{"id":"https://openalex.org/W4234393319","doi":"https://doi.org/10.1109/conielecomp.2011.5749314","title":"Keynote speakers","display_name":"Keynote speakers","publication_year":2011,"publication_date":"2011-02-01","ids":{"openalex":"https://openalex.org/W4234393319","doi":"https://doi.org/10.1109/conielecomp.2011.5749314"},"language":"en","primary_location":{"id":"doi:10.1109/conielecomp.2011.5749314","is_oa":false,"landing_page_url":"https://doi.org/10.1109/conielecomp.2011.5749314","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"CONIELECOMP 2011, 21st International Conference on Electrical Communications and Computers","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5013036380","display_name":"M.H. Rashid","orcid":null},"institutions":[{"id":"https://openalex.org/I83683471","display_name":"University of West Florida","ror":"https://ror.org/002w4zy91","country_code":"US","type":"education","lineage":["https://openalex.org/I83683471"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"M.H. Rashid","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of West Florida, 11000 University Parkway, Pensacola, 32514-5754, USA"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of West Florida, 11000 University Parkway, Pensacola, 32514-5754, USA","institution_ids":["https://openalex.org/I83683471"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002190612","display_name":"Jes\u00fas Favela","orcid":"https://orcid.org/0000-0003-2967-9654"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jesus Favela Vara","raw_affiliation_strings":["Departamento de Ciencias de la\nComputaci6n\nCentro de Investigaci6n Cientifica y\nEducaci6n Superior de Ensenada\n(CICESE)"],"affiliations":[{"raw_affiliation_string":"Departamento de Ciencias de la\nComputaci6n\nCentro de Investigaci6n Cientifica y\nEducaci6n Superior de Ensenada\n(CICESE)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110483373","display_name":"P. E. Russell","orcid":null},"institutions":[{"id":"https://openalex.org/I430192","display_name":"Appalachian State University","ror":"https://ror.org/051m4vc48","country_code":"US","type":"education","lineage":["https://openalex.org/I430192"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Phillip E Russell","raw_affiliation_strings":["Dept. of Phys. & Astron, Appalachian State Univ., Boone, NC, USA"],"affiliations":[{"raw_affiliation_string":"Dept. of Phys. & Astron, Appalachian State Univ., Boone, NC, USA","institution_ids":["https://openalex.org/I430192"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5000441079","display_name":"Hugo Saavedra","orcid":null},"institutions":[{"id":"https://openalex.org/I4210146573","display_name":"Joint Special Operations University","ror":"https://ror.org/04zn7j940","country_code":"US","type":"education","lineage":["https://openalex.org/I1330347796","https://openalex.org/I4210146573","https://openalex.org/I4405256115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hugo Amador Saavedra","raw_affiliation_strings":["Manager for Mexico and Central\nAmerica Operations\nProSoft Technology, Inc"],"affiliations":[{"raw_affiliation_string":"Manager for Mexico and Central\nAmerica Operations\nProSoft Technology, Inc","institution_ids":["https://openalex.org/I4210146573"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5013036380"],"corresponding_institution_ids":["https://openalex.org/I83683471"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.40859066,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"3"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.462799996137619,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.462799996137619,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10857","display_name":"Advanced Electron Microscopy Techniques and Applications","score":0.3619000017642975,"subfield":{"id":"https://openalex.org/subfields/1315","display_name":"Structural Biology"},"field":{"id":"https://openalex.org/fields/13","display_name":"Biochemistry, Genetics and Molecular Biology"},"domain":{"id":"https://openalex.org/domains/1","display_name":"Life Sciences"}},{"id":"https://openalex.org/T13552","display_name":"Advanced Materials Characterization Techniques","score":0.035100001841783524,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.7543014883995056},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6719884872436523},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6652642488479614},{"id":"https://openalex.org/keywords/microelectromechanical-systems","display_name":"Microelectromechanical systems","score":0.664638102054596},{"id":"https://openalex.org/keywords/sputtering","display_name":"Sputtering","score":0.5760361552238464},{"id":"https://openalex.org/keywords/focused-ion-beam","display_name":"Focused ion beam","score":0.5238566398620605},{"id":"https://openalex.org/keywords/diode","display_name":"Diode","score":0.4922317564487457},{"id":"https://openalex.org/keywords/plasmon","display_name":"Plasmon","score":0.4401724338531494},{"id":"https://openalex.org/keywords/ion-beam","display_name":"Ion beam","score":0.42924198508262634},{"id":"https://openalex.org/keywords/semiconductor","display_name":"Semiconductor","score":0.41574621200561523},{"id":"https://openalex.org/keywords/ion","display_name":"Ion","score":0.31543219089508057},{"id":"https://openalex.org/keywords/beam","display_name":"Beam (structure)","score":0.310955286026001},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.29513847827911377},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.29050830006599426},{"id":"https://openalex.org/keywords/thin-film","display_name":"Thin film","score":0.15430516004562378},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.11874246597290039}],"concepts":[{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.7543014883995056},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6719884872436523},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6652642488479614},{"id":"https://openalex.org/C37977207","wikidata":"https://www.wikidata.org/wiki/Q175561","display_name":"Microelectromechanical systems","level":2,"score":0.664638102054596},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5760361552238464},{"id":"https://openalex.org/C161866238","wikidata":"https://www.wikidata.org/wiki/Q258563","display_name":"Focused ion beam","level":3,"score":0.5238566398620605},{"id":"https://openalex.org/C78434282","wikidata":"https://www.wikidata.org/wiki/Q11656","display_name":"Diode","level":2,"score":0.4922317564487457},{"id":"https://openalex.org/C110879396","wikidata":"https://www.wikidata.org/wiki/Q58392","display_name":"Plasmon","level":2,"score":0.4401724338531494},{"id":"https://openalex.org/C50774322","wikidata":"https://www.wikidata.org/wiki/Q644248","display_name":"Ion beam","level":3,"score":0.42924198508262634},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.41574621200561523},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.31543219089508057},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.310955286026001},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.29513847827911377},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.29050830006599426},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.15430516004562378},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.11874246597290039},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/conielecomp.2011.5749314","is_oa":false,"landing_page_url":"https://doi.org/10.1109/conielecomp.2011.5749314","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"CONIELECOMP 2011, 21st International Conference on Electrical Communications and Computers","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4320036769","https://openalex.org/W4291746287","https://openalex.org/W2382573956","https://openalex.org/W2171786186","https://openalex.org/W1981057740","https://openalex.org/W1992059889","https://openalex.org/W4212788298","https://openalex.org/W2277939188","https://openalex.org/W1548576798","https://openalex.org/W2079796071"],"abstract_inverted_index":{"Electron":[0],"and":[1,10,23,42,47,49,58,71],"ion":[2,38],"beams":[3,54],"are":[4],"widely":[5],"utilized":[6],"in":[7],"both":[8],"fabrication":[9],"analysis":[11],"of":[12,20,52],"semiconductor":[13],"devices.":[14],"This":[15],"talk":[16],"will":[17,63],"highlight":[18],"examples":[19,62],"device":[21,45],"edit":[22],"repair":[24],"using":[25],"Focused":[26],"Ion":[27],"Beams":[28],"(FIB)":[29],"for":[30,34,44,55],"high":[31],"resolution":[32],"sputtering":[33],"cross":[35],"sectional":[36],"imaging,":[37],"beam":[39],"induced":[40],"deposition":[41],"etch":[43],"modification":[46],"repair,":[48],"the":[50],"use":[51],"electron":[53],"fabrication,":[56],"inspection":[57],"analysis.":[59],"Specific":[60],"applications":[61],"include":[64],"integrated":[65],"circuits,":[66],"MEMS":[67],"devices,":[68],"plasmonic":[69],"sensors":[70],"light":[72],"emitting":[73],"diodes.":[74]},"counts_by_year":[],"updated_date":"2026-04-17T18:11:37.981687","created_date":"2022-05-12T00:00:00"}