{"id":"https://openalex.org/W2538219064","doi":"https://doi.org/10.1109/icecs.2004.1399638","title":"CMOS SOI image sensor","display_name":"CMOS SOI image sensor","publication_year":2005,"publication_date":"2005-03-31","ids":{"openalex":"https://openalex.org/W2538219064","doi":"https://doi.org/10.1109/icecs.2004.1399638","mag":"2538219064"},"language":"en","primary_location":{"id":"doi:10.1109/icecs.2004.1399638","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icecs.2004.1399638","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2004 11th IEEE International Conference on Electronics, Circuits and Systems, 2004. ICECS 2004.","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5009031954","display_name":"Igor Brouk","orcid":null},"institutions":[{"id":"https://openalex.org/I174306211","display_name":"Technion \u2013 Israel Institute of Technology","ror":"https://ror.org/03qryx823","country_code":"IL","type":"education","lineage":["https://openalex.org/I174306211"]}],"countries":["IL"],"is_corresponding":true,"raw_author_name":"I. Brouk","raw_affiliation_strings":["Department of Electrical Engineering, Technion-Israel Institute of Technology, Haifa, Israel"],"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Technion-Israel Institute of Technology, Haifa, Israel","institution_ids":["https://openalex.org/I174306211"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5087985744","display_name":"Y. Nemirovsky","orcid":"https://orcid.org/0000-0002-0274-472X"},"institutions":[{"id":"https://openalex.org/I174306211","display_name":"Technion \u2013 Israel Institute of Technology","ror":"https://ror.org/03qryx823","country_code":"IL","type":"education","lineage":["https://openalex.org/I174306211"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Y. Nemirovsky","raw_affiliation_strings":["Department of Electrical Engineering, Technion-Israel Institute of Technology, Haifa, Israel"],"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Technion-Israel Institute of Technology, Haifa, Israel","institution_ids":["https://openalex.org/I174306211"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5009031954"],"corresponding_institution_ids":["https://openalex.org/I174306211"],"apc_list":null,"apc_paid":null,"fwci":1.4228,"has_fulltext":false,"cited_by_count":8,"citation_normalized_percentile":{"value":0.83941012,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"156","last_page":"159"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13114","display_name":"Image Processing Techniques and Applications","score":0.9948999881744385,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12389","display_name":"Infrared Target Detection Methodologies","score":0.9940000176429749,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.7488356828689575},{"id":"https://openalex.org/keywords/subthreshold-conduction","display_name":"Subthreshold conduction","score":0.6956139206886292},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"Silicon on insulator","score":0.6657913327217102},{"id":"https://openalex.org/keywords/photodiode","display_name":"Photodiode","score":0.6557384729385376},{"id":"https://openalex.org/keywords/image-sensor","display_name":"Image sensor","score":0.5693600177764893},{"id":"https://openalex.org/keywords/noise","display_name":"Noise (video)","score":0.5459162592887878},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5225377082824707},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.48545771837234497},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.4305506646633148},{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.4264991283416748},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.4235306978225708},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4131099283695221},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3526601791381836},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.26633530855178833},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.2534080743789673},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.192771315574646},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.16126888990402222},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.13697654008865356},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.09826314449310303},{"id":"https://openalex.org/keywords/image","display_name":"Image (mathematics)","score":0.0869286060333252}],"concepts":[{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.7488356828689575},{"id":"https://openalex.org/C156465305","wikidata":"https://www.wikidata.org/wiki/Q1658601","display_name":"Subthreshold conduction","level":4,"score":0.6956139206886292},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.6657913327217102},{"id":"https://openalex.org/C751236","wikidata":"https://www.wikidata.org/wiki/Q175943","display_name":"Photodiode","level":2,"score":0.6557384729385376},{"id":"https://openalex.org/C76935873","wikidata":"https://www.wikidata.org/wiki/Q209121","display_name":"Image sensor","level":2,"score":0.5693600177764893},{"id":"https://openalex.org/C99498987","wikidata":"https://www.wikidata.org/wiki/Q2210247","display_name":"Noise (video)","level":3,"score":0.5459162592887878},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5225377082824707},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.48545771837234497},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.4305506646633148},{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.4264991283416748},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4235306978225708},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4131099283695221},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3526601791381836},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.26633530855178833},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2534080743789673},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.192771315574646},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.16126888990402222},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.13697654008865356},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.09826314449310303},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.0869286060333252},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/icecs.2004.1399638","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icecs.2004.1399638","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the 2004 11th IEEE International Conference on Electronics, Circuits and Systems, 2004. ICECS 2004.","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy","score":0.8399999737739563}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":10,"referenced_works":["https://openalex.org/W1985001665","https://openalex.org/W1995202496","https://openalex.org/W2063037331","https://openalex.org/W2066726102","https://openalex.org/W2116506989","https://openalex.org/W2119691280","https://openalex.org/W2165373903","https://openalex.org/W2533738568","https://openalex.org/W2535533151","https://openalex.org/W2566161284"],"related_works":["https://openalex.org/W2001476809","https://openalex.org/W2545707786","https://openalex.org/W2095990703","https://openalex.org/W1921407827","https://openalex.org/W2146341803","https://openalex.org/W1983441360","https://openalex.org/W1979129154","https://openalex.org/W2331008491","https://openalex.org/W2070094114","https://openalex.org/W2553467462"],"abstract_inverted_index":{"Design,":[0],"operation":[1],"and":[2,40,61,73,93],"measurement":[3],"results":[4,84],"of":[5,18,27,34,64,85,95,98],"a":[6,11],"CMOS":[7,68,99],"camera":[8],"implemented":[9],"within":[10],"SOI":[12,62],"wafer":[13],"are":[14,46,71,88],"presented.":[15],"The":[16,83],"peak":[17],"photodiode":[19],"quantum":[20],"efficiency":[21],"is":[22,75],"obtained":[23],"for":[24,43],"the":[25,35,91],"wavelengths":[26],"400-500":[28],"nm.":[29],"In":[30],"addition,":[31],"noise":[32,37,97],"measurements":[33],"1/f":[36,81,96],"in":[38],"P-MOS":[39],"N-MOS":[41],"transistors":[42],"analog":[44,69,100],"applications":[45],"reported":[47],"under":[48],"wide":[49],"bias":[50],"conditions":[51],"ranging":[52],"from":[53],"subthreshold":[54],"to":[55,90],"saturation.":[56],"Two":[57],"implementations":[58],"(in":[59],"regular":[60],"wafers)":[63],"0.35":[65],"/spl":[66],"mu/m":[67],"process":[70],"compared":[72],"it":[74],"found":[76],"that":[77],"they":[78],"exhibit":[79],"similar":[80],"noise.":[82],"this":[86],"study":[87],"useful":[89],"design":[92],"modeling":[94],"circuits.":[101]},"counts_by_year":[{"year":2019,"cited_by_count":2},{"year":2014,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}