{"id":"https://openalex.org/W2111845770","doi":"https://doi.org/10.1109/case.2011.6042425","title":"Multilevel Lasso applied to Virtual Metrology in semiconductor manufacturing","display_name":"Multilevel Lasso applied to Virtual Metrology in semiconductor manufacturing","publication_year":2011,"publication_date":"2011-08-01","ids":{"openalex":"https://openalex.org/W2111845770","doi":"https://doi.org/10.1109/case.2011.6042425","mag":"2111845770"},"language":"en","primary_location":{"id":"doi:10.1109/case.2011.6042425","is_oa":false,"landing_page_url":"https://doi.org/10.1109/case.2011.6042425","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2011 IEEE International Conference on Automation Science and Engineering","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5061018928","display_name":"Simone Pampuri","orcid":"https://orcid.org/0000-0002-0582-9892"},"institutions":[{"id":"https://openalex.org/I25217355","display_name":"University of Pavia","ror":"https://ror.org/00s6t1f81","country_code":"IT","type":"education","lineage":["https://openalex.org/I25217355"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Simone Pampuri","raw_affiliation_strings":["University of Pavia, Italy","\u2021University of Pavia, Italy,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Pavia, Italy","institution_ids":["https://openalex.org/I25217355"]},{"raw_affiliation_string":"\u2021University of Pavia, Italy,","institution_ids":["https://openalex.org/I25217355"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081650242","display_name":"Andrea Schirru","orcid":"https://orcid.org/0000-0002-9249-1227"},"institutions":[{"id":"https://openalex.org/I25217355","display_name":"University of Pavia","ror":"https://ror.org/00s6t1f81","country_code":"IT","type":"education","lineage":["https://openalex.org/I25217355"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Andrea Schirru","raw_affiliation_strings":["University of Pavia, Italy","\u2021University of Pavia, Italy,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Pavia, Italy","institution_ids":["https://openalex.org/I25217355"]},{"raw_affiliation_string":"\u2021University of Pavia, Italy,","institution_ids":["https://openalex.org/I25217355"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066404065","display_name":"Giuseppe Fazio","orcid":"https://orcid.org/0000-0002-2535-0934"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Giuseppe Fazio","raw_affiliation_strings":["Numonyx, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Numonyx, Italy","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5017270452","display_name":"Giuseppe De Nicolao","orcid":"https://orcid.org/0000-0002-3712-9911"},"institutions":[{"id":"https://openalex.org/I25217355","display_name":"University of Pavia","ror":"https://ror.org/00s6t1f81","country_code":"IT","type":"education","lineage":["https://openalex.org/I25217355"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Giuseppe De Nicolao","raw_affiliation_strings":["University of Pavia, Italy","\u2021University of Pavia, Italy,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Pavia, Italy","institution_ids":["https://openalex.org/I25217355"]},{"raw_affiliation_string":"\u2021University of Pavia, Italy,","institution_ids":["https://openalex.org/I25217355"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":12.9608,"has_fulltext":false,"cited_by_count":30,"citation_normalized_percentile":{"value":0.9862796,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":90,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"244","last_page":"249"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11443","display_name":"Advanced Statistical Process Monitoring","score":0.9955999851226807,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T10640","display_name":"Spectroscopy and Chemometric Analyses","score":0.9811000227928162,"subfield":{"id":"https://openalex.org/subfields/1602","display_name":"Analytical Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/metrology","display_name":"Metrology","score":0.8668520450592041},{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.6900038719177246},{"id":"https://openalex.org/keywords/context","display_name":"Context (archaeology)","score":0.6351315975189209},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5912001132965088},{"id":"https://openalex.org/keywords/lasso","display_name":"Lasso (programming language)","score":0.5800781846046448},{"id":"https://openalex.org/keywords/dimensional-metrology","display_name":"Dimensional metrology","score":0.5113232135772705},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.511223316192627},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.4991579055786133},{"id":"https://openalex.org/keywords/statistical-process-control","display_name":"Statistical process control","score":0.4396357536315918},{"id":"https://openalex.org/keywords/manufacturing-engineering","display_name":"Manufacturing engineering","score":0.4159303903579712},{"id":"https://openalex.org/keywords/data-mining","display_name":"Data mining","score":0.38410821557044983},{"id":"https://openalex.org/keywords/industrial-engineering","display_name":"Industrial engineering","score":0.3709585964679718},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.2697926163673401},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.1397477388381958},{"id":"https://openalex.org/keywords/statistics","display_name":"Statistics","score":0.10032087564468384},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.09300476312637329}],"concepts":[{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.8668520450592041},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.6900038719177246},{"id":"https://openalex.org/C2779343474","wikidata":"https://www.wikidata.org/wiki/Q3109175","display_name":"Context (archaeology)","level":2,"score":0.6351315975189209},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5912001132965088},{"id":"https://openalex.org/C37616216","wikidata":"https://www.wikidata.org/wiki/Q3218363","display_name":"Lasso (programming language)","level":2,"score":0.5800781846046448},{"id":"https://openalex.org/C165880335","wikidata":"https://www.wikidata.org/wiki/Q5277273","display_name":"Dimensional metrology","level":3,"score":0.5113232135772705},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.511223316192627},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4991579055786133},{"id":"https://openalex.org/C113644684","wikidata":"https://www.wikidata.org/wiki/Q1356717","display_name":"Statistical process control","level":3,"score":0.4396357536315918},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.4159303903579712},{"id":"https://openalex.org/C124101348","wikidata":"https://www.wikidata.org/wiki/Q172491","display_name":"Data mining","level":1,"score":0.38410821557044983},{"id":"https://openalex.org/C13736549","wikidata":"https://www.wikidata.org/wiki/Q4489420","display_name":"Industrial engineering","level":1,"score":0.3709585964679718},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2697926163673401},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.1397477388381958},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.10032087564468384},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.09300476312637329},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C136764020","wikidata":"https://www.wikidata.org/wiki/Q466","display_name":"World Wide Web","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/case.2011.6042425","is_oa":false,"landing_page_url":"https://doi.org/10.1109/case.2011.6042425","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2011 IEEE International Conference on Automation Science and Engineering","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","score":0.6100000143051147,"id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W206335703","https://openalex.org/W1512098439","https://openalex.org/W1554944419","https://openalex.org/W1979877142","https://openalex.org/W2024594469","https://openalex.org/W2040191278","https://openalex.org/W2047028564","https://openalex.org/W2070963892","https://openalex.org/W2075852334","https://openalex.org/W2110884433","https://openalex.org/W2115571336","https://openalex.org/W2129431599","https://openalex.org/W2135046866","https://openalex.org/W2139430280","https://openalex.org/W2140170995","https://openalex.org/W3000332379","https://openalex.org/W3215186461","https://openalex.org/W4234173777","https://openalex.org/W6630527977","https://openalex.org/W6645284614","https://openalex.org/W6679159533"],"related_works":["https://openalex.org/W2061967405","https://openalex.org/W2392646414","https://openalex.org/W2008976958","https://openalex.org/W2082858021","https://openalex.org/W4248596843","https://openalex.org/W2155564425","https://openalex.org/W2151505334","https://openalex.org/W2507812949","https://openalex.org/W2115540908","https://openalex.org/W4256167503"],"abstract_inverted_index":{"In":[0,102],"semiconductor":[1,173],"manufacturing,":[2],"the":[3,6,21,56,63,109,172],"state":[4],"of":[5,49,75,90,108,156],"art":[7],"for":[8],"wafer":[9],"quality":[10],"control":[11,19],"is":[12,37,53,85,163],"based":[13,142],"on":[14,143,165],"product":[15],"monitoring":[16],"and":[17,34,59,96,126,134,152,168],"feedback":[18],"loops;":[20],"related":[22],"metrology":[23,57,76],"operations,":[24],"that":[25],"usually":[26,86],"involve":[27],"scanning":[28],"electron":[29],"microscopes,":[30],"are":[31,124],"particularly":[32],"cost-intensive":[33],"time-consuming.":[35],"It":[36],"therefore":[38],"not":[39],"possible":[40],"to":[41,61,71,99],"evaluate":[42],"every":[43],"wafer:":[44],"commonly,":[45],"a":[46,50,139],"small":[47],"subset":[48],"productive":[51],"lot":[52],"measured":[54],"at":[55],"station":[58],"delegated":[60],"represent":[62],"whole":[64],"lot.":[65],"Virtual":[66],"Metrology":[67],"(VM)":[68],"methodologies":[69],"aim":[70],"obtain":[72],"reliable":[73],"estimates":[74],"results":[77],"without":[78],"actually":[79],"performing":[80],"measurement":[81,169],"operations;":[82],"this":[83,103],"goal":[84],"achieved":[87],"by":[88,131,154],"means":[89,155],"statistical":[91],"models,":[92],"linking":[93],"process":[94,167],"data":[95,128,170],"context":[97],"information":[98],"target":[100],"measurements.":[101],"paper,":[104],"we":[105],"tackle":[106],"two":[107],"most":[110],"important":[111],"issues":[112],"in":[113,117],"VM:":[114],"(i)":[115],"regression":[116],"high":[118],"dimensional":[119],"spaces":[120],"where":[121],"few":[122],"variables":[123],"meaningful,":[125],"(ii)":[127],"heterogeneity":[129],"caused":[130],"inhomogeneous":[132],"production":[133],"equipment":[135],"logistics.":[136],"We":[137],"propose":[138],"hierarchical":[140],"framework":[141],"\u2113":[144],"<sub":[145],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[146],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">1</sub>":[147],"-penalized":[148],"machine":[149],"learning":[150,158],"techniques":[151],"solved":[153],"multitask":[157],"strategies.":[159],"The":[160],"proposed":[161],"methodology":[162],"validated":[164],"actual":[166],"from":[171],"manufacturing":[174],"industry.":[175]},"counts_by_year":[{"year":2022,"cited_by_count":4},{"year":2021,"cited_by_count":2},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":2},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":5},{"year":2013,"cited_by_count":5},{"year":2012,"cited_by_count":7}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}