{"id":"https://openalex.org/W2172096896","doi":"https://doi.org/10.1109/coase.2009.5234135","title":"Regular flow line models for semiconductor cluster tools: A case of lot dependent process times","display_name":"Regular flow line models for semiconductor cluster tools: A case of lot dependent process times","publication_year":2009,"publication_date":"2009-08-01","ids":{"openalex":"https://openalex.org/W2172096896","doi":"https://doi.org/10.1109/coase.2009.5234135","mag":"2172096896"},"language":"en","primary_location":{"id":"doi:10.1109/coase.2009.5234135","is_oa":false,"landing_page_url":"https://doi.org/10.1109/coase.2009.5234135","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2009 IEEE International Conference on Automation Science and Engineering","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101619159","display_name":"James R. Morrison","orcid":"https://orcid.org/0000-0001-7773-000X"},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"James R. Morrison","raw_affiliation_strings":["Industrial and Systems Engineering Department, Institute of the Design of Complex Systems, KAIST, Daejeon, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Industrial and Systems Engineering Department, Institute of the Design of Complex Systems, KAIST, Daejeon, South Korea","institution_ids":["https://openalex.org/I157485424"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5101619159"],"corresponding_institution_ids":["https://openalex.org/I157485424"],"apc_list":null,"apc_paid":null,"fwci":4.7194,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.95167286,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"561","last_page":"566"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10551","display_name":"Scheduling and Optimization Algorithms","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10551","display_name":"Scheduling and Optimization Algorithms","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10974","display_name":"Advanced Queuing Theory Analysis","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/1404","display_name":"Management Information Systems"},"field":{"id":"https://openalex.org/fields/14","display_name":"Business, Management and Accounting"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T11814","display_name":"Advanced Manufacturing and Logistics Optimization","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.6919886469841003},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6412580609321594},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.6167694926261902},{"id":"https://openalex.org/keywords/throughput","display_name":"Throughput","score":0.6049330234527588},{"id":"https://openalex.org/keywords/recursion","display_name":"Recursion (computer science)","score":0.5877649784088135},{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.5871267914772034},{"id":"https://openalex.org/keywords/semiconductor-device-modeling","display_name":"Semiconductor device modeling","score":0.5833401083946228},{"id":"https://openalex.org/keywords/production-line","display_name":"Production line","score":0.5688499808311462},{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.561681866645813},{"id":"https://openalex.org/keywords/line","display_name":"Line (geometry)","score":0.4806460440158844},{"id":"https://openalex.org/keywords/cluster","display_name":"Cluster (spacecraft)","score":0.4547244608402252},{"id":"https://openalex.org/keywords/flow","display_name":"Flow (mathematics)","score":0.4483812153339386},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.32867586612701416},{"id":"https://openalex.org/keywords/real-time-computing","display_name":"Real-time computing","score":0.3259415626525879},{"id":"https://openalex.org/keywords/computer-engineering","display_name":"Computer engineering","score":0.3203011751174927},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.24651122093200684},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.19862022995948792},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.1814928948879242},{"id":"https://openalex.org/keywords/programming-language","display_name":"Programming language","score":0.1321549415588379},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.13020721077919006},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.12034112215042114},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.08457043766975403}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.6919886469841003},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6412580609321594},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.6167694926261902},{"id":"https://openalex.org/C157764524","wikidata":"https://www.wikidata.org/wiki/Q1383412","display_name":"Throughput","level":3,"score":0.6049330234527588},{"id":"https://openalex.org/C168773036","wikidata":"https://www.wikidata.org/wiki/Q264164","display_name":"Recursion (computer science)","level":2,"score":0.5877649784088135},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5871267914772034},{"id":"https://openalex.org/C4775677","wikidata":"https://www.wikidata.org/wiki/Q7449393","display_name":"Semiconductor device modeling","level":3,"score":0.5833401083946228},{"id":"https://openalex.org/C99862985","wikidata":"https://www.wikidata.org/wiki/Q10858068","display_name":"Production line","level":2,"score":0.5688499808311462},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.561681866645813},{"id":"https://openalex.org/C198352243","wikidata":"https://www.wikidata.org/wiki/Q37105","display_name":"Line (geometry)","level":2,"score":0.4806460440158844},{"id":"https://openalex.org/C164866538","wikidata":"https://www.wikidata.org/wiki/Q367351","display_name":"Cluster (spacecraft)","level":2,"score":0.4547244608402252},{"id":"https://openalex.org/C38349280","wikidata":"https://www.wikidata.org/wiki/Q1434290","display_name":"Flow (mathematics)","level":2,"score":0.4483812153339386},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.32867586612701416},{"id":"https://openalex.org/C79403827","wikidata":"https://www.wikidata.org/wiki/Q3988","display_name":"Real-time computing","level":1,"score":0.3259415626525879},{"id":"https://openalex.org/C113775141","wikidata":"https://www.wikidata.org/wiki/Q428691","display_name":"Computer engineering","level":1,"score":0.3203011751174927},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.24651122093200684},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.19862022995948792},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.1814928948879242},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.1321549415588379},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.13020721077919006},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.12034112215042114},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.08457043766975403},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.0},{"id":"https://openalex.org/C555944384","wikidata":"https://www.wikidata.org/wiki/Q249","display_name":"Wireless","level":2,"score":0.0},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/coase.2009.5234135","is_oa":false,"landing_page_url":"https://doi.org/10.1109/coase.2009.5234135","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2009 IEEE International Conference on Automation Science and Engineering","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.4300000071525574,"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":11,"referenced_works":["https://openalex.org/W2007001378","https://openalex.org/W2025109235","https://openalex.org/W2065972011","https://openalex.org/W2105559552","https://openalex.org/W2112745333","https://openalex.org/W2138574698","https://openalex.org/W2144283213","https://openalex.org/W2150840790","https://openalex.org/W2158134789","https://openalex.org/W4213373825","https://openalex.org/W6682088274"],"related_works":["https://openalex.org/W2083874129","https://openalex.org/W2327254200","https://openalex.org/W2287022550","https://openalex.org/W2027697249","https://openalex.org/W1965337273","https://openalex.org/W2099964216","https://openalex.org/W4239197663","https://openalex.org/W4399396010","https://openalex.org/W1849611347","https://openalex.org/W2284242891"],"abstract_inverted_index":{"We":[0],"develop":[1],"a":[2,89,105],"reduced":[3],"complexity":[4,87],"recursion":[5],"for":[6],"the":[7,44,51,58,77,85,124],"wafer":[8,17,61],"delay":[9],"in":[10,13,34,109],"each":[11],"server":[12],"flow":[14],"lines":[15],"with":[16,38,57],"dependent":[18],"deterministic":[19],"or":[20],"regular":[21],"process":[22,45,63],"times":[23],"and":[24,94,111,114,121],"demonstrate":[25],"how":[26],"it":[27,47],"can":[28,71],"serve":[29],"to":[30,74],"model":[31],"lot":[32],"production":[33,110],"semiconductor":[35],"cluster":[36],"tools":[37],"setups.":[39],"Under":[40],"certain":[41],"assumptions":[42],"on":[43],"times,":[46,64],"is":[48],"shown":[49],"that":[50],"system":[52],"behavior":[53],"shares":[54],"some":[55],"similarities":[56],"case":[59],"of":[60,79,88,123],"independent":[62],"thereby":[65],"enabling":[66],"our":[67],"results.":[68],"Such":[69],"models":[70,98],"be":[72],"used":[73],"substantially":[75],"increase":[76],"fidelity":[78],"existing":[80],"fabricator":[81],"simulation":[82],"models,":[83],"without":[84],"computational":[86],"complete":[90],"step-by-step":[91],"wafer,":[92],"module":[93],"robot":[95],"simulation.":[96],"The":[97],"have":[99],"been":[100],"tested":[101],"using":[102],"data":[103],"from":[104],"clustered":[106],"photolithography":[107],"tool":[108,115],"exhibited":[112],"throughput":[113],"sojourn":[116],"time":[117],"values":[118],"within":[119],"1%":[120],"4%":[122],"actual":[125],"values,":[126],"respectively.":[127]},"counts_by_year":[{"year":2014,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}