{"id":"https://openalex.org/W2146931215","doi":"https://doi.org/10.1109/cicc.2002.1012860","title":"ESD protection design for RF integrated circuits: new challenges","display_name":"ESD protection design for RF integrated circuits: new challenges","publication_year":2003,"publication_date":"2003-06-25","ids":{"openalex":"https://openalex.org/W2146931215","doi":"https://doi.org/10.1109/cicc.2002.1012860","mag":"2146931215"},"language":"en","primary_location":{"id":"doi:10.1109/cicc.2002.1012860","is_oa":false,"landing_page_url":"https://doi.org/10.1109/cicc.2002.1012860","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the IEEE 2002 Custom Integrated Circuits Conference (Cat. No.02CH37285)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5072125647","display_name":"A.Z. Wang","orcid":null},"institutions":[{"id":"https://openalex.org/I180949307","display_name":"Illinois Institute of Technology","ror":"https://ror.org/037t3ry66","country_code":"US","type":"education","lineage":["https://openalex.org/I180949307"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A.Z. Wang","raw_affiliation_strings":["Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]},{"raw_affiliation_string":"Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052172658","display_name":"Haigang Feng","orcid":"https://orcid.org/0000-0002-8377-1171"},"institutions":[{"id":"https://openalex.org/I180949307","display_name":"Illinois Institute of Technology","ror":"https://ror.org/037t3ry66","country_code":"US","type":"education","lineage":["https://openalex.org/I180949307"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"H.G. Feng","raw_affiliation_strings":["Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]},{"raw_affiliation_string":"Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111939932","display_name":"R. Zhan","orcid":"https://orcid.org/0009-0003-9206-5863"},"institutions":[{"id":"https://openalex.org/I180949307","display_name":"Illinois Institute of Technology","ror":"https://ror.org/037t3ry66","country_code":"US","type":"education","lineage":["https://openalex.org/I180949307"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R.Y. Zhan","raw_affiliation_strings":["Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]},{"raw_affiliation_string":"Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081971104","display_name":"G. Chen","orcid":null},"institutions":[{"id":"https://openalex.org/I180949307","display_name":"Illinois Institute of Technology","ror":"https://ror.org/037t3ry66","country_code":"US","type":"education","lineage":["https://openalex.org/I180949307"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"G. Chen","raw_affiliation_strings":["Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]},{"raw_affiliation_string":"Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5017900036","display_name":"Wu Qu","orcid":"https://orcid.org/0000-0002-5405-2960"},"institutions":[{"id":"https://openalex.org/I180949307","display_name":"Illinois Institute of Technology","ror":"https://ror.org/037t3ry66","country_code":"US","type":"education","lineage":["https://openalex.org/I180949307"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Q. Wu","raw_affiliation_strings":["Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical & Computer Engineering, Illinois Institute of Technology, Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]},{"raw_affiliation_string":"Dept of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA","institution_ids":["https://openalex.org/I180949307"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I180949307"],"apc_list":null,"apc_paid":null,"fwci":5.3145,"has_fulltext":false,"cited_by_count":36,"citation_normalized_percentile":{"value":0.95877582,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":90,"max":97},"biblio":{"volume":null,"issue":null,"first_page":"411","last_page":"418"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11444","display_name":"Electromagnetic Compatibility and Noise Suppression","score":0.9991999864578247,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9988999962806702,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electrostatic-discharge","display_name":"Electrostatic discharge","score":0.7913478016853333},{"id":"https://openalex.org/keywords/resistive-touchscreen","display_name":"Resistive touchscreen","score":0.6150133609771729},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.5598741173744202},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.5288287997245789},{"id":"https://openalex.org/keywords/noise","display_name":"Noise (video)","score":0.5204358696937561},{"id":"https://openalex.org/keywords/capacitive-sensing","display_name":"Capacitive sensing","score":0.5193449258804321},{"id":"https://openalex.org/keywords/emi","display_name":"EMI","score":0.5107171535491943},{"id":"https://openalex.org/keywords/capacitive-coupling","display_name":"Capacitive coupling","score":0.5070974826812744},{"id":"https://openalex.org/keywords/radio-frequency","display_name":"Radio frequency","score":0.4799092710018158},{"id":"https://openalex.org/keywords/electronic-circuit","display_name":"Electronic circuit","score":0.4647144079208374},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.42548704147338867},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.36703118681907654},{"id":"https://openalex.org/keywords/electromagnetic-interference","display_name":"Electromagnetic interference","score":0.3111897110939026},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.10534822940826416}],"concepts":[{"id":"https://openalex.org/C205483674","wikidata":"https://www.wikidata.org/wiki/Q3574961","display_name":"Electrostatic discharge","level":3,"score":0.7913478016853333},{"id":"https://openalex.org/C6899612","wikidata":"https://www.wikidata.org/wiki/Q852911","display_name":"Resistive touchscreen","level":2,"score":0.6150133609771729},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.5598741173744202},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.5288287997245789},{"id":"https://openalex.org/C99498987","wikidata":"https://www.wikidata.org/wiki/Q2210247","display_name":"Noise (video)","level":3,"score":0.5204358696937561},{"id":"https://openalex.org/C206755178","wikidata":"https://www.wikidata.org/wiki/Q1131271","display_name":"Capacitive sensing","level":2,"score":0.5193449258804321},{"id":"https://openalex.org/C43461449","wikidata":"https://www.wikidata.org/wiki/Q2495531","display_name":"EMI","level":3,"score":0.5107171535491943},{"id":"https://openalex.org/C68278764","wikidata":"https://www.wikidata.org/wiki/Q444167","display_name":"Capacitive coupling","level":3,"score":0.5070974826812744},{"id":"https://openalex.org/C74064498","wikidata":"https://www.wikidata.org/wiki/Q3396184","display_name":"Radio frequency","level":2,"score":0.4799092710018158},{"id":"https://openalex.org/C134146338","wikidata":"https://www.wikidata.org/wiki/Q1815901","display_name":"Electronic circuit","level":2,"score":0.4647144079208374},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.42548704147338867},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.36703118681907654},{"id":"https://openalex.org/C184892835","wikidata":"https://www.wikidata.org/wiki/Q1474513","display_name":"Electromagnetic interference","level":2,"score":0.3111897110939026},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.10534822940826416},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/cicc.2002.1012860","is_oa":false,"landing_page_url":"https://doi.org/10.1109/cicc.2002.1012860","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the IEEE 2002 Custom Integrated Circuits Conference (Cat. No.02CH37285)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W585256305","https://openalex.org/W1543631479","https://openalex.org/W1992840544","https://openalex.org/W2117981382","https://openalex.org/W2139332251","https://openalex.org/W2156940031"],"related_works":["https://openalex.org/W76001227","https://openalex.org/W2349537384","https://openalex.org/W1986241886","https://openalex.org/W2041511579","https://openalex.org/W3120066331","https://openalex.org/W2549052135","https://openalex.org/W2018141764","https://openalex.org/W4385545073","https://openalex.org/W2163032211","https://openalex.org/W4242752962"],"abstract_inverted_index":{"The":[0],"challenge":[1],"in":[2,11,29],"RF":[3,76],"ESD":[4,21,44,77],"protection":[5,22,45],"circuit":[6,26],"design,":[7],"still":[8],"a":[9],"problem":[10],"definition,":[12],"is":[13],"to":[14,75],"address":[15],"the":[16,20,25,73],"complex":[17],"interactions":[18],"between":[19],"network":[23],"and":[24,40,56,65],"being":[27],"protected":[28],"both":[30],"directions.":[31],"This":[32],"paper":[33],"discusses":[34],"related":[35],"key":[36],"factors,":[37],"e.g.,":[38],"switching":[39],"accidental":[41],"triggering":[42],"of":[43],"networks,":[46],"as":[47,49],"well":[48],"ESD-induced":[50],"parasitic":[51],"capacitive,":[52],"resistive,":[53],"noise":[54,58],"coupling":[55],"self-generated":[57],"effects.":[59],"Evaluation":[60],"techniques":[61],"include":[62],"S-parameter,":[63],"Q-factor":[64],"overall":[66],"specification":[67],"examination.":[68],"Low-parasitic":[69],"compact":[70],"structures":[71],"are":[72],"solutions":[74],"protection.":[78]},"counts_by_year":[{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":2},{"year":2021,"cited_by_count":3},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-06-26T08:34:08.712188","created_date":"2025-10-10T00:00:00"}