{"id":"https://openalex.org/W2799181071","doi":"https://doi.org/10.1109/ecoc.2017.8346203","title":"Challenges in Silicon Photonics Process Technology","display_name":"Challenges in Silicon Photonics Process Technology","publication_year":2017,"publication_date":"2017-09-01","ids":{"openalex":"https://openalex.org/W2799181071","doi":"https://doi.org/10.1109/ecoc.2017.8346203","mag":"2799181071"},"language":"en","primary_location":{"id":"doi:10.1109/ecoc.2017.8346203","is_oa":false,"landing_page_url":"https://doi.org/10.1109/ecoc.2017.8346203","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2017 European Conference on Optical Communication (ECOC)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5091096177","display_name":"F. B\u0153uf","orcid":"https://orcid.org/0000-0002-1710-5170"},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Frederic Boeuf","raw_affiliation_strings":["STMicroelectronics, Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5107881222","display_name":"Nathalie Vulliet","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Nathalie Vulliet","raw_affiliation_strings":["STMicroelectronics, Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108115065","display_name":"Charles Baudot","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Charles Baudot","raw_affiliation_strings":["STMicroelectronics, Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5105537176","display_name":"Sonia Messaoud\u00e8ne","orcid":null},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Sonia Messaoudene","raw_affiliation_strings":["CEA-LETI, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI, Grenoble, France","institution_ids":["https://openalex.org/I4210150049","https://openalex.org/I3020098449","https://openalex.org/I2738703131"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044652440","display_name":"E. Baylac","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Elise Baylac","raw_affiliation_strings":["STMicroelectronics, Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110162262","display_name":"S. Cr\u00e9mer","orcid":null},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Sebastien Cremer","raw_affiliation_strings":["STMicroelectronics, Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.21013016,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":95,"max":98},"biblio":{"volume":"9780","issue":null,"first_page":"1","last_page":"3"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10666","display_name":"Photonic Crystals and Applications","score":0.9987000226974487,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11429","display_name":"Semiconductor Lasers and Optical Devices","score":0.9980999827384949,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photonics","display_name":"Photonics","score":0.7627852559089661},{"id":"https://openalex.org/keywords/silicon-photonics","display_name":"Silicon photonics","score":0.6679675579071045},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.608098030090332},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5837486982345581},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.5578201413154602},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4962213635444641},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.4591488242149353},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.42824786901474},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.4218944311141968},{"id":"https://openalex.org/keywords/process-integration","display_name":"Process integration","score":0.4135812520980835},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3032863140106201},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.2781752347946167},{"id":"https://openalex.org/keywords/process-engineering","display_name":"Process engineering","score":0.08549106121063232}],"concepts":[{"id":"https://openalex.org/C20788544","wikidata":"https://www.wikidata.org/wiki/Q467054","display_name":"Photonics","level":2,"score":0.7627852559089661},{"id":"https://openalex.org/C119423029","wikidata":"https://www.wikidata.org/wiki/Q3749103","display_name":"Silicon photonics","level":3,"score":0.6679675579071045},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.608098030090332},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5837486982345581},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.5578201413154602},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4962213635444641},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.4591488242149353},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.42824786901474},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4218944311141968},{"id":"https://openalex.org/C54725748","wikidata":"https://www.wikidata.org/wiki/Q7247277","display_name":"Process integration","level":2,"score":0.4135812520980835},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3032863140106201},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2781752347946167},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.08549106121063232},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/ecoc.2017.8346203","is_oa":false,"landing_page_url":"https://doi.org/10.1109/ecoc.2017.8346203","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2017 European Conference on Optical Communication (ECOC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/9","score":0.4399999976158142,"display_name":"Industry, innovation and infrastructure"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1457668193","https://openalex.org/W1984574682","https://openalex.org/W2009851753","https://openalex.org/W2019593748","https://openalex.org/W2028653855","https://openalex.org/W2184755054","https://openalex.org/W2322129078","https://openalex.org/W2525632257","https://openalex.org/W2567578621","https://openalex.org/W2583408672","https://openalex.org/W2583623455","https://openalex.org/W6700422111"],"related_works":["https://openalex.org/W2004137893","https://openalex.org/W2095448063","https://openalex.org/W2527131166","https://openalex.org/W3111305937","https://openalex.org/W587555549","https://openalex.org/W2296085454","https://openalex.org/W2472927059","https://openalex.org/W2989093732","https://openalex.org/W4232630919","https://openalex.org/W3021235062"],"abstract_inverted_index":{"In":[0],"this":[1],"paper":[2],"we":[3],"discuss":[4],"the":[5,14],"specific":[6],"challenges":[7],"of":[8,11],"process":[9],"integration":[10],"Si-Photonics":[12],"for":[13],"current":[15],"and":[16,22],"future":[17],"applications,":[18],"including":[19],"lithography,":[20],"etching":[21],"heterogeneous":[23],"materials":[24],"integration.":[25]},"counts_by_year":[{"year":2026,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}