{"id":"https://openalex.org/W4414198760","doi":"https://doi.org/10.1109/dac63849.2025.11133367","title":"Curvilinear Optical Proximity Correction via Cardinal Spline","display_name":"Curvilinear Optical Proximity Correction via Cardinal Spline","publication_year":2025,"publication_date":"2025-06-22","ids":{"openalex":"https://openalex.org/W4414198760","doi":"https://doi.org/10.1109/dac63849.2025.11133367"},"language":"en","primary_location":{"id":"doi:10.1109/dac63849.2025.11133367","is_oa":false,"landing_page_url":"https://doi.org/10.1109/dac63849.2025.11133367","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 62nd ACM/IEEE Design Automation Conference (DAC)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5112542413","display_name":"Su Zheng","orcid":"https://orcid.org/0000-0003-1159-1611"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"HK","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["HK"],"is_corresponding":true,"raw_author_name":"Su Zheng","raw_affiliation_strings":["Chinese University of Hong Kong"],"affiliations":[{"raw_affiliation_string":"Chinese University of Hong Kong","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055355549","display_name":"Xiaoxiao Liang","orcid":"https://orcid.org/0000-0003-4691-3940"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Xiaoxiao Liang","raw_affiliation_strings":["Hong Kong University of Science and Technology (GZ)"],"affiliations":[{"raw_affiliation_string":"Hong Kong University of Science and Technology (GZ)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066842835","display_name":"Ziyang Yu","orcid":"https://orcid.org/0000-0002-6656-3741"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"HK","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["HK"],"is_corresponding":false,"raw_author_name":"Ziyang Yu","raw_affiliation_strings":["Chinese University of Hong Kong"],"affiliations":[{"raw_affiliation_string":"Chinese University of Hong Kong","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071995111","display_name":"Yuzhe Ma","orcid":"https://orcid.org/0000-0002-3612-4182"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yuzhe Ma","raw_affiliation_strings":["Hong Kong University of Science and Technology (GZ)"],"affiliations":[{"raw_affiliation_string":"Hong Kong University of Science and Technology (GZ)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051340429","display_name":"Bei Yu","orcid":"https://orcid.org/0000-0001-6406-4810"},"institutions":[{"id":"https://openalex.org/I177725633","display_name":"Chinese University of Hong Kong","ror":"https://ror.org/00t33hh48","country_code":"HK","type":"education","lineage":["https://openalex.org/I177725633"]}],"countries":["HK"],"is_corresponding":false,"raw_author_name":"Bei Yu","raw_affiliation_strings":["Chinese University of Hong Kong"],"affiliations":[{"raw_affiliation_string":"Chinese University of Hong Kong","institution_ids":["https://openalex.org/I177725633"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5053378706","display_name":"Martin D. F. Wong","orcid":"https://orcid.org/0000-0001-8274-9688"},"institutions":[{"id":"https://openalex.org/I141568987","display_name":"Hong Kong Baptist University","ror":"https://ror.org/0145fw131","country_code":"HK","type":"education","lineage":["https://openalex.org/I141568987"]}],"countries":["HK"],"is_corresponding":false,"raw_author_name":"Martin Wong","raw_affiliation_strings":["Hong Kong Baptist University"],"affiliations":[{"raw_affiliation_string":"Hong Kong Baptist University","institution_ids":["https://openalex.org/I141568987"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5112542413"],"corresponding_institution_ids":["https://openalex.org/I177725633"],"apc_list":null,"apc_paid":null,"fwci":2.9884,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.91424534,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":95,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"7"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11245","display_name":"Advanced Numerical Analysis Techniques","score":0.9193000197410583,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11245","display_name":"Advanced Numerical Analysis Techniques","score":0.9193000197410583,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/curvilinear-coordinates","display_name":"Curvilinear coordinates","score":0.88919997215271},{"id":"https://openalex.org/keywords/spline","display_name":"Spline (mechanical)","score":0.5867000222206116},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"Optical proximity correction","score":0.5066999793052673},{"id":"https://openalex.org/keywords/inverse","display_name":"Inverse","score":0.5065000057220459},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.3700000047683716},{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.3066999912261963}],"concepts":[{"id":"https://openalex.org/C98343798","wikidata":"https://www.wikidata.org/wiki/Q1790208","display_name":"Curvilinear coordinates","level":2,"score":0.88919997215271},{"id":"https://openalex.org/C10390562","wikidata":"https://www.wikidata.org/wiki/Q581809","display_name":"Spline (mechanical)","level":2,"score":0.5867000222206116},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.5066999793052673},{"id":"https://openalex.org/C207467116","wikidata":"https://www.wikidata.org/wiki/Q4385666","display_name":"Inverse","level":2,"score":0.5065000057220459},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.503000020980835},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4481000006198883},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.3700000047683716},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.32839998602867126},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.3066999912261963},{"id":"https://openalex.org/C135252773","wikidata":"https://www.wikidata.org/wiki/Q1567213","display_name":"Inverse problem","level":2,"score":0.2847999930381775},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.271699994802475},{"id":"https://openalex.org/C2777953097","wikidata":"https://www.wikidata.org/wiki/Q7252868","display_name":"Proximity effect (electron beam lithography)","level":5,"score":0.2563000023365021},{"id":"https://openalex.org/C2776429412","wikidata":"https://www.wikidata.org/wiki/Q4688011","display_name":"Aerial image","level":3,"score":0.2540000081062317}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/dac63849.2025.11133367","is_oa":false,"landing_page_url":"https://doi.org/10.1109/dac63849.2025.11133367","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 62nd ACM/IEEE Design Automation Conference (DAC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":43,"referenced_works":["https://openalex.org/W1270655472","https://openalex.org/W1968603586","https://openalex.org/W2033627854","https://openalex.org/W2035705481","https://openalex.org/W2065429801","https://openalex.org/W2070935785","https://openalex.org/W2076697999","https://openalex.org/W2121036149","https://openalex.org/W2135961964","https://openalex.org/W2149425147","https://openalex.org/W2149602086","https://openalex.org/W2344299637","https://openalex.org/W2773299998","https://openalex.org/W2809465272","https://openalex.org/W2946332877","https://openalex.org/W2971516606","https://openalex.org/W3047198287","https://openalex.org/W3088909696","https://openalex.org/W3091844009","https://openalex.org/W3106410607","https://openalex.org/W3111433944","https://openalex.org/W3186713366","https://openalex.org/W3198572068","https://openalex.org/W3203959872","https://openalex.org/W4200483799","https://openalex.org/W4232775057","https://openalex.org/W4234309643","https://openalex.org/W4238829881","https://openalex.org/W4241870777","https://openalex.org/W4285292365","https://openalex.org/W4288079630","https://openalex.org/W4312121124","https://openalex.org/W4319993468","https://openalex.org/W4386242015","https://openalex.org/W4386765021","https://openalex.org/W4388855023","https://openalex.org/W4388971364","https://openalex.org/W4392909349","https://openalex.org/W4394599431","https://openalex.org/W4401416755","https://openalex.org/W4404133489","https://openalex.org/W4404133624","https://openalex.org/W4404133788"],"related_works":[],"abstract_inverted_index":{"This":[0],"paper":[1],"presents":[2],"a":[3,94],"novel":[4],"curvilinear":[5],"optical":[6],"proximity":[7],"correction":[8],"(OPC)":[9],"framework.":[10],"The":[11],"proposed":[12],"approach":[13],"involves":[14],"representing":[15],"mask":[16,45],"patterns":[17],"with":[18,44],"control":[19,35],"points,":[20,36],"which":[21],"are":[22],"interconnected":[23],"through":[24],"cardinal":[25],"splines.":[26],"Mask":[27],"optimization":[28],"is":[29],"achieved":[30],"by":[31,38],"iteratively":[32],"adjusting":[33],"these":[34],"guided":[37],"lithography":[39,68],"simulation.":[40],"To":[41],"ensure":[42],"compliance":[43],"rule":[46],"checking":[47,55],"(MRC)":[48],"criteria,":[49],"we":[50,71],"develop":[51],"comprehensive":[52],"methods":[53],"for":[54],"width,":[56],"space,":[57],"area,":[58],"and":[59,78],"curvature.":[60],"Additionally,":[61],"to":[62,74],"match":[63],"the":[64,85],"performance":[65],"of":[66,87],"inverse":[67],"techniques":[69],"(ILT),":[70],"design":[72],"algorithms":[73],"fit":[75],"ILT":[76],"results":[77],"resolve":[79],"MRC":[80],"violations.":[81],"Extensive":[82],"experiments":[83],"demonstrate":[84],"effectiveness":[86],"our":[88],"methodology,":[89],"highlighting":[90],"its":[91],"potential":[92],"as":[93],"viable":[95],"OPC/ILT":[96],"alternative.":[97]},"counts_by_year":[{"year":2025,"cited_by_count":2}],"updated_date":"2026-03-07T16:01:11.037858","created_date":"2025-10-10T00:00:00"}