191],"any":[193,205],"awareness;":[195],"many":[197],"cells,":[198,211],"removes":[201,215],"all":[202,216],"area":[206],"increase;":[207],"some":[209],"complex":[210],"still":[214],"but":[218],"modest":[221],"6.7%":[222],"average":[223],"increase":[224],"area.":[226]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}