{"id":"https://openalex.org/W1532002721","doi":"https://doi.org/10.1109/icdsp.2015.7252073","title":"Nanoscale memristors: Devices engineering, CMOS integration and novel applications","display_name":"Nanoscale memristors: Devices engineering, CMOS integration and novel applications","publication_year":2015,"publication_date":"2015-07-01","ids":{"openalex":"https://openalex.org/W1532002721","doi":"https://doi.org/10.1109/icdsp.2015.7252073","mag":"1532002721"},"language":"en","primary_location":{"id":"doi:10.1109/icdsp.2015.7252073","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icdsp.2015.7252073","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 IEEE International Conference on Digital Signal Processing (DSP)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5044224050","display_name":"Qiangfei Xia","orcid":"https://orcid.org/0000-0003-1436-8423"},"institutions":[{"id":"https://openalex.org/I24603500","display_name":"University of Massachusetts Amherst","ror":"https://ror.org/0072zz521","country_code":"US","type":"education","lineage":["https://openalex.org/I24603500"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Qiangfei Xia","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Massachusetts, Amherst, MA, USA","Nanodevices and Integrated Systems Laboratory, Department of Electrical and Computer Engineering, University of Massachusetts, Amherst, 01003, USA"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Massachusetts, Amherst, MA, USA","institution_ids":["https://openalex.org/I24603500"]},{"raw_affiliation_string":"Nanodevices and Integrated Systems Laboratory, Department of Electrical and Computer Engineering, University of Massachusetts, Amherst, 01003, USA","institution_ids":["https://openalex.org/I24603500"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5044224050"],"corresponding_institution_ids":["https://openalex.org/I24603500"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.02295494,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"1216","last_page":"1218"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11601","display_name":"Neuroscience and Neural Engineering","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2804","display_name":"Cellular and Molecular Neuroscience"},"field":{"id":"https://openalex.org/fields/28","display_name":"Neuroscience"},"domain":{"id":"https://openalex.org/domains/1","display_name":"Life Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.9983999729156494,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/memristor","display_name":"Memristor","score":0.883996844291687},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7779160141944885},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.667422890663147},{"id":"https://openalex.org/keywords/nanoimprint-lithography","display_name":"Nanoimprint lithography","score":0.571658730506897},{"id":"https://openalex.org/keywords/crossbar-switch","display_name":"Crossbar switch","score":0.5555444955825806},{"id":"https://openalex.org/keywords/nanoscopic-scale","display_name":"Nanoscopic scale","score":0.5345838069915771},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.507984459400177},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.48654189705848694},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.47675973176956177},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.46754613518714905},{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.45672494173049927},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.4478524327278137},{"id":"https://openalex.org/keywords/sputtering","display_name":"Sputtering","score":0.42499616742134094},{"id":"https://openalex.org/keywords/resistive-random-access-memory","display_name":"Resistive random-access memory","score":0.4160536527633667},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.39395684003829956},{"id":"https://openalex.org/keywords/thin-film","display_name":"Thin film","score":0.28719252347946167},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.27519822120666504},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.11060711741447449},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.11017152667045593}],"concepts":[{"id":"https://openalex.org/C150072547","wikidata":"https://www.wikidata.org/wiki/Q212923","display_name":"Memristor","level":2,"score":0.883996844291687},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7779160141944885},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.667422890663147},{"id":"https://openalex.org/C2777046567","wikidata":"https://www.wikidata.org/wiki/Q1540138","display_name":"Nanoimprint lithography","level":4,"score":0.571658730506897},{"id":"https://openalex.org/C29984679","wikidata":"https://www.wikidata.org/wiki/Q1929149","display_name":"Crossbar switch","level":2,"score":0.5555444955825806},{"id":"https://openalex.org/C45206210","wikidata":"https://www.wikidata.org/wiki/Q2415817","display_name":"Nanoscopic scale","level":2,"score":0.5345838069915771},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.507984459400177},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.48654189705848694},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.47675973176956177},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.46754613518714905},{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.45672494173049927},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.4478524327278137},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.42499616742134094},{"id":"https://openalex.org/C182019814","wikidata":"https://www.wikidata.org/wiki/Q1143830","display_name":"Resistive random-access memory","level":3,"score":0.4160536527633667},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.39395684003829956},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.28719252347946167},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.27519822120666504},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.11060711741447449},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.11017152667045593},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/icdsp.2015.7252073","is_oa":false,"landing_page_url":"https://doi.org/10.1109/icdsp.2015.7252073","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 IEEE International Conference on Digital Signal Processing (DSP)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","id":"https://metadata.un.org/sdg/7","score":0.7400000095367432}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1976920752","https://openalex.org/W2022533666","https://openalex.org/W2030999659","https://openalex.org/W2086504641","https://openalex.org/W2136288682"],"related_works":["https://openalex.org/W3005999147","https://openalex.org/W3164474614","https://openalex.org/W2171130799","https://openalex.org/W2005875039","https://openalex.org/W3173413269","https://openalex.org/W2015477599","https://openalex.org/W2548135880","https://openalex.org/W2144085790","https://openalex.org/W3177379469","https://openalex.org/W3176428941"],"abstract_inverted_index":{"We":[0,28],"scaled":[1],"the":[2,21],"memristor":[3],"devices":[4,53],"in":[5],"a":[6,30],"crossbar":[7],"arrays":[8],"down":[9],"to":[10],"8":[11],"nm":[12],"using":[13],"nanoimprint":[14],"lithography.":[15],"With":[16],"reactive":[17],"sputtering,":[18],"we":[19,49],"tuned":[20],"electrical":[22],"properties":[23],"of":[24],"TiOx":[25],"based":[26],"memristors.":[27],"developed":[29],"silicon":[31],"oxide":[32,39],"device":[33],"with":[34,54,60],"ultra-thin":[35],"layer":[36],"chemically":[37],"produced":[38],"that":[40],"exhibited":[41],"low":[42],"voltage":[43,63],"and":[44,64],"electrode-dependent":[45],"switching":[46,62],"behavior.":[47],"Finally,":[48],"integrated":[50],"planar":[51],"memristive":[52],"CMOS":[55],"substrates,":[56],"implementing":[57],"hybrid":[58],"circuits":[59],"lower":[61],"better":[65],"uniformity.":[66]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}