{"id":"https://openalex.org/W4200460771","doi":"https://doi.org/10.1109/essderc53440.2021.9631837","title":"Machine Learning Prediction of Defect Structures in Amorphous Silicon Dioxide","display_name":"Machine Learning Prediction of Defect Structures in Amorphous Silicon Dioxide","publication_year":2021,"publication_date":"2021-09-13","ids":{"openalex":"https://openalex.org/W4200460771","doi":"https://doi.org/10.1109/essderc53440.2021.9631837"},"language":"en","primary_location":{"id":"doi:10.1109/essderc53440.2021.9631837","is_oa":false,"landing_page_url":"https://doi.org/10.1109/essderc53440.2021.9631837","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ESSDERC 2021 - IEEE 51st European Solid-State Device Research Conference (ESSDERC)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5057210677","display_name":"Diego Milardovich","orcid":"https://orcid.org/0000-0003-2453-1693"},"institutions":[{"id":"https://openalex.org/I145847075","display_name":"TU Wien","ror":"https://ror.org/04d836q62","country_code":"AT","type":"education","lineage":["https://openalex.org/I145847075"]}],"countries":["AT"],"is_corresponding":false,"raw_author_name":"Diego Milardovich","raw_affiliation_strings":["Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040","institution_ids":["https://openalex.org/I145847075"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041086926","display_name":"Markus Jech","orcid":"https://orcid.org/0000-0003-3003-8168"},"institutions":[{"id":"https://openalex.org/I145847075","display_name":"TU Wien","ror":"https://ror.org/04d836q62","country_code":"AT","type":"education","lineage":["https://openalex.org/I145847075"]}],"countries":["AT"],"is_corresponding":false,"raw_author_name":"Markus Jech","raw_affiliation_strings":["Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040","institution_ids":["https://openalex.org/I145847075"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090077113","display_name":"Dominic Waldhoer","orcid":"https://orcid.org/0000-0002-8631-5681"},"institutions":[{"id":"https://openalex.org/I145847075","display_name":"TU Wien","ror":"https://ror.org/04d836q62","country_code":"AT","type":"education","lineage":["https://openalex.org/I145847075"]},{"id":"https://openalex.org/I4210105054","display_name":"Christian Doppler Laboratory for Thermoelectricity","ror":"https://ror.org/01cbw5x35","country_code":"AT","type":"facility","lineage":["https://openalex.org/I129774422","https://openalex.org/I145847075","https://openalex.org/I4210105054"]}],"countries":["AT"],"is_corresponding":false,"raw_author_name":"Dominic Waldhoer","raw_affiliation_strings":["Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040","Christian Doppler Laboratory for Single-Defect Spectroscopy in Semiconductor Devices, Vienna, Austria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040","institution_ids":["https://openalex.org/I145847075"]},{"raw_affiliation_string":"Christian Doppler Laboratory for Single-Defect Spectroscopy in Semiconductor Devices, Vienna, Austria","institution_ids":["https://openalex.org/I4210105054"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5022460576","display_name":"Al-Moatasem El-Sayed","orcid":"https://orcid.org/0000-0001-5191-1240"},"institutions":[{"id":"https://openalex.org/I145847075","display_name":"TU Wien","ror":"https://ror.org/04d836q62","country_code":"AT","type":"education","lineage":["https://openalex.org/I145847075"]},{"id":"https://openalex.org/I4210139004","display_name":"Nanolayers","ror":"https://ror.org/0462c0k61","country_code":"GB","type":"facility","lineage":["https://openalex.org/I4210139004"]}],"countries":["AT","GB"],"is_corresponding":false,"raw_author_name":"Al-Moatasem Bellah El-Sayed","raw_affiliation_strings":["Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040","Nanolayers Research Computing, Ltd., London, United Kingdom"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040","institution_ids":["https://openalex.org/I145847075"]},{"raw_affiliation_string":"Nanolayers Research Computing, Ltd., London, United Kingdom","institution_ids":["https://openalex.org/I4210139004"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5062594496","display_name":"Tibor Grasser","orcid":"https://orcid.org/0000-0001-6536-2238"},"institutions":[{"id":"https://openalex.org/I145847075","display_name":"TU Wien","ror":"https://ror.org/04d836q62","country_code":"AT","type":"education","lineage":["https://openalex.org/I145847075"]}],"countries":["AT"],"is_corresponding":false,"raw_author_name":"Tibor Grasser","raw_affiliation_strings":["Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Technische Universität Wien,Institute for Microelectronics,Vienna,Austria,1040","institution_ids":["https://openalex.org/I145847075"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.8647,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.75341595,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":97},"biblio":{"volume":null,"issue":null,"first_page":"239","last_page":"242"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11948","display_name":"Machine Learning in Materials Science","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11948","display_name":"Machine Learning in Materials Science","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9973999857902527,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/amorphous-solid","display_name":"Amorphous solid","score":0.6326093673706055},{"id":"https://openalex.org/keywords/workflow","display_name":"Workflow","score":0.6110612750053406},{"id":"https://openalex.org/keywords/noise","display_name":"Noise (video)","score":0.6103631854057312},{"id":"https://openalex.org/keywords/amorphous-silicon","display_name":"Amorphous silicon","score":0.5496639609336853},{"id":"https://openalex.org/keywords/amorphous-semiconductors","display_name":"Amorphous semiconductors","score":0.5323676466941833},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5089020729064941},{"id":"https://openalex.org/keywords/set","display_name":"Set (abstract data type)","score":0.46797898411750793},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.4678044617176056},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.46629709005355835},{"id":"https://openalex.org/keywords/task","display_name":"Task (project management)","score":0.4262791574001312},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.410840779542923},{"id":"https://openalex.org/keywords/machine-learning","display_name":"Machine learning","score":0.4105850160121918},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3839913606643677},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.35785454511642456},{"id":"https://openalex.org/keywords/crystalline-silicon","display_name":"Crystalline silicon","score":0.30896812677383423},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.21812060475349426},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.17778423428535461},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.1655201017856598},{"id":"https://openalex.org/keywords/crystallography","display_name":"Crystallography","score":0.13232839107513428}],"concepts":[{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.6326093673706055},{"id":"https://openalex.org/C177212765","wikidata":"https://www.wikidata.org/wiki/Q627335","display_name":"Workflow","level":2,"score":0.6110612750053406},{"id":"https://openalex.org/C99498987","wikidata":"https://www.wikidata.org/wiki/Q2210247","display_name":"Noise (video)","level":3,"score":0.6103631854057312},{"id":"https://openalex.org/C2776390347","wikidata":"https://www.wikidata.org/wiki/Q474163","display_name":"Amorphous silicon","level":4,"score":0.5496639609336853},{"id":"https://openalex.org/C2986957394","wikidata":"https://www.wikidata.org/wiki/Q474163","display_name":"Amorphous semiconductors","level":3,"score":0.5323676466941833},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5089020729064941},{"id":"https://openalex.org/C177264268","wikidata":"https://www.wikidata.org/wiki/Q1514741","display_name":"Set (abstract data type)","level":2,"score":0.46797898411750793},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.4678044617176056},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.46629709005355835},{"id":"https://openalex.org/C2780451532","wikidata":"https://www.wikidata.org/wiki/Q759676","display_name":"Task (project management)","level":2,"score":0.4262791574001312},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.410840779542923},{"id":"https://openalex.org/C119857082","wikidata":"https://www.wikidata.org/wiki/Q2539","display_name":"Machine learning","level":1,"score":0.4105850160121918},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3839913606643677},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.35785454511642456},{"id":"https://openalex.org/C2779667780","wikidata":"https://www.wikidata.org/wiki/Q18206302","display_name":"Crystalline silicon","level":3,"score":0.30896812677383423},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.21812060475349426},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.17778423428535461},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1655201017856598},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.13232839107513428},{"id":"https://openalex.org/C201995342","wikidata":"https://www.wikidata.org/wiki/Q682496","display_name":"Systems engineering","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C77088390","wikidata":"https://www.wikidata.org/wiki/Q8513","display_name":"Database","level":1,"score":0.0},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/essderc53440.2021.9631837","is_oa":false,"landing_page_url":"https://doi.org/10.1109/essderc53440.2021.9631837","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ESSDERC 2021 - IEEE 51st European Solid-State Device Research Conference (ESSDERC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":23,"referenced_works":["https://openalex.org/W176909285","https://openalex.org/W1975997599","https://openalex.org/W1981368803","https://openalex.org/W2006166977","https://openalex.org/W2014166972","https://openalex.org/W2019465613","https://openalex.org/W2023023112","https://openalex.org/W2029413789","https://openalex.org/W2067303788","https://openalex.org/W2101234009","https://openalex.org/W2105846921","https://openalex.org/W2151860561","https://openalex.org/W2159357141","https://openalex.org/W2468016554","https://openalex.org/W2550668110","https://openalex.org/W2565212977","https://openalex.org/W2797124026","https://openalex.org/W2896509645","https://openalex.org/W2976720228","https://openalex.org/W2989387189","https://openalex.org/W3095488726","https://openalex.org/W3103145119","https://openalex.org/W6675354045"],"related_works":["https://openalex.org/W2095015337","https://openalex.org/W2083321254","https://openalex.org/W2129859591","https://openalex.org/W2061728122","https://openalex.org/W2471284395","https://openalex.org/W2075339523","https://openalex.org/W2019622723","https://openalex.org/W2017099024","https://openalex.org/W385990669","https://openalex.org/W2089633568"],"abstract_inverted_index":{"Defects":[0],"in":[1,20,58,91,126],"insulators":[2],"can":[3],"have":[4,96],"a":[5,26,45,72,120,134],"highly":[6],"detrimental":[7],"impact":[8],"on":[9],"the":[10,32,52,67,79,86,112],"performance":[11],"of":[12,17,56,75,81,88,118],"semiconductor":[13],"devices.":[14],"The":[15,116],"study":[16],"defect":[18,122],"formation":[19,53,87],"these":[21],"amorphous":[22,59,92],"insulating":[23],"materials":[24],"is":[25,124],"computationally":[27],"challenging":[28],"task,":[29],"due":[30],"to":[31,50,85,100],"relatively":[33],"large":[34],"model":[35],"sizes":[36],"required":[37],"and":[38,54,106,128],"their":[39],"stochastic":[40],"nature.":[41],"Here,":[42],"we":[43],"propose":[44],"novel":[46],"machine":[47],"learning":[48],"framework":[49],"predict":[51],"structure":[55,123],"defects":[57,90],"materials.":[60],"Our":[61],"approach":[62],"aims":[63],"at":[64],"significantly":[65],"reducing":[66],"computational":[68],"costs,":[69],"while":[70],"maintaining":[71],"high":[73],"level":[74],"accuracy.":[76],"We":[77],"present":[78],"results":[80,130],"applying":[82],"our":[83],"workflow":[84],"hydroxyl$E^{\\prime}$center":[89],"silicon":[93],"dioxide,":[94],"which":[95],"recently":[97],"been":[98],"suggested":[99],"be":[101],"responsible":[102],"for":[103,133],"random":[104],"telegraph":[105],"1/f":[107],"noise,":[108],"as":[109,111],"well":[110],"bias":[113],"temperature":[114],"instability.":[115],"process":[117],"predicting":[119],"particular":[121],"studied":[125],"full-detail":[127],"statistical":[129],"are":[131],"presented":[132],"testing":[135],"data-set.":[136]},"counts_by_year":[{"year":2025,"cited_by_count":3},{"year":2023,"cited_by_count":1}],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}