{"id":"https://openalex.org/W1992393396","doi":"https://doi.org/10.1109/ias.2010.5614500","title":"Measurement of Charge Evolution in Oxides of DC Stressed MOS Structures","display_name":"Measurement of Charge Evolution in Oxides of DC Stressed MOS Structures","publication_year":2010,"publication_date":"2010-10-01","ids":{"openalex":"https://openalex.org/W1992393396","doi":"https://doi.org/10.1109/ias.2010.5614500","mag":"1992393396"},"language":"en","primary_location":{"id":"doi:10.1109/ias.2010.5614500","is_oa":false,"landing_page_url":"https://doi.org/10.1109/ias.2010.5614500","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2010 IEEE Industry Applications Society Annual Meeting","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5021229927","display_name":"L. Boyer","orcid":null},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I19894307","display_name":"Universit\u00e9 de Montpellier","ror":"https://ror.org/051escj72","country_code":"FR","type":"education","lineage":["https://openalex.org/I19894307"]},{"id":"https://openalex.org/I4210134800","display_name":"Institut d'\u00c9lectronique et des Syst\u00e8mes","ror":"https://ror.org/0431hh004","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I19894307","https://openalex.org/I4210095849","https://openalex.org/I4210134800"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Ludovic Boyer","raw_affiliation_strings":["Institut dElectronique du Sud, UMR 5214 UM2 CNRS, Universit\u00e9 Montpellier, Montpellier, France","Inst. d'Electron. du Sud, Univ. Montpellier 2, Montpellier, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut dElectronique du Sud, UMR 5214 UM2 CNRS, Universit\u00e9 Montpellier, Montpellier, France","institution_ids":["https://openalex.org/I4210134800","https://openalex.org/I19894307","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"Inst. d'Electron. du Sud, Univ. Montpellier 2, Montpellier, France","institution_ids":["https://openalex.org/I4210134800","https://openalex.org/I19894307"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080800242","display_name":"B. Rousset","orcid":"https://orcid.org/0000-0002-0340-1243"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I19894307","display_name":"Universit\u00e9 de Montpellier","ror":"https://ror.org/051escj72","country_code":"FR","type":"education","lineage":["https://openalex.org/I19894307"]},{"id":"https://openalex.org/I4210134800","display_name":"Institut d'\u00c9lectronique et des Syst\u00e8mes","ror":"https://ror.org/0431hh004","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I19894307","https://openalex.org/I4210095849","https://openalex.org/I4210134800"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Bernard Rousset","raw_affiliation_strings":["Institut dElectronique du Sud, UMR 5214 UM2 CNRS, Universit\u00e9 Montpellier, Montpellier, France","Inst. d'Electron. du Sud, Univ. Montpellier 2, Montpellier, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut dElectronique du Sud, UMR 5214 UM2 CNRS, Universit\u00e9 Montpellier, Montpellier, France","institution_ids":["https://openalex.org/I4210134800","https://openalex.org/I19894307","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"Inst. d'Electron. du Sud, Univ. Montpellier 2, Montpellier, France","institution_ids":["https://openalex.org/I4210134800","https://openalex.org/I19894307"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5074497593","display_name":"P. Notingher","orcid":"https://orcid.org/0000-0002-0369-7208"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I19894307","display_name":"Universit\u00e9 de Montpellier","ror":"https://ror.org/051escj72","country_code":"FR","type":"education","lineage":["https://openalex.org/I19894307"]},{"id":"https://openalex.org/I4210134800","display_name":"Institut d'\u00c9lectronique et des Syst\u00e8mes","ror":"https://ror.org/0431hh004","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I19894307","https://openalex.org/I4210095849","https://openalex.org/I4210134800"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Petru Notingher Jr.","raw_affiliation_strings":["Institut dElectronique du Sud, UMR 5214 UM2 CNRS, Universit\u00e9 Montpellier, Montpellier, France","Inst. d'Electron. du Sud, Univ. Montpellier 2, Montpellier, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut dElectronique du Sud, UMR 5214 UM2 CNRS, Universit\u00e9 Montpellier, Montpellier, France","institution_ids":["https://openalex.org/I4210134800","https://openalex.org/I19894307","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"Inst. d'Electron. du Sud, Univ. Montpellier 2, Montpellier, France","institution_ids":["https://openalex.org/I4210134800","https://openalex.org/I19894307"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112482374","display_name":"S. Agnel","orcid":null},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I190497903","display_name":"Laboratoire d'Analyse et d'Architecture des Syst\u00e8mes","ror":"https://ror.org/03vcm6439","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I190497903","https://openalex.org/I193033237","https://openalex.org/I196454796","https://openalex.org/I205747304","https://openalex.org/I4210095849","https://openalex.org/I4210152422","https://openalex.org/I4210159245","https://openalex.org/I4405258862","https://openalex.org/I4405259414"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Serge Agnel","raw_affiliation_strings":["Laboratoire dAnalyse et dArchitecture des Syst\u00e8mes, UPR CNRS, Toulouse, France","[Lab. d'Anal. et d'Archit. des Syst., CNRS, Toulouse, France]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire dAnalyse et dArchitecture des Syst\u00e8mes, UPR CNRS, Toulouse, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I190497903"]},{"raw_affiliation_string":"[Lab. d'Anal. et d'Archit. des Syst., CNRS, Toulouse, France]","institution_ids":["https://openalex.org/I190497903","https://openalex.org/I1294671590"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112870505","display_name":"Jean\u2010Louis Sanchez","orcid":null},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I190497903","display_name":"Laboratoire d'Analyse et d'Architecture des Syst\u00e8mes","ror":"https://ror.org/03vcm6439","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I190497903","https://openalex.org/I193033237","https://openalex.org/I196454796","https://openalex.org/I205747304","https://openalex.org/I4210095849","https://openalex.org/I4210152422","https://openalex.org/I4210159245","https://openalex.org/I4405258862","https://openalex.org/I4405259414"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Jean-Louis Sanchez","raw_affiliation_strings":["Laboratoire dAnalyse et dArchitecture des Syst\u00e8mes, UPR CNRS, Toulouse, France","[Lab. d'Anal. et d'Archit. des Syst., CNRS, Toulouse, France]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire dAnalyse et dArchitecture des Syst\u00e8mes, UPR CNRS, Toulouse, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I190497903"]},{"raw_affiliation_string":"[Lab. d'Anal. et d'Archit. des Syst., CNRS, Toulouse, France]","institution_ids":["https://openalex.org/I190497903","https://openalex.org/I1294671590"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.1589,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.49455677,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":95},"biblio":{"volume":"64","issue":null,"first_page":"1","last_page":"8"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10511","display_name":"High voltage insulation and dielectric phenomena","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10511","display_name":"High voltage insulation and dielectric phenomena","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/capacitance","display_name":"Capacitance","score":0.6846423745155334},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6628305912017822},{"id":"https://openalex.org/keywords/stress","display_name":"Stress (linguistics)","score":0.6169441342353821},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.607552170753479},{"id":"https://openalex.org/keywords/charge","display_name":"Charge (physics)","score":0.5880466103553772},{"id":"https://openalex.org/keywords/oxide","display_name":"Oxide","score":0.5735076665878296},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.5705537796020508},{"id":"https://openalex.org/keywords/substrate","display_name":"Substrate (aquarium)","score":0.5462727546691895},{"id":"https://openalex.org/keywords/thermal","display_name":"Thermal","score":0.48185431957244873},{"id":"https://openalex.org/keywords/work","display_name":"Work (physics)","score":0.4359338879585266},{"id":"https://openalex.org/keywords/semiconductor","display_name":"Semiconductor","score":0.42495211958885193},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3741598427295685},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.20170867443084717},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.1858874261379242},{"id":"https://openalex.org/keywords/electrode","display_name":"Electrode","score":0.14478525519371033},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.12517854571342468},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.06302711367607117}],"concepts":[{"id":"https://openalex.org/C30066665","wikidata":"https://www.wikidata.org/wiki/Q164399","display_name":"Capacitance","level":3,"score":0.6846423745155334},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6628305912017822},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.6169441342353821},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.607552170753479},{"id":"https://openalex.org/C188082385","wikidata":"https://www.wikidata.org/wiki/Q73792","display_name":"Charge (physics)","level":2,"score":0.5880466103553772},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5735076665878296},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.5705537796020508},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5462727546691895},{"id":"https://openalex.org/C204530211","wikidata":"https://www.wikidata.org/wiki/Q752823","display_name":"Thermal","level":2,"score":0.48185431957244873},{"id":"https://openalex.org/C18762648","wikidata":"https://www.wikidata.org/wiki/Q42213","display_name":"Work (physics)","level":2,"score":0.4359338879585266},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.42495211958885193},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3741598427295685},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.20170867443084717},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1858874261379242},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.14478525519371033},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.12517854571342468},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.06302711367607117},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C153294291","wikidata":"https://www.wikidata.org/wiki/Q25261","display_name":"Meteorology","level":1,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/ias.2010.5614500","is_oa":false,"landing_page_url":"https://doi.org/10.1109/ias.2010.5614500","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2010 IEEE Industry Applications Society Annual Meeting","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.5799999833106995,"id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1972524365","https://openalex.org/W2007639067","https://openalex.org/W2050794225","https://openalex.org/W2071042143","https://openalex.org/W2097129252","https://openalex.org/W2139530599","https://openalex.org/W2153650741","https://openalex.org/W2335259982","https://openalex.org/W4285018543","https://openalex.org/W4301422364","https://openalex.org/W6703040462","https://openalex.org/W6845246003"],"related_works":["https://openalex.org/W2347585086","https://openalex.org/W1527953837","https://openalex.org/W2042100038","https://openalex.org/W1966596465","https://openalex.org/W3086500945","https://openalex.org/W2018850574","https://openalex.org/W2781651239","https://openalex.org/W2368367884","https://openalex.org/W2764319374","https://openalex.org/W2983306545"],"abstract_inverted_index":{"This":[0],"work":[1],"addresses":[2],"electric":[3],"charge":[4,39],"measurement":[5],"in":[6,21],"gate":[7,119],"oxides":[8],"of":[9,37,100,117],"metal-oxide-semiconductor":[10],"(MOS)":[11],"structures":[12],"submitted":[13],"to":[14,18,29,72,107,110],"dc":[15],"stress":[16],"similar":[17],"that":[19,97],"applied":[20],"power":[22],"electronics":[23],"components":[24],"during":[25,58],"service":[26],"(2":[27],"MV/cm":[28],"4":[30],"MV/cm).":[31],"The":[32],"qualitative":[33],"and":[34,44,53,109],"quantitative":[35],"variation":[36],"the":[38,50,54,65,73,77,79,87,92,98,101,112,115,118],"is":[40,61,69,82,95],"analyzed":[41],"via":[42],"capacitance-voltage":[43,66],"thermal-step":[45,80],"measurements,":[46],"taking":[47],"into":[48],"account":[49],"structure":[51],"geometry":[52],"different":[55],"phenomena":[56],"occurring":[57],"stress.":[59],"It":[60,94],"shown":[62,96],"that,":[63],"while":[64],"technique,":[67],"which":[68],"mainly":[70],"sensitive":[71,84],"charges":[74,88,113],"placed":[75,89],"near":[76],"substrate,":[78],"method":[81],"more":[83],"for":[85],"detecting":[86],"all":[90],"over":[91],"oxide.":[93,120],"association":[99],"two":[102],"complimentary":[103],"techniques":[104],"can":[105],"allow":[106],"identify":[108],"localize":[111],"across":[114],"quasi-totality":[116]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}