{"id":"https://openalex.org/W2136317727","doi":"https://doi.org/10.1109/date.2011.5763289","title":"3D-ICML: A 3D bipolar ReRAM design with interleaved complementary memory layers","display_name":"3D-ICML: A 3D bipolar ReRAM design with interleaved complementary memory layers","publication_year":2011,"publication_date":"2011-03-01","ids":{"openalex":"https://openalex.org/W2136317727","doi":"https://doi.org/10.1109/date.2011.5763289","mag":"2136317727"},"language":"en","primary_location":{"id":"doi:10.1109/date.2011.5763289","is_oa":false,"landing_page_url":"https://doi.org/10.1109/date.2011.5763289","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2011 Design, Automation & Test in Europe","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5023625406","display_name":"Yi\u2010Chung Chen","orcid":"https://orcid.org/0000-0003-0353-7340"},"institutions":[{"id":"https://openalex.org/I170201317","display_name":"University of Pittsburgh","ror":"https://ror.org/01an3r305","country_code":"US","type":"education","lineage":["https://openalex.org/I170201317"]},{"id":"https://openalex.org/I57206974","display_name":"New York University","ror":"https://ror.org/0190ak572","country_code":"US","type":"education","lineage":["https://openalex.org/I57206974"]},{"id":"https://openalex.org/I90965887","display_name":"SUNY Polytechnic Institute","ror":"https://ror.org/000fxgx19","country_code":"US","type":"education","lineage":["https://openalex.org/I90965887"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yi-Chung Chen","raw_affiliation_strings":["Department of ECE, Polytechnic Institute of New york University, Brooklyn, NY, USA","Department of ECE, University of Pittsburgh, Pittsburgh, PA, USA","[Dept. of ECE, Polytechnic Institute of NYU, Brooklyn, NY, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of ECE, Polytechnic Institute of New york University, Brooklyn, NY, USA","institution_ids":["https://openalex.org/I90965887"]},{"raw_affiliation_string":"Department of ECE, University of Pittsburgh, Pittsburgh, PA, USA","institution_ids":["https://openalex.org/I170201317"]},{"raw_affiliation_string":"[Dept. of ECE, Polytechnic Institute of NYU, Brooklyn, NY, USA]","institution_ids":["https://openalex.org/I57206974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100429403","display_name":"Hai Li","orcid":"https://orcid.org/0000-0003-3228-6544"},"institutions":[{"id":"https://openalex.org/I57206974","display_name":"New York University","ror":"https://ror.org/0190ak572","country_code":"US","type":"education","lineage":["https://openalex.org/I57206974"]},{"id":"https://openalex.org/I90965887","display_name":"SUNY Polytechnic Institute","ror":"https://ror.org/000fxgx19","country_code":"US","type":"education","lineage":["https://openalex.org/I90965887"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hai Li","raw_affiliation_strings":["Department of ECE, Polytechnic Institute of New york University, Brooklyn, NY, USA","[Dept. of ECE, Polytechnic Institute of NYU, Brooklyn, NY, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of ECE, Polytechnic Institute of New york University, Brooklyn, NY, USA","institution_ids":["https://openalex.org/I90965887"]},{"raw_affiliation_string":"[Dept. of ECE, Polytechnic Institute of NYU, Brooklyn, NY, USA]","institution_ids":["https://openalex.org/I57206974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058073627","display_name":"Yiran Chen","orcid":"https://orcid.org/0000-0002-1486-8412"},"institutions":[{"id":"https://openalex.org/I170201317","display_name":"University of Pittsburgh","ror":"https://ror.org/01an3r305","country_code":"US","type":"education","lineage":["https://openalex.org/I170201317"]},{"id":"https://openalex.org/I90965887","display_name":"SUNY Polytechnic Institute","ror":"https://ror.org/000fxgx19","country_code":"US","type":"education","lineage":["https://openalex.org/I90965887"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yiran Chen","raw_affiliation_strings":["Department of ECE, Polytechnic Institute of New york University, Brooklyn, NY, USA","Department of ECE, University of Pittsburgh, Pittsburgh, PA, USA","Dept. of ECE, Univ. of Pittsburgh, Pittsburgh, PA, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of ECE, Polytechnic Institute of New york University, Brooklyn, NY, USA","institution_ids":["https://openalex.org/I90965887"]},{"raw_affiliation_string":"Department of ECE, University of Pittsburgh, Pittsburgh, PA, USA","institution_ids":["https://openalex.org/I170201317"]},{"raw_affiliation_string":"Dept. of ECE, Univ. of Pittsburgh, Pittsburgh, PA, USA","institution_ids":["https://openalex.org/I170201317"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5109848389","display_name":"Robinson E. Pino","orcid":null},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R E Pino","raw_affiliation_strings":["Air Force Research Laboratory, Rome, NY, USA","Air Force Research Laboratory, Advanced Computing, Rome, NY, USA#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Air Force Research Laboratory, Rome, NY, USA","institution_ids":["https://openalex.org/I1280414376"]},{"raw_affiliation_string":"Air Force Research Laboratory, Advanced Computing, Rome, NY, USA#TAB#","institution_ids":["https://openalex.org/I1280414376"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.3425,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.80039946,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/resistive-random-access-memory","display_name":"Resistive random-access memory","score":0.9284888505935669},{"id":"https://openalex.org/keywords/scalability","display_name":"Scalability","score":0.6252354383468628},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.5583956837654114},{"id":"https://openalex.org/keywords/non-volatile-memory","display_name":"Non-volatile memory","score":0.5226193070411682},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.48590460419654846},{"id":"https://openalex.org/keywords/random-access-memory","display_name":"Random access memory","score":0.4724804759025574},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.43220311403274536},{"id":"https://openalex.org/keywords/semiconductor-memory","display_name":"Semiconductor memory","score":0.4227829575538635},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.3807539939880371},{"id":"https://openalex.org/keywords/computer-hardware","display_name":"Computer hardware","score":0.2527487874031067},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.24706199765205383},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.1078592836856842},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.0858164131641388}],"concepts":[{"id":"https://openalex.org/C182019814","wikidata":"https://www.wikidata.org/wiki/Q1143830","display_name":"Resistive random-access memory","level":3,"score":0.9284888505935669},{"id":"https://openalex.org/C48044578","wikidata":"https://www.wikidata.org/wiki/Q727490","display_name":"Scalability","level":2,"score":0.6252354383468628},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.5583956837654114},{"id":"https://openalex.org/C177950962","wikidata":"https://www.wikidata.org/wiki/Q10997658","display_name":"Non-volatile memory","level":2,"score":0.5226193070411682},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.48590460419654846},{"id":"https://openalex.org/C2994168587","wikidata":"https://www.wikidata.org/wiki/Q5295","display_name":"Random access memory","level":2,"score":0.4724804759025574},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.43220311403274536},{"id":"https://openalex.org/C98986596","wikidata":"https://www.wikidata.org/wiki/Q1143031","display_name":"Semiconductor memory","level":2,"score":0.4227829575538635},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3807539939880371},{"id":"https://openalex.org/C9390403","wikidata":"https://www.wikidata.org/wiki/Q3966","display_name":"Computer hardware","level":1,"score":0.2527487874031067},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.24706199765205383},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.1078592836856842},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0858164131641388},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C77088390","wikidata":"https://www.wikidata.org/wiki/Q8513","display_name":"Database","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/date.2011.5763289","is_oa":false,"landing_page_url":"https://doi.org/10.1109/date.2011.5763289","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2011 Design, Automation & Test in Europe","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","id":"https://metadata.un.org/sdg/7","score":0.4399999976158142}],"awards":[],"funders":[{"id":"https://openalex.org/F4320337253","display_name":"Instituto de Ciencias del Mar y Limnolog\u00eda, Universidad Nacional Aut\u00f3noma de M\u00e9xico","ror":null},{"id":"https://openalex.org/F4320338294","display_name":"Air Force Research Laboratory","ror":"https://ror.org/02e2egq70"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":17,"referenced_works":["https://openalex.org/W1570060921","https://openalex.org/W1826027646","https://openalex.org/W2026362651","https://openalex.org/W2031176269","https://openalex.org/W2045197688","https://openalex.org/W2064756415","https://openalex.org/W2073477462","https://openalex.org/W2080564856","https://openalex.org/W2101587312","https://openalex.org/W2116344741","https://openalex.org/W2124039127","https://openalex.org/W2158520123","https://openalex.org/W2543446546","https://openalex.org/W4232132130","https://openalex.org/W6634212967","https://openalex.org/W6677325608","https://openalex.org/W6678566499"],"related_works":["https://openalex.org/W2076211355","https://openalex.org/W2007070351","https://openalex.org/W2033811947","https://openalex.org/W2183989414","https://openalex.org/W1551399929","https://openalex.org/W2038212394","https://openalex.org/W2533127403","https://openalex.org/W3209704453","https://openalex.org/W2024190459","https://openalex.org/W2917388298"],"abstract_inverted_index":{"Resistive":[0],"random":[1],"access":[2],"memory":[3,12,44,69,76,89,105,109,126],"(ReRAM)":[4],"has":[5],"been":[6],"demonstrated":[7],"as":[8,17],"a":[9,60,75],"promising":[10],"non-volatile":[11],"technology":[13],"with":[14,66],"features":[15],"such":[16],"high":[18],"density,":[19],"low":[20],"power,":[21],"good":[22],"scalability,":[23],"easy":[24],"fabrication":[25,101],"and":[26,103,113],"compatibility":[27],"to":[28],"the":[29,119,125],"existing":[30],"CMOS":[31],"technology.":[32],"The":[33,81],"conventional":[34],"three-dimensional":[35],"(3D)":[36],"bipolar":[37,63],"ReRAM":[38,64],"design":[39,65,98],"usually":[40],"stacks":[41],"up":[42],"multiple":[43,108],"layers":[45,70,90],"that":[46],"are":[47],"separated":[48],"by":[49],"isolation":[50],"layers,":[51],"e.g.":[52],"Spin-on-Glass":[53],"(SOG).":[54],"In":[55],"this":[56],"paper,":[57],"we":[58],"propose":[59],"new":[61],"3D":[62],"interleaved":[67],"complimentary":[68],"(3D-ICML)":[71],"which":[72,122],"can":[73,94,99,115],"form":[74],"island":[77],"without":[78],"any":[79],"isolation.":[80],"set":[82],"of":[83],"metal":[84],"wires":[85],"between":[86],"two":[87],"adjacent":[88],"in":[91],"vertical":[92],"direction":[93],"be":[95,116],"shared.":[96],"3D-ICML":[97],"reduce":[100],"complexity":[102],"increase":[104],"density.":[106],"Meanwhile,":[107],"cells":[110],"interconnected":[111],"horizontally":[112],"vertically":[114],"accessed":[117],"at":[118],"same":[120],"time,":[121],"dramatically":[123],"increases":[124],"bandwidth.":[127]},"counts_by_year":[{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}