{"id":"https://openalex.org/W2170902588","doi":"https://doi.org/10.1109/cicc.2003.1249367","title":"Differentially-shielded monolithic inductors","display_name":"Differentially-shielded monolithic inductors","publication_year":2004,"publication_date":"2004-01-24","ids":{"openalex":"https://openalex.org/W2170902588","doi":"https://doi.org/10.1109/cicc.2003.1249367","mag":"2170902588"},"language":"en","primary_location":{"id":"doi:10.1109/cicc.2003.1249367","is_oa":false,"landing_page_url":"https://doi.org/10.1109/cicc.2003.1249367","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the IEEE 2003 Custom Integrated Circuits Conference, 2003.","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5049368074","display_name":"Taesik Cheung","orcid":"https://orcid.org/0000-0003-4796-5726"},"institutions":[{"id":"https://openalex.org/I185261750","display_name":"University of Toronto","ror":"https://ror.org/03dbr7087","country_code":"CA","type":"education","lineage":["https://openalex.org/I185261750"]}],"countries":["CA"],"is_corresponding":true,"raw_author_name":"T.S.D. Cheung","raw_affiliation_strings":["Department of E&CE, University of Toronto, ONT, Canada"],"affiliations":[{"raw_affiliation_string":"Department of E&CE, University of Toronto, ONT, Canada","institution_ids":["https://openalex.org/I185261750"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108859315","display_name":"J.R. Long","orcid":"https://orcid.org/0009-0002-9654-3853"},"institutions":[{"id":"https://openalex.org/I98358874","display_name":"Delft University of Technology","ror":"https://ror.org/02e2c7k09","country_code":"NL","type":"education","lineage":["https://openalex.org/I98358874"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"J.R. Long","raw_affiliation_strings":["ERL DIMES, Delft University of Technnology, Netherlands"],"affiliations":[{"raw_affiliation_string":"ERL DIMES, Delft University of Technnology, Netherlands","institution_ids":["https://openalex.org/I98358874"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086074047","display_name":"K. Vaed","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"K. Vaed","raw_affiliation_strings":["IBM Microelectronics, Hopewell Junction, NY, USA"],"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, Hopewell Junction, NY, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001184956","display_name":"R. Volant","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R. Volant","raw_affiliation_strings":["IBM Microelectronics, Hopewell Junction, NY, USA"],"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, Hopewell Junction, NY, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082070690","display_name":"A. Chinthakindi","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. Chinthakindi","raw_affiliation_strings":["IBM Microelectronics, Hopewell Junction, NY, USA"],"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, Hopewell Junction, NY, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045622606","display_name":"C.M. Schnabel","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C.M. Schnabel","raw_affiliation_strings":["IBM Microelectronics, Hopewell Junction, NY, USA"],"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, Hopewell Junction, NY, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5091520048","display_name":"J. Florkey","orcid":null},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. Florkey","raw_affiliation_strings":["IBM Microelectronics, Hopewell Junction, NY, USA"],"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, Hopewell Junction, NY, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041566914","display_name":"Zhenyu He","orcid":"https://orcid.org/0000-0002-7713-5515"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Z.X. He","raw_affiliation_strings":["IBM Microelectronics, Hopewell Junction, NY, USA"],"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, Hopewell Junction, NY, USA","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113283941","display_name":"K. Stein","orcid":"https://orcid.org/0009-0005-4706-5797"},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"K. Stein","raw_affiliation_strings":["IBM Microelectronics, Hopewell Junction, NY, USA"],"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, Hopewell Junction, NY, USA","institution_ids":["https://openalex.org/I1341412227"]}]}],"institutions":[],"countries_distinct_count":3,"institutions_distinct_count":9,"corresponding_author_ids":["https://openalex.org/A5049368074"],"corresponding_institution_ids":["https://openalex.org/I185261750"],"apc_list":null,"apc_paid":null,"fwci":6.9124,"has_fulltext":false,"cited_by_count":35,"citation_normalized_percentile":{"value":0.97246209,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"95","last_page":"98"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10187","display_name":"Radio Frequency Integrated Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10187","display_name":"Radio Frequency Integrated Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/inductor","display_name":"Inductor","score":0.8418107032775879},{"id":"https://openalex.org/keywords/shielded-cable","display_name":"Shielded cable","score":0.7757526636123657},{"id":"https://openalex.org/keywords/shield","display_name":"Shield","score":0.7319471836090088},{"id":"https://openalex.org/keywords/electromagnetic-shielding","display_name":"Electromagnetic shielding","score":0.7084028720855713},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6690441370010376},{"id":"https://openalex.org/keywords/substrate","display_name":"Substrate (aquarium)","score":0.6080807447433472},{"id":"https://openalex.org/keywords/aluminium","display_name":"Aluminium","score":0.5219703912734985},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.4937683045864105},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.47599923610687256},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.4484878480434418},{"id":"https://openalex.org/keywords/copper","display_name":"Copper","score":0.42591673135757446},{"id":"https://openalex.org/keywords/q-factor","display_name":"Q factor","score":0.42088782787323},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.17932051420211792},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.17686894536018372},{"id":"https://openalex.org/keywords/metallurgy","display_name":"Metallurgy","score":0.15914183855056763},{"id":"https://openalex.org/keywords/geology","display_name":"Geology","score":0.0645071268081665}],"concepts":[{"id":"https://openalex.org/C144534570","wikidata":"https://www.wikidata.org/wiki/Q5325","display_name":"Inductor","level":3,"score":0.8418107032775879},{"id":"https://openalex.org/C77590175","wikidata":"https://www.wikidata.org/wiki/Q3506009","display_name":"Shielded cable","level":2,"score":0.7757526636123657},{"id":"https://openalex.org/C138081364","wikidata":"https://www.wikidata.org/wiki/Q852013","display_name":"Shield","level":2,"score":0.7319471836090088},{"id":"https://openalex.org/C2265751","wikidata":"https://www.wikidata.org/wiki/Q332007","display_name":"Electromagnetic shielding","level":2,"score":0.7084028720855713},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6690441370010376},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.6080807447433472},{"id":"https://openalex.org/C513153333","wikidata":"https://www.wikidata.org/wiki/Q663","display_name":"Aluminium","level":2,"score":0.5219703912734985},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.4937683045864105},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.47599923610687256},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.4484878480434418},{"id":"https://openalex.org/C544778455","wikidata":"https://www.wikidata.org/wiki/Q753","display_name":"Copper","level":2,"score":0.42591673135757446},{"id":"https://openalex.org/C187725362","wikidata":"https://www.wikidata.org/wiki/Q830521","display_name":"Q factor","level":3,"score":0.42088782787323},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.17932051420211792},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.17686894536018372},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.15914183855056763},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0645071268081665},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.0},{"id":"https://openalex.org/C97126364","wikidata":"https://www.wikidata.org/wiki/Q349669","display_name":"Resonator","level":2,"score":0.0},{"id":"https://openalex.org/C5900021","wikidata":"https://www.wikidata.org/wiki/Q163082","display_name":"Petrology","level":1,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/cicc.2003.1249367","is_oa":false,"landing_page_url":"https://doi.org/10.1109/cicc.2003.1249367","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the IEEE 2003 Custom Integrated Circuits Conference, 2003.","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W2097385544","https://openalex.org/W2125377543","https://openalex.org/W2166228848","https://openalex.org/W2167004581","https://openalex.org/W2788994432"],"related_works":["https://openalex.org/W1994549183","https://openalex.org/W1819679269","https://openalex.org/W2019398180","https://openalex.org/W4302014066","https://openalex.org/W2183629699","https://openalex.org/W2171039361","https://openalex.org/W2385321276","https://openalex.org/W2078853487","https://openalex.org/W2079671455","https://openalex.org/W1965367518"],"abstract_inverted_index":{"Differential":[0],"shielding":[1],"reduces":[2],"substrate":[3],"losses":[4],"and":[5,37,68],"improves":[6],"the":[7],"Q-factor":[8],"of":[9,29,79],"a":[10,23,54,69],"monolithic":[11],"inductor":[12],"on":[13,48],"silicon":[14],"by":[15],"up":[16],"to":[17],"35%":[18],"without":[19],"process":[20],"modification":[21],"or":[22],"patterned":[24],"ground":[25],"shield.":[26],"Peak":[27],"Qs":[28],"32":[30],"for":[31,39,53],"4":[32],"/spl":[33,41,50],"mu/m":[34,42],"thick":[35,43],"aluminum":[36],"28":[38],"2.3":[40],"copper":[44],"metals":[45],"are":[46],"demonstrated":[47],"10":[49],"Omega/-cm":[51],"substrates":[52],"7.7":[55],"nH":[56],"test":[57],"inductor.":[58],"The":[59],"differential":[60],"shield":[61],"fulfills":[62],"all":[63],"existing":[64],"metal":[65],"density":[66],"requirements,":[67],"compact":[70],"circuit":[71],"model":[72],"is":[73],"presented":[74],"that":[75],"agrees":[76],"within":[77],"8%":[78],"measurement.":[80]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}