{"id":"https://openalex.org/W2120097220","doi":"https://doi.org/10.1109/fpt.2007.4439272","title":"A Rapid Prototyping of Real-Time Pattern Generator for Step-and-Scan Lithography Using Digital Micromirror Device","display_name":"A Rapid Prototyping of Real-Time Pattern Generator for Step-and-Scan Lithography Using Digital Micromirror Device","publication_year":2007,"publication_date":"2007-12-01","ids":{"openalex":"https://openalex.org/W2120097220","doi":"https://doi.org/10.1109/fpt.2007.4439272","mag":"2120097220"},"language":"en","primary_location":{"id":"doi:10.1109/fpt.2007.4439272","is_oa":false,"landing_page_url":"https://doi.org/10.1109/fpt.2007.4439272","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2007 International Conference on Field-Programmable Technology","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5025462434","display_name":"Naoto Miyamoto","orcid":null},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Naoto Miyamoto","raw_affiliation_strings":["New Industry Creation Hatchery Center, University of Tohoku, Japan","Tohoku University, Sendai"],"affiliations":[{"raw_affiliation_string":"New Industry Creation Hatchery Center, University of Tohoku, Japan","institution_ids":["https://openalex.org/I201537933"]},{"raw_affiliation_string":"Tohoku University, Sendai","institution_ids":["https://openalex.org/I201537933"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5098043145","display_name":"Masahiko Shimakage","orcid":null},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masahiko Shimakage","raw_affiliation_strings":["New Industry Creation Hatchery Center, University of Tohoku, Japan","Graduate School of Engineering, Tohoku University, Aza Aoba 10, Aramaki, Aoba-ku, Sendai, 980-8579, Japan"],"affiliations":[{"raw_affiliation_string":"New Industry Creation Hatchery Center, University of Tohoku, Japan","institution_ids":["https://openalex.org/I201537933"]},{"raw_affiliation_string":"Graduate School of Engineering, Tohoku University, Aza Aoba 10, Aramaki, Aoba-ku, Sendai, 980-8579, Japan","institution_ids":["https://openalex.org/I201537933"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110499026","display_name":"Tatsuo Morimoto","orcid":null},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tatsuo Morimoto","raw_affiliation_strings":["New Industry Creation Hatchery Center, University of Tohoku, Japan","New Industry Creation Hatchery Center, Tohoku University, Aza-aoba 10, Aramaki, Aoba-ku, Sendai 980-8579, Japan"],"affiliations":[{"raw_affiliation_string":"New Industry Creation Hatchery Center, University of Tohoku, Japan","institution_ids":["https://openalex.org/I201537933"]},{"raw_affiliation_string":"New Industry Creation Hatchery Center, Tohoku University, Aza-aoba 10, Aramaki, Aoba-ku, Sendai 980-8579, Japan","institution_ids":["https://openalex.org/I201537933"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010377239","display_name":"Kazuya Kadota","orcid":null},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kazuya Kadota","raw_affiliation_strings":["New Industry Creation Hatchery Center, University of Tohoku, Japan","New Industry Creation Hatchery Center, Tohoku University, Aza-aoba 10, Aramaki, Aoba-ku, Sendai 980-8579, Japan"],"affiliations":[{"raw_affiliation_string":"New Industry Creation Hatchery Center, University of Tohoku, Japan","institution_ids":["https://openalex.org/I201537933"]},{"raw_affiliation_string":"New Industry Creation Hatchery Center, Tohoku University, Aza-aoba 10, Aramaki, Aoba-ku, Sendai 980-8579, Japan","institution_ids":["https://openalex.org/I201537933"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110456758","display_name":"Shigetoshi Sugawa","orcid":null},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shigetoshi Sugawa","raw_affiliation_strings":["Graduate School of Engineering, University of Tohoku, Sendai, Japan","Member, IEEE, Graduate School of Engineering, Tohoku University, Aza Aoba 10, Aramaki, Aoba-ku, Sendai, 980-8579, Japan"],"affiliations":[{"raw_affiliation_string":"Graduate School of Engineering, University of Tohoku, Sendai, Japan","institution_ids":["https://openalex.org/I201537933"]},{"raw_affiliation_string":"Member, IEEE, Graduate School of Engineering, Tohoku University, Aza Aoba 10, Aramaki, Aoba-ku, Sendai, 980-8579, Japan","institution_ids":["https://openalex.org/I201537933"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110479973","display_name":"Tadahiro Ohmi","orcid":null},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tadahiro Ohmi","raw_affiliation_strings":["New Industry Creation Hatchery Center, University of Tohoku, Japan","Fellow, IEEE, New Industry Creation Hatchery Center, Tohoku University, Aza Aoba 10, Aramaki, Aoba-ku, Sendai, 980-8579, Japan"],"affiliations":[{"raw_affiliation_string":"New Industry Creation Hatchery Center, University of Tohoku, Japan","institution_ids":["https://openalex.org/I201537933"]},{"raw_affiliation_string":"Fellow, IEEE, New Industry Creation Hatchery Center, Tohoku University, Aza Aoba 10, Aramaki, Aoba-ku, Sendai, 980-8579, Japan","institution_ids":["https://openalex.org/I201537933"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5025462434"],"corresponding_institution_ids":["https://openalex.org/I201537933"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.15315233,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"305","last_page":"308"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12452","display_name":"Electrowetting and Microfluidic Technologies","score":0.994700014591217,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11749","display_name":"Iterative Learning Control Systems","score":0.991100013256073,"subfield":{"id":"https://openalex.org/subfields/2207","display_name":"Control and Systems Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/digital-micromirror-device","display_name":"Digital micromirror device","score":0.946256160736084},{"id":"https://openalex.org/keywords/stratix","display_name":"Stratix","score":0.7813897728919983},{"id":"https://openalex.org/keywords/field-programmable-gate-array","display_name":"Field-programmable gate array","score":0.6715307235717773},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6596090197563171},{"id":"https://openalex.org/keywords/digital-pattern-generator","display_name":"Digital pattern generator","score":0.6453046202659607},{"id":"https://openalex.org/keywords/frame-rate","display_name":"Frame rate","score":0.6281786561012268},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6108413934707642},{"id":"https://openalex.org/keywords/computer-hardware","display_name":"Computer hardware","score":0.5761053562164307},{"id":"https://openalex.org/keywords/frame","display_name":"Frame (networking)","score":0.518705427646637},{"id":"https://openalex.org/keywords/rapid-prototyping","display_name":"Rapid prototyping","score":0.5094843506813049},{"id":"https://openalex.org/keywords/bitmap","display_name":"Bitmap","score":0.500544548034668},{"id":"https://openalex.org/keywords/generator","display_name":"Generator (circuit theory)","score":0.47012054920196533},{"id":"https://openalex.org/keywords/interface","display_name":"Interface (matter)","score":0.4182942509651184},{"id":"https://openalex.org/keywords/digital-light-processing","display_name":"Digital Light Processing","score":0.41288521885871887},{"id":"https://openalex.org/keywords/chip","display_name":"Chip","score":0.3675544857978821},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.2648681402206421},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.21704599261283875},{"id":"https://openalex.org/keywords/computer-graphics","display_name":"Computer graphics (images)","score":0.186579167842865},{"id":"https://openalex.org/keywords/power","display_name":"Power (physics)","score":0.1812596619129181},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.16607901453971863},{"id":"https://openalex.org/keywords/computer-vision","display_name":"Computer vision","score":0.14829358458518982},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.1320435106754303},{"id":"https://openalex.org/keywords/projector","display_name":"Projector","score":0.13018548488616943},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.11409929394721985}],"concepts":[{"id":"https://openalex.org/C18645525","wikidata":"https://www.wikidata.org/wiki/Q1369469","display_name":"Digital micromirror device","level":2,"score":0.946256160736084},{"id":"https://openalex.org/C2776277307","wikidata":"https://www.wikidata.org/wiki/Q22074755","display_name":"Stratix","level":3,"score":0.7813897728919983},{"id":"https://openalex.org/C42935608","wikidata":"https://www.wikidata.org/wiki/Q190411","display_name":"Field-programmable gate array","level":2,"score":0.6715307235717773},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6596090197563171},{"id":"https://openalex.org/C151346624","wikidata":"https://www.wikidata.org/wiki/Q5276129","display_name":"Digital pattern generator","level":3,"score":0.6453046202659607},{"id":"https://openalex.org/C3261483","wikidata":"https://www.wikidata.org/wiki/Q119565","display_name":"Frame rate","level":2,"score":0.6281786561012268},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6108413934707642},{"id":"https://openalex.org/C9390403","wikidata":"https://www.wikidata.org/wiki/Q3966","display_name":"Computer hardware","level":1,"score":0.5761053562164307},{"id":"https://openalex.org/C126042441","wikidata":"https://www.wikidata.org/wiki/Q1324888","display_name":"Frame (networking)","level":2,"score":0.518705427646637},{"id":"https://openalex.org/C2780395129","wikidata":"https://www.wikidata.org/wiki/Q1128971","display_name":"Rapid prototyping","level":2,"score":0.5094843506813049},{"id":"https://openalex.org/C3115412","wikidata":"https://www.wikidata.org/wiki/Q1194708","display_name":"Bitmap","level":2,"score":0.500544548034668},{"id":"https://openalex.org/C2780992000","wikidata":"https://www.wikidata.org/wiki/Q17016113","display_name":"Generator (circuit theory)","level":3,"score":0.47012054920196533},{"id":"https://openalex.org/C113843644","wikidata":"https://www.wikidata.org/wiki/Q901882","display_name":"Interface (matter)","level":4,"score":0.4182942509651184},{"id":"https://openalex.org/C64434820","wikidata":"https://www.wikidata.org/wiki/Q523366","display_name":"Digital Light Processing","level":3,"score":0.41288521885871887},{"id":"https://openalex.org/C165005293","wikidata":"https://www.wikidata.org/wiki/Q1074500","display_name":"Chip","level":2,"score":0.3675544857978821},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.2648681402206421},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.21704599261283875},{"id":"https://openalex.org/C121684516","wikidata":"https://www.wikidata.org/wiki/Q7600677","display_name":"Computer graphics (images)","level":1,"score":0.186579167842865},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.1812596619129181},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.16607901453971863},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.14829358458518982},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1320435106754303},{"id":"https://openalex.org/C2776865275","wikidata":"https://www.wikidata.org/wiki/Q311666","display_name":"Projector","level":2,"score":0.13018548488616943},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.11409929394721985},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C157915830","wikidata":"https://www.wikidata.org/wiki/Q2928001","display_name":"Bubble","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C129307140","wikidata":"https://www.wikidata.org/wiki/Q6795880","display_name":"Maximum bubble pressure method","level":3,"score":0.0},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/fpt.2007.4439272","is_oa":false,"landing_page_url":"https://doi.org/10.1109/fpt.2007.4439272","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2007 International Conference on Field-Programmable Technology","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2061813362","https://openalex.org/W3176021015","https://openalex.org/W7027973194"],"related_works":["https://openalex.org/W2027271498","https://openalex.org/W2030715203","https://openalex.org/W2355839080","https://openalex.org/W1938137611","https://openalex.org/W2094727786","https://openalex.org/W2361272194","https://openalex.org/W1984995854","https://openalex.org/W2592762180","https://openalex.org/W179250695","https://openalex.org/W2565038809"],"abstract_inverted_index":{"An":[0],"FPGA":[1,90],"prototyping":[2],"of":[3,43,56],"real-time":[4],"pattern":[5,31,83],"generator":[6,84],"for":[7,27],"step-and-scan":[8],"lithography":[9],"equipment":[10],"using":[11],"digital":[12],"micromirror":[13],"device":[14],"(DMD)":[15],"is":[16],"described.":[17],"It":[18,33],"supports":[19,35],"1":[20],"M":[21],"sample/sec":[22],"stage":[23,64],"position":[24],"data":[25,74],"acquisition":[26],"high-speed":[28],"and":[29,72,100],"high-accuracy":[30],"generation.":[32],"also":[34,68],"arbitrary":[36],"pixel-level":[37],"masking":[38],"to":[39,62,79,89],"cancel":[40,63],"the":[41,50,54,57],"effect":[42],"DMD":[44,80,102],"manufacturing":[45],"variability.":[46],"We":[47,66],"have":[48,67],"developed":[49,69],"sliding":[51],"window":[52],"at":[53,97,105],"interface":[55],"frame":[58,103],"buffer":[59],"in":[60],"order":[61],"fluctuation.":[65],"a":[70],"fast":[71],"small":[73],"converter":[75],"from":[76],"binary":[77],"bitmap":[78],"format.":[81],"This":[82],"has":[85],"been":[86],"successfully":[87],"implemented":[88],"Stratix-II":[91],"EP2S180":[92],"with":[93],"max":[94,101],"clock":[95],"frequency":[96],"123.93":[98],"MHz":[99],"rate":[104],"1,202":[106],"frame/sec.":[107]},"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2013,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}