{"id":"https://openalex.org/W2170020313","doi":"https://doi.org/10.1109/esscirc.2003.1257208","title":"Low voltage, high-Q SOI MEMS varactors for RF applications","display_name":"Low voltage, high-Q SOI MEMS varactors for RF applications","publication_year":2004,"publication_date":"2004-07-20","ids":{"openalex":"https://openalex.org/W2170020313","doi":"https://doi.org/10.1109/esscirc.2003.1257208","mag":"2170020313"},"language":"en","primary_location":{"id":"doi:10.1109/esscirc.2003.1257208","is_oa":false,"landing_page_url":"https://doi.org/10.1109/esscirc.2003.1257208","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ESSCIRC 2004 - 29th European Solid-State Circuits Conference (IEEE Cat. No.03EX705)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://orbit.dtu.dk/en/publications/0d599547-b8b8-41e4-86f9-beca53d94279","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5073305333","display_name":"Arda D. Yal\u00e7\u0131nkaya","orcid":"https://orcid.org/0000-0002-6603-1198"},"institutions":[{"id":"https://openalex.org/I96673099","display_name":"Technical University of Denmark","ror":"https://ror.org/04qtj9h94","country_code":"DK","type":"education","lineage":["https://openalex.org/I96673099"]}],"countries":["DK"],"is_corresponding":true,"raw_author_name":"A.D. Yalcinkaya","raw_affiliation_strings":["Mikroelektronik Centret (MIC), Technical University of Denmark, Kongens Lyngby, Denmark"],"affiliations":[{"raw_affiliation_string":"Mikroelektronik Centret (MIC), Technical University of Denmark, Kongens Lyngby, Denmark","institution_ids":["https://openalex.org/I96673099"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101685671","display_name":"S\u00f8ren H\u00f8jgaard Jensen","orcid":"https://orcid.org/0000-0001-8418-1408"},"institutions":[{"id":"https://openalex.org/I96673099","display_name":"Technical University of Denmark","ror":"https://ror.org/04qtj9h94","country_code":"DK","type":"education","lineage":["https://openalex.org/I96673099"]}],"countries":["DK"],"is_corresponding":false,"raw_author_name":"S. Jensen","raw_affiliation_strings":["Mikroelektronik Centret (MIC), Technical University of Denmark, Kongens Lyngby, Denmark"],"affiliations":[{"raw_affiliation_string":"Mikroelektronik Centret (MIC), Technical University of Denmark, Kongens Lyngby, Denmark","institution_ids":["https://openalex.org/I96673099"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5089737511","display_name":"Ole Hansen","orcid":"https://orcid.org/0000-0002-6090-8323"},"institutions":[{"id":"https://openalex.org/I96673099","display_name":"Technical University of Denmark","ror":"https://ror.org/04qtj9h94","country_code":"DK","type":"education","lineage":["https://openalex.org/I96673099"]}],"countries":["DK"],"is_corresponding":false,"raw_author_name":"O. Hansen","raw_affiliation_strings":["Mikroelektronik Centret (MIC), Technical University of Denmark, Kongens Lyngby, Denmark"],"affiliations":[{"raw_affiliation_string":"Mikroelektronik Centret (MIC), Technical University of Denmark, Kongens Lyngby, Denmark","institution_ids":["https://openalex.org/I96673099"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5073305333"],"corresponding_institution_ids":["https://openalex.org/I96673099"],"apc_list":null,"apc_paid":null,"fwci":0.3388,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.67119611,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"103","issue":null,"first_page":"607","last_page":"610"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11449","display_name":"Mechanical and Optical Resonators","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/deep-reactive-ion-etching","display_name":"Deep reactive-ion etching","score":0.8244125247001648},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.7659592628479004},{"id":"https://openalex.org/keywords/varicap","display_name":"Varicap","score":0.7209712266921997},{"id":"https://openalex.org/keywords/capacitance","display_name":"Capacitance","score":0.6504145860671997},{"id":"https://openalex.org/keywords/capacitor","display_name":"Capacitor","score":0.6249238848686218},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.5944218039512634},{"id":"https://openalex.org/keywords/microelectromechanical-systems","display_name":"Microelectromechanical systems","score":0.5092450380325317},{"id":"https://openalex.org/keywords/q-factor","display_name":"Q factor","score":0.5064200162887573},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.5015408992767334},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"Silicon on insulator","score":0.4488365054130554},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.4107872247695923},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.3630964756011963},{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"Reactive-ion etching","score":0.3452186584472656},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.3009720742702484},{"id":"https://openalex.org/keywords/resonator","display_name":"Resonator","score":0.1975092887878418},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.18106460571289062},{"id":"https://openalex.org/keywords/electrode","display_name":"Electrode","score":0.11575350165367126},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.110894113779068},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.11004781723022461},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.10527345538139343}],"concepts":[{"id":"https://openalex.org/C124634506","wikidata":"https://www.wikidata.org/wiki/Q486936","display_name":"Deep reactive-ion etching","level":5,"score":0.8244125247001648},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7659592628479004},{"id":"https://openalex.org/C15485314","wikidata":"https://www.wikidata.org/wiki/Q467463","display_name":"Varicap","level":4,"score":0.7209712266921997},{"id":"https://openalex.org/C30066665","wikidata":"https://www.wikidata.org/wiki/Q164399","display_name":"Capacitance","level":3,"score":0.6504145860671997},{"id":"https://openalex.org/C52192207","wikidata":"https://www.wikidata.org/wiki/Q5322","display_name":"Capacitor","level":3,"score":0.6249238848686218},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5944218039512634},{"id":"https://openalex.org/C37977207","wikidata":"https://www.wikidata.org/wiki/Q175561","display_name":"Microelectromechanical systems","level":2,"score":0.5092450380325317},{"id":"https://openalex.org/C187725362","wikidata":"https://www.wikidata.org/wiki/Q830521","display_name":"Q factor","level":3,"score":0.5064200162887573},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.5015408992767334},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.4488365054130554},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.4107872247695923},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3630964756011963},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.3452186584472656},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.3009720742702484},{"id":"https://openalex.org/C97126364","wikidata":"https://www.wikidata.org/wiki/Q349669","display_name":"Resonator","level":2,"score":0.1975092887878418},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.18106460571289062},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.11575350165367126},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.110894113779068},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.11004781723022461},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.10527345538139343},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/esscirc.2003.1257208","is_oa":false,"landing_page_url":"https://doi.org/10.1109/esscirc.2003.1257208","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ESSCIRC 2004 - 29th European Solid-State Circuits Conference (IEEE Cat. No.03EX705)","raw_type":"proceedings-article"},{"id":"pmh:oai:pure.atira.dk:publications/0d599547-b8b8-41e4-86f9-beca53d94279","is_oa":true,"landing_page_url":"https://orbit.dtu.dk/en/publications/0d599547-b8b8-41e4-86f9-beca53d94279","pdf_url":null,"source":{"id":"https://openalex.org/S4306400705","display_name":"Technical University of Denmark, DTU Orbit (Technical University of Denmark, DTU)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I96673099","host_organization_name":"Technical University of Denmark","host_organization_lineage":["https://openalex.org/I96673099"],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Yalcinkaya , A D , Jensen , S & Hansen , O 2003 , Low Voltage, High-Q SOI MEMS Varactors for RF Applications . in Proceedings of the 29th EuropeanSolid-State Circuits Conference (ESSCIRC) . IEEE , 29th European Solid-State Circuits Conference , Estoril , Portugal , 16/09/2003 . https://doi.org/10.1109/ESSCIRC.2003.1257208","raw_type":"contributionToPeriodical"}],"best_oa_location":{"id":"pmh:oai:pure.atira.dk:publications/0d599547-b8b8-41e4-86f9-beca53d94279","is_oa":true,"landing_page_url":"https://orbit.dtu.dk/en/publications/0d599547-b8b8-41e4-86f9-beca53d94279","pdf_url":null,"source":{"id":"https://openalex.org/S4306400705","display_name":"Technical University of Denmark, DTU Orbit (Technical University of Denmark, DTU)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I96673099","host_organization_name":"Technical University of Denmark","host_organization_lineage":["https://openalex.org/I96673099"],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Yalcinkaya , A D , Jensen , S & Hansen , O 2003 , Low Voltage, High-Q SOI MEMS Varactors for RF Applications . in Proceedings of the 29th EuropeanSolid-State Circuits Conference (ESSCIRC) . IEEE , 29th European Solid-State Circuits Conference , Estoril , Portugal , 16/09/2003 . https://doi.org/10.1109/ESSCIRC.2003.1257208","raw_type":"contributionToPeriodical"},"sustainable_development_goals":[{"score":0.800000011920929,"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W2047117695","https://openalex.org/W2069854651","https://openalex.org/W2122502010","https://openalex.org/W2124759908","https://openalex.org/W2162439313","https://openalex.org/W4285719527"],"related_works":["https://openalex.org/W2507729704","https://openalex.org/W3163667899","https://openalex.org/W2360464821","https://openalex.org/W1504164758","https://openalex.org/W2014359839","https://openalex.org/W2027983671","https://openalex.org/W2512909473","https://openalex.org/W1997614918","https://openalex.org/W2119253874","https://openalex.org/W2018237554"],"abstract_inverted_index":{"A":[0,24],"micro":[1],"electromechanical":[2],"tunable":[3],"capacitor":[4,138],"with":[5,21,47],"a":[6,10,64,85,95,147],"low":[7],"control":[8,120],"voltage,":[9],"wide":[11],"tuning":[12,127],"range":[13],"and":[14,84,132,169],"high":[15,167,171],"electrical":[16,77],"quality":[17,78],"factor":[18,79],"is":[19,109,146],"presented":[20],"detailed":[22],"characterizations.":[23],"50/spl":[25],"mu/m":[26],"thick":[27],"single-crystalline":[28],"silicon":[29],"layer":[30],"was":[31,141],"etched":[32],"using":[33],"deep":[34],"reactive":[35],"ion":[36],"etching":[37],"(DRIE)":[38],"for":[39],"obtaining":[40],"high-aspect":[41],"ratio":[42],"(>20)":[43],"parallel":[44],"comb-drive":[45],"structures":[46],"vertical":[48],"sidewalls.":[49],"Consisting":[50],"of":[51,70,80,106,129],"only":[52],"one":[53],"lithographic":[54],"mask":[55],"step,":[56],"the":[57,73,92,99,107,144,165],"process":[58],"sequence":[59],"can":[60],"be":[61,112,152],"completed":[62],"in":[63,98,116,154],"short":[65],"time.":[66],"Having":[67],"1":[68],"pF":[69],"nominal":[71],"capacitance,":[72],"device":[74,145],"offers":[75],"an":[76],"100":[81],"at":[82,88],"100MHz":[83],"self":[86],"resonance":[87],"4.08":[89],"GHz,":[90],"enabling":[91],"usage":[93],"as":[94],"passive":[96,149],"component":[97,150],"RF":[100],"band.":[101],"The":[102],"mechanical":[103],"settling":[104],"time":[105],"varactor":[108],"measured":[110],"to":[111,125,151],"200":[113],"/spl":[114],"mu/s":[115],"ambient":[117],"air.":[118],"For":[119],"voltages":[121],"ranging":[122],"from":[123,136],"1.5V":[124],"5V,":[126],"ratios":[128],"2:1,":[130],"1.7:1":[131],"1.5:1":[133],"are":[134],"obtained":[135],"different":[137],"designs.":[139],"It":[140],"found":[142],"that":[143],"suitable":[148],"used":[153],"band-pass":[155],"filtering,":[156],"voltage":[157],"controlled":[158],"oscillator":[159],"or":[160],"impedance":[161],"matching":[162],"applications":[163],"on":[164],"very":[166],"frequency(VHF)":[168],"ultra":[170],"frequency":[172],"(UHF)":[173],"bands.":[174]},"counts_by_year":[],"updated_date":"2026-04-04T16:13:02.066488","created_date":"2025-10-10T00:00:00"}