{"id":"https://openalex.org/W1976727490","doi":"https://doi.org/10.1109/coase.2014.6899414","title":"Smart dynamic sampling for wafer at risk reduction in semiconductor manufacturing","display_name":"Smart dynamic sampling for wafer at risk reduction in semiconductor manufacturing","publication_year":2014,"publication_date":"2014-08-01","ids":{"openalex":"https://openalex.org/W1976727490","doi":"https://doi.org/10.1109/coase.2014.6899414","mag":"1976727490"},"language":"en","primary_location":{"id":"doi:10.1109/coase.2014.6899414","is_oa":false,"landing_page_url":"https://doi.org/10.1109/coase.2014.6899414","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2014 IEEE International Conference on Automation Science and Engineering (CASE)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5003356358","display_name":"Sylvain Housseman","orcid":null},"institutions":[{"id":"https://openalex.org/I3019848993","display_name":"Mines Saint-\u00c9tienne","ror":"https://ror.org/05a1dws80","country_code":"FR","type":"education","lineage":["https://openalex.org/I203339264","https://openalex.org/I205703379","https://openalex.org/I3019848993"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Sylvain Housseman","raw_affiliation_strings":["Ecole des Mines de Saint- \u00c9tienne, Centre Micro\u00e9lectronique de Provence, Site Georges Charpak, 880 route de Mimet, F-13541 Gardanne, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole des Mines de Saint- \u00c9tienne, Centre Micro\u00e9lectronique de Provence, Site Georges Charpak, 880 route de Mimet, F-13541 Gardanne, France","institution_ids":["https://openalex.org/I3019848993"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028102263","display_name":"St\u00e9phane Dauz\u00e8re\u2010P\u00e9r\u00e8s","orcid":"https://orcid.org/0000-0002-3566-3248"},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I3019848993","display_name":"Mines Saint-\u00c9tienne","ror":"https://ror.org/05a1dws80","country_code":"FR","type":"education","lineage":["https://openalex.org/I203339264","https://openalex.org/I205703379","https://openalex.org/I3019848993"]},{"id":"https://openalex.org/I4210099416","display_name":"Laboratoire d'Informatique, de Mod\u00e9lisation et d'Optimisation des Syst\u00e8mes","ror":"https://ror.org/00t3fpp34","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I198244214","https://openalex.org/I198244214","https://openalex.org/I203339264","https://openalex.org/I205703379","https://openalex.org/I3019848993","https://openalex.org/I4210099416","https://openalex.org/I4210123221","https://openalex.org/I4210159245","https://openalex.org/I4387154249"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Stephane Dauzere-Peres","raw_affiliation_strings":["Ecole des Mines de Saint-\u00c9tienne, LIMOS, CNRS, UMR, Gardanne, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole des Mines de Saint-\u00c9tienne, LIMOS, CNRS, UMR, Gardanne, France","institution_ids":["https://openalex.org/I4210099416","https://openalex.org/I3019848993","https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011593588","display_name":"Gloria Luz Rodriguez-Verjan","orcid":null},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I3019848993","display_name":"Mines Saint-\u00c9tienne","ror":"https://ror.org/05a1dws80","country_code":"FR","type":"education","lineage":["https://openalex.org/I203339264","https://openalex.org/I205703379","https://openalex.org/I3019848993"]},{"id":"https://openalex.org/I4210099416","display_name":"Laboratoire d'Informatique, de Mod\u00e9lisation et d'Optimisation des Syst\u00e8mes","ror":"https://ror.org/00t3fpp34","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I1294671590","https://openalex.org/I198244214","https://openalex.org/I198244214","https://openalex.org/I203339264","https://openalex.org/I205703379","https://openalex.org/I3019848993","https://openalex.org/I4210099416","https://openalex.org/I4210123221","https://openalex.org/I4210159245","https://openalex.org/I4387154249"]},{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Gloria Rodriguez-Verjan","raw_affiliation_strings":["Ecole des Mines de Saint-\u00c9tienne, LIMOS, CNRS, UMR, Gardanne, France","STMicroelectronics Rousset, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole des Mines de Saint-\u00c9tienne, LIMOS, CNRS, UMR, Gardanne, France","institution_ids":["https://openalex.org/I4210099416","https://openalex.org/I3019848993","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"STMicroelectronics Rousset, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5011705857","display_name":"Jacques Pinaton","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jacques Pinaton","raw_affiliation_strings":["STMicroelectronics, Crolles, FR"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, FR","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.2485,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.82015052,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"780","last_page":"785"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11443","display_name":"Advanced Statistical Process Monitoring","score":0.9883000254631042,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T11159","display_name":"Manufacturing Process and Optimization","score":0.9790999889373779,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.8086735010147095},{"id":"https://openalex.org/keywords/workload","display_name":"Workload","score":0.7286671996116638},{"id":"https://openalex.org/keywords/wafer-fabrication","display_name":"Wafer fabrication","score":0.6402117609977722},{"id":"https://openalex.org/keywords/sampling","display_name":"Sampling (signal processing)","score":0.6280004382133484},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5615841746330261},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.5576837062835693},{"id":"https://openalex.org/keywords/reduction","display_name":"Reduction (mathematics)","score":0.5550490021705627},{"id":"https://openalex.org/keywords/reliability-engineering","display_name":"Reliability engineering","score":0.5470486879348755},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.49723127484321594},{"id":"https://openalex.org/keywords/manufacturing-engineering","display_name":"Manufacturing engineering","score":0.3963449001312256},{"id":"https://openalex.org/keywords/process-engineering","display_name":"Process engineering","score":0.3283070921897888},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.30234262347221375},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.10400116443634033},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.0860510766506195}],"concepts":[{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.8086735010147095},{"id":"https://openalex.org/C2778476105","wikidata":"https://www.wikidata.org/wiki/Q628539","display_name":"Workload","level":2,"score":0.7286671996116638},{"id":"https://openalex.org/C35750839","wikidata":"https://www.wikidata.org/wiki/Q7959421","display_name":"Wafer fabrication","level":3,"score":0.6402117609977722},{"id":"https://openalex.org/C140779682","wikidata":"https://www.wikidata.org/wiki/Q210868","display_name":"Sampling (signal processing)","level":3,"score":0.6280004382133484},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5615841746330261},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.5576837062835693},{"id":"https://openalex.org/C111335779","wikidata":"https://www.wikidata.org/wiki/Q3454686","display_name":"Reduction (mathematics)","level":2,"score":0.5550490021705627},{"id":"https://openalex.org/C200601418","wikidata":"https://www.wikidata.org/wiki/Q2193887","display_name":"Reliability engineering","level":1,"score":0.5470486879348755},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.49723127484321594},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.3963449001312256},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.3283070921897888},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.30234262347221375},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.10400116443634033},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0860510766506195},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C106131492","wikidata":"https://www.wikidata.org/wiki/Q3072260","display_name":"Filter (signal processing)","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/coase.2014.6899414","is_oa":false,"landing_page_url":"https://doi.org/10.1109/coase.2014.6899414","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2014 IEEE International Conference on Automation Science and Engineering (CASE)","raw_type":"proceedings-article"},{"id":"pmh:oai:HAL:emse-01792292v1","is_oa":false,"landing_page_url":"https://hal-emse.ccsd.cnrs.fr/emse-01792292","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL (Le Centre pour la Communication Scientifique Directe)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I1294671590","host_organization_name":"Centre National de la Recherche Scientifique","host_organization_lineage":["https://openalex.org/I1294671590"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"2014 IEEE International Conference on Automation Science and Engineering (CASE), Aug 2014, Taipei, Taiwan. ⟨10.1109/CoASE.2014.6899414⟩","raw_type":"Conference papers"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","score":0.5600000023841858,"id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W19040241","https://openalex.org/W1875330218","https://openalex.org/W2020460778","https://openalex.org/W2023087857","https://openalex.org/W2024436545","https://openalex.org/W2040882416","https://openalex.org/W2103117824","https://openalex.org/W2111281374","https://openalex.org/W2115580343","https://openalex.org/W2118797653","https://openalex.org/W2134065700","https://openalex.org/W2134413183","https://openalex.org/W2151186428","https://openalex.org/W2224480906","https://openalex.org/W4230846784","https://openalex.org/W6688960504"],"related_works":["https://openalex.org/W2170726572","https://openalex.org/W2146435486","https://openalex.org/W2006086900","https://openalex.org/W1483119123","https://openalex.org/W2377558694","https://openalex.org/W2992897358","https://openalex.org/W2394172622","https://openalex.org/W1594978932","https://openalex.org/W2083418455","https://openalex.org/W2140718007"],"abstract_inverted_index":{"Semiconductor":[0],"manufacturing":[1],"is":[2,13,47],"highly":[3],"complex":[4],"and":[5,21,86,96,100],"expensive,":[6],"hence":[7],"the":[8,17,23,50,58,63,73,82,88,91],"early":[9],"detection":[10],"of":[11,19,32,62],"problems":[12],"necessary":[14],"to":[15,48,56,81,87],"minimize":[16,57],"number":[18],"scraps":[20],"improve":[22],"overall":[24,59],"yield.":[25],"This":[26],"paper":[27],"presents":[28],"an":[29,37],"industrial":[30,103],"application":[31],"dynamic":[33],"sampling":[34],"based":[35],"on":[36],"aggregated":[38],"risk":[39,60],"indicator":[40],"at":[41],"process":[42],"tool":[43],"level.":[44],"The":[45],"objective":[46],"identify":[49],"lots":[51],"that":[52],"should":[53],"be":[54],"measured":[55],"level":[61],"fabrication":[64],"plant":[65],"(fab).":[66],"Results":[67],"show":[68],"significant":[69],"improvements":[70],"compared":[71,101],"with":[72],"previous":[74],"strategy:":[75],"Sampling":[76],"decisions":[77],"are":[78,98],"better":[79],"adapted":[80],"current":[83],"production":[84],"state":[85],"workload":[89],"in":[90],"inspection":[92],"area.":[93],"Several":[94],"parameters":[95],"algorithms":[97],"proposed":[99],"using":[102],"data.":[104]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2016,"cited_by_count":2}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}