{"id":"https://openalex.org/W1933867914","doi":"https://doi.org/10.1109/cca.2015.7320882","title":"Optimization and simulation of exposure pattern for scanning laser lithography","display_name":"Optimization and simulation of exposure pattern for scanning laser lithography","publication_year":2015,"publication_date":"2015-09-01","ids":{"openalex":"https://openalex.org/W1933867914","doi":"https://doi.org/10.1109/cca.2015.7320882","mag":"1933867914"},"language":"en","primary_location":{"id":"doi:10.1109/cca.2015.7320882","is_oa":false,"landing_page_url":"https://doi.org/10.1109/cca.2015.7320882","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 IEEE Conference on Control Applications (CCA)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5055686178","display_name":"Omid T. Ghalehbeygi","orcid":"https://orcid.org/0000-0002-7908-7924"},"institutions":[{"id":"https://openalex.org/I78757542","display_name":"University of Newcastle Australia","ror":"https://ror.org/00eae9z71","country_code":"AU","type":"education","lineage":["https://openalex.org/I78757542"]}],"countries":["AU"],"is_corresponding":true,"raw_author_name":"Omid T. Ghalehbeygi","raw_affiliation_strings":["School of Electrical Engineering and Computer Science, The University of Newcastle, Callaghan, NSW, Australia","School of Electrical Engineering & Computer Science, The University of Newcastle, Callaghan, NSW 2308, Australia#TAB#"],"affiliations":[{"raw_affiliation_string":"School of Electrical Engineering and Computer Science, The University of Newcastle, Callaghan, NSW, Australia","institution_ids":["https://openalex.org/I78757542"]},{"raw_affiliation_string":"School of Electrical Engineering & Computer Science, The University of Newcastle, Callaghan, NSW 2308, Australia#TAB#","institution_ids":["https://openalex.org/I78757542"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032472721","display_name":"Garth A. Berriman","orcid":null},"institutions":[{"id":"https://openalex.org/I78757542","display_name":"University of Newcastle Australia","ror":"https://ror.org/00eae9z71","country_code":"AU","type":"education","lineage":["https://openalex.org/I78757542"]}],"countries":["AU"],"is_corresponding":false,"raw_author_name":"Garth Berriman","raw_affiliation_strings":["School of Electrical Engineering and Computer Science, The University of Newcastle, Callaghan, NSW, Australia","School of Electrical Engineering & Computer Science, The University of Newcastle, Callaghan, NSW 2308, Australia#TAB#"],"affiliations":[{"raw_affiliation_string":"School of Electrical Engineering and Computer Science, The University of Newcastle, Callaghan, NSW, Australia","institution_ids":["https://openalex.org/I78757542"]},{"raw_affiliation_string":"School of Electrical Engineering & Computer Science, The University of Newcastle, Callaghan, NSW 2308, Australia#TAB#","institution_ids":["https://openalex.org/I78757542"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055319905","display_name":"Andrew J. Fleming","orcid":"https://orcid.org/0000-0001-7132-8458"},"institutions":[{"id":"https://openalex.org/I78757542","display_name":"University of Newcastle Australia","ror":"https://ror.org/00eae9z71","country_code":"AU","type":"education","lineage":["https://openalex.org/I78757542"]}],"countries":["AU"],"is_corresponding":false,"raw_author_name":"Andrew J. Fleming","raw_affiliation_strings":["School of Electrical Engineering and Computer Science, The University of Newcastle, Callaghan, NSW, Australia","School of Electrical Engineering & Computer Science, The University of Newcastle, Callaghan, NSW 2308, Australia#TAB#"],"affiliations":[{"raw_affiliation_string":"School of Electrical Engineering and Computer Science, The University of Newcastle, Callaghan, NSW, Australia","institution_ids":["https://openalex.org/I78757542"]},{"raw_affiliation_string":"School of Electrical Engineering & Computer Science, The University of Newcastle, Callaghan, NSW 2308, Australia#TAB#","institution_ids":["https://openalex.org/I78757542"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5086220312","display_name":"John Holdsworth","orcid":"https://orcid.org/0000-0002-8936-0832"},"institutions":[{"id":"https://openalex.org/I78757542","display_name":"University of Newcastle Australia","ror":"https://ror.org/00eae9z71","country_code":"AU","type":"education","lineage":["https://openalex.org/I78757542"]}],"countries":["AU"],"is_corresponding":false,"raw_author_name":"John L. Holdsworth","raw_affiliation_strings":["School of Mathematical and Physical Science, The University of Newcastle, Callaghan, NSW, Australia","School of Mathematical and Physical Science, The University of Newcastle, Callaghan NSW 2308, Australia"],"affiliations":[{"raw_affiliation_string":"School of Mathematical and Physical Science, The University of Newcastle, Callaghan, NSW, Australia","institution_ids":["https://openalex.org/I78757542"]},{"raw_affiliation_string":"School of Mathematical and Physical Science, The University of Newcastle, Callaghan NSW 2308, Australia","institution_ids":["https://openalex.org/I78757542"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5055686178"],"corresponding_institution_ids":["https://openalex.org/I78757542"],"apc_list":null,"apc_paid":null,"fwci":0.8018,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.76097456,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"1868","last_page":"1873"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9973000288009644,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photolithography","display_name":"Photolithography","score":0.8927286863327026},{"id":"https://openalex.org/keywords/photomask","display_name":"Photomask","score":0.8898375034332275},{"id":"https://openalex.org/keywords/photoresist","display_name":"Photoresist","score":0.8542413711547852},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.76935213804245},{"id":"https://openalex.org/keywords/computational-lithography","display_name":"Computational lithography","score":0.7411258220672607},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"Optical proximity correction","score":0.7395098209381104},{"id":"https://openalex.org/keywords/maskless-lithography","display_name":"Maskless lithography","score":0.7100431323051453},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5731115341186523},{"id":"https://openalex.org/keywords/reduction","display_name":"Reduction (mathematics)","score":0.45992574095726013},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.4451286196708679},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.44070643186569214},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3927595913410187},{"id":"https://openalex.org/keywords/x-ray-lithography","display_name":"X-ray lithography","score":0.3535894751548767},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.3484301269054413},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.2514650821685791},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.21166622638702393},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.1993417739868164},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.1322932243347168},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.0948193371295929}],"concepts":[{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.8927286863327026},{"id":"https://openalex.org/C14737013","wikidata":"https://www.wikidata.org/wiki/Q1319657","display_name":"Photomask","level":4,"score":0.8898375034332275},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.8542413711547852},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.76935213804245},{"id":"https://openalex.org/C182873914","wikidata":"https://www.wikidata.org/wiki/Q5157329","display_name":"Computational lithography","level":5,"score":0.7411258220672607},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.7395098209381104},{"id":"https://openalex.org/C137905882","wikidata":"https://www.wikidata.org/wiki/Q6783445","display_name":"Maskless lithography","level":5,"score":0.7100431323051453},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5731115341186523},{"id":"https://openalex.org/C111335779","wikidata":"https://www.wikidata.org/wiki/Q3454686","display_name":"Reduction (mathematics)","level":2,"score":0.45992574095726013},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4451286196708679},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.44070643186569214},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3927595913410187},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.3535894751548767},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3484301269054413},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2514650821685791},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.21166622638702393},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.1993417739868164},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.1322932243347168},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0948193371295929},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/cca.2015.7320882","is_oa":false,"landing_page_url":"https://doi.org/10.1109/cca.2015.7320882","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 IEEE Conference on Control Applications (CCA)","raw_type":"proceedings-article"},{"id":"pmh:uon:23299","is_oa":false,"landing_page_url":"http://hdl.handle.net/1959.13/1316997","pdf_url":null,"source":{"id":"https://openalex.org/S4377196471","display_name":"NOVA (University of Newcastle Australia)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I78757542","host_organization_name":"University of Newcastle Australia","host_organization_lineage":["https://openalex.org/I78757542"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Quality Education","id":"https://metadata.un.org/sdg/4","score":0.8199999928474426}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W244729084","https://openalex.org/W1594489858","https://openalex.org/W1666853924","https://openalex.org/W1967646700","https://openalex.org/W1968557601","https://openalex.org/W1994463647","https://openalex.org/W1997609865","https://openalex.org/W2000832136","https://openalex.org/W2020612772","https://openalex.org/W2060807102","https://openalex.org/W2067386733","https://openalex.org/W2076605490","https://openalex.org/W2078607594","https://openalex.org/W2121030977","https://openalex.org/W2123224804","https://openalex.org/W2128294987","https://openalex.org/W2129996279","https://openalex.org/W2137485473","https://openalex.org/W2144873182","https://openalex.org/W2160093801"],"related_works":["https://openalex.org/W2115322984","https://openalex.org/W2026384529","https://openalex.org/W2083608678","https://openalex.org/W2091275358","https://openalex.org/W2053810203","https://openalex.org/W2080426739","https://openalex.org/W2171618672","https://openalex.org/W2080608046","https://openalex.org/W2354791188","https://openalex.org/W2050251653"],"abstract_inverted_index":{"Maskless":[0],"optical":[1,71],"lithography":[2,105],"is":[3,52,121],"a":[4,19,54,76,135,139,164],"technique":[5,77,106,120],"for":[6,113],"writing":[7],"patterns":[8],"into":[9],"an":[10,81,103,148],"optically":[11],"sensitive":[12],"material":[13],"(photoresist)":[14],"without":[15],"the":[16,29,33,38,42,48,58,63,70,88,94,143,159,174,184,188,191],"use":[17],"of":[18,28,57,69,79,130,142,158,176,181,183,190],"photomask.":[20],"The":[21,119],"patterning":[22],"process":[23,126],"involves":[24],"exposing":[25],"selected":[26],"areas":[27],"photoresist":[30],"film":[31],"to":[32,36,46,62,93,146],"sensitizing":[34],"light":[35],"produce":[37,47],"desired":[39,49,59,89,185],"pattern.":[40],"Unfortunately,":[41],"exposure":[43,82],"pattern":[44,50,60,83,90],"required":[45],"(output)":[51],"not":[53],"simple":[55],"function":[56,141],"due":[61],"geometric":[64],"properties":[65],"and":[66,133,187],"focusing":[67],"limits":[68],"beam.":[72],"Thus,":[73],"we":[74],"seek":[75],"capable":[78],"generating":[80],"which":[84,108],"will":[85],"result":[86],"in":[87,116,128,138,153,156,163,179],"being":[91],"transferred":[92],"photoresist.":[95],"This":[96,151],"goal":[97],"can":[98],"be":[99],"achieved":[100],"by":[101,124,195],"exploiting":[102],"inverse":[104],"(ILT)":[107],"has":[109,169],"previously":[110,171],"been":[111,170],"used":[112],"mask":[114],"design":[115],"micro-photolithography":[117],"systems.":[118],"carried":[122],"out":[123],"interpreting":[125],"flow":[127],"terms":[129,180],"forward":[131],"modelling":[132],"presenting":[134],"regularization":[136],"term":[137],"cost":[140],"optimization":[144,160],"problem":[145],"approach":[147],"efficient":[149],"solution.":[150],"reduction":[152],"computational":[154],"complexity":[155],"parts":[157],"calculation,":[161],"results":[162],"much":[165],"faster":[166],"convergence":[167],"than":[168],"reported.":[172],"Finally,":[173],"effectiveness":[175],"this":[177],"method":[178],"fidelity":[182],"features":[186],"time":[189],"calculation":[192],"are":[193],"verified":[194],"computer":[196],"simulation.":[197]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":2}],"updated_date":"2026-04-04T16:13:02.066488","created_date":"2025-10-10T00:00:00"}