{"id":"https://openalex.org/W2532234721","doi":"https://doi.org/10.1109/essderc.2016.7599604","title":"Performance and layout effects of SiGe channel in 14nm UTBB FDSOI: SiGe-first vs. SiGe-last integration","display_name":"Performance and layout effects of SiGe channel in 14nm UTBB FDSOI: SiGe-first vs. SiGe-last integration","publication_year":2016,"publication_date":"2016-09-01","ids":{"openalex":"https://openalex.org/W2532234721","doi":"https://doi.org/10.1109/essderc.2016.7599604","mag":"2532234721"},"language":"en","primary_location":{"id":"doi:10.1109/essderc.2016.7599604","is_oa":false,"landing_page_url":"https://doi.org/10.1109/essderc.2016.7599604","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2016 46th European Solid-State Device Research Conference (ESSDERC)","raw_type":"proceedings-article"},"type":"preprint","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109433803","display_name":"R. Berthelon","orcid":null},"institutions":[{"id":"https://openalex.org/I106785703","display_name":"Institut polytechnique de Grenoble","ror":"https://ror.org/05sbt2524","country_code":"FR","type":"education","lineage":["https://openalex.org/I106785703","https://openalex.org/I899635006"]},{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I4210117989","display_name":"Direction de la Recherche Technologique","ror":"https://ror.org/02ggzyd20","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989"]},{"id":"https://openalex.org/I4210135147","display_name":"Centre d\u2019\u00c9laboration de Mat\u00e9riaux et d\u2019\u00c9tudes Structurales","ror":"https://ror.org/03kwnqq69","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I134560555","https://openalex.org/I196454796","https://openalex.org/I196454796","https://openalex.org/I4210098836","https://openalex.org/I4210135147","https://openalex.org/I4388446414","https://openalex.org/I4405258862","https://openalex.org/I4405258862","https://openalex.org/I4405258862"]}],"countries":["FR"],"is_corresponding":true,"raw_author_name":"R. Berthelon","raw_affiliation_strings":["CEA-LETL Minatec campus, Grenoble, France","CEMES-CNRS, France","S'TMicroelectronics, Crolles, France"],"affiliations":[{"raw_affiliation_string":"CEA-LETL Minatec campus, Grenoble, France","institution_ids":["https://openalex.org/I3020098449","https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I106785703"]},{"raw_affiliation_string":"CEMES-CNRS, France","institution_ids":["https://openalex.org/I4210135147","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"S'TMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5105986506","display_name":"F. Andrieu","orcid":null},"institutions":[{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210117989","display_name":"Direction de la Recherche Technologique","ror":"https://ror.org/02ggzyd20","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989"]},{"id":"https://openalex.org/I106785703","display_name":"Institut polytechnique de Grenoble","ror":"https://ror.org/05sbt2524","country_code":"FR","type":"education","lineage":["https://openalex.org/I106785703","https://openalex.org/I899635006"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"F. Andrieu","raw_affiliation_strings":["CEA-LETL Minatec campus, Grenoble, France"],"affiliations":[{"raw_affiliation_string":"CEA-LETL Minatec campus, Grenoble, France","institution_ids":["https://openalex.org/I3020098449","https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I106785703"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073081906","display_name":"P. Perreau","orcid":null},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I106785703","display_name":"Institut polytechnique de Grenoble","ror":"https://ror.org/05sbt2524","country_code":"FR","type":"education","lineage":["https://openalex.org/I106785703","https://openalex.org/I899635006"]},{"id":"https://openalex.org/I4210117989","display_name":"Direction de la Recherche Technologique","ror":"https://ror.org/02ggzyd20","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"P. Perreau","raw_affiliation_strings":["CEA-LETL Minatec campus, Grenoble, France"],"affiliations":[{"raw_affiliation_string":"CEA-LETL Minatec campus, Grenoble, France","institution_ids":["https://openalex.org/I3020098449","https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I106785703"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044652440","display_name":"E. Baylac","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"E. Baylac","raw_affiliation_strings":["S'TMicroelectronics, Crolles, France"],"affiliations":[{"raw_affiliation_string":"S'TMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081222743","display_name":"Alexandre Pofelski","orcid":"https://orcid.org/0000-0002-4653-9197"},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"A. Pofelski","raw_affiliation_strings":["S'TMicroelectronics, Crolles, France"],"affiliations":[{"raw_affiliation_string":"S'TMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5091355788","display_name":"E. Josse","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"E. Josse","raw_affiliation_strings":["STMicroelectronics, Crolles, FR"],"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, FR","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109943665","display_name":"D. Dutartre","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"D. Dutartre","raw_affiliation_strings":["S'TMicroelectronics, Crolles, France"],"affiliations":[{"raw_affiliation_string":"S'TMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024168567","display_name":"A. Claverie","orcid":"https://orcid.org/0000-0003-2211-4618"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210135147","display_name":"Centre d\u2019\u00c9laboration de Mat\u00e9riaux et d\u2019\u00c9tudes Structurales","ror":"https://ror.org/03kwnqq69","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I134560555","https://openalex.org/I196454796","https://openalex.org/I196454796","https://openalex.org/I4210098836","https://openalex.org/I4210135147","https://openalex.org/I4388446414","https://openalex.org/I4405258862","https://openalex.org/I4405258862","https://openalex.org/I4405258862"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"A. Claverie","raw_affiliation_strings":["CEMES-CNRS, France"],"affiliations":[{"raw_affiliation_string":"CEMES-CNRS, France","institution_ids":["https://openalex.org/I4210135147","https://openalex.org/I1294671590"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5017016818","display_name":"M. Haond","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"M. Haond","raw_affiliation_strings":["S'TMicroelectronics, Crolles, France"],"affiliations":[{"raw_affiliation_string":"S'TMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":9,"corresponding_author_ids":["https://openalex.org/A5109433803"],"corresponding_institution_ids":["https://openalex.org/I106785703","https://openalex.org/I4210104693","https://openalex.org/I1294671590","https://openalex.org/I2738703131","https://openalex.org/I3020098449","https://openalex.org/I4210117989","https://openalex.org/I4210135147"],"apc_list":null,"apc_paid":null,"fwci":0.31904403,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.67466818,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"127","last_page":"130"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6896133422851562},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6293827295303345},{"id":"https://openalex.org/keywords/silicon-germanium","display_name":"Silicon-germanium","score":0.6288155317306519},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"Silicon on insulator","score":0.5169196128845215},{"id":"https://openalex.org/keywords/channel","display_name":"Channel (broadcasting)","score":0.4986276626586914},{"id":"https://openalex.org/keywords/electron-mobility","display_name":"Electron mobility","score":0.4531380236148834},{"id":"https://openalex.org/keywords/epitaxy","display_name":"Epitaxy","score":0.44395965337753296},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4046354293823242},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2920798063278198},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.2644301652908325},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.25371038913726807},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.15082114934921265},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.12437471747398376}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6896133422851562},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6293827295303345},{"id":"https://openalex.org/C2780389399","wikidata":"https://www.wikidata.org/wiki/Q367849","display_name":"Silicon-germanium","level":3,"score":0.6288155317306519},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.5169196128845215},{"id":"https://openalex.org/C127162648","wikidata":"https://www.wikidata.org/wiki/Q16858953","display_name":"Channel (broadcasting)","level":2,"score":0.4986276626586914},{"id":"https://openalex.org/C106782819","wikidata":"https://www.wikidata.org/wiki/Q6501076","display_name":"Electron mobility","level":2,"score":0.4531380236148834},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.44395965337753296},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4046354293823242},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2920798063278198},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.2644301652908325},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.25371038913726807},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.15082114934921265},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.12437471747398376}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/essderc.2016.7599604","is_oa":false,"landing_page_url":"https://doi.org/10.1109/essderc.2016.7599604","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2016 46th European Solid-State Device Research Conference (ESSDERC)","raw_type":"proceedings-article"},{"id":"pmh:oai:HAL:hal-01719492v1","is_oa":false,"landing_page_url":"https://hal.science/hal-01719492","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL (Le Centre pour la Communication Scientifique Directe)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I1294671590","host_organization_name":"Centre National de la Recherche Scientifique","host_organization_lineage":["https://openalex.org/I1294671590"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Solid-State Device Research Conference (ESSDERC), 2016 46th European, 2016, Unknown, Unknown Region. pp.127-130, ⟨10.1109/ESSDERC.2016.7599604⟩","raw_type":"Conference papers"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":14,"referenced_works":["https://openalex.org/W1551913864","https://openalex.org/W1963638400","https://openalex.org/W1997960370","https://openalex.org/W2024820277","https://openalex.org/W2040773322","https://openalex.org/W2055593676","https://openalex.org/W2081421305","https://openalex.org/W2154869256","https://openalex.org/W2307660729","https://openalex.org/W2538527511","https://openalex.org/W2544418166","https://openalex.org/W2546770439","https://openalex.org/W6728924860","https://openalex.org/W6729357885"],"related_works":["https://openalex.org/W2104300577","https://openalex.org/W4206445530","https://openalex.org/W2771786520","https://openalex.org/W2034653092","https://openalex.org/W2174354966","https://openalex.org/W2810180604","https://openalex.org/W2325281603","https://openalex.org/W2944964251","https://openalex.org/W1599330255","https://openalex.org/W2052287872"],"abstract_inverted_index":{"cited":[0],"By":[1],"0":[2]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2018,"cited_by_count":2}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}